| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/18/2013 | WO2013054838A1 Liquid processing apparatus and liquid processing method |
| 04/18/2013 | WO2013054803A1 Composition for forming fine resist pattern and pattern forming method using same |
| 04/18/2013 | WO2013054771A1 Silane composition and cured film thereof, and method for forming negative resist pattern using same |
| 04/18/2013 | WO2013054702A1 Composition for forming resist underlayer film, method for manufacturing same, pattern forming method, and resist underlayer film |
| 04/18/2013 | WO2013053792A1 Chain transfer reagents in polyurethane-based photopolymer formulations |
| 04/18/2013 | WO2013053771A1 Sulphur-containing chain transfer reagents in polyurethane-based photopolymer formulations |
| 04/18/2013 | WO2013053123A1 A photoresist coater carrying system and a photoresist coater with this system |
| 04/18/2013 | WO2013028650A3 Methods for fabricating three-dimensional nano-scale structures and devices |
| 04/18/2013 | WO2013013831A8 A substrate surface structured with thermally stable metal alloy nanoparticles, a method for preparing the same and uses thereof, in particular as a catalyst |
| 04/18/2013 | US20130095435 Multi-layer articles capable of forming color images and methods of forming color images |
| 04/18/2013 | US20130095433 Photolithography method including dual development process |
| 04/18/2013 | US20130095431 Fabricating method for controlling hole-wall angle of contact hole in lcd device |
| 04/18/2013 | US20130095430 Method for fabricating lcd |
| 04/18/2013 | US20130095429 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same |
| 04/18/2013 | US20130095428 Radiation-sensitive resin composition |
| 04/18/2013 | US20130095427 Resist composition for euv or eb and method of forming resist pattern |
| 04/18/2013 | US20130095426 Photosensitive polymides |
| 04/18/2013 | US20130095425 Photoresist composition |
| 04/18/2013 | US20130095424 Compound, resin and photoresist composition |
| 04/18/2013 | US20130095418 Optimized mask design for fabricating periodic and quasi-periodic patterns |
| 04/18/2013 | US20130095416 Photomask and pattern formation method |
| 04/18/2013 | US20130094010 Lithographic systems and processes of making and using same |
| 04/18/2013 | US20130094009 Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder |
| 04/18/2013 | US20130094006 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method |
| 04/18/2013 | US20130094005 Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method |
| 04/18/2013 | US20130092520 Touch device and fabrication method thereof |
| 04/18/2013 | DE102012207048A1 Method for manufacturing e.g. field faucet mirror of illumination optical device, involves arranging structural element with broken mirror element so that one of defective mirror elements is provided out of range of reflection surfaces |
| 04/18/2013 | DE102011084649A1 Spiegel mit piezoelektrischem Substrat sowie optische Anordnung damit Mirror with a piezoelectric substrate and optical arrangement so |
| 04/18/2013 | DE102011084637A1 Mikrolithographisches Belichtungsverfahren, sowie Beleuchtungseinrichtung Microlithographic exposure method, and lighting equipment |
| 04/17/2013 | EP2581416A1 Photocurable Organopolysiloxane Composition |
| 04/17/2013 | EP2580778A1 Heat-conducting element, assembly and use of the same |
| 04/17/2013 | EP2580626A1 Optical system |
| 04/17/2013 | EP2580625A1 Optical system of a microlithographic projection exposure apparatus |
| 04/17/2013 | EP2580624A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition |
| 04/17/2013 | CN202889796U Heating device for photosensitive ink fading liquid |
| 04/17/2013 | CN202886844U Automatic developing machine |
| 04/17/2013 | CN202886843U Metal or dust-free glass |
| 04/17/2013 | CN202886842U Rotary roller seal device for immersion-type photoetching machine |
| 04/17/2013 | CN202886841U Cascading-type self-adaption gas seal device for immersion-type photoetching machine |
| 04/17/2013 | CN202886840U Device for making mask plate |
| 04/17/2013 | CN202886839U XYY mechanism of alignment system of exposure machine |
| 04/17/2013 | CN202886838U Semi-automatic coater |
| 04/17/2013 | CN202886837U Safety protector for photoresist bottle |
| 04/17/2013 | CN202886835U Reflection-type mask and exposure device |
| 04/17/2013 | CN202877166U Screen degumming and developing all-in-one machine |
| 04/17/2013 | CN103052917A Scanning exposure apparatus using microlens array |
| 04/17/2013 | CN103052916A Negative photosensitive resin composition |
| 04/17/2013 | CN103052670A Compound, radiation-sensitive composition and resist pattern formation method |
| 04/17/2013 | CN103052498A Modular racking system |
| 04/17/2013 | CN103052272A Exposure film anti-welding manual contraposition graph design method |
| 04/17/2013 | CN103052247A Starting current limiting circuit for ultrahigh-voltage mercury lamp in photoetching equipment |
| 04/17/2013 | CN103050441A Oxide thin film transistor preparation method |
| 04/17/2013 | CN103050383A Method for eliminating side lobe pattern |
| 04/17/2013 | CN103050379A Method for forming narrow-pitch lines |
| 04/17/2013 | CN103048896A Macro/micro-motion mechanism for aligning manual photoetching machine to Z-direction of workbench |
| 04/17/2013 | CN103048895A Newly-formulated film developing fixing solvent suitable for watermarking flexographic printing |
| 04/17/2013 | CN103048894A Photoetching machine projection lens wave aberration on-line measuring device and method |
| 04/17/2013 | CN103048893A Azobenzene polymer surface undulation grating photoetching machine based on guided mode interference |
| 04/17/2013 | CN103048892A Vibration-isolation platform based on height/horizontal attitude six-dimensional position detection and control |
| 04/17/2013 | CN103048891A Six-degree-of-freedom magnetic levitation micropositioner |
| 04/17/2013 | CN103048890A PIN alignment system and method for outer manual exposure machine |
| 04/17/2013 | CN103048889A Extreme ultraviolet lithography light source generation system based on drive of circular polarization laser |
| 04/17/2013 | CN103048888A Photoetching method and system using metal glass as photoresist |
| 04/17/2013 | CN103048887A Control circuit with constant light intensity of super-high-pressure mercury lamp in lithography equipment |
| 04/17/2013 | CN103048886A Spherical pneumatic balancing mechanism |
| 04/17/2013 | CN103048885A Ultra-large size flat panel display maskless photolithography system and method |
| 04/17/2013 | CN103048884A Photosensitive composition containing acridone derivative as photoinitiator |
| 04/17/2013 | CN103048883A Photosensitive composition containing polymerizable photoinitiator |
| 04/17/2013 | CN103048882A Colored curable resin composition |
| 04/17/2013 | CN103048881A 固化性树脂组合物 The curable resin composition of the |
| 04/17/2013 | CN103048880A Colorant, coloring composition, color filter and display device |
| 04/17/2013 | CN103048879A Imprint apparatus,device manufacturing method, and imprint method |
| 04/17/2013 | CN103048878A Imprint method, imprint apparatus, and article manufacturing method |
| 04/17/2013 | CN103048877A Ink-jet printing silk screen plate making method and photo-sensitive resist ink thereof |
| 04/17/2013 | CN103048876A Method of forming patterns of semiconductor device |
| 04/17/2013 | CN103048822A Method and device for removing bubbles for pipeline of substrate coating machine and corresponding coating machine |
| 04/17/2013 | CN103048728A Device and method for simultaneously inscribing by multi-wavelength grating in multi-core banding optical fiber |
| 04/17/2013 | CN103048718A Method for manufacturing square pass photonsieve by applying stepping projection digital photoetching machine |
| 04/17/2013 | CN103048715A Planar sub-wavelength aperiodic high-contrast grating and preparation method thereof |
| 04/17/2013 | CN103048707A Method for producing sub-wavelength antireflection structure and compression moulding method of sub-wavelength antireflection structure |
| 04/17/2013 | CN103046061A Cleaning agent for development equipment and use method thereof |
| 04/17/2013 | CN103045015A Liquid photo-imageable alkali developable and anodizing resistant ink and preparation method thereof |
| 04/17/2013 | CN103045014A Naturally dried photosensitive acid-corrosion-resistant electroplating printing ink and preparation method thereof |
| 04/17/2013 | CN103044581A Macromolecular photoinitiator as well as preparation method and application thereof |
| 04/17/2013 | CN103044256A Calixarene and photoresist composition comprising same |
| 04/17/2013 | CN103044248A Low-polymer cross-linking agent, preparation method thereof, insulation protection photoresist for manufacturing process of touch screen device and application thereof |
| 04/17/2013 | CN103042823A Low viscosity anticorrosion ink and printing method thereof |
| 04/17/2013 | CN102574703B Apparatus for reducing waste lithographic printing plate developing liquid |
| 04/17/2013 | CN102492059B Diphenyl sulfide ketone oxime ester photoinitiator as well as preparation method and application thereof |
| 04/17/2013 | CN102354084B Flow field pressure transducer of immersion lithography machine based on PVDF (polyvinylidene fluoride) |
| 04/17/2013 | CN102279532B Device for assembling and regulating lens of projection objective of lithography machine |
| 04/17/2013 | CN102279454B Supporting device of lens in photoetching projection objective |
| 04/17/2013 | CN102243436B Electric-field-induced micro-compounding method under geometrical restraint |
| 04/17/2013 | CN102193343B Developing apparatus and developing method |
| 04/17/2013 | CN102184821B Method for manufacturing grid of millimeter-wave traveling wave tube |
| 04/17/2013 | CN102073223B Lithographic apparatus having parts with a coated film adhered thereto |
| 04/17/2013 | CN102073222B Method for improving alignment signals accuracy of step-projection photoetching machine |
| 04/17/2013 | CN102043354B Developing apparatus and developing method |
| 04/17/2013 | CN102023491B Actuator, lithographic apparatus, and actuator constructing method |
| 04/17/2013 | CN101995771B Coloring light-sensitive resin composition, and a colorful optical filter and a liquid crystal display device manufactured by using the coloring light-sensitive resin composition |