| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/02/2013 | EP2539776A1 Method and apparatus for performing pattern alignment |
| 01/02/2013 | EP2539775A1 Method and apparatus for performing pattern alignment |
| 01/02/2013 | EP2539774A1 Method and apparatus for performing pattern alignment |
| 01/02/2013 | EP2539773A1 Method and apparatus for performing pattern alignment |
| 01/02/2013 | EP2539772A1 Exposure device for producing printing originals and use of an exposure device |
| 01/02/2013 | EP2539771A1 Lithographic apparatus and device manufacturing method |
| 01/02/2013 | EP2539770A1 Lithographic apparatus and device manufacturing method |
| 01/02/2013 | EP2539769A1 Pattern forming method and resist composition |
| 01/02/2013 | EP2539750A1 Azicon beam polarization devices |
| 01/02/2013 | EP2539668A1 Method and system for measurng in patterned structures |
| 01/02/2013 | EP2539316A1 Latent acids and their use |
| 01/02/2013 | CN202652718U Multifunctional cart receiving PCB orderly |
| 01/02/2013 | CN202649670U Spray device of solder resist developing machine |
| 01/02/2013 | CN202649669U Exposure compensation machine |
| 01/02/2013 | CN202649668U Automatic mask cleaning system and exposure equipment |
| 01/02/2013 | CN202649580U Adjustable magnification lens for direct-write lithography machine |
| 01/02/2013 | CN1894626B Photocurable compositions for articles having stable tensile properties |
| 01/02/2013 | CN102859612A Photosensitive Conductive Film, Method For Forming Conductive Membrane, And Method For Forming Conductive Pattern |
| 01/02/2013 | CN102859444A Spectral purity filter |
| 01/02/2013 | CN102859443A Method and apparatus for loading a substrate |
| 01/02/2013 | CN102859442A Collector mirror assembly and method for producing extreme ultraviolet radiation |
| 01/02/2013 | CN102859441A Nanopatterning method and apparatus |
| 01/02/2013 | CN102859440A Illumination system of a microlithographic projection exposure apparatus |
| 01/02/2013 | CN102859439A Positive radiation-sensitive composition, interlayer insulating film for display element, and formation method for same |
| 01/02/2013 | CN102859438A Photosensitive resin composition, photosensitive element comprising the composition, method for formation of septum for image display device, process for production of image display device, and image display device |
| 01/02/2013 | CN102859437A Photosensitive composition, photosensitive film, photosensitive laminate, method for forming permanent pattern, and printed board |
| 01/02/2013 | CN102859436A Methods and systems of material removal and pattern transfer |
| 01/02/2013 | CN102859400A Pigment dispersion, negative resist composition for color filter, color filter, liquid crystal display device, and organic light-emitting display device |
| 01/02/2013 | CN102858738A Liquid radiation curable resins for additive fabrication comprising a triaryl sulfonium borate cationic photoinitiator |
| 01/02/2013 | CN102856245A Efficient photoetching manufacturing method of ferrite base membrane circuit |
| 01/02/2013 | CN102856224A Method and apparatus for processing wafer edge portion |
| 01/02/2013 | CN102856168A Method for improving peeling of island-shaped photoresist |
| 01/02/2013 | CN102854761A Solution and method for removing photoresist after etching |
| 01/02/2013 | CN102854760A Nozzle device for wafer machining and semiconductor manufacturing equipment |
| 01/02/2013 | CN102854759A Method for reducing photoresist pattern defect and equipment for forming photoresist pattern |
| 01/02/2013 | CN102854758A X-Y micro-adjustment apparatus for optical element in lithographic projection objective |
| 01/02/2013 | CN102854757A Projection objective wave aberration measurement system and method based on aerial image linear fitting |
| 01/02/2013 | CN102854756A Method and device for exposure |
| 01/02/2013 | CN102854755A Exposure apparatus |
| 01/02/2013 | CN102854754A Exposing method and device thereof |
| 01/02/2013 | CN102854753A Exposure device and exposure method |
| 01/02/2013 | CN102854752A Proximity exposure device |
| 01/02/2013 | CN102854751A Focusing adjustment leveling mechanism of photolithographic machine and leveling mechanism of photolithographic machine |
| 01/02/2013 | CN102854750A Photosensitive resin composition, photosensitive element, method for forming resist pattern, method for producing lead frame, and method for producing printed wiring board |
| 01/02/2013 | CN102854749A Photosensitive resin composition for color filter and color filter using same |
| 01/02/2013 | CN102854748A Photosensitive composition and application thereof |
| 01/02/2013 | CN102854747A Flexible photopolymer plate with small plate surface viscosity |
| 01/02/2013 | CN102854746A Curable resin composition for photo spacer, column spacer and liquid crystal display |
| 01/02/2013 | CN102854745A Photosensitive polymer composition, method of producing pattern and electronic parts |
| 01/02/2013 | CN102854744A Photosensitive resin composition, cured product thereof, and method for producing photosensitive resin |
| 01/02/2013 | CN102854743A Radiation-sensitive resin composition, cured film for display element, method for forming cured film for display element, and display element |
| 01/02/2013 | CN102854742A Black resin composition, black matrix and light shielding layer |
| 01/02/2013 | CN102854741A Compound soft die for wafer-grade nano imprinting of uneven substrate and manufacturing method |
| 01/02/2013 | CN102854740A Gray tone mask inspecting device and method, and pattern transferring method |
| 01/02/2013 | CN102854668A Manufacture method of display substrate, display substrate and display device |
| 01/02/2013 | CN102854656A Colored light filtering substrate and relative manufacturing method thereof |
| 01/02/2013 | CN102854597A High-precision supporting structure of optical element in photo-etching objective lens |
| 01/02/2013 | CN102854596A High-precision supporting structure of optical lens |
| 01/02/2013 | CN102850485A Cyanoadamantyl compounds and polymers |
| 01/02/2013 | CN102850484A Polymer composition and photoresist comprising the same |
| 01/02/2013 | CN102849929A Titania-doped quartz glass member and making method |
| 01/02/2013 | CN102848667A Anti-counterfeiting film with multiple anti-counterfeiting effects, and preparation method thereof |
| 01/02/2013 | CN102279519B Three-dimensional micron/nano-structured fluid dielectrophoresis force scanning, embossing and forming method |
| 01/02/2013 | CN102262356B Methods for optimizing photoresist graph and forming contact hole |
| 01/02/2013 | CN102236254B 辐射敏感组合物 Radiation-sensitive composition |
| 01/02/2013 | CN102226853B Beam splitter apparatus and system |
| 01/02/2013 | CN102212304B Flexible circuit conductive composition, preparation method and using method thereof |
| 01/02/2013 | CN102207608B Catadioptric projection objective |
| 01/02/2013 | CN102163722B Negative electrode base member |
| 01/02/2013 | CN102161635B Photoactive compound |
| 01/02/2013 | CN102143843B Negative-working imageable element and method of use |
| 01/02/2013 | CN102096348B Digital Moire fringe method for improving quality of Moire fringe images in imprinting alignment process |
| 01/02/2013 | CN102096310B Method for correcting photoresist pattern and etching method |
| 01/02/2013 | CN102053504B Selection of optimum patterns in a design layout based on diffraction signature analysis |
| 01/02/2013 | CN102027418B Method for the real-time monitoring of integrated circuit manufacture through localized monitoring structures in OPC model space |
| 01/02/2013 | CN101968607B Automatic focusing method and device for lithography machine |
| 01/02/2013 | CN101930184B Developing treatment apparatus |
| 01/02/2013 | CN101891999B Water soluble photosensitive fluorescent powder coating and method for making anode fluorescent powder layer by same |
| 01/02/2013 | CN101755238B Dual photoinitiator, photocurable composition, use thereof and process for producing a three dimensional article |
| 01/02/2013 | CN101750903B Photolithography |
| 01/02/2013 | CN101718955B Substrate processing system and substrate processing method |
| 01/02/2013 | CN101713918B Techniques for reducing degradation and/or modifying feature size of photomasks |
| 01/02/2013 | CN101566803B Exposure method and apparatus, and electronic device manufacturing method and lighting optical device |
| 01/02/2013 | CN101533220B Light-sensitive resin composition, light-sensitive resin transfer material, photospacer |
| 01/02/2013 | CN101495920B Negative-working radiation-sensitive compositions and imageable materials |
| 01/02/2013 | CN101470362B Exposure apparatus and device manufacturing method |
| 01/02/2013 | CN101414131B Exposure apparatus and method for photolithography process |
| 01/02/2013 | CN101384968B Scanning exposure apparatus, micro device manufacturing method, mask, projection optical apparatus and mask manufacturing method |
| 01/02/2013 | CN101370837B Active energy ray-curable resin composition and use thereof |
| 01/02/2013 | CN101324753B Radiation sensibility composition for forming staining layer, color filter and color liquid crystal display element |
| 01/02/2013 | CN101308327B Radiation-sensed resin composition, layer insulation film, microlens and forming method thereof |
| 01/02/2013 | CN101233456B 金属和电介质相容的牺牲性抗反射涂层清洗及去除组合物 Compatibility of the metal and the dielectric sacrificial anti-reflective coating composition for the cleaning and removal of |
| 01/02/2013 | CN101187782B Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system |
| 01/02/2013 | CN101065708B Method for forming photoresist pattern using double layer antireflection film |
| 01/02/2013 | CN101014569B Oxime ester initiators |
| 01/01/2013 | US8345216 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method |
| 01/01/2013 | US8344341 Lithographic apparatus and device manufacturing method |
| 01/01/2013 | US8344088 Spin-on anti-reflective coatings for photolithography |
| 01/01/2013 | US8344041 Monomer for dental compositions |
| 01/01/2013 | US8343714 Resist applying and developing method, resist film processing unit, and resist applying and developing apparatus comprising the unit |