| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/09/2013 | US8414733 Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide |
| 04/04/2013 | WO2013049409A2 Substrates having nanostructures having biological species immobilized thereon and methods of forming the same and methods of forming nanostructures on surfaces |
| 04/04/2013 | WO2013048997A2 Solid imaging systems, components thereof, and methods of solid imaging |
| 04/04/2013 | WO2013048069A1 Positive-type photosensitive resin composition, and insulating film and oled formed using the same |
| 04/04/2013 | WO2013047916A1 Camera |
| 04/04/2013 | WO2013047911A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern using the composition, process for manufacturing electronic device and electronic device |
| 04/04/2013 | WO2013047902A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern |
| 04/04/2013 | WO2013047899A1 Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern |
| 04/04/2013 | WO2013047895A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, manufacturing method of semiconductor device, semiconductor device and production method of resin |
| 04/04/2013 | WO2013047859A1 Coloring composition, colored pattern, color filter and method of producing the same, pattern forming method, solid-state imaging device, and image display device |
| 04/04/2013 | WO2013047619A1 Colored curable composition, color filter, method for producing same, display element, and solid-state image sensor |
| 04/04/2013 | WO2013047536A1 Photoresist composition and resist pattern forming method |
| 04/04/2013 | WO2013047528A1 Photoresist composition and resist pattern forming method |
| 04/04/2013 | WO2013047516A1 Diarylamine novolac resin |
| 04/04/2013 | WO2013047396A1 Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device |
| 04/04/2013 | WO2013047305A1 Photosensitive resin composition, and dry film resist |
| 04/04/2013 | WO2013047229A1 Method for producing lithographic printing plate |
| 04/04/2013 | WO2013047228A1 Method for producing lithographic printing plate |
| 04/04/2013 | WO2013047117A1 Photoresist composition, method for forming resist pattern, and polymer |
| 04/04/2013 | WO2013047106A1 Resin having fluorene structure and underlayer film-forming material for lithography |
| 04/04/2013 | WO2013047092A1 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device |
| 04/04/2013 | WO2013047091A1 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device |
| 04/04/2013 | WO2013047089A1 Lithographic printing plate precursor and process for producing lithographic printing plate |
| 04/04/2013 | WO2013047072A1 Composition for forming overcoat film for immersion exposure and method for resist pattern formation |
| 04/04/2013 | WO2013047068A1 Colored photosensitive composition, color filter and process for producing same, and liquid-crystal display device |
| 04/04/2013 | WO2013047044A1 Composition for forming film for liquid-immersion exposure, polymer, compound, and method for forming resist pattern |
| 04/04/2013 | WO2013046877A1 Printing method using on press development lithograph printing plate precursor |
| 04/04/2013 | WO2013046856A1 Method for producing lithographic printing plate |
| 04/04/2013 | WO2013046627A1 Mask blank for reflection-type exposure, and mask for reflection-type exposure |
| 04/04/2013 | WO2013045597A1 Imaging catoptric euv projection optical unit |
| 04/04/2013 | WO2013045311A1 Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method |
| 04/04/2013 | WO2013045310A1 Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus |
| 04/04/2013 | WO2013045069A1 Measuring device and optical system comprising such a measuring device |
| 04/04/2013 | WO2013044936A1 Projection objective of a microlithographic projection exposure apparatus |
| 04/04/2013 | WO2013044535A1 Special light shading plate and manufacturing method thereof, and method for manufacturing liquid crystal panel |
| 04/04/2013 | US20130084663 Method for fabricating photo spacer and liquid crystal display and array substrate |
| 04/04/2013 | US20130084532 Photolithographic method |
| 04/04/2013 | US20130084531 Method of producing organic electroluminescence display device |
| 04/04/2013 | US20130084530 Method for fabricating patterned layer |
| 04/04/2013 | US20130084529 Positive resist composition and patterning process |
| 04/04/2013 | US20130084528 Positive resist composition and patterning process |
| 04/04/2013 | US20130084527 Positive resist composition and patterning process |
| 04/04/2013 | US20130084526 Photo-resist and method of photolithography |
| 04/04/2013 | US20130084525 Photoacid generator and photoresist comprising same |
| 04/04/2013 | US20130084524 Composition for forming liquid immersion upper layer film and method for forming resist pattern |
| 04/04/2013 | US20130084523 Resist compositioin and method of forming resist pattern |
| 04/04/2013 | US20130084518 Negative chemical amplification resist composition, resist film, and, resist-coated mask blanks, method for forming resist pattern, and photomask, each using the same |
| 04/04/2013 | US20130084517 Resist protective film-forming composition and patterning process |
| 04/04/2013 | US20130084438 Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device |
| 04/04/2013 | US20130082408 Method for producing semiconductor device and semiconductor device |
| 04/04/2013 | US20130081858 Photosensitive resin composition, cured film thereof and printed circuit board |
| 04/04/2013 | DE112011100311T5 Formwerkzeug mit einem dreidimensionalen Oberflächenstrukturmuster und Verfahren zur Herstellung desselben Of the same mold with a three-dimensional surface structure pattern and method for producing |
| 04/04/2013 | DE102012216286A1 Measuring system for determining position change of optical element for projection exposure apparatus for microlithography, has sensor head and light conductor for emitting measuring light of measurement light source to sensor head |
| 04/04/2013 | DE102011114875A1 Substrathalter Substrate holder |
| 04/04/2013 | DE102011083888A1 Abbildende katoptrische EUV-Projektionsoptik Imaging catoptrical EUV projection optics |
| 04/04/2013 | DE102011083855B3 Method for coating extreme UV mirror of illumination system of microlithography-projection lighting system, involves forming coating system on set of disconnected areas on mirror after applying coating system and after removing mask |
| 04/04/2013 | DE10145463B4 Verbindungen mit Pufferschichten Compounds with buffer layers |
| 04/03/2013 | EP2574983A1 Lithography device and method |
| 04/03/2013 | EP2574460A2 Lithographic printing plate precursor and method of manufacturing lithographic printing plate |
| 04/03/2013 | EP2574407A1 Method for producing a coating of a substrate |
| 04/03/2013 | CN202854484U Photoresist coating equipment |
| 04/03/2013 | CN1947479B Method and apparatus for accurately applying structures to a substrate |
| 04/03/2013 | CN103026458A Microlens exposure device |
| 04/03/2013 | CN103026299A Method and apparatus for performing pattern alignment |
| 04/03/2013 | CN103026298A Structures for enhancement of local electric field, light absorption, light radiation, material detection and methods for making and using of the same |
| 04/03/2013 | CN103026285A Light integrator for rectangular beam cross sections of different dimensions |
| 04/03/2013 | CN103025835A A composition for coating over a photoresist pattern |
| 04/03/2013 | CN103022145A Array substrate, display device and preparation method |
| 04/03/2013 | CN103021925A STI (shallow trench isolation) manufacturing process, trench etching method and photoresist processing method |
| 04/03/2013 | CN103021803A Method for protecting thick metal layer photoetching alignment mark |
| 04/03/2013 | CN103019051A Resist stripping solution |
| 04/03/2013 | CN103019050A Thinner composition for RRC process, apparatus for supplying the same, and thinner composition for EBR process |
| 04/03/2013 | CN103019049A Stripping agent containing alkylamide mixture |
| 04/03/2013 | CN103019048A Developing spray nozzle |
| 04/03/2013 | CN103019047A Developing solution spraying device and spraying method |
| 04/03/2013 | CN103019046A Six-freedom-degree magnetic levitation micropositioner based on multi-group individual drive decoupling control |
| 04/03/2013 | CN103019045A Silicon wafer platform with anti-collision function |
| 04/03/2013 | CN103019044A Method for detecting exposure energy of circuit board |
| 04/03/2013 | CN103019043A Angularly resolved scatterometer and inspection method |
| 04/03/2013 | CN103019042A Method for improving stability of alignment precision of high-transparency mask plate |
| 04/03/2013 | CN103019041A Exposure machine |
| 04/03/2013 | CN103019040A Exposure apparatus, mask and micro device manufacturing method and projection optical apparatus |
| 04/03/2013 | CN103019039A Reticle for exposure, exposure method and production method of semiconductor wafer |
| 04/03/2013 | CN103019038A 辐射源 Emitter |
| 04/03/2013 | CN103019037A 辐射源 Emitter |
| 04/03/2013 | CN103019036A 辐射源 Emitter |
| 04/03/2013 | CN103019035A Mask stage with mask transfer protection function, application method thereof, and lithographic apparatus |
| 04/03/2013 | CN103019034A Positive-type photosensitive resin composition, cured film and manufacturing method thereof, pattern, mems structure manufacturing method, dry and wet etching method |
| 04/03/2013 | CN103019033A Photosensitive resin composition, method of forming pattern, color filter, and display device |
| 04/03/2013 | CN103019032A Photosensitive resin composition, method of producing cured film, cured film, organic el display device, and liquid crystal display device |
| 04/03/2013 | CN103019031A A photosensitive resin composition, and a coating film and color filter using the composition |
| 04/03/2013 | CN103019030A Lens forming method, the lens and negative photosensitive composition |
| 04/03/2013 | CN103019027A Method for improving optical proximity simulation from exposure result |
| 04/03/2013 | CN103018819A Method for preparing high polymer micro-nano fiber bragg grating based on nanoimprint lithography |
| 04/03/2013 | CN103018808A Photon sieve and manufacturing method thereof |
| 04/03/2013 | CN103018806A Sub-wavelength extreme ultraviolet metal transmission grating and manufacture method thereof |
| 04/03/2013 | CN103018800A Surface-plasma-enhanced symmetric structure and preparation method thereof |
| 04/03/2013 | CN103012652A Copolymer containing vinyl ether group and preparation method and application thereof |
| 04/03/2013 | CN103012227A Sulfonium salt photo-acid generator having high photo-acid generation quantum yield, and preparation method and application thereof |
| 04/03/2013 | CN103012129A Calixarene compound and photoresist composition comprising the same |