| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/21/2013 | WO2013038909A1 Process for producing lithographic printing plate and lithographic printing plate |
| 03/21/2013 | WO2013037856A1 Substrate processing apparatus |
| 03/21/2013 | WO2013037802A1 Vacuum chamber with base plate |
| 03/21/2013 | WO2013037607A1 Apparatus for monitoring a lithographic patterning device |
| 03/21/2013 | WO2013037486A2 Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly |
| 03/21/2013 | WO2013037197A1 Photosensitive benzocyclobutene resin composition and preparation method and patterning method thereof |
| 03/21/2013 | WO2013037139A1 Lcd exposure platform device and exposure system |
| 03/21/2013 | WO2013036979A1 Photoresist |
| 03/21/2013 | WO2013012169A3 Photosensitive composition and compound used therein |
| 03/21/2013 | US20130072411 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 03/21/2013 | US20130071792 Method for fabricating liquid crystal display device |
| 03/21/2013 | US20130071791 Charged particle beam irradiation apparatus, charged particle beam drawing apparatus, and method of manufacturing article |
| 03/21/2013 | US20130071790 Method of forming an etch mask |
| 03/21/2013 | US20130071789 Resist composition and method of forming resist pattern |
| 03/21/2013 | US20130071788 Patterning process and resist composition |
| 03/21/2013 | US20130071787 Positive photosensitive resin composition and method for forming cured film using the same |
| 03/21/2013 | US20130071786 Coating composition and image-forming material, lithographic printing plate precursor and oxygen-blocking film including the coating composition |
| 03/21/2013 | US20130071777 Phase shift mask blank, method of manufacturing the same, and phase shift mask |
| 03/21/2013 | US20130071775 Method of Manufacturing a Mask |
| 03/21/2013 | US20130071773 Holographic storage medium |
| 03/21/2013 | US20130071611 Three-dimensional integrated structure having a high shape factor, and related forming method |
| 03/21/2013 | US20130070227 Imaging optical system |
| 03/21/2013 | US20130070226 Marker structure and method of forming the same |
| 03/21/2013 | US20130070225 Guidance for target processing tool |
| 03/21/2013 | US20130070223 Projection system with flexible coupling |
| 03/21/2013 | US20130070221 Microlithographic projection exposure apparatus |
| 03/21/2013 | DE102012221242A1 Micro-electromechanical mirror assembly for extreme UV projection exposure system for microlithography, has actuator arranged so that mirror is adjustable between two positions by actuation of actuator having printed electro active polymer |
| 03/21/2013 | DE102012209290A1 Optical arrangement i.e. extreme UV lithography system, has moving unit i.e. linear motor, for selectively introducing filter in beam path or for removal of spectral filter from beam path of light source |
| 03/21/2013 | DE102012206545A1 Optical assembly of optical imaging device used in microlithography for production of microelectronic circuits, has connecting unit with elastic element that generates coordinated supporting force in supported state of lens |
| 03/21/2013 | DE102012204142A1 Collector for microlithography projection exposure apparatus used during manufacture of micro-or nano-structured component, has movable portion that is moved to adjust spatial extent of radiation in region of intermediate focus |
| 03/21/2013 | DE102011082994A1 Arrangement for mounting an optical element such as extreme ultraviolet (EUV) projection exposure apparatus has damping element which brings about damping of natural vibration form of pin in a lateral direction |
| 03/20/2013 | EP2570854A1 Illumination-source shape definition in optical lithography |
| 03/20/2013 | EP2570853A2 Coating composition and image-forming material, lithographic printing plate precursor and oxygen-blocking film including the coating composition |
| 03/20/2013 | CN202815413U Device for exposure and alignment of dry films |
| 03/20/2013 | CN202815412U Pre-alignment mechanism of photoetching machine |
| 03/20/2013 | CN202815411U Special high-precision and high-efficiency exposure machine for grating ruler and optical coded disc |
| 03/20/2013 | CN1954265B Antireflective film-forming composition containing vinyl ether compound |
| 03/20/2013 | CN102986003A Fluid processing device and fluid processing method |
| 03/20/2013 | CN102985880A Method for forming cured film |
| 03/20/2013 | CN102985879A 1.5D SLM for lithography |
| 03/20/2013 | CN102985878A Method and apparatus for performing pattern alignment |
| 03/20/2013 | CN102985877A Photosensitive resin composition, photosensitive resin composition film, and semiconductor device using the photosensitive resin composition or the photosensitive resin composition film |
| 03/20/2013 | CN102985876A Positive-type photosensitive resin composition and black bank of an organic light-emitting device including same |
| 03/20/2013 | CN102985875A Multi-layer compressible foam sheet and method of making the same |
| 03/20/2013 | CN102983067A Manufacturing method of hybrid lines |
| 03/20/2013 | CN102983066A Mixing line making method |
| 03/20/2013 | CN102983065A Forming method for pattern, mask pattern and manufacture method for semiconductor component |
| 03/20/2013 | CN102981380A Pre-aligning device and pre-aligning method for photoetching device |
| 03/20/2013 | CN102981379A Cleaning agent composition for photoresist |
| 03/20/2013 | CN102981378A Method of removing photoresist of polyimide flexible electrode preparation process |
| 03/20/2013 | CN102981377A 金属和电介质相容的牺牲性抗反射涂层清洗及去除组合物 Compatibility of the metal and the dielectric sacrificial anti-reflective coating composition for the cleaning and removal of |
| 03/20/2013 | CN102981376A Photoresist cleaning solution |
| 03/20/2013 | CN102981375A Method for designing relay lens group in extreme ultra-violet lithography lighting system |
| 03/20/2013 | CN102981374A Detection plate group gluing method and clamp |
| 03/20/2013 | CN102981373A Y-shaped waveguide laser direct writing device |
| 03/20/2013 | CN102981372A Intelligent exposure system of tubular surface wired circuit conductive pattern |
| 03/20/2013 | CN102981371A Reconstructible sub-wavelength grating photoetching machine based on surface plasma interference |
| 03/20/2013 | CN102981370A Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method |
| 03/20/2013 | CN102981369A Optical filming side stopping method |
| 03/20/2013 | CN102981368A Antireflective film-forming composition containing vinyl ether compound |
| 03/20/2013 | CN102981367A Photosensitive composition containing 4-(2,4,6-trimethyl benzene formyl) diphenyl sulfide as photoinitiator |
| 03/20/2013 | CN102981366A Solder-resistance composite and application to printed circuit board |
| 03/20/2013 | CN102981365A Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer |
| 03/20/2013 | CN102981364A Coloring composition used for color filter, color filter and display element |
| 03/20/2013 | CN102981363A 抗蚀剂组合物 The resist composition |
| 03/20/2013 | CN102981362A Method using 4 and 5-cyclohexene oxide-1 and 2-dioctyl phthalate glycidyl ester as prepolymer to prepare three-dimensional lithography fast forming photosensitive resin and application |
| 03/20/2013 | CN102981361A Plastics |
| 03/20/2013 | CN102981360A Manufacturing method of micro-nano speckle |
| 03/20/2013 | CN102981359A Photoetching method |
| 03/20/2013 | CN102981358A 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof |
| 03/20/2013 | CN102981357A Photosensitive resin composition, and photosensitive element, and resist pattern formation method |
| 03/20/2013 | CN102981312A 光配向膜及其制作方法 Light with the film and its production method |
| 03/20/2013 | CN102981306A Method for manufacturing color filter |
| 03/20/2013 | CN102981279A Ultralow-distortion and dodging digital projection optical system for DMD |
| 03/20/2013 | CN102981255A Large view field projection objective lens |
| 03/20/2013 | CN102981249A Projection optical system |
| 03/20/2013 | CN102981234A Axial adjustment device for optical element |
| 03/20/2013 | CN102981204A 193nm fused quartz grating polarizer and application thereof to photoetching equipment |
| 03/20/2013 | CN102981202A Fabrication method of color filter |
| 03/20/2013 | CN102981201A Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby |
| 03/20/2013 | CN102981198A Wet etching method of echelle grating in single-crystal silicon |
| 03/20/2013 | CN102981197A Reactive ion beam etching method of broad-band grating |
| 03/20/2013 | CN102978621A Wet etching method for aluminum film in surface acoustic wave device |
| 03/20/2013 | CN102977630A Dispersing agent for organic pigment and use thereof |
| 03/20/2013 | CN102977259A Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer |
| 03/20/2013 | CN102975509A Relief printing plate precursor for laser engraving, relief printing plate, and process for making same |
| 03/20/2013 | CN102368140B Developing method and developing device |
| 03/20/2013 | CN102221775B Substrate manufacturing method, blank manufacturing method, regenerating photomask and manufacturing method thereof |
| 03/20/2013 | CN102207609B Catadioptric projection objective |
| 03/20/2013 | CN102141728B Method for forming three-dimensional pattern |
| 03/20/2013 | CN102081304B Negative resist composition and patterning process |
| 03/20/2013 | CN101959686B Sensitizer/initiator combination for negative-working thermal-sensitive compositions usable for lithographic plates |
| 03/20/2013 | CN101855599B Electroformed stencils for solar cell front side metallization |
| 03/20/2013 | CN101802712B Composition containing polymer having nitrogenous silyl group for forming resist underlayer film |
| 03/20/2013 | CN101776850B Exposure system and device production method |
| 03/20/2013 | CN101762989B Method for improving reliability of photosensitive materials of flat-panel display |
| 03/20/2013 | CN101669069B Photosensitive resin and process for producing microlens |
| 03/20/2013 | CN101598905B Lithographic apparatus and a method of operating the apparatus |
| 03/20/2013 | CN101561628B Method of making air-bridge |
| 03/20/2013 | CN101395535B Heat curable composition for protective film, cured product and liquid crystal display device |