| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/28/2013 | WO2013027866A1 Exposure apparatus and method of confining a liquid |
| 02/28/2013 | WO2013027646A1 Photosensitive resin composition, and photosensitive film, photosensitive laminate, method for forming permanent pattern, and printed substrate using same |
| 02/28/2013 | WO2013027590A1 Lithographic printing plate precursor and process for producing lithographic printing plate |
| 02/28/2013 | WO2013027521A1 Active light-sensitive or radiation-sensitive resin composition, active light-sensitive or radiation-sensitive film using active light-sensitive or radiation-sensitive resin composition, and pattern forming method |
| 02/28/2013 | WO2013027405A1 Spatial light modulating element and exposure equipment |
| 02/28/2013 | WO2013027220A2 Process for dry-coating of flexogarphic surfaces |
| 02/28/2013 | WO2013026750A1 Exposure apparatus and method for the patterned exposure of a light-sensitive layer |
| 02/28/2013 | WO2013026598A1 Metrology method and apparatus, and device manufacturing method |
| 02/28/2013 | WO2013026368A1 Interference exposure device and method |
| 02/28/2013 | WO2013026361A1 Step photolithography device and photolithography exposure method |
| 02/28/2013 | WO2012175342A3 Self-assemblable polymer and method for use in lithography |
| 02/28/2013 | WO2012130768A9 Mirror array |
| 02/28/2013 | US20130053281 Fluid sampling device and method of use thereof |
| 02/28/2013 | US20130052593 Removal of alkaline crystal defects in lithographic patterning |
| 02/28/2013 | US20130052592 Fabrication method of cylindrical gratings |
| 02/28/2013 | US20130052591 Cleaning nozzle for advanced lithography process |
| 02/28/2013 | US20130052590 Drawing apparatus and method of manufacturing article |
| 02/28/2013 | US20130052589 Lithographic printing plate precursors for on-press development |
| 02/28/2013 | US20130052588 Salt, photoresist composition and method for producing photoresist pattern |
| 02/28/2013 | US20130052587 Patterning process and resist composition |
| 02/28/2013 | US20130052586 Lithographic printing plate precursor and method of preparing lithographic printing plate using the same |
| 02/28/2013 | US20130052585 Photodecomposable bases and photoresist compositions |
| 02/28/2013 | US20130052584 Lithographic printing plate precursor and method of manufacturing lithographic printing plate |
| 02/28/2013 | US20130052583 Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture |
| 02/28/2013 | US20130052582 Aluminum substrates and lithographic printing plate precursors |
| 02/28/2013 | US20130052568 Resist pattern forming method, resist pattern, positive resist composition, nanoimprint mold and photomask |
| 02/28/2013 | US20130052567 Resist pattern forming method, resist pattern, crosslinkable negative resist composition, nanoimprint mold and photomask |
| 02/28/2013 | US20130052566 Lithography methods, methods for forming patterning tools and patterning tools |
| 02/28/2013 | US20130050864 Color Filter and Manufacturing Method Thereof |
| 02/28/2013 | US20130050806 Electrophoresis device, method of manufacturing the electrophoresis device, display, display substrate, and electronic unit |
| 02/28/2013 | US20130050802 Electrowetting device and method of manufacturing the same |
| 02/28/2013 | US20130050619 Display apparatus and method for manufacturing the same |
| 02/28/2013 | US20130049171 Method for producing semiconductor components on a substrate, and substrate comprising semiconductor components |
| 02/28/2013 | US20130049149 Method of forming pattern, actinic-ray- or radiation-sensitive resin composition and actinic-ray- or radiation-sensitive film |
| 02/28/2013 | US20130048604 Photoresist composition and method of forming a fine pattern using the same |
| 02/28/2013 | DE10239768B4 Photoresist-Stripplösung und Verfahren zum Strippen von Photoresists unter Verwendung derselben Photoresist stripping solution and process for stripping photoresist using the same |
| 02/28/2013 | DE102012204833A1 Mirror i.e. facet mirror, for use in lighting system for projection exposure system, has layer partially formed from graphene and arranged as finishing layer on layer arrangement, and substrate made of material e.g. glass and ceramic |
| 02/28/2013 | DE102012200732A1 Mirror assembly for optical system of microlithography projection exposure apparatus used for manufacture of LCD, has fixing elements and solid-portion joints that are arranged on opposite sides of carrier |
| 02/28/2013 | DE102006031995B4 Linsenrohlinge und Linsenelemente sowie Verfahren zu deren Herstellung Lens blanks, and lens elements, as well as processes for their preparation |
| 02/27/2013 | EP2562796A2 Photoresist strip processes for improved device integrity |
| 02/27/2013 | EP2562600A2 Multi-beam exposure scanning method and apparatus and printing plate manufacturing method |
| 02/27/2013 | EP2562599A2 Process for producing a photomask on a photopolymeric surface |
| 02/27/2013 | EP2562568A1 Fabrication method of cylindrical gratings |
| 02/27/2013 | EP2562526A1 Device and method for detecting optical performance of beam shaping element |
| 02/27/2013 | EP2561407A1 Collector mirror assembly and method for producing extreme ultraviolet radiation |
| 02/27/2013 | EP2561341A1 Functionalizing biosensors using a multiplexed dip pen array |
| 02/27/2013 | EP2458650A9 Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector |
| 02/27/2013 | CN202758167U Baking rack and baking oven with the same |
| 02/27/2013 | CN202758166U Exposure machine |
| 02/27/2013 | CN202758165U Antistatic photomask conveying device |
| 02/27/2013 | CN202753608U Fluid film monitoring device |
| 02/27/2013 | CN102947760A Photomask, and laser annealing device and exposure device which use same |
| 02/27/2013 | CN102947759A Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a mask |
| 02/27/2013 | CN102947733A Colored resin composition, color filter, liquid crystal display device, and organic EL display |
| 02/27/2013 | CN102945854A Array substrate and manufacturing method of fan-out leads on array substrate and display device |
| 02/27/2013 | CN102945816A Substrate treating apparatus and method using the same |
| 02/27/2013 | CN102945800A Post-deposition encapsulation of nanostructures: compositions, devices and systems incorporating same |
| 02/27/2013 | CN102945791A Preparation method of silicon nanowire array |
| 02/27/2013 | CN102945107A Accurate alignment printing method for visible area protective layer in capacitive touch screen |
| 02/27/2013 | CN102944986A Polyimide stripping liquid for chips and preparation method of polyimide stripping liquid |
| 02/27/2013 | CN102944985A Optical projection mask aligner |
| 02/27/2013 | CN102944984A Method for monitoring and compensating photoetching and splicing precisions of large-sized chip products |
| 02/27/2013 | CN102944983A Method for improving key dimension measurement of pattern to be measured |
| 02/27/2013 | CN102944982A Exposure apparatus, exposure method, and device manufacturing method |
| 02/27/2013 | CN102944981A Exposure apparatus, and device fabricating method |
| 02/27/2013 | CN102944980A Microchecker having permanent magnet gravity support structure |
| 02/27/2013 | CN102944979A Microchecker having permanent magnet gravity compensation structure |
| 02/27/2013 | CN102944978A Exposure system, calibration system, optical engines, exposure method, and production method |
| 02/27/2013 | CN102944977A Photosensitive solder resist composite, application thereof and printed circuit board (PCB) containing same |
| 02/27/2013 | CN102944976A Ultraviolet nano imprinting system |
| 02/27/2013 | CN102944975A Mask plate and manufacturing method thereof, and array substrate manufacturing method |
| 02/27/2013 | CN102944974A Mask plate and array substrate manufacturing method |
| 02/27/2013 | CN102944972A Method of producing a relief image |
| 02/27/2013 | CN102944971A Exposure detection method of mask and photoetching material |
| 02/27/2013 | CN102944960A Electric scanning focus swinging liquid crystal micro lens and preparation method thereof |
| 02/27/2013 | CN102942207A Method for preparing patterned ZnO nanorod array |
| 02/27/2013 | CN102338989B Parallel laser direct write device for prolonging focal depth |
| 02/27/2013 | CN102231050B Method for improving process efficiency of photoetching machine |
| 02/27/2013 | CN102024686B Semiconductor manufacturing process and apparatus used for the same |
| 02/27/2013 | CN101995772B Photosensitive resin composition, flexible circuit board employing the same, and circuit board production method |
| 02/27/2013 | CN101981507B Process for producing lithographic printing plate |
| 02/27/2013 | CN101894827B Test wafer for gluing and edge cleaning detection |
| 02/27/2013 | CN101881844B Girdle photon sieve and manufacturing method thereof |
| 02/27/2013 | CN101482703B Exposing method using variable shaped beam, and pattern forming method using the same |
| 02/27/2013 | CN101408733B Methods relating to immersion lithography and an immersion lithographic apparatus |
| 02/27/2013 | CN101263430B Microlithography projection optical system, method for manufacturing a device and method to design an optical surface |
| 02/27/2013 | CN101078876B Green photonasty resin composition, transfer printing material, color filter and display device |
| 02/26/2013 | US8384880 Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
| 02/26/2013 | US8384877 Exposure apparatus and method for producing device |
| 02/26/2013 | US8384133 Image sensor comprising anti-reflection layer having high refractive index |
| 02/26/2013 | US8383329 Pattern exposure method, conductive film producing method, and conductive film |
| 02/26/2013 | US8383327 Method for producing an electro-optical printed circuit board with optical waveguide structures |
| 02/26/2013 | US8383325 Lithographic apparatus and method |
| 02/26/2013 | US8383324 Mask registration correction |
| 02/26/2013 | US8383323 selectively hard masking a semiconductor wafer; baking to drive out solvents in first resist; first resist exposed to and exposing an edge of the wafer to radiation; hard baking and coating; exposing select portions of the wafer edge having the second resist thereon to the second radiation |
| 02/26/2013 | US8383322 Immersion lithography watermark reduction |
| 02/26/2013 | US8383321 Method for developing a printing plate precursor |
| 02/26/2013 | US8383320 Resist underlayer film forming composition and method of forming resist pattern using the same |
| 02/26/2013 | US8383319 Lithographic printing plate precursors and stacks |
| 02/26/2013 | US8383318 Acid-sensitive, developer-soluble bottom anti-reflective coatings |