| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/23/2013 | CN101073036B 正型干膜光致抗蚀剂 Positive-type dry film photoresist |
| 01/22/2013 | US8357484 Multilayer dry film resist, method of manufacturing the resist, and method of manufacturing display plate for liquid crystal display panel using the resist |
| 01/22/2013 | US8357483 Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin |
| 01/22/2013 | US8357477 Color filter substrate, electronic apparatus and manufacturing method thereof |
| 01/22/2013 | US8357476 Method for producing a base material for screen printing, and base material of this type |
| 01/17/2013 | WO2013010111A2 Nanoimprint lithography |
| 01/17/2013 | WO2013008950A1 Exposure apparatus, exposure method, measurement method and device manufacturing method |
| 01/17/2013 | WO2013008912A1 Composition for forming fine pattern and method for forming fined pattern using same |
| 01/17/2013 | WO2013008700A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, manufacturing method of electronic device and electronic device |
| 01/17/2013 | WO2013008652A1 Photopolymerization initiator, photosensitive composition, and cured article |
| 01/17/2013 | WO2013008631A1 Photosensitive composition |
| 01/17/2013 | WO2013008146A1 Method of impression-based production of a filter for an electromagnetic radiation |
| 01/17/2013 | WO2013007922A1 Facility for exposing photopolymer plates |
| 01/17/2013 | WO2013007731A1 Illumination optical unit for projection lithography |
| 01/17/2013 | WO2013007442A1 Lithographic patterning process and resists to use therein |
| 01/17/2013 | WO2013007363A1 Process for the production of a layered body and layered bodies without masking obtainable therefrom |
| 01/17/2013 | WO2013007362A1 Process for the production of a layered body and layered bodies obtainable therefrom |
| 01/17/2013 | WO2013007214A1 Alkali-soluble resin and photosensitive resin composition containing same and use thereof |
| 01/17/2013 | WO2012159968A3 Illumination optical unit |
| 01/17/2013 | US20130017637 Method for forming pattern and method for manufacturing display device by using the same |
| 01/17/2013 | US20130017636 Composition for removing a photoresist and method of manufacturing a thin-film transistor substrate using the composition |
| 01/17/2013 | US20130017501 Method of forming resist pattern |
| 01/17/2013 | US20130017500 Method of forming resist pattern |
| 01/17/2013 | US20130017499 Process for production of photoresist pattern |
| 01/17/2013 | US20130017498 Tunable two-mirror interference lithography system |
| 01/17/2013 | US20130017497 Synthesis and applications of soluble pentacene precursors and related compounds |
| 01/17/2013 | US20130017496 Method for manufacturing recording head |
| 01/17/2013 | US20130017495 Interference exposure apparatus, interference exposure method, and manufacturing method of semiconductor device |
| 01/17/2013 | US20130017494 Photoresist Processing Methods |
| 01/17/2013 | US20130017492 Patterning process and resist composition |
| 01/17/2013 | US20130017491 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
| 01/17/2013 | US20130017490 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
| 01/17/2013 | US20130017489 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
| 01/17/2013 | US20130017488 Self-Imageable Layer Forming Polymer and Compositions Thereof |
| 01/17/2013 | US20130017487 Compositions and processes for photolithography |
| 01/17/2013 | US20130017486 Process of making a lithographic structure using antireflective materials |
| 01/17/2013 | US20130017485 Lithographic printing plate precursor and method of producing thereof |
| 01/17/2013 | US20130017484 Polymerizable ester compound, polymer, resist composition, and patterning process |
| 01/17/2013 | US20130017483 Electrode and method for manufacturing the same |
| 01/17/2013 | US20130017476 Measuring apparatus, drawing apparatus, and article manufacturing method |
| 01/17/2013 | US20130017378 Apparatus and Method for Providing Resist Alignment Marks in a Double Patterning Lithographic Process |
| 01/17/2013 | US20130017377 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same |
| 01/17/2013 | US20130017376 Negative resist composition, method for producing relief pattern using the same, and electronic component using the same |
| 01/17/2013 | US20130017375 Developing solution for photoresist on substrate including conductive polymer, and method for forming pattern |
| 01/17/2013 | US20130017374 Carbon nanotubes nanocomposites for microfabrication applications |
| 01/17/2013 | US20130015562 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition |
| 01/17/2013 | US20130014658 Developer for processing lithographic printing plate precursor, method for manufacturing lithographic printing plate by using the developer, and printing method |
| 01/17/2013 | DE112011100591T5 Sulfonamid-enthaltende Deckschicht- und Fotoresist-Zusatzstoff-Zusammensetzung und Verfahren zur Vermeidung Sulfonamide-containing supersized and photoresist additive composition and procedures to avoid |
| 01/17/2013 | DE102011088740A1 Optical system for micro-lithographic projection exposure system, has optical element and correction radiation source, over which optical element supplies electromagnetic correction radiation for correcting temperature profile |
| 01/17/2013 | DE102011078928A1 Beleuchtungsoptik für die Projektionslithografie Illumination optics for projection lithography |
| 01/16/2013 | EP2546864A1 Collector mirror assembly and extreme ultraviolet light source device using said collector mirror assembly |
| 01/16/2013 | EP2546697A2 Photosensitive organic insulation composition for an oled device |
| 01/16/2013 | EP2545413A1 Radiation source, lithographic apparatus and device manufacturing method |
| 01/16/2013 | EP2545412A1 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same |
| 01/16/2013 | EP2545095A1 Methods for producing photosensitive microparticles, non-aqueous dispersions thereof and articles prepared therewith |
| 01/16/2013 | CN202677062U Printing plate head-tail bridge exposure system |
| 01/16/2013 | CN202677061U Objective lens protection device |
| 01/16/2013 | CN202677060U Reticle stage beam for photoetching machine |
| 01/16/2013 | CN202677059U Double-side photoetching structure of ceramic wafer |
| 01/16/2013 | CN102884609A Inspecting apparatus and inspecting method |
| 01/16/2013 | CN102884480A Illumination system of a microlithographic projection exposure apparatus |
| 01/16/2013 | CN102884479A Negative photoresist composition, and method for patterning device |
| 01/16/2013 | CN102884396A Method and system for measurng in patterned structures |
| 01/16/2013 | CN102884094A Adamantyl (meth)acrylate monomer and (meth)acrylic polymer that contains repeating units derived from the monomer |
| 01/16/2013 | CN102880892A Method for adding barcodes in real time during exposure of mask-free photoetching machine |
| 01/16/2013 | CN102880370A Touch inductor for capacitive touch screen with film structure and manufacturing method thereof |
| 01/16/2013 | CN102880018A Reference grating space image adjusting device used for alignment system and adjusting method |
| 01/16/2013 | CN102880017A Stripping liquid composition for photoresist and preparation and applications of stripping liquid composition |
| 01/16/2013 | CN102880016A Stair-type self-adaptive air sealing device used for immersed type photoetching machine |
| 01/16/2013 | CN102880015A Micro-displacement measurement method and sensing device for dual-workpiece platforms of photoetching machine |
| 01/16/2013 | CN102880014A Device and method for photoetching illumination of active deformable mirror based on active optical technology |
| 01/16/2013 | CN102880013A Reticle stage worktable |
| 01/16/2013 | CN102880012A Exposure method capable of improving process registration accuracy |
| 01/16/2013 | CN102880011A Detection method of registration precision of interlayer graph |
| 01/16/2013 | CN102880010A Surface plasma ultra-diffraction photoetching method based on tip-insulator-metal structure |
| 01/16/2013 | CN102880009A Six-degree-of-freedom micro-motion worktable |
| 01/16/2013 | CN102880008A A lithographic apparatus, a projection system and a device manufacturing method |
| 01/16/2013 | CN102880007A Fluid handling structure, a lithographic apparatus and a device manufacturing method |
| 01/16/2013 | CN102880006A Fluid handling structure, lithographic apparatus and device manufacturing method |
| 01/16/2013 | CN102880005A Interference exposure apparatus, interference exposure method, and manufacturing method of semiconductor device |
| 01/16/2013 | CN102880004A Photoinduced polymer holographic recording material and preparation method thereof |
| 01/16/2013 | CN102880003A Laser write-through organic thermal etching material and preparation method thereof |
| 01/16/2013 | CN102880002A Black photosensitive resin composition, display panel and liquid crystal display |
| 01/16/2013 | CN102880001A Laser thermal lithography organic photoresist and preparation method of photoresist |
| 01/16/2013 | CN102880000A 固化性树脂组合物及其用途 The curable resin composition and uses thereof |
| 01/16/2013 | CN102879999A Positive-working photoimageable bottom antireflective coating |
| 01/16/2013 | CN102879998A Method for etching touch screen |
| 01/16/2013 | CN102879996A Method for manufacturing phase shift photomask |
| 01/16/2013 | CN102879947A Color filter, method for manufacturing same, semi-transparent and semi-reflecting liquid crystal display device |
| 01/16/2013 | CN102879846A Color filter, liquid crystal display components and color filter manufacturing method |
| 01/16/2013 | CN102879845A Method for manufacturing nanoscale grating based on polydimethylsiloxane (PDMS) |
| 01/16/2013 | CN102879067A Mass calibration method for workpiece table |
| 01/16/2013 | CN102875745A Alkali soluble resin, photosensitive resin composition containing it and application thereof |
| 01/16/2013 | CN102314078B Photoetching method |
| 01/16/2013 | CN102194663B Wet processing apparatus, wet processing method and storage medium |
| 01/16/2013 | CN102193324B Joint debugging device and joint debugging method for workpiece table interferometer and mask table interferometer |
| 01/16/2013 | CN102193319B Double-platform exchange system for wafer stage of photoetching machine |
| 01/16/2013 | CN102169294B Method for measuring scanning inclination of mask table in scanning mask aligner |
| 01/16/2013 | CN102141739B Double-stage exchange system for lithography machine silicon wafer stages |
| 01/16/2013 | CN102141734B Gravity compensator and micropositioner adopting same |