| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/31/2013 | US20130029267 Flexographic printing plate precursor for thermal development, and process for making a flexographic printing plate |
| 01/31/2013 | US20130029255 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition |
| 01/31/2013 | US20130029254 Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition |
| 01/31/2013 | US20130029130 Method for fabricating a porous carbon structure using optical interference lithography, and porous carbon structure fabricated by same |
| 01/31/2013 | US20130028587 Black curable composition, light-shielding color filter for a solid-state imaging device and method of producing the same, solid-state imaging device, wafer level lens, and camera module |
| 01/31/2013 | US20130027682 Exposure Apparatus, Exposure Method, and Method for Producing Device |
| 01/31/2013 | US20130027477 Piezoelectric inkjet printheads and methods for monolithically forming the same |
| 01/31/2013 | US20130026044 Chemically amplified positive resist composition and patterning process |
| 01/31/2013 | US20130025479 Photopolymer stamp manufacturing process and preparation system and photopolymer stamp dies |
| 01/31/2013 | DE102012202675A1 Imaging optics for use in optical system of projection exposure system, has imaging lights carrying components and mirror for grazing incidence of imaging light, where mirror for touching incident is arranged in image beam path |
| 01/31/2013 | DE102011080052A1 Spiegel, optisches System mit Spiegel und Verfahren zur Herstellung eines Spiegels Mirror optical system including mirrors and method for the preparation of a mirror |
| 01/31/2013 | DE102011079837A1 Optical system for microlithographic projection exposure system for manufacturing e.g. LCDs, has beam-splitting optic element arranged such that degree of polarization of incident light beam is lesser than specified value |
| 01/31/2013 | DE102011079777A1 Mikrolithographisches Belichtungsverfahren Microlithographic exposure method |
| 01/30/2013 | EP2551722A1 Chemically amplified positive resist composition and patterning process |
| 01/30/2013 | EP2551721A1 Photosensitive resin composition, printing plate precursor and flexographic printing plate |
| 01/30/2013 | EP2550564A1 A beam line for a source of extreme ultraviolet (euv) radiation |
| 01/30/2013 | EP2550563A1 Lithographic apparatus and spectral purity filter |
| 01/30/2013 | EP2550562A1 Pattern forming method and resist composition |
| 01/30/2013 | EP2550554A1 Black curable composition, light-shielding color filter for a solid-state imaging device and method of producing the same, solid-state imaging device, wafer level lens, and camera module |
| 01/30/2013 | CN202712144U Substrate conveying apparatus and developing machine |
| 01/30/2013 | CN202710921U Improved developing machine |
| 01/30/2013 | CN202710920U 感光干膜 Photosensitive dry film |
| 01/30/2013 | CN1993457B Cleaning compositions for microelectronics substrates |
| 01/30/2013 | CN102906868A Apparatus and method for electrostatic discharge (esd) reduction |
| 01/30/2013 | CN102906858A Resist removal device and resist removal method |
| 01/30/2013 | CN102906642A Pattern forming method and actinic-ray- or radiation-sensitive resin composition |
| 01/30/2013 | CN102906641A Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component |
| 01/30/2013 | CN102903649A Method for selecting photoresist thickness of ion implantation |
| 01/30/2013 | CN102903629A Photoactive compound gradient photoresist |
| 01/30/2013 | CN102902169A Method for removing photoresist layer |
| 01/30/2013 | CN102902168A Photoresist cleaning solution |
| 01/30/2013 | CN102902167A Method for detecting accuracy of mask plate hood of photoetching machine |
| 01/30/2013 | CN102902166A Rotary roller sealing device for immersion lithography machine |
| 01/30/2013 | CN102902165A Device for laminated virtual mask and integration method of silicon photonics integrated chip |
| 01/30/2013 | CN102902164A Two-dimensional mosaic processing method for direct writing lithography machine in step printing |
| 01/30/2013 | CN102902163A Illumination module movement device |
| 01/30/2013 | CN102902162A 感光性树脂组合物 The photosensitive resin composition |
| 01/30/2013 | CN102902161A Negative image photosensitive composition and lithograph plate manufactured from same |
| 01/30/2013 | CN102902160A Colored solidification resin composition |
| 01/30/2013 | CN102902159A Photoresist bottle safety protection device |
| 01/30/2013 | CN102902158A Flexographic printing plate precursor for laser engraving and process for producing same, and flexographic printing plate and process for making same |
| 01/30/2013 | CN102902157A 玻璃加工方法 Glass processing methods |
| 01/30/2013 | CN102902156A Manufacturing method of free-form surface optical micro lens array |
| 01/30/2013 | CN102902155A 光掩模及曝光装置 A photomask and exposure apparatus |
| 01/30/2013 | CN102902002A Reflection type volume holographic Bragg grating ultraviolet exposure method |
| 01/30/2013 | CN102901997A Preparation method of curved compound eye |
| 01/30/2013 | CN102898959A Photo-curable adhesive composition and its use |
| 01/30/2013 | CN102898561A Alkali-soluble resin, preparation method of alkali-soluble resin and photoresist |
| 01/30/2013 | CN102896879A Photosensitive planographic printing plate precursor and method of producing planographic printing plate |
| 01/30/2013 | CN102129890B Amorphous alloy-based optical focusing lens and preparation method thereof |
| 01/30/2013 | CN102112924B Photosensitive flexographic printing original plate |
| 01/30/2013 | CN101907831B Light irradiating apparatus for exposure apparatus, lighting control method thereof, exposure apparatus, and substrate |
| 01/30/2013 | CN101762970B Manufacturing method of etched substrate and light-sensitive resin composition |
| 01/30/2013 | CN101609254B A resist pattern-improving material and a method for preparing a resist pattern by using the same |
| 01/30/2013 | CN101573663B Black matrix high sensitive photoresist composition for liquid crystal display and black matrix prepared by using the same |
| 01/30/2013 | CN101546119B Radiation sensitive resin composition, division article, preparation method and liquid crystal display element |
| 01/30/2013 | CN101529335B Antireflective coating compositions and imaging method |
| 01/30/2013 | CN101483146B Bonding structure and semiconductor device manufacturing apparatus |
| 01/30/2013 | CN101210307B Mask device, method of fabricating the same, and method of fabricating organic light emitting display device using the same |
| 01/29/2013 | US8365104 Original data producing method and original data producing program |
| 01/29/2013 | US8363315 Catadioptric projection objective with mirror group |
| 01/29/2013 | US8363208 Lithographic apparatus and device manufacturing method |
| 01/29/2013 | US8361704 Method for reducing tip-to-tip spacing between lines |
| 01/29/2013 | US8361703 Resist protective coating composition and patterning process |
| 01/29/2013 | US8361702 Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate |
| 01/29/2013 | US8361700 Lithographic printing plate precursor and method of preparing lithographic printing plate |
| 01/29/2013 | US8361697 Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern and process for producing printed circuit board, lead frame, semiconductor package and concavoconvex board |
| 01/29/2013 | US8361696 Polymer resin compounds and photoresist composition including new polymer resin compounds |
| 01/29/2013 | US8361695 Resist underlayer film forming composition and method for forming resist pattern |
| 01/29/2013 | US8361694 Resist underlayer film forming composition |
| 01/29/2013 | US8361693 Chemically amplified positive photoresist composition and pattern forming process |
| 01/29/2013 | US8361692 Negative resist composition and patterning process using the same |
| 01/29/2013 | US8361691 Radiation-sensitive composition and process for producing low-molecular compound for use therein |
| 01/29/2013 | US8361605 Photosensitive resin composition, dry film, and processed product made using the same |
| 01/29/2013 | US8359975 Process and apparatus having an adjustable heater |
| 01/29/2013 | CA2556749C Combined ablation and exposure system and method |
| 01/24/2013 | WO2013012853A1 Displays having self-aligned apertures and methods of making the same |
| 01/24/2013 | WO2013012481A1 Method for improving print performance of flexographic printing elements |
| 01/24/2013 | WO2013012299A2 Mask, and optical filter manufacturing apparatus comprising same |
| 01/24/2013 | WO2013012230A2 Light curable resin composition |
| 01/24/2013 | WO2013012169A2 Photosensitive composition and compound used therein |
| 01/24/2013 | WO2013012068A1 Thin film formation composition for lithography which contains titanium and silicon |
| 01/24/2013 | WO2013012035A1 Negative-type photosensitive resin composition, resin film, and electronic component |
| 01/24/2013 | WO2013012032A1 Exposure device, exposure method, method for manufacturing device, program and recording medium |
| 01/24/2013 | WO2013011687A1 Colored resin composition for color filters |
| 01/24/2013 | WO2013011508A2 Optical system and method for measuring in patterned stuctures |
| 01/24/2013 | WO2013011112A1 Method and apparatus for determining a critical dimension variation of a photolithographic mask |
| 01/24/2013 | WO2013010806A1 Optical assembly with suppression of degradation |
| 01/24/2013 | WO2013010730A1 Method for providing a template for a self-assemblable polymer for use in device lithography |
| 01/24/2013 | WO2012164539A4 Printing periodic patterns using multiple lasers |
| 01/24/2013 | WO2012151167A3 Euv lithography flare calculation and compensation |
| 01/24/2013 | WO2012129162A3 Methods of making patterned structures of materials, patterned structures of materials, and methods of using same |
| 01/24/2013 | WO2012087352A3 Superhydrophobic and superoleophobic nanosurfaces |
| 01/24/2013 | US20130023121 Double patterning method using tilt-angle deposition |
| 01/24/2013 | US20130023117 Semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 01/24/2013 | US20130022930 Method for Reversing Tone of Patterns on Integrated Circuit and Patterning Sub-Lithography Trenches |
| 01/24/2013 | US20130022929 Method and system for manufacturing a surface using shaped charged particle beam lithography |
| 01/24/2013 | US20130022928 Resist composition and method for producing resist pattern |
| 01/24/2013 | US20130022927 Photosensitive composition and photosensitive lithographic printing plate material |
| 01/24/2013 | US20130022926 Radiation-sensitive resin composition |