| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/10/2013 | CN103038267A Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates |
| 04/10/2013 | CN103038226A Homoadamantane derivatives, process for preparing same, and photoresist compositions |
| 04/10/2013 | CN103038038A Method for manufacturing nano-imprint mould, method for manufacturing light-emitting diode using the nano imprint mould manufactured thereby, and light-emitting diode manufactured thereby |
| 04/10/2013 | CN103035512A Production method of non-photosensitive polyimide passivation layer |
| 04/10/2013 | CN103035511A Method for producing zero layer photoetching marking of high-voltage device without barrier layers |
| 04/10/2013 | CN103035492A Manufacturing method for double protection layers in semiconductor device |
| 04/10/2013 | CN103034076A Novel developing processing unit structure |
| 04/10/2013 | CN103034075A Illumination system for a microlithographic projection exposure apparatus |
| 04/10/2013 | CN103034074A Double silicon wafer platform exchange system for photoetching machine with immersion-liquid recovery devices |
| 04/10/2013 | CN103034073A Double silicon wafer platform exchange system provided with immersion-liquid recovery devices and laser interferometers |
| 04/10/2013 | CN103034072A Contraposition method for substrate to be exposed and negative film and image detection contraposition system |
| 04/10/2013 | CN103034071A Exposure machine alignment method and control equipment |
| 04/10/2013 | CN103034070A Exposure device and method for forming cured film |
| 04/10/2013 | CN103034069A Inspection apparatus, lithographic apparatus, and device manufacturing method |
| 04/10/2013 | CN103034068A Lithographic apparatus and method of cooling a component in a lithographic apparatus |
| 04/10/2013 | CN103034067A Method of applying pattern to substrate, device manufacturing method and lithographic apparatus for use in such methods |
| 04/10/2013 | CN103034066A Methods to control EUV exposure dose and EUV lithographic methods and apparatus using such methods |
| 04/10/2013 | CN103034065A Magnetic suspension gravity compensator and lithographic device |
| 04/10/2013 | CN103034064A Device for pre-aligning substrate and further detecting and adjusting substrate direction |
| 04/10/2013 | CN103034063A Photoetching equipment |
| 04/10/2013 | CN103034062A Method for edge exposure of wafer, optical modules and automatic focusing systems |
| 04/10/2013 | CN103034061A Manufacturing mehtod of substrate |
| 04/10/2013 | CN103034060A Resist film forming apparatus, resist film forming method, and mold original plate production method |
| 04/10/2013 | CN103034059A 光致抗蚀剂和光刻方法 Photoresist and photolithographic method |
| 04/10/2013 | CN103034058A Coloring composition, color filter and display device |
| 04/10/2013 | CN103034057A Coloring composition, color filter and display device |
| 04/10/2013 | CN103034056A Colored photosensitive resin composition |
| 04/10/2013 | CN103034055A Colored photosensitive resin composition |
| 04/10/2013 | CN103034054A Photosensitive resin composition, cured film thereof and printed circuit board |
| 04/10/2013 | CN103034053A Photosensitive resin composition, cured film thereof and printed circuit board |
| 04/10/2013 | CN103034052A Photosensitive resin composition, cured film thereof and printed circuit board |
| 04/10/2013 | CN103034051A Colored curable resin composition |
| 04/10/2013 | CN103034050A High-precision silver grid line screen production method for crystalline silicon solar cells |
| 04/10/2013 | CN103034049A Method for manufacturing metal wire and array substrate |
| 04/10/2013 | CN103034048A Photoetching method |
| 04/10/2013 | CN103034047A Photoetching technology capable of enhancing resolution ratio |
| 04/10/2013 | CN103034046A Mask plate, exposure system and exposure method |
| 04/10/2013 | CN103034044A Multi-gray scale photomask, manufacturing method of multi-gray scale photomask and pattern transfer method |
| 04/10/2013 | CN103033993A Method for fabricating photo spacer and liquid crystal display and array substrate |
| 04/10/2013 | CN103033988A Optical alignment device of alignment film and manufacturing method of alignment film |
| 04/10/2013 | CN103033981A Color filter substrate and manufacturing method thereof as well as liquid crystal panel |
| 04/10/2013 | CN103033975A Mask plate and method for composing a picture with same |
| 04/10/2013 | CN103033915A Symmetric type refractive and reflective optical system |
| 04/10/2013 | CN103033862A Reflector device for preparing distributed feed back (DFB) laser phase-shift gratings and preparation method thereof |
| 04/10/2013 | CN103033859A Fly lens |
| 04/10/2013 | CN103031059A Compositions and antireflective coatings for photolithography |
| 04/10/2013 | CN102436143B High-precision printing circular screen photographic emulsion and preparation method thereof |
| 04/10/2013 | CN102375329B Test mask and method for measuring exposure system parameters therewith |
| 04/10/2013 | CN102346369B Nanoimprint lithography machine for whole wafer |
| 04/10/2013 | CN102338986B Organic-inorganic composite laser thermal-etching film and micro-nano graph preparation method |
| 04/10/2013 | CN102314074B Mask plate and mask plate manufacturing method |
| 04/10/2013 | CN102269938B Detection method of wave aberration of projection objective based on self-adapting noise reduction of space image |
| 04/10/2013 | CN102243444B Exposure equipment, mask plate and exposure method |
| 04/10/2013 | CN102200690B On-line measuring mark of image plane of lithography machine projection objective and measuring method |
| 04/10/2013 | CN102193344B Method for removing photoresist in deep N-well process |
| 04/10/2013 | CN102193340B Image processing method by projection photo-etching focusing |
| 04/10/2013 | CN102193325B System for controlling active vibration isolation device |
| 04/10/2013 | CN102193323B Double-stage system of lithography machine |
| 04/10/2013 | CN102193320B Alignment device for photoetching machines and alignment method thereof |
| 04/10/2013 | CN102136415B Method for improving roughness of line edge of photoetching pattern in semiconductor process |
| 04/10/2013 | CN102117019B Method for controlling retention time of photoresist developing liquid on substrate |
| 04/10/2013 | CN102112497B Photoinitiator mixtures |
| 04/10/2013 | CN102088823B Printed wiring board and method for producing the same |
| 04/10/2013 | CN102063021B Attenuation device capable of adjusting light beam energy |
| 04/10/2013 | CN102053491B Ultra-deep subwavelength tunable nano photoetching structure and method based on surface plasma resonant cavity |
| 04/10/2013 | CN102037346B Photopolymerizable compositions |
| 04/10/2013 | CN101981510B Detergent for removing plasma etching residues |
| 04/10/2013 | CN101960380B Colored curable composition, color filter and solid-state imaging device |
| 04/10/2013 | CN101937172B Positive type radiation-sensitive composition, cured film, interlayer insulating film, method for forming method interlayer insulating film, display element and siloxane polymer |
| 04/10/2013 | CN101932975B Illumination optics and projection exposure apparatus |
| 04/10/2013 | CN101917110B Linear motor magnetic shield apparatus |
| 04/10/2013 | CN101884013B Photoresist compositions and method for multiple exposures with multiple layer resist systems |
| 04/10/2013 | CN101866112B Reticle support that reduces reticle slippage |
| 04/10/2013 | CN101807001B Photosensitive resin composition and application thereof |
| 04/10/2013 | CN101799636B Exposure equipment, exposure method and assembly manufacturing method |
| 04/10/2013 | CN101750905B Lithographic apparatus and device manufacturing method |
| 04/10/2013 | CN101738872B Methods and system for lithography calibration |
| 04/10/2013 | CN101689023B Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s |
| 04/10/2013 | CN101680783B Moving body system, pattern forming device, exposure apparatus, measuring instrument, and device manufacturing method |
| 04/10/2013 | CN101576686B Liquid crystal display device and production method thereof |
| 04/10/2013 | CN101523292B Method for manufacturing semiconductor device using quadruple-layer laminate |
| 04/10/2013 | CN101414121B Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device |
| 04/10/2013 | CN101383327B LCD device, pixel array substrate, manufacturing of pixel array substrate |
| 04/10/2013 | CN101122745B Positive printing heat-sensitive lithographic printing planography and its preparation method |
| 04/10/2013 | CN101063830B Clean methods, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus |
| 04/09/2013 | US8416515 Positioning unit and alignment device for an optical element |
| 04/09/2013 | US8416385 Lithographic apparatus and device manufacturing method |
| 04/09/2013 | US8415101 Digital optical chemistry micromirror imager |
| 04/09/2013 | US8415092 Substrate developing method, substrate processing method and developing solution supply nozzle |
| 04/09/2013 | US8415091 Water mark defect prevention for immersion lithography |
| 04/09/2013 | US8415090 Production method of optical waveguide for connector |
| 04/09/2013 | US8415089 Single-mask double-patterning lithography |
| 04/09/2013 | US8415087 Method of making a lithographic printing plate |
| 04/09/2013 | US8415086 Method of studying chirality controlled artificial kagome spin ice building blocks |
| 04/09/2013 | US8415085 Resist composition, method of forming resist pattern, novel compound, and acid generator |
| 04/09/2013 | US8415083 On-track process for patterning hardmask by multiple dark field exposures |
| 04/09/2013 | US8415082 Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator |
| 04/09/2013 | US8415081 Photosensitive resin composition having a high refractive index |
| 04/09/2013 | US8415080 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer |
| 04/09/2013 | US8415000 Patterned inorganic layers, radiation based patterning compositions and corresponding methods |