| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/03/2013 | CN103011140A Method for preparing graphene/graphite pattern by using photoresist |
| 04/03/2013 | CN103011060A Method for preparing hemispheric micro-nano lens array |
| 04/03/2013 | CN103011058A Method for preparing three-dimensional hollow micro nanometer functional structure by utilizing laser direct writing |
| 04/03/2013 | CN102707587B Technology for stripping metal of touch screen |
| 04/03/2013 | CN102621805B Method for preparing micro-nano-channels based on liquid-gas equilibrium polymer nano-channels self-building mechanism |
| 04/03/2013 | CN102227686B Method for forming resist pattern |
| 04/03/2013 | CN102207676B Method and system for manufacturing semiconductor device by using photoetching technology |
| 04/03/2013 | CN102174950B Automatic balancing mechanism for platemaking roller |
| 04/03/2013 | CN102087483B Optical system for focal plane detection in projection lithography |
| 04/03/2013 | CN101978324B Projection objective for microlithography |
| 04/03/2013 | CN101889247B Composition for forming base film for lithography and method for forming multilayer resist pattern |
| 04/03/2013 | CN101846884B Coating device |
| 04/03/2013 | CN101793993B Optical elements, optical arrangement and system |
| 04/03/2013 | CN101685255B Coloring photosensitive composition, color filter and liquid crystal display |
| 04/03/2013 | CN101681091B Mask film to form relief images and method of use |
| 04/03/2013 | CN101639628B Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element |
| 04/03/2013 | CN101416118B Device substrate washing method |
| 04/03/2013 | CN101349864B Photomask, manufacturing method thereof and pattern transfer printing method |
| 04/03/2013 | CN101317133B Lithographic method for maskless pattern transfer onto a photosensitive substrate |
| 04/03/2013 | CN101258444B Negative photoresist for silicon KOH etch without silicon nitride |
| 04/02/2013 | USRE44120 Filter for extreme ultraviolet lithography |
| 04/02/2013 | US8411253 Computer readable medium and exposure method |
| 04/02/2013 | US8411248 Exposure apparatus and device fabrication method |
| 04/02/2013 | US8410616 Method of processing resist, semiconductor device, and method of producing the same |
| 04/02/2013 | US8410188 Sealant for one-drop fill process |
| 04/02/2013 | US8409790 Method of producing a relief image for printing |
| 04/02/2013 | US8409789 Optical diffusers, photomasks and their methods of fabrication |
| 04/02/2013 | US8409788 Laser induced thermal imaging method, method of patterning organic layer using the same and method of fabricating organic light emitting diode display device using the same |
| 04/02/2013 | US8409787 Method of forming a pattern in a semiconductor device and method of forming a gate using the same |
| 04/02/2013 | US8409786 Pattern forming method and method for manufacturing semiconductor device |
| 04/02/2013 | US8409785 Apparatus and method for treating imaging materials |
| 04/02/2013 | US8409784 Photosensitive resin composition, dry film, and processed product made using the same |
| 04/02/2013 | US8409783 Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer |
| 04/02/2013 | US8409782 Photoresist composition comprising photoinitiators, and transparent thin film and liquid crystal display device using the composition |
| 04/02/2013 | US8409781 Composition for formation of resist protection film, and method for formation of resist pattern using the same |
| 04/02/2013 | US8409780 Negative working, heat-sensitive lithographic printing plate precursor |
| 04/02/2013 | US8409706 Preparation process of microbeads, and microbeads |
| 04/02/2013 | US8409488 Nano impression lithographic process which involves the use of a die having a region able to generate heat |
| 03/28/2013 | WO2013044210A2 Stripping compositions having mixtures of alkylamides |
| 03/28/2013 | WO2013043493A1 Negative-working lithographic printing plate precursors |
| 03/28/2013 | WO2013043421A2 Negative-working lithographic printing plate precursors |
| 03/28/2013 | WO2013042973A2 I-line photoresist composition and method for forming fine pattern using same |
| 03/28/2013 | WO2013042916A1 Method for preparing graphene using photosensitizer |
| 03/28/2013 | WO2013042710A1 Led light source apparatus and exposure apparatus |
| 03/28/2013 | WO2013042694A1 (meth)acrylic acid ester derivative, high-molecular-weight compound, and photoresist composition |
| 03/28/2013 | WO2013042522A1 Optical recording head and image formation device |
| 03/28/2013 | WO2013041569A1 Method and apparatus for predicting a growth rate of deposited contaminants |
| 03/28/2013 | WO2013041323A1 Radiation source |
| 03/28/2013 | WO2013041134A1 Arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatus |
| 03/28/2013 | WO2013040748A1 Sub-wavelength extreme ultraviolet metal transmission grating and manufacturing method thereof |
| 03/28/2013 | WO2012162271A3 Method and system for manufacture of a electronic devices based on localized deposition of precursor gases |
| 03/28/2013 | WO2012089934A4 Process for fabricating high-precision objects by high-resolution lithography and dry deposition and objects thus obtained |
| 03/28/2013 | WO2011032768A3 Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus |
| 03/28/2013 | US20130078580 Thinner composition for rrc process, apparatus for supplying the same, and thinner composition for ebr process |
| 03/28/2013 | US20130078579 Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound |
| 03/28/2013 | US20130078578 Resist developer, method for forming a resist pattern and method for manufacturing a mold |
| 03/28/2013 | US20130078577 Charged particle beam drawing apparatus, drawing data generation method, drawing data generation program storage medium, and article manufacturing method |
| 03/28/2013 | US20130078576 Compositions of neutral layer for directed self assembly block copolymers and processes thereof |
| 03/28/2013 | US20130078575 Negative-working lithographic printing plate precursors |
| 03/28/2013 | US20130078574 Self-assemblable polymer and method for use in lithography |
| 03/28/2013 | US20130078573 Negative-working lithographic printing plate precursors with ir dyes |
| 03/28/2013 | US20130078572 Resist composition and method of forming resist pattern |
| 03/28/2013 | US20130078571 Photoresist composition, method for producing photoresist composition, and method for forming resist pattern |
| 03/28/2013 | US20130078570 Method of forming pattern and laminate |
| 03/28/2013 | US20130078569 Calixarene and photoresist composition comprising same |
| 03/28/2013 | US20130078558 Lithographic cd correction by second exposure |
| 03/28/2013 | US20130078557 Lithographic cd correction by second exposure |
| 03/28/2013 | US20130078556 Color resin composition and method for forming multicolor color filters |
| 03/28/2013 | US20130078553 Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device |
| 03/28/2013 | US20130078552 Dedicated Mask and Production Method thereof, LCD Panel Production Method |
| 03/28/2013 | US20130078434 Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the same |
| 03/28/2013 | US20130078433 Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film using the same, pattern forming method, electronic device manufacturing method, and electronic device, each using the same |
| 03/28/2013 | US20130078432 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device |
| 03/28/2013 | US20130078426 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film, pattern forming method, method for preparing electronic device, and electronic device, each using the same |
| 03/28/2013 | US20130077080 Holding apparatus, exposure apparatus, exposure metod, and device manufacturing method |
| 03/28/2013 | US20130077076 Microlithography illumination optical system and microlithography projection exposure apparatus including same |
| 03/28/2013 | US20130077073 Methods to control euv exposure dose and euv lithographic methods and apparatus using such methods |
| 03/28/2013 | US20130077065 Cleaning substrate for a lithography apparatus, a cleaning method for a lithography apparatus and a lithography apparatus |
| 03/28/2013 | US20130077064 Arrangement for use in a projection exposure tool for microlithography having a reflective optical element |
| 03/28/2013 | US20130076458 Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component |
| 03/28/2013 | US20130075364 Patterning process and materials for lithography |
| 03/28/2013 | DE112011101165T5 Fotoempfindliche Zusammensetzung und fotoempfindliches lithographisches Druckplattenmaterial A photosensitive composition and photosensitive lithographic printing plate material |
| 03/28/2013 | DE112006001203B4 Verfahren zum Bilden eines hoch auflösenden Musters A method for forming a high-resolution pattern |
| 03/28/2013 | DE102012216284A1 Mikrolithographische Projektionsbelichtungsanlage Microlithographic projection exposure apparatus |
| 03/28/2013 | DE102012207335A1 Projection lens for projection exposure system for imaging distortion correcting reticle on wafer to manufacture e.g. micro-structured component, has optical components, where lens distortion is varied around specific percent of resolution |
| 03/28/2013 | DE102012207125A1 Optical element comprises extreme-ultraviolet radiation layer, reflecting multilayer system, guard layer system, and upper layer containing chemical compound including three or more different chemical elements |
| 03/28/2013 | DE102012204295A1 Filter element for filtering debris in projection exposure system e.g. microlithography projection exposure system, has segments comprising segment frame, where segments are releasably connected with each other |
| 03/28/2013 | DE102011114254A1 Messvorrichtung und optisches System mit einer solchen Measuring apparatus and optical system with such a |
| 03/28/2013 | DE102011083462A1 EUV-Spiegel mit einer Oxynitrid-Deckschicht mit stabiler Zusammensetzung EUV mirror with an oxynitride layer having a stable composition |
| 03/28/2013 | DE102011083461A1 Verfahren zum Erzeugen einer Deckschicht aus Siliziumoxid an einem EUV-Spiegel A method of producing a top layer of silicon oxide on an EUV mirror |
| 03/28/2013 | DE102004059664B4 Gerät zur automatischen Fokussierung und Verfahren dazu Device for automatic focus and method therefor |
| 03/28/2013 | CA2849742A1 Optical recording head and image forming apparatus |
| 03/27/2013 | EP2573620A2 Structure with a high aspect ratio and method of fabrication thereof |
| 03/27/2013 | EP2573619A1 Compositions and antireflective coatings for photolithography |
| 03/27/2013 | EP2572891A1 Plate material for direct platemaking of ink-jet printing and ink-jet printing method |
| 03/27/2013 | EP2572244A1 Device and method for producing flexographic printing sleeves |
| 03/27/2013 | EP2572243A1 Polymerizable composition |
| 03/27/2013 | EP2572241A1 Synthesis of nanopeapods by galvanic displacement of segmented nanowires |
| 03/27/2013 | EP2571629A2 Stencils for high-throughput micron-scale etching of substrates and processes of making and using the same |
| 03/27/2013 | CN202837813U Developing production line with autonomic reagent feeding function for processing circuit boards |