| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/14/2013 | US20130040238 Developable bottom antireflective coating compositions for negative resists |
| 02/14/2013 | US20130040237 Salt, photoresist composition and method for producing photoresist pattern |
| 02/14/2013 | US20130040230 Method of determining focus and dose of an apparatus of optical micro-lithography |
| 02/14/2013 | US20130040096 Pattern forming method and actinic-ray- or radiation-senstive resin composition |
| 02/14/2013 | US20130039460 Methods and systems for determining a critical dimension and overlay of a specimen |
| 02/14/2013 | CA2842417A1 Laminated flexographic printing sleeves and methods of making the same |
| 02/13/2013 | EP2557456A2 Positive photosensitive resin composition and method of forming cured film from the same |
| 02/13/2013 | EP2557416A2 Sample surface inspection apparatus and method |
| 02/13/2013 | EP2557126A1 Compound and color filter |
| 02/13/2013 | EP2556729A1 Euv radiation source and euv radiation generation method |
| 02/13/2013 | EP2556044A1 Norbornene-type polymers, comositions thereof and lithographic process using such compositions |
| 02/13/2013 | CN202738268U Water-saving type developing production line for printed circuit board (PCB) production |
| 02/13/2013 | CN202735680U Developing device of circuit board |
| 02/13/2013 | CN202735679U Simple mask-free photoetching machine |
| 02/13/2013 | CN202735678U Overall layout structure of electronic system of photoetching machine |
| 02/13/2013 | CN202735677U Device for marking inner layer circuit board of laser direct-writing exposure machine |
| 02/13/2013 | CN202735675U Mask plate |
| 02/13/2013 | CN202734770U Device detecting glued surface parallelism of total reflection prism based on equal thickness interference principle |
| 02/13/2013 | CN102934031A Method of producing a relief image from a liquid photopolymer resin |
| 02/13/2013 | CN102934030A Substrates for mirrors for EUV lithography and their production |
| 02/13/2013 | CN102934029A Process and materials for making contained layers and devices made with same |
| 02/13/2013 | CN102934028A Photosensitive resin composition and display device |
| 02/13/2013 | CN102934027A Improved cantilevers for deposition |
| 02/13/2013 | CN102934026A Led curable liquid resin compositions for additive fabrication |
| 02/13/2013 | CN102933628A Self-assemblable polymer and method for use in lithography |
| 02/13/2013 | CN102933038A Method and apparatus for accurately applying structures to a substrate |
| 02/13/2013 | CN102931184A 半导体结构及其制法 The semiconductor structure Jiqizhifa |
| 02/13/2013 | CN102931070A Silicon substrate isotropic wet etching process |
| 02/13/2013 | CN102929111A Developed photoresist layer aligning detection method |
| 02/13/2013 | CN102929110A Device and method for supercritical drying of microwave excitation |
| 02/13/2013 | CN102929109A Negative photoresist developing solution and application thereof |
| 02/13/2013 | CN102929108A Method for aligning by combining lenses with multiple magnifications in direct-writing photoetching machine |
| 02/13/2013 | CN102929107A Pupil shaping device for photoetching illumination |
| 02/13/2013 | CN102929106A Photoetching illuminating system for ultraviolet photoetching machine |
| 02/13/2013 | CN102929105A Exposure quality detection method |
| 02/13/2013 | CN102929104A Optical imaging arrangement |
| 02/13/2013 | CN102929103A Photoetching technology verifying method and system thereof |
| 02/13/2013 | CN102929102A Deep ultraviolet chemically amplified positive photoresist |
| 02/13/2013 | CN102929101A Electric conduction photoresist, organic light emitting device (OLED) electrode applying same and manufacturing method of OLED |
| 02/13/2013 | CN102929100A Device and method for implementing alignment reel-to-reel UV (ultraviolet) forming |
| 02/13/2013 | CN102929099A Imprint apparatus and article manufacturing method |
| 02/13/2013 | CN102929098A V-structured mold cavity and manufacturing method thereof, and manufacturing method of light-guide plate |
| 02/13/2013 | CN102929097A Photomask, TFT (Thin Film Transistor) glass substrate and manufacturing method thereof |
| 02/13/2013 | CN102929096A Y-tone mask substrate, gray-tone mask, and formation method of product fabrication mark or product information mark |
| 02/13/2013 | CN102929046A Blue phase liquid crystal panel, blue phase liquid crystal device and manufacture method of blue phase liquid crystal panel |
| 02/13/2013 | CN102928899A Diffusion sheet, backlight, liquid crystal display apparatus, and method of producing a diffusion sheet |
| 02/13/2013 | CN102924630A UV light curing application system containing amino ketone compound 1-([1,1'-biphenyl]-4-yl)-2-methyl-2-morpholinopropan-1-one |
| 02/13/2013 | CN102924341A Salt, photoresist composition and method for producing photoresist pattern |
| 02/13/2013 | CN102921198A Defoaming device for stripping developing solution KOH/NaOH |
| 02/13/2013 | CN102436140B Method for preparing nanoimprint template |
| 02/13/2013 | CN102214742B Method for preparing two-dimensional photonic crystal structure GaN (gallium nitride) based LED (light emitting diode) |
| 02/13/2013 | CN102103331B Stage device, exposure apparatus, and method of manufacturing devices |
| 02/13/2013 | CN102061228B Microelectronic cleaning compositions containing oxidizers and organic solvents |
| 02/13/2013 | CN102047182B Exposure apparatus, exposure method, and device manufacturing method |
| 02/13/2013 | CN102027417B Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method |
| 02/13/2013 | CN101984756B Curable resin composition for nanoimprint |
| 02/13/2013 | CN101971103B Cleaning composition for removing resist |
| 02/13/2013 | CN101946211B Illumination system for a microlithographic projection exposure apparatus |
| 02/13/2013 | CN101842473B Novel nitrile and amidoxime compounds and methods of preparation |
| 02/13/2013 | CN101794076B Automatic substrate transport system and method |
| 02/13/2013 | CN101750897B Unit for providing chemical liquid, apparatus and method for treating substrate using the same |
| 02/13/2013 | CN101727013B Method for on-line monitoring of photoetching conditions |
| 02/13/2013 | CN101546123B Light sensitive resin composition, cured matter and printed circuit substrate having solder mask layer formed with the cured matter |
| 02/13/2013 | CN101546114B Exposure system, light shield and method for designing same |
| 02/13/2013 | CN101323708B Colorant, color filter, LCD device, composition and preparation |
| 02/13/2013 | CN101303527B Photocuring resin composition, dry film, curing product and print circuit board |
| 02/12/2013 | US8373070 Metal structure of flexible multi-layer substrate and manufacturing method thereof |
| 02/12/2013 | US8372928 Hard, impermeable, flexible and conformal organic coatings |
| 02/12/2013 | US8372578 Gray-tone lithography using optical diffusers |
| 02/12/2013 | US8372577 Photosensitive resin compositions and photosensitive dry films using the same |
| 02/12/2013 | US8372576 Miniaturized microparticles |
| 02/12/2013 | US8372575 Ultraviolet-curing resin material for pattern transfer and magnetic recording medium manufacturing method using the same |
| 02/12/2013 | US8372563 MEMS lithography mask with improved tungsten deposition topography and method for the same |
| 02/12/2013 | US8371219 Lithographic printing plate precursor and plate making method thereof |
| 02/07/2013 | WO2013018988A1 Fluororesin and photosensitive resin composition including same |
| 02/07/2013 | WO2013018987A1 Polymer compound comprising dye and curable resin composition comprising same |
| 02/07/2013 | WO2013018986A1 Polymer compound comprising dye and curable resin composition comprising same |
| 02/07/2013 | WO2013018978A1 Photoactive compound and a light-sensitive resin composition comprising same |
| 02/07/2013 | WO2013018802A1 Resist underlayer film-forming composition for euv lithography containing condensation polymer |
| 02/07/2013 | WO2013018762A1 Method for correcting alignment of substrate to be exposed, and exposure device |
| 02/07/2013 | WO2013018705A1 Photosensitive resin composition, cured product and spacer |
| 02/07/2013 | WO2013018699A1 Microlens array and scanning exposure device using same |
| 02/07/2013 | WO2013018635A1 Photosensitive resin composition and cured product thereof |
| 02/07/2013 | WO2013018572A1 Microlens array and scanning exposure device using same |
| 02/07/2013 | WO2013018569A1 Resist developer, process for forming resist pattern and process for producing mold |
| 02/07/2013 | WO2013018524A1 Photosensitive resin composition, material for forming relief pattern, photosensitive film, polyimide film, cured relief pattern and method for producing same, and semiconductor device |
| 02/07/2013 | WO2013018414A1 Treatment liquid supply device, treatment liquid supply method and computer storage medium |
| 02/07/2013 | WO2013018093A1 Monitoring system and method for verifying measurements in patterned structures |
| 02/07/2013 | WO2013017924A2 Method for correcting misalignment of positions on a first wafer bonded to a second wafer |
| 02/07/2013 | WO2013017558A1 Damping arrangement |
| 02/07/2013 | WO2013017091A1 Negative photosensitive resin composition, color filter, liquid crystal display device |
| 02/07/2013 | WO2013016973A1 Visible light photoinitiating system for preparing high diffraction efficiency hologram optical polymer material |
| 02/07/2013 | WO2013016815A1 Polymer-based resonator antennas |
| 02/07/2013 | WO2012067755A3 Photoresist composition for negative development and pattern forming method using thereof |
| 02/07/2013 | US20130035272 Novel nitrile and amidoxime compounds and methods of preparation for semiconductor processing |
| 02/07/2013 | US20130034816 Conductive Vias In A Substrate |
| 02/07/2013 | US20130034815 Methods for preparing lithograhic printing plates |
| 02/07/2013 | US20130034814 Silane-based compounds and photosensitive resin composition comprising the same |
| 02/07/2013 | US20130034813 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS |
| 02/07/2013 | US20130034812 Polymerizable composition for solder resist, and solder resist pattern formation method |