| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/24/2013 | US20130022925 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022924 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022923 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022922 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022921 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022920 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022919 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022918 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022917 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022916 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022915 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022914 Homoadamantane derivative, method for producing the same and photosensitive materials for photoresist |
| 01/24/2013 | US20130022913 Method for producing positive-type photosensitive resin composition, positive-type photosensitive resin composition, and filter |
| 01/24/2013 | US20130022912 Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound |
| 01/24/2013 | US20130022911 Polymer, resist composition and method of forming resist pattern |
| 01/24/2013 | US20130022910 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022909 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022901 Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device |
| 01/24/2013 | US20130022900 Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 01/24/2013 | US20130022830 Bumping process and structure thereof |
| 01/24/2013 | US20130022764 Housing with patterns and method for forming patterns on the housing |
| 01/24/2013 | US20130021688 Color filter and manufacturing method thereof |
| 01/24/2013 | US20130020684 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same |
| 01/24/2013 | DE112011100590T5 Sulfonamid-enthaltende Fotoresist-Zusammensetzungen und Verfahren zur Verwendung Sulfonamide-containing photoresist compositions and methods of using |
| 01/24/2013 | DE112008004047T5 Zusammengesetzter Stempel zum Prägen Composite stamp for stamping |
| 01/24/2013 | DE102012200733A1 Mirror assembly for optical system e.g. microlithographic projection exposure apparatus, has radiator whose sections are designed in such way that relative contribution of sections compensate to temperature-induced deformation |
| 01/24/2013 | DE102011079450A1 Optische Anordnung mit Degradationsunterdrückung The optical arrangement with Degradationsunterdrückung |
| 01/24/2013 | CA2838838A1 Method for improving print performance of flexographic printing elements |
| 01/23/2013 | EP2549331A1 Color developing photosensitive composition, lithographic printing original plate, and method for producing same |
| 01/23/2013 | EP2548739A2 Lithographic printing plate precursor |
| 01/23/2013 | EP2548080A1 Extreme ultraviolet light generation system |
| 01/23/2013 | EP2547486A1 Method and device for the spatially periodic modification of a substrate surface using an f-theta lens |
| 01/23/2013 | EP2362268B1 Polymer, chemically amplified positive resist compositions and pattern forming process |
| 01/23/2013 | CN202696737U Power supplying apparatus for plate making equipment |
| 01/23/2013 | CN202693997U Developing liquid automatic adding device |
| 01/23/2013 | CN202693996U Locating tool for reworking circuit board green oil exposure alignment |
| 01/23/2013 | CN202693995U Visual system |
| 01/23/2013 | CN202693948U Device for adjusting air curtain angle |
| 01/23/2013 | CN1900823B Method of uniformly coating a substrate |
| 01/23/2013 | CN102893218A Photoresist stripper composition |
| 01/23/2013 | CN102893217A Lithographic apparatus and device manufacturing method |
| 01/23/2013 | CN102893216A Process for producing fine pattern |
| 01/23/2013 | CN102893215A 聚合性组成物 Polymerizable composition |
| 01/23/2013 | CN102893214A Photosensitive organic insulation composition for an OLED device |
| 01/23/2013 | CN102892746A Norbornene-type polymers, comositions thereof and lithographic process using such compositions |
| 01/23/2013 | CN102891095A Semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 01/23/2013 | CN102890433A Alignment device and alignment method for lithography equipment |
| 01/23/2013 | CN102890432A Mask plate manufacturing method by additively exposing figure |
| 01/23/2013 | CN102890431A Exposure method, exposure apparatus, and method for producing device |
| 01/23/2013 | CN102890430A Device and method for adjusting power uniformity of exposure surface of direct-writing exposure machine |
| 01/23/2013 | CN102890429A Method for increasing data transmission speed in photoetching system through skew scanning display |
| 01/23/2013 | CN102890428A Method for aligning exposure patterns on two sides of PCB (printed circuit board) |
| 01/23/2013 | CN102890427A Method for preparing skewed data in field programmable gate array (FPGA) of direct-writing type photoetching system |
| 01/23/2013 | CN102890426A Oblique scan display method in direct writing photoetching system |
| 01/23/2013 | CN102890425A Lighting optical system, exposure system, and device production method |
| 01/23/2013 | CN102890424A Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device |
| 01/23/2013 | CN102890423A Calibration device and calibration method for photoelectric detector |
| 01/23/2013 | CN102890422A Probe system and method for mask alignment |
| 01/23/2013 | CN102890421A Photoetching defocus detection method, photoetching defocus detection system and photoetching technology optimization method |
| 01/23/2013 | CN102890420A Positive photosensitive resin composition for manufacturing low temperature poly silicon liquid crystal display |
| 01/23/2013 | CN102890419A 感光性树脂组成物及其应用 The photosensitive resin composition and its application |
| 01/23/2013 | CN102890418A Photoresist film formation resin and preparation method thereof |
| 01/23/2013 | CN102890417A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890416A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890415A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890414A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890413A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890412A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890411A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890410A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890409A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890408A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890407A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890406A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890405A Resist composition and method for producing resist pattern |
| 01/23/2013 | CN102890404A Imprint method and imprint system |
| 01/23/2013 | CN102890403A Method for forming pattern and shell employing method to form pattern |
| 01/23/2013 | CN102890402A Method for removing defects of photosensitive developable bottom anti-reflective coatings (PS-DBARC) |
| 01/23/2013 | CN102890352A Array substrate, liquid crystal display element and producing method of array substrate |
| 01/23/2013 | CN102193322B Detection device and adjusting method for objective lens roof of photo-etching machine |
| 01/23/2013 | CN102138104B Photosensitive resin composition for protective film of printed wiring board for semiconductor package |
| 01/23/2013 | CN102114726B Laser thermal-ablation mask coating for printing plate and preparation method thereof |
| 01/23/2013 | CN102103326B Method of manufacturing optical element |
| 01/23/2013 | CN102047181B 感光性树脂组合物 The photosensitive resin composition |
| 01/23/2013 | CN101995773B Photoresist coating device |
| 01/23/2013 | CN101980084B Exposure apparatus, exposure method, and device manufacturing method |
| 01/23/2013 | CN101952780B Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method |
| 01/23/2013 | CN101946210B Composition for forming resist underlayer film and method for forming resist pattern using the same |
| 01/23/2013 | CN101930180B Method and device for detecting focal plane change of exposure machine table |
| 01/23/2013 | CN101930170B Substrate etching method |
| 01/23/2013 | CN101872129B Lithographic apparatus and device manufacturing method |
| 01/23/2013 | CN101861548B Illumination system of a microlithographic projection exposure apparatus |
| 01/23/2013 | CN101840158B A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method |
| 01/23/2013 | CN101762985B Apparatus for processing a substrate |
| 01/23/2013 | CN101639458B Material for detecting indoor organic gas and method for preparing gas-sensitive element using same |
| 01/23/2013 | CN101628477B Process for the production of a three-dimensional object with resolution improvement by ''pixel-shift'' |
| 01/23/2013 | CN101322074B Silicon-containing resist underlying layer film forming composition for formation of photocrosslinking cured resist underlying layer film |
| 01/23/2013 | CN101311829B Radiation- induced resin composition, spacer, protection film and forming method thereof |
| 01/23/2013 | CN101295135B Photoresist composition and method of manufacturing a thin-film transistor substrate using the same |
| 01/23/2013 | CN101251716B Photoresist composition, coating method thereof, method of forming organic film pattern using the same and display device fabricated thereby |