Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/2013
01/16/2013CN102129175B Rotating platform supported by air flotation
01/16/2013CN102096325B Light intensity attenuation device and method
01/16/2013CN102087484B Method for photoengraving graphical sapphire substrate
01/16/2013CN102081309B Method for improving alignment scanning success rate
01/16/2013CN101868760B Porous template, method and imprinting stack for nano-imprint lithography
01/16/2013CN101755231B Projection objective
01/16/2013CN101657757B Methods of forming a stamp, methods of patterning a substrate, and a stamp and a patterning system for same
01/16/2013CN101600993B Imprint method and imprint apparatus
01/16/2013CN101535895B Photosensitive resin composition, and flexible print circuit board using the same
01/16/2013CN101410946B Lighting optical system, exposure system, and device production method
01/16/2013CN101371193B Photolithographic systems and methods for producing sub-diffraction-limited features
01/16/2013CN101341172B Oxime ester photoinitiators
01/16/2013CN101290479B Angle decomposition scatter and detection method
01/16/2013CN101206407B Method of photolithographic exposure
01/15/2013US8354220 Resist ink and method of forming pattern using the same
01/15/2013US8354219 Photosensitive resin composition and dry film comprising the same
01/15/2013US8354218 Resist composition and method of forming resist pattern
01/15/2013US8354217 Salt and photoresist composition containing the same
01/15/2013US8354216 Negative-working imaging elements and methods of use
01/15/2013US8354215 Method for stripping photoresist
01/15/2013US8354206 Method of generating photomask data, method of fabricating photomask, non-transitory memory medium storing program for generating photomask data, method of manufacturing solid-state image sensor having microlens array and method of manufacturing microlens array
01/15/2013US8354204 hIGH REFRACTIVE INDEX, FLEXIBILITY; HIGH SENSITIVITY; LOW SCATTERING; WEATHERPROOFING; DURABILITY ; CONTAINING ORGANOMETALLIC COMPOUND WITH PHOTOPOLYMERIZABLE COMPOUND
01/15/2013US8354157 Support plate, method for producing the same, and method for processing substrate
01/10/2013WO2013005797A1 Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin
01/10/2013WO2013004992A1 Method of manufacture and apparatus therefor
01/10/2013WO2013004403A1 Optical imaging arrangement with vibration decoupled support units
01/10/2013WO2013004278A1 Optical imaging arrangement with individually actively supported components
01/10/2013WO2012144798A3 Polymer and photosensitive resin composition containing same
01/10/2013WO2012134226A3 Cleaning-solution composition for photolithography
01/10/2013WO2012130768A3 Mirror array
01/10/2013WO2012125409A3 Modeling euv lithography shadowing effect
01/10/2013WO2012121416A4 Nanoimprinting mold
01/10/2013US20130012801 Probe Element and Method of Forming a Probe Element
01/10/2013US20130012648 Colored composition, inkjet ink, color filter and method of producing the same, solid-state image sensor and display device
01/10/2013US20130011799 Method for the production of polymeric membranes having an ordered arrangement of high-aspect-ratio nanopores, by means of heavy ion bombing
01/10/2013US20130011798 Method of applying patterned metallization to block filter resonators
01/10/2013US20130011797 Charged particle beam drawing apparatus and article manufacturing method
01/10/2013US20130011796 Drawing apparatus and method of manufacturing article
01/10/2013US20130011795 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
01/10/2013US20130011794 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
01/10/2013US20130011793 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
01/10/2013US20130011792 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
01/10/2013US20130011791 Coloring photosensitive composition, lithographic printing plate precursor and plate making method
01/10/2013US20130011790 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
01/10/2013US20130011789 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
01/10/2013US20130011788 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
01/10/2013US20130011787 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
01/10/2013US20130011786 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
01/10/2013US20130011785 Pattern forming method and resist composition
01/10/2013US20130011784 Photosensitive Sacrificial Polymer with Low Residue
01/10/2013US20130011783 Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns
01/10/2013US20130011664 Molded Oxide Product and Process for Producing Same
01/10/2013US20130011635 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same
01/10/2013US20130011630 Metal-oxide films from small molecules for lithographic applications
01/10/2013US20130011619 Pattern forming method, chemical amplification resist composition and resist film
01/10/2013US20130011561 Multilayer antireflection coatings, structures and devices including the same and methods of making the same
01/10/2013US20130010277 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle
01/10/2013US20130009846 Insert for radomes and methods of manufacturing insert for radomes
01/10/2013US20130009074 Uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon
01/10/2013US20130008869 Oblique Parts or Surfaces
01/10/2013DE19609652B4 Verfahren und Vorrichtung zur Korrektur von Maskenmustern Method and apparatus for correction of mask patterns
01/10/2013DE102011087331A1 Optical element for optical device of projection exposure system, has main portion that is firmly connected with substrate by solder or weld for fixing holder
01/09/2013EP2544242A1 Method of texturing a photovoltaic cell
01/09/2013EP2544218A1 Process for production of photoresist pattern
01/09/2013EP2543495A1 Process for producing die roll
01/09/2013EP2542943A2 Methods and device for laser processing
01/09/2013EP2542942A1 Pattern generators comprising a calibration system
01/09/2013EP2542941A1 1.5d slm for lithography
01/09/2013EP2542940A1 Method for merging multiple geometrical pixel images and generating a single modulator pixel image
01/09/2013CN202663661U Exposure alignment structure in circuit manufacturing process of printed circuit board
01/09/2013CN202661774U Damping system used in stepping photoetching device
01/09/2013CN102870383A Substrate support structure, clamp preparation unit, and lithography system
01/09/2013CN102870047A Positive radiation-sensitive composition, interlayer insulating film for display element, and formation method for same
01/09/2013CN102870046A Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition
01/09/2013CN102870045A Positive Radiation-sensitive Composition For Discharge Nozzle Coating Method, Interlayer Insulating Film For Display Element, And Formation Method For Same
01/09/2013CN102870041A Color filter for low temperature applications
01/09/2013CN102870030A Imaging optics, and a projection exposure apparatus for microlithography having such an imaging optics
01/09/2013CN102867811A Semiconductor structure and manufacturing method thereof as well as method for manufacturing layouts of semiconductor
01/09/2013CN102867740A Non-destructive and pollution-free graphical method for nano-carbon film
01/09/2013CN102866604A Mask plate alignment mark arrangement method
01/09/2013CN102866602A Off-axis signal processing method
01/09/2013CN102866601A Stripping liquid for plasma display screen as well as preparation method and application of stripping liquid
01/09/2013CN102866600A Illumination system of a microlithographic projection exposure apparatus
01/09/2013CN102866599A Method for detecting controllability of mask aligner to graph fuzzy imaging
01/09/2013CN102866598A Lens structure for stepping double-exposed photoetching machine and photoetching machine
01/09/2013CN102866597A Three-dimensional micrometric displacement measurement method and sensing device used for mask aligner double-workpiece bench
01/09/2013CN102866596A Micro-positioner of vertical decoupling gravity compensator provided with corrugated pipe
01/09/2013CN102866595A Two-dimensional micro-displacement measuring method for double workpiece tables of photoetching machine and sensing device
01/09/2013CN102866594A Photoetching method for grating aided nano imaging
01/09/2013CN102866593A Device for monitoring stability of optical path of photoetching equipment
01/09/2013CN102866592A Photoetching exposure method for improving alignment precision of multi-layer mask process
01/09/2013CN102866591A Exposing device and method, and device fabricating method
01/09/2013CN102866590A Methods and systems for pattern design with tailored response to wavefront aberration
01/09/2013CN102866589A Determination method and information processing apparatus
01/09/2013CN102866588A Exposure device
01/09/2013CN102866587A Workpiece table
01/09/2013CN102866586A Lithography device system and measuring method thereof
01/09/2013CN102866585A Novel compound and method of producing the same, acid generator, resist composition and method of forming resist
01/09/2013CN102866584A Photosensitive resin composition
01/09/2013CN102866583A Coloring photosensitive resin composition