| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/07/2013 | DE102006040275B4 Ausrichtmarken für Lithografie mit polarisiertem Licht und Verfahren zur Verwendung derselben Alignment marks for lithography with polarized light and method of using same |
| 03/06/2013 | EP2565902A2 Electron beam exposure system |
| 03/06/2013 | EP2565714A1 Lithographic printing plate precursor and method of preparing lithographic printing plate using the same |
| 03/06/2013 | EP2565686A1 Method for making optically effective surface relief microstructures |
| 03/06/2013 | EP2564273A1 Spectral purity filter |
| 03/06/2013 | EP2564272A2 Ball-spacer method for planar object leveling |
| 03/06/2013 | EP2564271A1 Separation control substrate/template for nanoimprint lithography |
| 03/06/2013 | EP2564270A1 Force curve analysis method for planar object leveling |
| 03/06/2013 | CN202771156U Double-workpiece-platform measurement initialization system |
| 03/06/2013 | CN202771155U Double-beam exposure system capable of being used for manufacturing photonic crystal mask layer |
| 03/06/2013 | CN202771154U Damage-resistant film |
| 03/06/2013 | CN202771153U Nano-imprint device for high-brightness LED graphics |
| 03/06/2013 | CN1989156B Fluorine-containing copolymer, alkali-developable resin composition, and alkali-developable photosensitive resin composition |
| 03/06/2013 | CN1645548B Charged particle beam device |
| 03/06/2013 | CN1530743B Light mask and diffuse-reflecting board |
| 03/06/2013 | CN102959679A Composition for photocurable imprint, and method for formation of pattern using the composition |
| 03/06/2013 | CN102959678A Method of manufacturing semiconductor device and system for manufacturing semiconductor device |
| 03/06/2013 | CN102959674A Plasma display panel and manfacturing method thereof |
| 03/06/2013 | CN102959471A Method of improving print performance in flexographic printing plates |
| 03/06/2013 | CN102959470A Exposure system |
| 03/06/2013 | CN102959469A Method and apparatus for alignment optimization with respect to plurality of layers |
| 03/06/2013 | CN102956475A Preparation method of cross-polycrystalline silicon layer of Si-Ge bi-polar CMOS (complementary metal oxide semiconductor) |
| 03/06/2013 | CN102956461A Forming method of grid electrode |
| 03/06/2013 | CN102956443A Manufacturing method of semiconductor device |
| 03/06/2013 | CN102956441A Method for producing semiconductor components on substrate and substrate with semiconductor components |
| 03/06/2013 | CN102956422A Charged particle beam forming aperture and charged particle beam exposure apparatus |
| 03/06/2013 | CN102955381A Photoresist strip processes for improved device integrity |
| 03/06/2013 | CN102955380A Low-etch cleaning fluid for photoresist |
| 03/06/2013 | CN102955379A Method for compensating overlay error caused by lens distortion |
| 03/06/2013 | CN102955378A Morphology characterization method for photoresist |
| 03/06/2013 | CN102955377A Lithographic apparatus, device manufacturing method, and method of calibrating displacement measuring system |
| 03/06/2013 | CN102955376A Programmable illuminator for photolithography system |
| 03/06/2013 | CN102955375A Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method |
| 03/06/2013 | CN102955374A Rapid and precise temperature controlling equipment of glass substrate surface |
| 03/06/2013 | CN102955373A Approaching exposure apparatus and approaching type exposure method |
| 03/06/2013 | CN102955372A Substrate table assembly, immersion lithographic apparatus and device manufacturing method |
| 03/06/2013 | CN102955371A Coherent factor adjusting system in deep ultraviolet lithography lighting system |
| 03/06/2013 | CN102955370A Lithography model for 3D topographic wafers |
| 03/06/2013 | CN102955369A Lithographic apparatus, substrate table and device manufacturing method |
| 03/06/2013 | CN102955368A Stepper lithography device and lithography exposure method |
| 03/06/2013 | CN102955367A Stage quality measuring and correcting method |
| 03/06/2013 | CN102955366A Projection exposure device and splicing method |
| 03/06/2013 | CN102955365A Interference exposure device and method thereof |
| 03/06/2013 | CN102955364A Photoetching method of substrate having steps |
| 03/06/2013 | CN102955363A Optical proximity correction online monitoring method |
| 03/06/2013 | CN102955362A Novel photo-resistive buffer tank |
| 03/06/2013 | CN102955361A Positive type photosensitive resin composition, method for forming cured film, cured film, liquid crystal display device, and organic EL display device |
| 03/06/2013 | CN102955360A Photosensitive composition, method for manufacturing molded article, molded article and semiconductor device |
| 03/06/2013 | CN102955359A Salt, photoresist composition and method for producing photoresist pattern |
| 03/06/2013 | CN102955358A Photosensitive composition, micro lens array and stereoscopic image display device |
| 03/06/2013 | CN102955357A Nanometer imprinting composite template and preparation method thereof |
| 03/06/2013 | CN102955356A Multiple chemical treatment process for reducing pattern defect |
| 03/06/2013 | CN102955355A Method for preparing solvent permeation nanoimprint micro-nano structure |
| 03/06/2013 | CN102955346A Manufacturing method for scribing lines of projection screen of profile projector |
| 03/06/2013 | CN102955235A Refraction and reflection projection optical system with large view field |
| 03/06/2013 | CN102955234A Refraction and reflection projection objective with large view field |
| 03/06/2013 | CN102955228A Machine vision imaging lens structure |
| 03/06/2013 | CN102955188A Color filter, liquid crystal display element, and method for producing the color filter |
| 03/06/2013 | CN102954761A Position measurement system, lithographic apparatus and device manufacturing method |
| 03/06/2013 | CN102952122A Compound used in color composition |
| 03/06/2013 | CN102952109A Compound used in color composition |
| 03/06/2013 | CN102952053A Salt, photoresist composition and method for producing photoresist pattern |
| 03/06/2013 | CN102952030A Compound, charge transporting film, photoelectric conversion device, and electrophotographic photoreceptor |
| 03/06/2013 | CN102951761A Method for recovering waste photoresist stripper |
| 03/06/2013 | CN102385254B Photo-sensitivity resin composition |
| 03/06/2013 | CN102298276B Silicon wafer degumming device |
| 03/06/2013 | CN102289157B Projection photoetching system with composite photon sieve |
| 03/06/2013 | CN102200689B Hybrid maglev gravity compensation apparatus |
| 03/06/2013 | CN102073214B Heat treatment unit of gluing developing machine |
| 03/06/2013 | CN102044415B Method for manufacturing semiconductor structure |
| 03/06/2013 | CN101933408B Method for electroconductive pattern formation |
| 03/06/2013 | CN101833248B Substrate table, immersion lithographic apparatus and device manufacturing method |
| 03/06/2013 | CN101794046B Display device, touch sensor, and method for manufacturing display device |
| 03/06/2013 | CN101675386B Alkali developable photosensitive resin composition and dry film manufactured by the same |
| 03/06/2013 | CN101584255B Radiation system and lithographic apparatus |
| 03/06/2013 | CN101552189B 等离子体处理方法 The plasma processing method |
| 03/06/2013 | CN101535894B Photosensitive resin composition for forming column spacer of liquid crystal display, method for forming column spacer using the composition, column spacer formed by the method, and display device comprising thereof |
| 03/06/2013 | CN101526738B Photoresist composition and method for making array base plate using the same |
| 03/06/2013 | CN101522613B Sulphonium salt photoinitiators |
| 03/06/2013 | CN101297244B 光刻系统和投影方法 Projection lithography system and method |
| 03/06/2013 | CN101258018B Film forming composition for nanoimprinting and method for pattern formation |
| 03/06/2013 | CN101082772B Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device |
| 03/06/2013 | CN101057316B Position measurement method, position control method, measurement method, loading method, exposure method, exoposure apparatus, and device production method |
| 03/05/2013 | US8389593 Composition for simultaneously forming two isolated column spacer patterns |
| 03/05/2013 | US8389206 High normality solution for removing freeze material in lithographic applications |
| 03/05/2013 | US8389205 Patterning nano-scale patterns on a film comprising unzipping polymer chains |
| 03/05/2013 | US8389204 Method for producing comb-shaped electrode |
| 03/05/2013 | US8389203 Applying UV radiation using LEDs to cure photo-curable material on the photopolymer flexographic plate, a photopolymer letterpress plate, or a photopolymer sleeve during the process of imaging |
| 03/05/2013 | US8389202 Polymer, radiation-sensitive composition, monomer, and method of producing compound |
| 03/05/2013 | US8389201 Positive resist composition and pattern forming process |
| 03/05/2013 | US8389200 Pattern forming method |
| 03/05/2013 | US8389199 Lithographic imaging with printing members having metal imaging bilayers |
| 03/05/2013 | US8389198 Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate |
| 03/05/2013 | US8389197 Compound, positive resist composition and resist pattern forming method |
| 03/05/2013 | US8387886 Security document with electrically-controlled display element |
| 03/05/2013 | US8387482 Method and system to control movement of a body for nano-scale manufacturing |
| 02/28/2013 | WO2013028650A2 Methods for fabricating three-dimensional nano-scale structures and devices |
| 02/28/2013 | WO2013028066A1 Lithography system and method for storing positional data of a target |
| 02/28/2013 | WO2013027936A2 Black photosensitive resin composition and image display device having same |
| 02/28/2013 | WO2013027900A1 Heterodyne interference lithography apparatus, and method for forming micro-patterns, wafer, and semiconductor device using the apparatus |