| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/17/2013 | CN101971097B Photosensitive resin composition, photosensitive element, resist pattern forming method and method for manufacturing printed circuit board |
| 04/17/2013 | CN101963760B Coating apparatus having coater chuck |
| 04/17/2013 | CN101963758B Calixarene blended molecular glass photoresists and process of use |
| 04/17/2013 | CN101893825B Tunable wavelength illumination system |
| 04/17/2013 | CN101859072B Fluid handling device, immersion lithographic apparatus and device manufacturing method |
| 04/17/2013 | CN101832995B Biological detection test piece and manufacturing method thereof |
| 04/17/2013 | CN101819384B Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method |
| 04/17/2013 | CN101794087B Stripper composition for photoresist and method for using the stripper composition to strip the photoresist |
| 04/17/2013 | CN101784578B Reactive carboxylate compound, active-energy-ray-curable resin composition utilizing the same, and use of the same |
| 04/17/2013 | CN101782665B Method for manufacturing display panel |
| 04/17/2013 | CN101762981B Chemically amplified positive resist composition and resist patterning process |
| 04/17/2013 | CN101685263B Exposure apparatus and device producing method |
| 04/17/2013 | CN101650533B Method and system for monitoring photolithographic process |
| 04/17/2013 | CN101477313B Device and method for microstructuring a storage medium and storage medium comprising a microstructured region |
| 04/17/2013 | CN101430505B Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate |
| 04/17/2013 | CN101349804B Catadioptric optical system for scatterometry |
| 04/17/2013 | CN101246312B Recycling of large-size photomask substrate |
| 04/16/2013 | US8423923 Optical proximity correction method |
| 04/16/2013 | US8422623 Exposure apparatus and device manufacturing method |
| 04/16/2013 | US8421992 Exposure method, exposure apparatus, and method for producing device |
| 04/16/2013 | US8420708 Methods for making dental restorations using two-phase light-curing materials |
| 04/16/2013 | US8420546 Manufacturing method of semiconductor device |
| 04/16/2013 | US8420304 Resist coating and developing apparatus, resist coating and developing method, resist-film processing apparatus, and resist-film processing method |
| 04/16/2013 | US8420303 Substrate processing method, computer-readable storage medium and substrate processing system |
| 04/16/2013 | US8420302 Method of fine patterning a thin film and method of manufacturing a display substrate using the method |
| 04/16/2013 | US8420301 Method for forming a wiring pattern by laser irradiation |
| 04/16/2013 | US8420299 Forming method of resist pattern and manufacturing method of thin-film magnetic head |
| 04/16/2013 | US8420298 Method for production of crosslinked polyvinyl acetal resin, and crosslinked polyvinyl acetal resin |
| 04/16/2013 | US8420297 Developers and method of coloring lithographic printing members |
| 04/16/2013 | US8420295 Lithographic printing plate precursor |
| 04/16/2013 | US8420294 Salt and photoresist composition comprising the same |
| 04/16/2013 | US8420293 Optical waveguides and methods thereof |
| 04/16/2013 | US8420292 Polymer, resist composition, and patterning process |
| 04/16/2013 | US8420291 Positive photosensitive resin composition, method for forming pattern, electronic component |
| 04/16/2013 | US8420290 Acetal compounds and their preparation, polymers, resist compositions and patterning process |
| 04/16/2013 | US8420289 Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods |
| 04/16/2013 | US8420288 Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the same |
| 04/16/2013 | US8420287 Positive photosensitive resin composition |
| 04/16/2013 | US8420281 Epoxy-functionalized perfluoropolyether polyurethanes |
| 04/16/2013 | US8420124 Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography |
| 04/16/2013 | US8418612 Printing plate making apparatus and printing plate making method |
| 04/11/2013 | WO2013052045A1 Nanoplasmonic device with nanoscale cooling |
| 04/11/2013 | WO2013051805A2 Photosensitive resin composition |
| 04/11/2013 | WO2013051695A1 Positive photosensitive resin composition, method for producing cured product, method for producing resin pattern, cured product and optical member |
| 04/11/2013 | WO2013051558A1 Composition for forming silicon-containing euv resist underlayer film |
| 04/11/2013 | WO2013051516A1 Method for forming conductive pattern, conductive pattern substrate, and touch panel sensor |
| 04/11/2013 | WO2013051442A1 Composition for forming resist upperlayer film for lithography |
| 04/11/2013 | WO2013051383A1 Method for forming photoresist pattern and method for forming etching mask |
| 04/11/2013 | WO2013050842A1 System and method for generating extreme ultraviolet light |
| 04/11/2013 | WO2013050431A1 A salt for color filter application, a process for making the same, and a colorant comprising the same |
| 04/11/2013 | WO2013050243A1 Chuck, lithography apparatus and method of using a chuck |
| 04/11/2013 | WO2013050199A1 Reflective optical element for the euv wavelength range, method for producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure apparatus for microlithography comprising such a projection lens |
| 04/11/2013 | WO2013050198A1 Method for setting the intensity distribution in an optical system of a microlithographic projection exposure apparatus, and optical system |
| 04/11/2013 | WO2013050081A1 Method for controlling a motion of optical elements in lithography systems |
| 04/11/2013 | WO2013049936A1 Fabrication of free standing membranes and use thereof for synthesis of nanoparticle patterns |
| 04/11/2013 | WO2013012299A3 Mask, and optical filter manufacturing apparatus comprising same |
| 04/11/2013 | WO2013010111A3 Nanoimprint lithography |
| 04/11/2013 | WO2013006314A3 Metal-oxide films from small molecules for lithographic applications |
| 04/11/2013 | US20130089986 Method of forming patterns of semiconductor device |
| 04/11/2013 | US20130089821 Resist pattern formation method and pattern miniaturization agent |
| 04/11/2013 | US20130089820 Resist top coat composition and patterning process |
| 04/11/2013 | US20130089819 Resist composition, method of forming resist pattern, polymeric compound, and compound |
| 04/11/2013 | US20130089817 Photoresist composition and resist pattern-forming method |
| 04/11/2013 | US20130089813 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography |
| 04/11/2013 | US20130089752 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography |
| 04/11/2013 | US20130089716 Spin-on carbon compositions for lithographic processing |
| 04/11/2013 | US20130088702 Assembly and a method for lifting a module of a lithography system in a vertical direction and a lithography system comprising such assembly |
| 04/11/2013 | US20130088701 Imaging optical system and projection exposure installation for microlithography including same |
| 04/11/2013 | US20130088700 Blind, exposure apparatus having the blind and method of driving the exposure apparatus |
| 04/11/2013 | US20130088697 Collector mirror assembly and method for producing extreme ultraviolet radiation |
| 04/11/2013 | US20130088696 Setting method of exposure apparatus, substrate imaging apparatus and non-transitory computer-readable storage medium |
| 04/11/2013 | DE102011084266A1 Kollektor Collector |
| 04/11/2013 | DE102011084152A1 Verfahren zur Einstellung der Intensitätsverteilung in einem optischen System einer mikrolithographischen Projektionsbelichtungsanlage, sowie optisches System Method for adjusting the intensity distribution in an optical system of a microlithography projection exposure apparatus, and optical system |
| 04/11/2013 | DE102011084117A1 Reflektives optisches Element für den EUV-Wellenlängenbereich, Verfahren zur Erzeugung und zur Korrektur eines solchen Elements, Projektionsobjektiv für die Mikrolithographie mit einem solchen Element und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv The reflective optical element for the EUV wavelength range method for generating and correction of such an element, projection lens for microlithography with such an element and projection exposure system for microlithography with such a projection lens |
| 04/11/2013 | DE102011076145B4 Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik A method for assigning a pupil of a pupil facet mirror illumination optics of a projection exposure system to a field facet of the field facet mirror of the illumination optics |
| 04/11/2013 | DE102005004392B4 Resistmuster-Verdickungsmaterial und Verfahren zum Ausbilden von Resistmustern, und Verfahren zum Herstellung einer Halbleitervorrichtung Resist pattern thickening material and process for forming resist patterns, and method for manufacturing a semiconductor device |
| 04/11/2013 | CA2849381A1 Fabrication of free standing membranes and use thereof for synthesis of nanoparticle patterns |
| 04/10/2013 | EP2579313A1 Organic light emitting diode display device and method of fabricating the same |
| 04/10/2013 | EP2579304A1 Insulation pattern forming method and insulation pattern forming material for damascene process |
| 04/10/2013 | EP2579100A2 Inspection apparatus, lithographic apparatus, and device manufacturing method |
| 04/10/2013 | EP2579099A1 Laser exposure method and product |
| 04/10/2013 | EP2579098A1 Method of forming patterns |
| 04/10/2013 | EP2578410A1 Active prospective intelligent monitoring method for liquid film and device thereof |
| 04/10/2013 | EP2577400A1 Method of producing a relief image from a liquid photopolymer resin |
| 04/10/2013 | EP2577399A1 Optical system for a microlithographic projection apparatus |
| 04/10/2013 | EP2577398A1 Multilayer mirror |
| 04/10/2013 | EP2577397A1 Pattern forming method and actinic-ray- or radiation-sensitive resin composition |
| 04/10/2013 | EP2577396A1 Nanoimprint lithography |
| 04/10/2013 | EP2577395A1 Lithography method for doubled pitch |
| 04/10/2013 | EP2577361A1 Antireflective coating composition and process for manufacturing microelectronic device |
| 04/10/2013 | EP2576231A1 Lithographic printing plate precursor, plate making method thereof and novel polymer compound |
| 04/10/2013 | EP2576172A1 Replication method |
| 04/10/2013 | CN202870460U Film with aligning nails |
| 04/10/2013 | CN202870368U An auxiliary fixing device and a fixing system of a photolithographic objective lens glass |
| 04/10/2013 | CN202862770U Manufacturing equipment of screen printing plate in silk screen printing |
| 04/10/2013 | CN103038708A Euv exposure apparatus |
| 04/10/2013 | CN103038707A Pattern generators comprising a calibration system |
| 04/10/2013 | CN103038706A 聚合性组成物 Polymerizable composition |
| 04/10/2013 | CN103038705A Color filter for low temperature applications |
| 04/10/2013 | CN103038690A Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type |