| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/09/2013 | CN102866582A Nanometer impression device and nanometer impression method for high-brightness light-emitting diode (LED) graphics |
| 01/09/2013 | CN102866581A Method for overcoming exposure region defect caused by underexposure |
| 01/09/2013 | CN102866580A Nanolithography method and nanolithography device |
| 01/09/2013 | CN102866579A Method for manufacturing rotary drum pressing die based on dynamic nano engraving technology |
| 01/09/2013 | CN102866578A Photoetching method |
| 01/09/2013 | CN102866575A Manufacture method of phase-shift optical mask |
| 01/09/2013 | CN102866574A Phase-shift photo-mask manufacturing method |
| 01/09/2013 | CN102866544A Transparent electrode manufacturing method, mask plate and equipment |
| 01/09/2013 | CN102866532A Color filter substrate and relevant manufacturing method thereof |
| 01/09/2013 | CN102866458A Preparation process for etching deep optical waveguide |
| 01/09/2013 | CN102866443A Method of forming a sampled grating and method of producing a laser diode |
| 01/09/2013 | CN102866440A Manufacturing method of plano-convex microlens and array of plano-convex microlens |
| 01/09/2013 | CN102863559A Photoinitiator for UV (ultraviolet)-LED curing |
| 01/09/2013 | CN102141726B Manufacturing method of photomask, photomask and manufacturing method of display device |
| 01/09/2013 | CN102136484B Indium columns for face-down bonding interconnection of infrared focal plane and preparation method thereof |
| 01/09/2013 | CN102116960B Color film substrate and manufacturing method thereof |
| 01/09/2013 | CN102109763B Positive type photosensitive resin composition |
| 01/09/2013 | CN102016720B 柔版印刷原版 Flexographic printing original |
| 01/09/2013 | CN101960338B Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby |
| 01/09/2013 | CN101960337B Coloring resin composition for color filter, color filter, organic EL display and liquid crystal display |
| 01/09/2013 | CN101939166B Method of imaging and developing positive-working imageable elements |
| 01/09/2013 | CN101852992B Apparatus and method for optical position assessment |
| 01/09/2013 | CN101852985B Manufacturing method of substrate alignment mark |
| 01/09/2013 | CN101846886B Delta TCC (transmission cross coefficient) for high-speed sensibility model calculation |
| 01/09/2013 | CN101833237B Pressing device |
| 01/09/2013 | CN101794082B Lithographic apparatus and device manufacturing method |
| 01/09/2013 | CN101713925B Photoetching device |
| 01/09/2013 | CN101696351B Antistatic agent, antistatic film, and article coated with antistatic film |
| 01/09/2013 | CN101673683B Substrate processing method |
| 01/09/2013 | CN101598906B Substrate table, lithographic apparatus and device manufacturing method |
| 01/09/2013 | CN101535357B Photosensitive resin composition, photosensitive transfer material, pixel barrier and method for forming the same, substrate with pixel barrier, color filter and method for producing the same, and dis |
| 01/09/2013 | CN101500817B Production method and production device of cylindrical print substrate |
| 01/09/2013 | CN101402775B Inorganic filler and organic filler-containing curable resin composition, resist film coated printed wiring board, and method for producing the same |
| 01/08/2013 | US8351021 Optical system, exposure system, and exposure method |
| 01/08/2013 | US8351019 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| 01/08/2013 | US8350096 Compound for resist and radiation-sensitive composition |
| 01/08/2013 | US8349549 Resist surface modifying liquid, and method for formation of resist pattern using the same |
| 01/08/2013 | US8349548 Oxime ester photoinitiators |
| 01/08/2013 | US8349547 Lithographically defined microporous carbon structures |
| 01/08/2013 | US8349545 Methods of forming patterns |
| 01/08/2013 | US8349544 Method of manufacturing semiconductor device |
| 01/08/2013 | US8349543 Pattern-forming method, metal oxide film-forming material and method for using the metal oxide film-forming material |
| 01/08/2013 | US8349542 Manufacturing process of semiconductor device |
| 01/08/2013 | US8349541 Semiconductor device manufacturing method |
| 01/08/2013 | US8349540 Semiconductor device manufacturing method |
| 01/08/2013 | US8349539 Photosensitive polymides |
| 01/08/2013 | US8349538 Photo-curable and thermo-curable resin composition, and a dry film solder resist |
| 01/08/2013 | US8349537 Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof |
| 01/08/2013 | US8349536 Dithiane derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition |
| 01/08/2013 | US8349535 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith |
| 01/08/2013 | US8349534 Positive resist composition and method of forming resist pattern |
| 01/08/2013 | US8349533 Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process |
| 01/08/2013 | US8349241 Method to arrange features on a substrate to replicate features having minimal dimensional variability |
| 01/08/2013 | CA2495531C Backlighting system for displays |
| 01/03/2013 | WO2013002883A2 Slip film for relief image printing element |
| 01/03/2013 | WO2013002417A1 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device |
| 01/03/2013 | WO2013002295A1 Method of forming pattern and actinic-ray- or radiation-sensitive resin composition |
| 01/03/2013 | WO2013002283A1 Etching solution and etching process using same |
| 01/03/2013 | WO2013001923A1 Dye dispersion, photosensitive resin composition for color filter, color filter, liquid crystal display device, and organoluminescent display device |
| 01/03/2013 | WO2012151033A3 Method for offset imaging |
| 01/03/2013 | WO2012148274A4 Charged particle system for processing a target surface |
| 01/03/2013 | WO2012148267A4 Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams |
| 01/03/2013 | WO2012145282A3 Enhanced multi-photon imaging resolution method |
| 01/03/2013 | WO2012144735A3 Novel diblock copolymer, preparation method thereof, and method of forming nano pattern using the same |
| 01/03/2013 | WO2012135278A3 Olefin-triggered acid amplifiers |
| 01/03/2013 | US20130004901 Coating compositions for use with an overcoated photoresist |
| 01/03/2013 | US20130004900 Method for forming resist under layer film, pattern forming method and composition for resist under layer film |
| 01/03/2013 | US20130004899 Sub-wavelength Lithography via Rabi Oscillations |
| 01/03/2013 | US20130004898 Making a microfluidic device with improved adhesion |
| 01/03/2013 | US20130004897 Method for manufacturing a planographic printing plate |
| 01/03/2013 | US20130004896 Compound for resist and radiation-sensitive composition specification |
| 01/03/2013 | US20130004895 Photosensitive resin composition, photosensitive dry film and method for forming pattern |
| 01/03/2013 | US20130004894 Under coat film material and method of forming multilayer resist pattern |
| 01/03/2013 | US20130004893 Coating compositions for use with an overcoated photoresist |
| 01/03/2013 | US20130004888 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition |
| 01/03/2013 | US20130004887 Holographic recording medium |
| 01/03/2013 | US20130004741 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition |
| 01/03/2013 | US20130004740 Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device |
| 01/03/2013 | US20130004739 Pattern forming method, method for producing electronic device using the same, and electronic device |
| 01/03/2013 | US20130003108 Frequency Domain Layout Decomposition in Double Patterning Lithography |
| 01/03/2013 | US20130001751 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same |
| 01/03/2013 | US20130001560 Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and el television |
| 01/03/2013 | US20130001483 Photosensitive Resin Composition for Color Filter and Color Filter Using the Same |
| 01/03/2013 | DE10227054B4 Wiederverwendbare Druckform, Druckwerk und Druckmaschine damit sowie Verfahren zur Bebilderung der Druckform Reusable printing form, printing and printing machine so as well as methods for imaging the printing form |
| 01/03/2013 | DE102012200454A1 Method for manufacturing reflective optical element for extreme ultraviolet lithography for manufacturing of semiconductor devices, involves providing substrate, applying releasing layer, and applying layer with optical function |
| 01/03/2013 | DE102011113521A1 Microlithographic extreme UV (EUV) projection exposure apparatus for imaging reflective mask on photosensitive layer, has drive element that is adapted to reflective switching elements to emit projection and heating light rays |
| 01/03/2013 | DE102011088623A1 Optical element for projection lens of projection exposure system, has base portion that is provided with volume region such that thermal conductivity of thermal insulation layer located opposite to volume region is reduced |
| 01/03/2013 | DE102011085949A1 Filter i.e. dead mirror blocking filter, for filtering certain proportions of work light of light beam assembly, has fields arranged next to each other, and lattice arrangement defining and surrounding fields and formed in irregular manner |
| 01/03/2013 | DE102011081110A1 Interference lithography device for use in patterning of light exit surface of wafer for high brightness LED, has phase/blaze grating with low period length, for coherent superposition of sub-beams in image plane |
| 01/03/2013 | DE102011078224A1 Method for measuring optical system to manufacture microstructured components, involves computing spatial diagnosis distribution of property of reference surfaces from measurement values of variables of bundles and incidence regions |
| 01/02/2013 | EP2541588A1 Stage device |
| 01/02/2013 | EP2541326A1 Method for preparing a planographic printing plate and developer solution for master planographic printing plate |
| 01/02/2013 | EP2541325A1 Exposure apparatus and exposure method |
| 01/02/2013 | EP2541324A1 Optical system |
| 01/02/2013 | EP2541323A1 Manufacturing-process equipment |
| 01/02/2013 | EP2541322A1 Composition, process of preparation and method of application and exposure for light imaging paper |
| 01/02/2013 | EP2540801A1 Copper oxide etchant and etching method using the same |
| 01/02/2013 | EP2540750A1 Polymer composition and photoresist comprising same |
| 01/02/2013 | EP2539778A1 Method and apparatus for alignment optimization with respect to plurality of layers |
| 01/02/2013 | EP2539777A1 Method and apparatus for performing pattern alignment |