| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 03/13/2013 | CN102967890A Simple preparation method and application of polydimethylsiloxane (PDMS) polymer microlens array |
| 03/13/2013 | CN102964515A Resin and photosensitive resin composition for layer insulation film and protective film |
| 03/13/2013 | CN102963111A Lithographic printing plate precursor and method of preparing lithographic printing plate using the same |
| 03/13/2013 | CN102375350B Detection layout and detection method of development technology |
| 03/13/2013 | CN102289153B Method for measuring steady state stability of plate-making etching equipment |
| 03/13/2013 | CN102207689B Alignment system and align mark precision extraction method of write-through lithography machine |
| 03/13/2013 | CN102161637B Photoactive compound |
| 03/13/2013 | CN102142367B Method for fabricating integrated circuit |
| 03/13/2013 | CN102076732B 新型聚酰亚胺前体组合物及其利用 The new polyimide precursor composition and its use |
| 03/13/2013 | CN102063017B Exposure apparatus and method of manufacturing device |
| 03/13/2013 | CN102033424B 压印光刻 Imprint lithography |
| 03/13/2013 | CN102005382B Dual exposure track only pitch split process |
| 03/13/2013 | CN101989049B Lithographic apparatus and monitoring method |
| 03/13/2013 | CN101959909B Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition |
| 03/13/2013 | CN101836164B Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type |
| 03/13/2013 | CN101802033B 感光性树脂组合物 The photosensitive resin composition |
| 03/13/2013 | CN101762982B Infrared positive thermal-sensitive offset plate |
| 03/13/2013 | CN101681120B Optical unit, illumination optical apparatus, exposure apparatus, exposure method, and device manufacturing method |
| 03/13/2013 | CN101583907B Antireflective coating compositions comprising solvent mixtures for photoresists |
| 03/13/2013 | CN101506739B Method and system for correcting image changes |
| 03/13/2013 | CN101490621B Hardmask composition for processing resist underlayer film, process for producing semiconductor integrated circuit device using the hardmask composition, and semiconductor integrated circuit device pr |
| 03/13/2013 | CN101470357B Exposure apparatus |
| 03/13/2013 | CN101458449B Graytone mask blank, method of manufacturing graytone mask and graytone mask, and pattern transfer method |
| 03/13/2013 | CN101339362B Fault correcting method for gray tone mask, gray tone mask and manufacturing method thereof |
| 03/13/2013 | CN101075086B 光掩模和曝光方法 Photomask exposure method and |
| 03/13/2013 | CN101055420B Negative type photo-sensitive composition and its lithographic plate printing method |
| 03/12/2013 | US8395757 Optimized polarization illumination |
| 03/12/2013 | US8395755 Lithographic apparatus and device manufacturing method |
| 03/12/2013 | US8394579 Methods of forming patterns |
| 03/12/2013 | US8394578 Method of forming resist pattern and negative tone-development resist composition |
| 03/12/2013 | US8394577 Patterning process |
| 03/12/2013 | US8394576 Method for patterning a photosensitive layer |
| 03/12/2013 | US8394575 Formulations for environmentally friendly photoresist film layers |
| 03/12/2013 | US8394573 Photoresist compositions and methods for shrinking a photoresist critical dimension |
| 03/12/2013 | US8394572 Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus |
| 03/12/2013 | US8394571 Methods of forming electronic devices |
| 03/12/2013 | US8394570 Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process |
| 03/12/2013 | US8394569 Resist composition for immersion lithography and method for forming resist pattern |
| 03/12/2013 | US8394313 Process for the production of a three-dimensional object with an improved separation of hardened material layers from a construction plane |
| 03/12/2013 | US8393885 Processing apparatus |
| 03/07/2013 | WO2013032860A1 Method for preparing a relief printing form |
| 03/07/2013 | WO2013032780A1 Lithographic printing plate precursors for on-press development |
| 03/07/2013 | WO2013032776A1 Aluminum substrates and lithographic printing plate precursors |
| 03/07/2013 | WO2013032190A1 Photopolymerizable unsaturated resin, photosensitive resin composition comprising the same, and light shielding spacer and liquid crystal display device formed therefrom |
| 03/07/2013 | WO2013032178A2 Photosensitive resin composition |
| 03/07/2013 | WO2013031985A1 Photosensitive alkali-soluble silicone resin composition |
| 03/07/2013 | WO2013031928A1 Exposure apparatus, liquid holding method, and device manufacturing method |
| 03/07/2013 | WO2013031901A1 Method and device for inspecting spatial light modulator, and exposure method and device |
| 03/07/2013 | WO2013031887A1 Optical substrate and semiconductor light-emitting element |
| 03/07/2013 | WO2013031878A1 Polymerizable monomer, polymer, resist using same, and pattern forming method therefor |
| 03/07/2013 | WO2013031863A1 Reflective mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank |
| 03/07/2013 | WO2013031753A1 Colored resin composition and resin black matrix substrate |
| 03/07/2013 | WO2013031737A1 Negative photosensitive resin composition, partition wall and optical element |
| 03/07/2013 | WO2013031736A1 Negative photosensitive resin composition, partition wall, black matrix and optical element |
| 03/07/2013 | WO2013031686A1 Negative active-light-sensitive or radiation-sensitive resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photomask |
| 03/07/2013 | WO2013031632A1 Exposure light adjustment device |
| 03/07/2013 | WO2013031434A1 Radiation-sensitive composition, method for forming pattern, color filter and method of producing the same, and solid-state image sensor |
| 03/07/2013 | WO2013031235A1 Aligning method, exposure method, device manufacturing method, and method for manufacturing flat panel display |
| 03/07/2013 | WO2013031230A1 Method for manufacturing display panel |
| 03/07/2013 | WO2013031223A1 Substrate treatment device, substrate treatment method, light exposure method, light exposure device, method for manufacturing device, and method for manufacturing flat panel display |
| 03/07/2013 | WO2013031222A1 Object transportation device, object processing device, exposure device, method for producing flat panel display, method for producing device, method for transporting object, and method for exchanging object |
| 03/07/2013 | WO2013029985A2 Method for manufacturing periodic structures on a surface of a substrate |
| 03/07/2013 | WO2013029957A2 A method of determining focus corrections, lithographic processing cell and device manufacturing method |
| 03/07/2013 | WO2013029906A1 Radiation source |
| 03/07/2013 | WO2013029902A1 Radiation source and lithographic apparatus |
| 03/07/2013 | WO2013029898A1 Radiation source |
| 03/07/2013 | WO2013029897A1 Radiation source and lithographic apparatus |
| 03/07/2013 | WO2013029896A1 Radiation source and method for lithographic apparatus for device manufacture |
| 03/07/2013 | WO2013029895A1 Radiation source |
| 03/07/2013 | WO2013029893A2 Lithographic system, method of controlling a lithographic apparatus and device manufacturing method |
| 03/07/2013 | WO2013029879A1 Lithographic apparatus, method of setting up a lithographic apparatus and device manufacturing method |
| 03/07/2013 | WO2013011508A3 Optical system and method for measuring in patterned stuctures |
| 03/07/2013 | WO2013008072A3 A process for preparing polymer composition of functionalized epoxy resist, polymer composition and applications thereof |
| 03/07/2013 | WO2012158838A3 High density, hard tip arrays |
| 03/07/2013 | WO2012144762A3 Method for printing a conductive circuit using a uv rotational molding machine |
| 03/07/2013 | US20130059308 Polymer microfilters and methods of manufacturing the same |
| 03/07/2013 | US20130059255 Methods of Lithographically Patterning a Substrate |
| 03/07/2013 | US20130059254 Photolithography method using a chemically-amplified resist |
| 03/07/2013 | US20130059253 Exposure apparatus, liquid holding method, and device manufacturing method |
| 03/07/2013 | US20130059252 Method for forming resist pattern and composition for forming protective film |
| 03/07/2013 | US20130059251 Micro/nano photoconductor |
| 03/07/2013 | US20130059241 Development processing method and development processing apparatus |
| 03/07/2013 | US20130059240 Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing Method |
| 03/07/2013 | US20130059239 Photoresist pattern forming method, and microlens array forming method |
| 03/07/2013 | US20130059238 Reverse optical proximity correction method |
| 03/07/2013 | US20130059236 Mask blank, transfer mask and process for manufacturing semiconductor devices |
| 03/07/2013 | US20130059234 Exposure method and exposure mask |
| 03/07/2013 | US20130059233 Photopolymer media with enhanced dynamic range |
| 03/07/2013 | US20130057841 Lithographic projection apparatus and device manufacturing method |
| 03/07/2013 | US20130057817 Photo-alignment film and manufacturing method thereof |
| 03/07/2013 | US20130057618 Method of manufacturing a liquid ejection head and liquid ejection head |
| 03/07/2013 | US20130056654 Positive resist composition and patterning process |
| 03/07/2013 | US20130056653 Positive resist composition and patterning process |
| 03/07/2013 | US20130056022 Bare aluminum baffles for resist stripping chambers |
| 03/07/2013 | DE112010004289T5 Silicium-enthaltende Beschichtungszusamnmensetzungen und Verfahren zur Verwendung Silicon-containing and methods of using Beschichtungszusamnmensetzungen |
| 03/07/2013 | DE112008004068T5 Hartmaskenzusammensetzung mit verbesserter Lagerstabilität zum Bilden eines Resist-Unterschichtsfilms Hardmask composition having improved storage stability of forming a resist underlayer film |
| 03/07/2013 | DE10339915B4 Entwicklungsverfahren und Verfahren zur Herstellung eines Halbleiterbauteils Developing method and process for producing a semiconductor device |
| 03/07/2013 | DE102012202169A1 Positioning device for positioning mirror of extreme UV projection exposure system for manufacturing semiconductor chip, has magnet conductive sheets and body partially shielding external magnetic field in region of holding device |
| 03/07/2013 | DE102006050889B4 Waferbelichtungseinrichtung und Verfahren Wafer exposure device and method |
| 03/07/2013 | DE102006040280B4 Überlagerungstarget für Lithografie mit polarisiertem Licht Overlay target for lithography with polarized light |