| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/26/2013 | US8383317 Method of making carbon nanotube patterned film or carbon nanotube composite using carbon nanotubes surface-modified with polymerizable moieties |
| 02/26/2013 | US8383316 Resists for lithography |
| 02/26/2013 | US8383302 Colored curable composition, color filter and production method thereof, and solid-state imaging device |
| 02/26/2013 | US8383013 Photosensitive paste composition for fabricating the plasma display panel electrode, plasma display panel electrode and plasma display panel thereby |
| 02/21/2013 | WO2013025619A2 Method and composition for removing resist, etch residue, and copper oxide from substrates having copper, metal hardmask and low-k dielectric material |
| 02/21/2013 | WO2013024779A1 Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method |
| 02/21/2013 | WO2013024778A1 Resist composition, resist pattern formation method, polyphenol compound used therein, and alcohol compound capable of being derived therefrom |
| 02/21/2013 | WO2013024777A1 Cyclic compound, method for producing same, composition, and method for forming resist pattern |
| 02/21/2013 | WO2013024756A1 Photoresist composition |
| 02/21/2013 | WO2013024691A1 Coloring composition, coloring radiation-sensitive composition, color filter and solid-state imaging device |
| 02/21/2013 | WO2013023876A1 Lithographic apparatus and device manufacturing method |
| 02/21/2013 | WO2013023874A1 Lithographic apparatus, programmable patterning device and lithographic method |
| 02/21/2013 | WO2013023547A1 Method for preparing a patterned graphene film |
| 02/21/2013 | WO2013023357A1 Composite photon sieve projection lithography system |
| 02/21/2013 | WO2012151033A9 Method for offset imaging |
| 02/21/2013 | US20130045591 Negative tone develop process with photoresist doping |
| 02/21/2013 | US20130045448 Positioning apparatus, exposure apparatus and method of manufacturing device |
| 02/21/2013 | US20130045447 Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method |
| 02/21/2013 | US20130045446 Radiation-sensitive resin composition, method for forming a resist pattern and sulfonium compound |
| 02/21/2013 | US20130045445 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive resin film therefrom and method of forming pattern using the composition |
| 02/21/2013 | US20130045444 Positive resist composition and patterning process |
| 02/21/2013 | US20130045443 Polymer, resist composition and method of forming resist pattern |
| 02/21/2013 | US20130045440 Resist pattern forming method, resist pattern, crosslinking negative chemical-amplification resist composition for organic solvent development, nanoimprint mold, and photomask |
| 02/21/2013 | US20130045365 Pattern forming method, chemical amplification resist composition and resist film |
| 02/21/2013 | US20130045362 Method for making a conductive laminate |
| 02/21/2013 | US20130044364 Display device and method for manufacturing the same |
| 02/21/2013 | US20130043480 Exposure Device, Exposure Method and Method of Manufacturing Semiconductor Device |
| 02/21/2013 | DE102012107289A1 System und Verfahren zum Ausrichten eines Wafers für die Herstellung System and method for aligning a wafer for the production |
| 02/21/2013 | DE102011081247A1 Belichtungsanlage und Verfahren zur strukturierten Belichtung einer lichtempfindlichen Schicht Exposure apparatus and method for structured exposing a photosensitive layer |
| 02/20/2013 | EP2560192A2 Stage device, exposure apparatus, and method of manufacturing devices |
| 02/20/2013 | EP2560050A1 Support table, lithographic apparatus and device manufacturing method |
| 02/20/2013 | EP2560049A2 Composition for forming a silicon-containing resist underlayer film and patterning processing using the same |
| 02/20/2013 | EP2560047A1 Highly reflective substrates for the digital processing of photopolymer printing plates |
| 02/20/2013 | EP2559052A1 Electron-beam lithography method with correction of line ends by insertion of contrast patterns |
| 02/20/2013 | EP2559051A1 Method of electron-beam lithography with correction of corner roundings |
| 02/20/2013 | EP2558908A1 Photoresist film and methods for abrasive etching and cutting |
| 02/20/2013 | EP2558907A1 Improved cantilevers for deposition |
| 02/20/2013 | EP2558427A1 D1492 liquid bapo photoinitiator and its use in radiation curable compositions |
| 02/20/2013 | CN202748591U Environmental friendly processor applied to water washing type printing plate material |
| 02/20/2013 | CN202748590U Double-sided exposure machine for photoresist of silicon wafer |
| 02/20/2013 | CN102939567A 光学系统 The optical system |
| 02/20/2013 | CN102939566A Optical system of microlithographic projection exposure apparatus |
| 02/20/2013 | CN102939565A Method and apparatus for performing pattern alignment |
| 02/20/2013 | CN102939564A Method of topographical and electrical nanostructuration of a thin film of electret polymer and thin film of electret polymer obtained |
| 02/20/2013 | CN102939549A Antireflective coating composition and process for manufacturing microelectronic device |
| 02/20/2013 | CN102938499A Ultrahigh frequency radio frequency identification (RFID) etching antenna and manufacturing technique thereof |
| 02/20/2013 | CN102937779A Developing liquid spraying railway machine and spraying method of developing liquid |
| 02/20/2013 | CN102937778A Method for determining matching relations among components in photoetching lighting system |
| 02/20/2013 | CN102937777A Gas-sealing and gas-liquid isolating device for immersed type photoetching machine |
| 02/20/2013 | CN102937776A Negative photosensitive resin laminate and use of negative photosensitive resin laminate |
| 02/20/2013 | CN102937775A Structure of thermo-sensitive CTcP (Computer to Conventional Plate) plate |
| 02/20/2013 | CN102937742A 成像光学系统 The imaging optical system |
| 02/20/2013 | CN102935770A Manufacturing method of thermosensitive CTcP (Computer To conventional Plate) |
| 02/20/2013 | CN102253599B Red-colored composition for color filter, and color filter |
| 02/20/2013 | CN102147576B Photoresist stripping liquid composition |
| 02/20/2013 | CN102024752B Method for improving chip cutting |
| 02/20/2013 | CN102012642B Photolithography equipment vacuum exposure device |
| 02/20/2013 | CN101995768B Imprint lithography apparatus and method |
| 02/20/2013 | CN101980083B Method for preparing filter membrane mesh structure by laser interference photoetching technology |
| 02/20/2013 | CN101795527B Radiation source, lithographic apparatus and device manufacturing method |
| 02/20/2013 | CN101689029B Lamination device and method for flexographic plate manufacturing |
| 02/20/2013 | CN101681099B Positive photosensitive resin composition and polyhydroxyamide resin |
| 02/20/2013 | CN101553549B Photobase generator and photocurable resin composition |
| 02/20/2013 | CN101533222B Photocurable coating composition, and overprint and process for producing same |
| 02/20/2013 | CN101490620B Color filter composition |
| 02/20/2013 | CN101093365B Against corrosion film stripper composition |
| 02/19/2013 | US8377634 Radiation sensitive silicone resin composition |
| 02/19/2013 | US8377633 Maskless vortex phase shift optical direct write lithography |
| 02/19/2013 | US8377632 Method of reducing microloading effect |
| 02/19/2013 | US8377631 Planarization over topography with molecular glass materials |
| 02/19/2013 | US8377630 On-press plate development without contamination of fountain fluid |
| 02/19/2013 | US8377629 Method for preparing lithographic printing plate precursors |
| 02/19/2013 | US8377628 Negative working, heat-sensitive, lithographic printing plate precursor |
| 02/19/2013 | US8377627 Compound and radiation-sensitive composition |
| 02/19/2013 | US8377626 Methods of forming a pattern using negative-type photoresist compositions |
| 02/19/2013 | US8377625 Method for producing a copolymer solution with a uniform concentration for semiconductor lithography |
| 02/19/2013 | US8377624 Negative-working thermal imageable elements |
| 02/19/2013 | US8377623 Photocurable resin composition for producing three dimensional articles having high clarity |
| 02/19/2013 | US8377622 Thermally imageable dielectric layers, thermal transfer donors and receivers |
| 02/19/2013 | US8377316 Structure and method for creating surface texture of compliant coatings on piezo ink jet imaging drums |
| 02/14/2013 | WO2013023124A2 Developable bottom antireflective coating compositions for negative resists |
| 02/14/2013 | WO2013022573A1 Laminated flexographic printing sleeves and methods of making the same |
| 02/14/2013 | WO2013022099A1 Silicon-containing resist underlayer film-forming composition having sulfone structure |
| 02/14/2013 | WO2013022081A1 Composition for forming tungsten oxide film and method for producing tungsten oxide film using same |
| 02/14/2013 | WO2013022068A1 Photosensitive resin composition, photosensitive film, permanent resist and method for producing permanent resist |
| 02/14/2013 | WO2013021734A1 Resin composition for resists |
| 02/14/2013 | WO2013021400A1 Panel lamination apparatus and method |
| 02/14/2013 | WO2013021007A1 Method for connecting components and composite structure |
| 02/14/2013 | WO2013020473A1 Post-development photoresist layer alignment and detection method |
| 02/14/2013 | WO2012148884A3 Orthogonal solvents and compatible photoresists for the photolithographic patterning of organic electronic devices |
| 02/14/2013 | US20130040410 Photoresist composition, method of forming a pattern using the same, and method of manufacturing a display substrate |
| 02/14/2013 | US20130040247 Liquid immersion member, method for manufacturing liquid immersion member, exposure apparatus, and device manufacturing method |
| 02/14/2013 | US20130040246 Multiple chemical treatment process for reducing pattern defect |
| 02/14/2013 | US20130040245 Methods Of Processing Substrates |
| 02/14/2013 | US20130040244 Method of manufacturing semiconductor device |
| 02/14/2013 | US20130040243 Laminated Flexographic Printing Sleeves and Methods of Making the Same |
| 02/14/2013 | US20130040242 Method and system for exposure of a phase shift mask |
| 02/14/2013 | US20130040241 Method and System for Charged Particle Beam Lithography |
| 02/14/2013 | US20130040240 Charged particle beam drawing apparatus, and method of manufacturing article |
| 02/14/2013 | US20130040239 Salt, photoresist composition and method for producing photoresist pattern |