| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/20/2013 | CN101133364B Composition for underlayer film of resist and process for producing the same |
| 03/19/2013 | US8402407 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method |
| 03/19/2013 | US8400615 Lithographic apparatus and device manufacturing method |
| 03/19/2013 | US8399833 Charged particle beam writing method, method for detecting position of reference mark for charged particle beam writing, and charged particle beam writing apparatus |
| 03/19/2013 | US8399184 Method for laser interference lithography using diffraction grating |
| 03/19/2013 | US8399183 Patterning a single integrated circuit layer using automatically-generated masks and multiple masking layers |
| 03/19/2013 | US8399182 Method of fabricating liquid crystal display device |
| 03/19/2013 | US8399181 Methods of fabricating photomasks for improving damascene wire uniformity without reducing performance |
| 03/19/2013 | US8399180 Three dimensional integration with through silicon vias having multiple diameters |
| 03/19/2013 | US8399179 High aspect ratio microstructures |
| 03/19/2013 | US8399178 Method of producing a relief image arrangement usable in particular in the field of flexography and arrangement produced according to this method |
| 03/19/2013 | US8399177 Enhanced relief printing plate |
| 03/19/2013 | US8399176 Photosensitive resin composition |
| 03/19/2013 | US8399175 Photopolymer resins for photo replication of information layers |
| 03/19/2013 | US8399174 Method of forming fine patterns using a block copolymer |
| 03/19/2013 | US8399173 Resist composition and resist pattern forming method |
| 03/19/2013 | US8399172 Negative-working lithographic printing plate precursor and method of lithographic printing using same |
| 03/19/2013 | US8399159 Mask blank substrate |
| 03/19/2013 | US8398320 Non-transitory storage medium for rinsing or developing sequence |
| 03/19/2013 | US8398001 Aperture plate and methods for its construction and use |
| 03/14/2013 | WO2013036555A1 Block copolymers and lithographic patterning using same |
| 03/14/2013 | WO2013036125A1 Projection system with flexible coupling |
| 03/14/2013 | WO2013036116A1 Support structure for wafer table |
| 03/14/2013 | WO2013035854A1 Contact exposure device and contact exposure method |
| 03/14/2013 | WO2013035731A1 Liquid treatment apparatus for substrate, and method for controlling liquid treatment apparatus for substrate |
| 03/14/2013 | WO2013035696A1 Substrate transfer apparatus and substrate processing apparatus |
| 03/14/2013 | WO2013035661A1 Substrate processing device |
| 03/14/2013 | WO2013035642A1 Method for manufacturing imprint mold, and resist developing device |
| 03/14/2013 | WO2013035535A1 Flexographic printing original plate and water-developable photosensitive resin laminate |
| 03/14/2013 | WO2013035489A1 Substrate processing device |
| 03/14/2013 | WO2013035025A1 Device for moving objects in a vacuum environment |
| 03/14/2013 | WO2013034753A1 Vibration isolation module and substrate processing system |
| 03/14/2013 | WO2013034474A1 Method of making a lithographic printing plate |
| 03/14/2013 | WO2012073086A8 Optical device, laser apparatus, and extreme ultraviolet light generation system |
| 03/14/2013 | US20130065186 Radiation-sensitive resin composition, method for forming resist pattern, organic acid and acid generating agent |
| 03/14/2013 | US20130065185 Scanning Lithography using point source imaging arrays |
| 03/14/2013 | US20130065184 Charged particle beam drawing method and charged particle beam drawing apparatus |
| 03/14/2013 | US20130065183 Patterning process and resist composition |
| 03/14/2013 | US20130065182 Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method |
| 03/14/2013 | US20130065181 Lithographic printing plate support, method of manufacturing the same, and presensitized plate |
| 03/14/2013 | US20130065180 Resist composition and method of forming resist pattern |
| 03/14/2013 | US20130065179 Positive resist composition and patterning process |
| 03/14/2013 | US20130065178 Compositions and processes for immersion lithography |
| 03/14/2013 | US20130065168 Color filter for low temperature applications |
| 03/14/2013 | US20130065167 Photoresist composition for color filter and method for forming color filter |
| 03/14/2013 | US20130065165 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 03/14/2013 | US20130065162 Method of fabricating wave-shaped mask and exposure method of fabricating nano-scaled structure using the wave-shaped mask |
| 03/14/2013 | US20130065160 Removable transparent membrane for a pellicle |
| 03/14/2013 | US20130064063 Master disc having a ptm later and a nickel undercoat |
| 03/14/2013 | US20130062307 Method of making a mask, method of patterning by using this mask and method of manufacturing a micro-device |
| 03/14/2013 | DE10219805B4 Verfahren zur Stabilisierung der Strahlungsleistung einer gepuist betriebenen, auf gasentladungserzeugtem Plasma basierenden Strahlungsquelle A method for stabilizing the radiation power of a gepuist operated, based gasentladungserzeugtem plasma radiation source |
| 03/14/2013 | DE102011113940A1 Method for determining dose alterations for adapting e.g. diameter of contact holes of mask for manufacturing semiconductor component, involves determining alterations as variations in intensity values from extreme intensity value |
| 03/14/2013 | DE102011090165A1 Erhöhte Integrität von Metallgatestapeln mit großem ε durch Bewahren eines Lackmaterials über Endbereichen von Gateelektrodenstrukturen Increased integrity of metal gate stacks with large ε by preserving a resist material on end portions of gate electrode structures |
| 03/14/2013 | DE102011082414A1 Autofokuseinrichtung und Autofokussierverfahren für eine Abbildungsvorrichtung Autofocus device and autofocusing method for an imaging device |
| 03/13/2013 | EP2568495A1 Method for manufacturing semiconductor device and apparatus for manufacturing semiconductor device |
| 03/13/2013 | EP2568340A2 Electronic device, and method for manufacturing symbol on exterior of electronic device |
| 03/13/2013 | EP2568339A2 Lithographic printing plate precursor and method of manufacturing lithographic printing plate |
| 03/13/2013 | EP2568338A1 Colored curable composition, color filter and method of producing color filter, solid-state image sensor and liquid crystal display device |
| 03/13/2013 | EP2568337A2 Method of manufacturing quantum dot layer and quantum dot optoelectronic device including the quantum dot layer |
| 03/13/2013 | EP2567995A2 Resin composition for printing plate |
| 03/13/2013 | EP2567291A1 Method of topographical and electrical nanostructuration of a thin film of electret polymer and thin film of electret polymer obtained |
| 03/13/2013 | EP2567290A1 Fabrication of nanometer and micrometer structures with continuous reliefs |
| 03/13/2013 | EP2567285A1 Color filter for low temperature applications |
| 03/13/2013 | EP2567284A1 Color filter for low temperature applications |
| 03/13/2013 | EP2566900A2 Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates |
| 03/13/2013 | CN202794854U Developing device |
| 03/13/2013 | CN202794853U Developing device |
| 03/13/2013 | CN202794852U Transmission device of developing machine and the same |
| 03/13/2013 | CN202794851U Novel exposing device |
| 03/13/2013 | CN202794850U 3-dimensional (3D) exposure device |
| 03/13/2013 | CN202794849U Even surface light source device for exposure machine |
| 03/13/2013 | CN202794848U Film exposure device |
| 03/13/2013 | CN202794847U Exposure rack of exposure machine |
| 03/13/2013 | CN202794846U Negative film contraposition system |
| 03/13/2013 | CN202794845U Copper-clad plate aligning system for exposure machine |
| 03/13/2013 | CN202794844U Flexible circuit board exposure machine |
| 03/13/2013 | CN202794843U Novel alignment film |
| 03/13/2013 | CN202794592U Photonic crystal manufacturing device based on holographic interference |
| 03/13/2013 | CN202793315U Difference interferometer module and lithographic system having the difference interferometer module |
| 03/13/2013 | CN202793314U Interferometer module and lithography system |
| 03/13/2013 | CN1934500B Antireflective film containing sulfur atom |
| 03/13/2013 | CN1918643B Novel optical storage materials based on narrowband optical properties |
| 03/13/2013 | CN1894630B Methods and systems for controlling radiation beam characteristics for microlithographic processing |
| 03/13/2013 | CN102971674A Method and apparatus for performing pattern alignment |
| 03/13/2013 | CN102971391A Fluorine-based surfactant, and coating composition and resist composition each using same |
| 03/13/2013 | CN102970826A Processing method for utilizing dustproof support frame to perform manual alignment exposure on circuit board |
| 03/13/2013 | CN102969300A Alignment precision detection pattern and usage method thereof |
| 03/13/2013 | CN102968003A Method for removing photoresist |
| 03/13/2013 | CN102968002A Drying film remover for chip and preparation method of remover |
| 03/13/2013 | CN102968001A Alkaline cleaning solution |
| 03/13/2013 | CN102968000A Dual-sided processing method and exposure device |
| 03/13/2013 | CN102967999A Interference lithography system and method based on spatial light modulator |
| 03/13/2013 | CN102967998A Arrangment of horizonal sensor used for lithography device, lithography device, and device manufacture method |
| 03/13/2013 | CN102967997A Method and apparatus for determining an overlay error |
| 03/13/2013 | CN102967996A Method for improving alignment accuracy of lithography machine |
| 03/13/2013 | CN102967995A Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, process for making relief printing plate, and relief printing plate |
| 03/13/2013 | CN102967994A Solidified resin composition |
| 03/13/2013 | CN102967993A Relief layer and imprint method for making the same |
| 03/13/2013 | CN102967992A Array substrate, mask plate and manufacturings method thereof, as well as display device |
| 03/13/2013 | CN102967970A Array substrate, liquid display element, and method for manufacturing array subsrtate |