| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/24/2013 | CN103069342A Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask |
| 04/24/2013 | CN103069341A Positive photosensitive siloxane composition |
| 04/24/2013 | CN103069340A Photoreactive resin composition |
| 04/24/2013 | CN103069339A Resin composition for photoresist |
| 04/24/2013 | CN103069338A Method for producing lithographic printing plate |
| 04/24/2013 | CN103068884A Photosensitive silicone resin composition |
| 04/24/2013 | CN103068876A Epoxy resin composition having monocyclic aliphatic hydrocarbon ring |
| 04/24/2013 | CN103068583A Master planographic printing plate for on-press development, and plate-making method using said master planographic printing plate |
| 04/24/2013 | CN103065946A Lithography method |
| 04/24/2013 | CN103064265A Method for exposing Indium tin oxide (ITO) film of touch screen and locating component adopted by method |
| 04/24/2013 | CN103064264A Focusing and leveling device |
| 04/24/2013 | CN103064263A Resist stripper composition and method of stripping resist using same |
| 04/24/2013 | CN103064262A Grating phase modulator applied to laser interference photoetching system |
| 04/24/2013 | CN103064261A Harsh rapid propulsion method for surface evolution stimulation in photoresist etching process |
| 04/24/2013 | CN103064260A Tin droplet target generation device used for light source of EUV (Extreme Ultraviolet) lithography machine |
| 04/24/2013 | CN103064259A Isolation method and isolation system of extreme ultraviolet laser plasma light source debris |
| 04/24/2013 | CN103064258A Fluid handling structure, a lithographic apparatus and a device manufacturing method |
| 04/24/2013 | CN103064257A Illumination-source shape definition in optical lithography |
| 04/24/2013 | CN103064256A Linear motor and lithography arrangement including linear motor |
| 04/24/2013 | CN103064255A Approximate exposure device, method for positioning substrate of approximate exposure device, and method for manufacturing substrate of display panel |
| 04/24/2013 | CN103064254A Photosensitive resin compound, photosensitive component, formation method of resist pattern, and manufacturing method of printed circuit board |
| 04/24/2013 | CN103064253A Photosensitive composition containing acridine oxide |
| 04/24/2013 | CN103064252A Photosensitive composition containing bifunctional benzophenone derivatives as photoinitiator |
| 04/24/2013 | CN103064251A Photosensitive composition containing bifunctional photoinitiator |
| 04/24/2013 | CN103064250A Photosensitive resin composition, photosensitive element wherein same is used, method for forming a resist-pattern, and method for producing a printed wiring board |
| 04/24/2013 | CN103064249A Photocurable compositions containing reactive particles |
| 04/24/2013 | CN103064248A Manufacturing method of film pattern and baseplate structure |
| 04/24/2013 | CN103064137A Electric field induction imprinting method of aspheric surface micro-lens array |
| 04/24/2013 | CN103064136A Combined microlens array for integrated imaging three-dimensional (3D) display and manufacturing method thereof |
| 04/24/2013 | CN103062321A Zero-rigidity vibration isolator with coplace air flotation orthogonal decoupling and sliding knuckle bearing angle decoupling |
| 04/24/2013 | CN103062318A Zero-rigidity vibration isolator with coplace air flotation orthogonal decoupling and two-dimensional flexible hinge angle decoupling |
| 04/24/2013 | CN103062317A Vibration isolator with characteristics of two-dimensional flexible hinge angle decoupling and magnetic levitation plane drive positioning |
| 04/24/2013 | CN103062316A Eddy current damping zero stiffness vibration isolator for flexible membrane angle decoupling |
| 04/24/2013 | CN103062311A Eddy current damping vibration isolator of double-layer air-flotation orthogonal decoupling and air-flotation ball bearing angle decoupling |
| 04/24/2013 | CN103062309A Eddy-current damping vibration isolator with coplace air flotation orthogonal decoupling and rolling knuckle bearing angle decoupling |
| 04/24/2013 | CN103062307A Eddy-current damping vibration isolator with coplace air flotation orthogonal decoupling and two-dimensional flexible hinge angle decoupling |
| 04/24/2013 | CN103062306A Eddy current damping vibration isolator of double-layer air-flotation orthogonal decoupling and two-dimensional flexible hinge angle decoupling |
| 04/24/2013 | CN103062305A Zero-rigidity vibration isolator of double-layer air-flotation orthogonal decoupling and two-dimensional flexible hinge angle decoupling |
| 04/24/2013 | CN103062304A Magnetic suspension zero stiffness vibration isolator and vibration isolation system for flexible membrane angle decoupling |
| 04/24/2013 | CN103062303A Magnetic levitation zero-stiffness vibration isolator and vibration isolation system for air floatation ball bearing angle decoupling |
| 04/24/2013 | CN103062301A Magnetic suspension vibration isolator of double-layer air-flotation orthogonal decoupling and air-flotation ball bearing angle decoupling |
| 04/24/2013 | CN103062299A Rolling knuckle bearing angle decoupling and magnetic levitation zero-stiffness vibration isolator and vibration isolation system |
| 04/24/2013 | CN103062298A Coplane air floatation orthogonal decoupling and air floatation ball bearing angle decoupling electromagnetic damping vibration isolator |
| 04/24/2013 | CN103062297A Magnetic levitation vibration isolator with coplace air flotation orthogonal decoupling and rolling knuckle bearing angle decoupling |
| 04/24/2013 | CN103062295A Magnetic levitation vibration isolator with coplace air flotation orthogonal decoupling and two-dimensional flexible hinge angle decoupling |
| 04/24/2013 | CN103062294A Magnetic suspension vibration isolator of double-layer air-flotation orthogonal decoupling and two-dimensional flexible hinge angle decoupling |
| 04/24/2013 | CN103062293A Coplane air floatation orthogonal decoupling and air floatation ball bearing angle decoupling magnetic levitation plane driving location vibration isolator |
| 04/24/2013 | CN103062292A Electromagnetic damping vibration isolator of double-layer air-flotation orthogonal decoupling and sliding knuckle bearing angle decoupling |
| 04/24/2013 | CN103062291A Rolling knuckle bearing angle decoupling electromagnetic damping zero-stiffness vibration isolator |
| 04/24/2013 | CN103062290A Electromagnetic damping vibration isolator with coplace air flotation orthogonal decoupling and rolling knuckle bearing angle decoupling |
| 04/24/2013 | CN103062289A Electromagnetic damping vibration isolator of double-layer air-flotation orthogonal decoupling and rolling knuckle bearing angle decoupling |
| 04/24/2013 | CN103062287A Electromagnetic damping vibration isolator with coplace air flotation orthogonal decoupling and two-dimensional flexible hinge angle decoupling |
| 04/24/2013 | CN103062286A Zero stiffness vibration isolator for flexible membrane angle decoupling and vibration isolation system formed by same |
| 04/24/2013 | CN103062284A Zero-rigidity vibration isolator of double-layer air-flotation orthogonal decoupling and flexible film angle decoupling |
| 04/24/2013 | CN102257434B Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure |
| 04/24/2013 | CN102253601B Method for improving thermostability of 7350 photoresist |
| 04/24/2013 | CN102224458B Composition, process of preparation and method of application and exposure for light imaging paper |
| 04/24/2013 | CN102117764B Method for performing photolithographic process on deep hole substrate |
| 04/24/2013 | CN102096313B Yaw circuit system in wind power generating system |
| 04/24/2013 | CN102067038B Exposure apparatus, exposure method, and device manufacturing method |
| 04/24/2013 | CN102054764B Method for manufacturing rectangular hole of semiconductor device by using KrF process and other processes in which linewidth is less than KrF |
| 04/24/2013 | CN102027570B Water-repellant composition for substrate to be exposed, method of forming resist pattern, electronic device produced by the formation method, method of imparting water repellency to substrate to be exposed, water-repellant set for substrate to be ex |
| 04/24/2013 | CN101996866B Method for protecting overlay mark graph |
| 04/24/2013 | CN101952778B Photosensitive resin laminate |
| 04/24/2013 | CN101884015B Resist underlayer film forming composition and method for forming resist pattern |
| 04/24/2013 | CN101878451B Blocked isocyanato bearing silicon containing composition for the formation of resist undercoat |
| 04/24/2013 | CN101866113B Method of processing substrate, exposure device and method of manufacturing device |
| 04/24/2013 | CN101859064B Method for forming resist pattern and method for manufacturing semiconductor device |
| 04/24/2013 | CN101794088B Composition for removing photoresist and/or etching residue from a substrate and use thereof |
| 04/24/2013 | CN101572226B Method of forming fine patterns of semiconductor device |
| 04/24/2013 | CN101397428B Pigment dispersion composition, photocurable composition, color filter and manufacture method thereof, liquid crystal display element and solid imaging element |
| 04/24/2013 | CN101051183B Pattern forming method |
| 04/23/2013 | US8429573 Data generation method for semiconductor device, and electron beam exposure system |
| 04/23/2013 | US8426121 Self-aligned spatial frequency doubling |
| 04/23/2013 | US8426120 High-throughput imaging of graphene based sheets by fluorescence quenching microscopy and applications of same |
| 04/23/2013 | US8426119 Dynamic projection method for micro-truss foam fabrication |
| 04/23/2013 | US8426118 Method of forming pitch multiplied contacts |
| 04/23/2013 | US8426117 Mask pattern forming method, fine pattern forming method, and film deposition apparatus |
| 04/23/2013 | US8426116 Method for fabricating a semiconductor device |
| 04/23/2013 | US8426115 Patterning process and resist composition |
| 04/23/2013 | US8426114 L-shaped feature, method of making an L-shaped feature and method of making an L-shaped structure |
| 04/23/2013 | US8426113 Chemically amplified silsesquioxane resist compositions |
| 04/23/2013 | US8426112 Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group |
| 04/23/2013 | US8426111 Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating |
| 04/23/2013 | US8426110 Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound |
| 04/23/2013 | US8426109 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same |
| 04/23/2013 | US8426108 Chemically amplified positive resist composition for EB or EUV lithography and patterning process |
| 04/23/2013 | US8426107 Positive-type photosensitive composition |
| 04/23/2013 | US8426106 Photoresist composition |
| 04/23/2013 | US8426105 Resist-modifying composition and pattern forming process |
| 04/23/2013 | US8426104 Negative-working imageable elements |
| 04/23/2013 | US8426103 Positive resist composition for use with electron beam, X-ray or EUV and pattern forming method using the same |
| 04/23/2013 | US8426102 Lithographic printing plate precursor and plate making method |
| 04/23/2013 | US8426101 Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition |
| 04/23/2013 | US8426089 Colored curable composition, color filter, and method for producing color filter |
| 04/23/2013 | US8426086 Mask and method of manufacturing array substrate using the same |
| 04/23/2013 | US8425172 Reticle manipulation device |
| 04/18/2013 | WO2013056238A2 Programmable photolithography |
| 04/18/2013 | WO2013055150A2 Photosensitive resin composition for color filter and color filter manufactured by using same |
| 04/18/2013 | WO2013054870A1 Positive photosensitive resin composition, method for producing cured product, method for producing resin pattern, cured product, and optical member |