| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/01/2013 | CN103076716A Resin composition, photosensitive resin composition, gasket and display device |
| 05/01/2013 | CN103076715A Mask plate and exposure equipment optimal-focal distance monitoring method |
| 05/01/2013 | CN103076701A Liquid crystal display device and manufacturing method therefor |
| 05/01/2013 | CN103076645A Manufacturing method of surface-mounted type cloudy grating |
| 05/01/2013 | CN103076284A Fabrication method of optical micro-nano biosensor integrated with microfluidic system |
| 05/01/2013 | CN103073668A Alkali soluble resin as well as preparation method, photosensitive resin composition and color filter |
| 05/01/2013 | CN103073663A Polymer emulsion containing infrared absorption dye and preparation method thereof |
| 05/01/2013 | CN103073425A Photosensitive monomer, liquid crystal material, liquid crystal panel, fabrication method of liquid crystal panel, photoelectronic device and fabrication method |
| 05/01/2013 | CN103072940A Metal microstructure processing method based on blue laser direct writing |
| 05/01/2013 | CN102591155B Heat stability processing method for 830-nanometer infrared photosensitive heat-sensitive CTP (computer to plate) |
| 05/01/2013 | CN102314084B Light sensitization composition using p-toluenesulfonylhydrazide hydrazone compound and application of light sensitization composition |
| 05/01/2013 | CN102239448B Method and apparatus for making liquid flexographic printing elements |
| 05/01/2013 | CN102214492B Method for making concave-surface X-ray focusing pinhole |
| 05/01/2013 | CN102174059B Sulfydryl-containing low polysiloxane compound, ultraviolet photoresist composition thereof, and impressing process |
| 05/01/2013 | CN102144188B Improved nanoimprint method |
| 05/01/2013 | CN102124410B Photosensitive letterpress printing original plate |
| 05/01/2013 | CN102096314B Methods of fabricating an imprint mold and of forming a pattern using the imprint mold |
| 05/01/2013 | CN102046667B Novel compound, polymerizable composition, color filter and process for produciton thereof, solid-state imaging element, and lithographic printing original plate |
| 05/01/2013 | CN102033420B Photomask, photomask manufacturing method, pattern transfer method and method for manufacturing liquid crystal display device |
| 05/01/2013 | CN102004393B Composite patterning devices for soft lithography |
| 05/01/2013 | CN101971094B Coloring curable composition, color filter and method for producing color filter |
| 05/01/2013 | CN101796460B Illumination system for illuminating a mask in a microlithographic projection exposure apparatus |
| 05/01/2013 | CN101681108B A lithographic printing plate precursor |
| 05/01/2013 | CN101666977B Resist composition for immersion exposure and method for manufacturing a semiconductor device using the same |
| 05/01/2013 | CN101602682B Photoinitiator/halogen-free fire retardant, preparation method and application thereof |
| 05/01/2013 | CN101600994B Photosensitive resin composition, cured film, protective film, insulating film and semiconductor device using the same, and display device |
| 05/01/2013 | CN101541898B Pigment dispersion, coloring composition for color filter, color filter, liquid crystal display and organic EL display |
| 05/01/2013 | CN101531600B Quaternary ammonium hydroxide as well as preparation method and application thereof |
| 05/01/2013 | CN101430509B Immersion lithography fluids |
| 05/01/2013 | CN101295136B Light-sensitive polymer composition |
| 05/01/2013 | CN101154032B Photo mask blank material, photo mask and manufacture method, photo mask midbody, pattern copy method of the same |
| 05/01/2013 | CN101114124B Photosensitive composition, photosensitive resin transfer film, manufacturing method of photo spacer, substrate for liquid crystal display device, and liquid crystal display device |
| 05/01/2013 | CN101059655B Photosensitive composition and color filter formed from photosensitive composition |
| 04/30/2013 | US8432533 Method and system for photolithographic fabrication with resolution far below the diffraction limit |
| 04/30/2013 | US8432072 Three axis linear actuator |
| 04/30/2013 | US8431333 Method for removing an uncured photosensitive composition |
| 04/30/2013 | US8431332 Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern |
| 04/30/2013 | US8431331 Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion |
| 04/30/2013 | US8431330 Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent |
| 04/30/2013 | US8431329 Self-aligned spacer multiple patterning methods |
| 04/30/2013 | US8431328 Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus |
| 04/30/2013 | US8431326 Salt and photoresist composition comprising the same |
| 04/30/2013 | US8431325 Compound, resin, resist composition and method for producing resist pattern |
| 04/30/2013 | US8431324 Radiation-sensitive resin composition |
| 04/30/2013 | US8431323 Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process |
| 04/30/2013 | US8431289 Photosensitive composition for volume hologram recording, photosensitive medium for volume hologram recording and volume hologram |
| 04/25/2013 | WO2013058587A1 Vacuum drying apparatus |
| 04/25/2013 | WO2013058552A1 Led light source module for light exposure, led light source apparatus for light exposure, and system for managing led light source apparatus for light exposure |
| 04/25/2013 | WO2013058506A2 Polyimide light-sensitive resin composition for oled |
| 04/25/2013 | WO2013058471A1 Apparatus and method for manufacturing fine pattern using interferogram of optical axis direction |
| 04/25/2013 | WO2013058386A1 Method for manufacturing ink-repellent agent, negative-type photosensitive resin composition, partition wall, and optical device |
| 04/25/2013 | WO2013058250A1 Radiation-sensitive resin composition |
| 04/25/2013 | WO2013058197A1 Substrate for lithographic printing plate and negative photosensitive plate for lithographic printing |
| 04/25/2013 | WO2013058189A1 Additive for composition for forming resist underlayer film, and composition for forming resist underlayer film which contains said additive |
| 04/25/2013 | WO2013057046A1 Mirror with piezoelectric substrate, optical arrangement therewith and associated method |
| 04/25/2013 | WO2013056981A1 Microlithographic exposure method and illumination device |
| 04/25/2013 | WO2013056941A1 Lithographic apparatus and method |
| 04/25/2013 | WO2013056637A1 Method for manufacturing holographic blazed grating |
| 04/25/2013 | WO2013056627A1 Method for manufacturing holographic bi-blazed grating |
| 04/25/2013 | WO2013056484A1 Manufacturing method for controlling wall angle of contact hole of liquid crystal display device |
| 04/25/2013 | WO2013032178A3 Photosensitive resin composition |
| 04/25/2013 | WO2013029957A3 A method of determining focus corrections, lithographic processing cell and device manufacturing method |
| 04/25/2013 | WO2013025619A3 Method and composition for removing resist, etch residue, and copper oxide from substrates having copper, metal hardmask and low-k dielectric material |
| 04/25/2013 | US20130102160 Methods of Forming Patterns |
| 04/25/2013 | US20130101942 Method for forming resist pattern, and composition for forming resist underlayer film |
| 04/25/2013 | US20130101941 Method for design and manufacture of patterns with variable shaped beam lithography |
| 04/25/2013 | US20130101940 Chemical amplified photoresist composition |
| 04/25/2013 | US20130101939 Lithographic printing plate precursors |
| 04/25/2013 | US20130101938 On-press developable lithographic printing plate precursors |
| 04/25/2013 | US20130101937 Modified novolak phenolic resin, making method, and resist composition |
| 04/25/2013 | US20130101936 Positive resist composition and patterning process |
| 04/25/2013 | US20130101928 Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus |
| 04/25/2013 | US20130101812 Method of forming pattern |
| 04/25/2013 | US20130101795 Photolithography on shrink film |
| 04/25/2013 | US20130101788 Optical air slit and method for manufacturing optical air slits |
| 04/25/2013 | US20130100430 Lithographic apparatus and device manufacturing method |
| 04/25/2013 | US20130100429 Optical system and multi facet mirror of a microlithographic projection exposure apparatus |
| 04/25/2013 | US20130100428 Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask |
| 04/25/2013 | US20130100425 Fluid handling structure, a lithographic apparatus and a device manufacturing method |
| 04/25/2013 | US20130099260 Resist stripping composition and method of stripping resist using the same |
| 04/25/2013 | US20130098835 Microscopically structured polymer monoliths and fabrication methods |
| 04/25/2013 | DE112011101962T5 Methode zur Bildung von Resistmustern und Agens für die Musterminiaturisierung Method for formation of resist patterns and agent for Musterminiaturisierung |
| 04/25/2013 | DE102012210073A1 Illumination optics for projection exposure system for extreme UV projection lithography for manufacturing micro or nano-structured component, has partial optics designed such that light strikes on facet mirror with convergent optical path |
| 04/25/2013 | DE102012205554A1 Optical system for microlithography system used for production of microstructured components, has beam deflecting device with beam deflecting element, which focuses incident light in plane of wafer |
| 04/24/2013 | EP2584589A1 Illuminating optical system, expose device, and device production method |
| 04/24/2013 | EP2584409A1 Resist composition, resist pattern formation method, polymeric compound, and compound |
| 04/24/2013 | EP2584408A2 Imprint method and imprint apparatus |
| 04/24/2013 | EP2584407A1 Method for Printing Etch-masks Using Phase-change Materials |
| 04/24/2013 | EP2583813A1 Roller mold manufacturing device and manufacturing method |
| 04/24/2013 | EP2583141A2 Illumination optical system for microlithography and projection exposure system with an illumination optical system of this type |
| 04/24/2013 | EP2583140A1 Plate for producing stereotype and method for producing said plate for producing stereotype |
| 04/24/2013 | EP2583139A2 Process and materials for making contained layers and devices made with same |
| 04/24/2013 | CN202904224U Double-sided light-sensitive circuit board alignment device for exposure machine |
| 04/24/2013 | CN202904223U Water-saving type developing device for machining circuit board |
| 04/24/2013 | CN202904222U Energy conversation type developer for machining circuit board |
| 04/24/2013 | CN202904221U Wet film developing machine with automatic liquid medicine adding function for circuit board processing |
| 04/24/2013 | CN202904220U Horizontal angle adjusting mechanism for photomask structure of exposure machine |
| 04/24/2013 | CN202904219U 夹具装置与曝光平台 Clip device platform and exposure |
| 04/24/2013 | CN1737000B Polymer, chemical amplification erosion resistant composition and forming method |
| 04/24/2013 | CN103069343A Carboxy ester ketal removal compositions, methods of manufacture, and uses thereof |