Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2013
03/27/2013CN202837812U Lens group for stepping-type exposure machine
03/27/2013CN202837811U Gluing fixture used for wedge-shaped plate set of photoetching machine
03/27/2013CN202837810U Exposure alignment system
03/27/2013CN202837809U Device for alignment of inner layer of laser direct writing exposure machine
03/27/2013CN202837808U Concave-convex transparent adhesive film for printed circuit board (PCB) exposure
03/27/2013CN202837807U Coating liquid drying device in light-sensitive plate production
03/27/2013CN202837747U Light leak detection base plate and light leak detection device
03/27/2013CN202835238U Bulb part installation device
03/27/2013CN202823952U On-line sulfuric-acid peroxide mixture (SPM) preparation system
03/27/2013CN1842745B Thin film transistor, manufacturing method and method of manufacturing display
03/27/2013CN1700417B Semiconductor device and method for manufacturing the same, liquid crystal television, and EL television
03/27/2013CN103003918A Pattern formation method and polymer alloy base material
03/27/2013CN103003914A Method and system for modifying substrate patterned features using ion implantation
03/27/2013CN103003754A Method and apparatus for determining an overlay error
03/27/2013CN103003753A Method for producing a component and component produced by the method
03/27/2013CN103003752A Photosensitive resin composition, and method for producing photosensitive resin composition
03/27/2013CN103003055A Roller mold manufacturing device and manufacturing method
03/27/2013CN103000585A Manufacturing method of mask ROM (read only memory)
03/27/2013CN102998915A Positive photoresist and stripping agent composition
03/27/2013CN102998914A Write-through lithography processing system and lithography method
03/27/2013CN102998913A Simultaneous localization photoetching exposure device and method
03/27/2013CN102998912A Developing apparatus and developing method
03/27/2013CN102998911A Novel manufacturing method of photosensitive CTP (Computer-To-Plate) printing plate
03/27/2013CN102998910A Exposure apparatus, exposure method and device manufacturing method
03/27/2013CN102998909A Exposure apparatus
03/27/2013CN102998908A Drawing apparatus and drawing method
03/27/2013CN102998907A Aligning signal acquisition system and aligning method used in mask aligning
03/27/2013CN102998906A Support structure of lithography machine and manufacture method
03/27/2013CN102998905A Screen cloth for printing and making method thereof
03/27/2013CN102998904A Photoresist comprising multi-amide component
03/27/2013CN102998903A Photosensitive composition containing acridine bifunctional photoinitiator
03/27/2013CN102998902A Colored photosensitive resin composition
03/27/2013CN102998901A Preparation method of SU-8 nanofluid channel of integrated scale
03/27/2013CN102998900A Manufacturing method of photosensitive plate with ultrathin photosensitive layer
03/27/2013CN102998899A Two-degree-of-freedom nanometer positioning platform
03/27/2013CN102998893A Reflective mask plate, exposure device and exposure method
03/27/2013CN102998852A Cushion isolating material, liquid crystal panel, liquid crystal display device and preparation method of cushion isolating material
03/27/2013CN102998779A Varifocal photoetching objective lens system
03/27/2013CN102998740A Device and method for simultaneously inscribing multi-wavelength array gratings in ribbon fiber
03/27/2013CN102995118A Method for preparing D type optical fiber colloidal crystal micro-nano structure
03/27/2013CN102994015A Primer used for waterless offset printing plate-making, and preparation method and application thereof
03/27/2013CN102993890A Coating composition and image-forming material, lithographic printing plate precursor and oxygen-blocking film including the coating composition
03/27/2013CN102591142B Nano imprinting device and method for imaging sapphire substrate
03/27/2013CN102486606B Photoetching method
03/27/2013CN102419518B Developing machine, developing solution feeding system and method thereof
03/27/2013CN102354086B Real-time calibration method for orthogonality of precision mobile platform
03/27/2013CN102323720B Flexible micro-positioning platform based on driving of piezoelectric ceramics
03/27/2013CN102285290B Positive thermo-sensitive lithographic plate precursor
03/27/2013CN102272680B Developing apparatus, method for processing developer liquid, method for producing printing plate, and filtration device
03/27/2013CN102253524B Manufacturing method of colorful filtering substrate
03/27/2013CN102213917B Black-colored photosensitive resin composition, black matrix prepared by using thereof and color filter comprising the black matrix
03/27/2013CN102183876B Substrate processing apparatus
03/27/2013CN102169994B Negative electrode base member
03/27/2013CN102163721B Negative electrode base member
03/27/2013CN102163009B Developing apparatus and developing method
03/27/2013CN102122115B Method of generating photomask data, method of fabricating photomask, solid-state image sensor having microlens array and method of manufacturing same
03/27/2013CN102084300B Fine pattern mask, method for producing the same, and method for forming fine pattern using the mask
03/27/2013CN102034754B Method for fabricating an integrated circuit device and photoresist stripping composition
03/27/2013CN102016722B Robot for in-vacuum use
03/27/2013CN101980087B Immersion exposure appratus and method
03/27/2013CN101965542B Photosensitive polyorganosiloxane composition
03/27/2013CN101937174B Substrate table, lithographic apparatus, method of using a substrate table and device manufacturing method
03/27/2013CN101868762B Photopatternable deposition inhibitor containing siloxane
03/27/2013CN101828149B Displacement device with precision measurement
03/27/2013CN101802709B Pigment dispersion composition, resist composition for color filter including the same, and color filter using the same
03/27/2013CN101794084B Lithographic apparatus and device manufacturing method
03/27/2013CN101784958B Photosensitive composition, cured film formed therefrom, and device having cured film
03/27/2013CN101738876B Developing method and developing apparatus
03/27/2013CN101625526B Coloring light-sensitive resin composition for ultraviolet ray laser, method for forming patterns, optical filter and production method thereof and display device
03/27/2013CN101576717B Exposure apparatus, and device fabricating method
03/27/2013CN101533229B Reticle for projection exposure apparatus and exposure method using the same
03/27/2013CN101477302B Phase shift mask and method for forming pattern
03/27/2013CN101460897B Exposure method and exposure apparatus
03/27/2013CN101458464B Alignment method, alignment system and product with alignment mark
03/27/2013CN101458461B Method of fine patterning semiconductor device
03/27/2013CN101410945B Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
03/27/2013CN101359176B Curing composition, method for producing photospace material and liquid crystal display device
03/27/2013CN101321727B 肟酯光敏引发剂 Oxime ester photoinitiator
03/27/2013CN101303528B Photocuring resin composition, dry film, and print circuit board
03/27/2013CN101256355B Compositions and processes for immersion lithography
03/27/2013CN101248391B Lithographic coated-type underlayer film forming composition containing vinylnaphthalene resin derivative
03/27/2013CN101226334B Mirror plane erosion carving gravure technique
03/27/2013CN101052921B A system and a method for generating periodic and/or quasi-periodic pattern on a sample
03/26/2013US8405051 Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method
03/26/2013US8404433 Method for forming resist pattern and method for manufacturing semiconductor device
03/26/2013US8404432 Lithography process
03/26/2013US8404430 Multi-chip reticle photomasks
03/26/2013US8404428 Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound
03/26/2013US8404427 Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition
03/26/2013US8404426 Negative resist composition, method of forming resist pattern and polymeric compound
03/26/2013US8402786 Synthetic silica glass optical component and process for its production
03/22/2013CA2790266A1 Transducer structure for a transducer probe and methods of fabricating same
03/21/2013WO2013039389A2 Target positioning device, method for driving a target positioning device, and a lithography system comprising such a target positioning device
03/21/2013WO2013039387A1 Guidance for target processing tool
03/21/2013WO2013039386A1 Assembly and a method for lifting a module of a lithography system in vertical direction and a lithography system comprising such assembly
03/21/2013WO2013039243A1 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
03/21/2013WO2013039235A1 Method for recycling wastewater produced by plate-making process
03/21/2013WO2013039100A1 Film exposure device
03/21/2013WO2013039075A1 Colored photosensitive composition, color filter, production method for color filter, and display device
03/21/2013WO2013038974A1 Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor