| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/08/2013 | CN101910946B Composition for formation of anti-reflective film, and pattern formation method using the composition |
| 05/08/2013 | CN101807005B Processing liquid supply system and processing liquid supply method |
| 05/08/2013 | CN101784583B Novel polyimide resin and photosensitive polyimide resin composition |
| 05/08/2013 | CN101696339B Materials of electronic paper micro-cup and preparation method |
| 05/08/2013 | CN101681114B Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity |
| 05/08/2013 | CN101663617B Photosensitive resin composition, dry film, and processed work made with the same |
| 05/08/2013 | CN101639634B Alkaline developer for coloring light sensitive composition, image forming method, color filter and liquid crystal display device |
| 05/08/2013 | CN101560279B A composition and a multipolymer used in organic antireflective coating |
| 05/08/2013 | CN101551589B Silica based positive type photosensitive organic compound |
| 05/08/2013 | CN101526761B Image forming method, color filter and display apparatus |
| 05/08/2013 | CN101452220B Lithographic apparatus and device manufacturing method |
| 05/08/2013 | CN101354541B Integrated post-exposure bake track |
| 05/07/2013 | US8436983 Optical system, exposure system, and exposure method |
| 05/07/2013 | US8436979 Exposure apparatus, and device manufacturing method |
| 05/07/2013 | US8436978 Exposure apparatus, and device manufacturing method |
| 05/07/2013 | US8435728 Method of slimming radiation-sensitive material lines in lithographic applications |
| 05/07/2013 | US8435727 Method and system for modifying photoresist using electromagnetic radiation and ion implantation |
| 05/07/2013 | US8435724 Fabricating method for touch screen panel |
| 05/07/2013 | US8435723 Pattern forming method and device production method |
| 05/07/2013 | US8435722 Method for fabricating liquid crystal display device |
| 05/07/2013 | US8435721 Resist underlayer film forming composition and forming method of resist pattern using the same |
| 05/07/2013 | US8435720 Lithographic printing plate precursor and plate making method thereof |
| 05/07/2013 | US8435719 Tunable contact angle process for immersionlithography topcoats and photoresists |
| 05/07/2013 | US8435718 Upper layer-forming composition and photoresist patterning method |
| 05/07/2013 | US8435717 Compound for photoacid generator, resist composition using the same, and pattern-forming method |
| 05/07/2013 | US8435702 Manufacturing method of semiconductor device and manufacturing method of mask |
| 05/07/2013 | CA2557472C Micrometric direct-write methods for patterning conductive material and applications to flat panel display repair |
| 05/02/2013 | WO2013063104A1 Air gauges comprising dual-range differential pressure sensor |
| 05/02/2013 | WO2013062985A1 High fidelity patterning employing a fluorohydrocarbon-containing polymer |
| 05/02/2013 | WO2013062255A2 Monomer coupled with thermal acid generator, polymer gained from monomer coupled with thermal acid generator, composition for resist underlayer film including polymer, and method for forming pattern using composition for resist underlayer film |
| 05/02/2013 | WO2013062133A1 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device |
| 05/02/2013 | WO2013062100A1 Method for producing tetraalkylammonium salt solution |
| 05/02/2013 | WO2013062082A1 Layered photosensitive-resin product for letterpress printing plate |
| 05/02/2013 | WO2013062080A1 Method for producing polymer film, and polymer film |
| 05/02/2013 | WO2013062066A1 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device |
| 05/02/2013 | WO2013062011A1 Colored photosensitive resin composition, colored spacer, color filter, and liquid crystal display device |
| 05/02/2013 | WO2013061601A1 Pattern-forming method |
| 05/02/2013 | WO2013060853A1 Optical element |
| 05/02/2013 | WO2013060561A1 Optical system in an illumination device of a microlithographic projection exposure apparatus |
| 05/02/2013 | WO2013060201A1 Environment friendly waterless offset plate |
| 05/02/2013 | WO2013060087A1 Polyhedral oligomeric silsesquioxane compound containing mercapto polyfunctional group, its composition, and soft template for imprinting |
| 05/02/2013 | WO2013036027A3 Phenol-based self-crosslinking polymer and resist underlayer film composition including same |
| 05/02/2013 | WO2013013947A3 Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure method |
| 05/02/2013 | WO2012133955A3 Simulation method, simulation program, recording medium having the simulation program stored therein, method for producing droplet arrangement patterns utilizing the simulation method, nanoimprinting method, method for producing patterned substrates, and ink jet apparatus |
| 05/02/2013 | US20130109605 Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate |
| 05/02/2013 | US20130108969 Method and an apparatus having a compressible collar for thermally treating a photosensitive precursor |
| 05/02/2013 | US20130108968 Method and apparatus for thermal treatment of printing surface in relief printing |
| 05/02/2013 | US20130108967 Method for forming cured film |
| 05/02/2013 | US20130108966 Method for thermal treatment of relief surface for a relief printing form |
| 05/02/2013 | US20130108965 Radiation-sensitive composition |
| 05/02/2013 | US20130108964 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS |
| 05/02/2013 | US20130108963 Photosensitive resin composition and method for preparing photosensitive composition |
| 05/02/2013 | US20130108962 Radiation-sensitive composition |
| 05/02/2013 | US20130108961 Photosensitive Resin Composition And Cured Product Thereof |
| 05/02/2013 | US20130108960 Patterning process and resist composition |
| 05/02/2013 | US20130108959 Use of a composition comprising vinyl monomer-comprising polymer, solvent and at least one halogen-free biocide |
| 05/02/2013 | US20130108958 Production method of resist composition for lithography |
| 05/02/2013 | US20130108957 Production method of resist composition for lithography |
| 05/02/2013 | US20130108956 Nanocomposite positive photosensitive composition and use thereof |
| 05/02/2013 | US20130108948 Mask, manufacturing method thereof and mask haze monitoring method |
| 05/02/2013 | US20130107246 Optical touch sensing structure and manufacturing method thereof |
| 05/02/2013 | US20130107240 Maskless Vortex Phase Shift Optical Direct Write Lithography |
| 05/02/2013 | US20130107238 Lithographic apparatus and device manufacturing method |
| 05/02/2013 | US20130107237 Method of slimming radiation-sensitive material lines in lithographic applications |
| 05/02/2013 | US20130107180 Liquid crystal display device and method for fabricating the same |
| 05/02/2013 | US20130107147 Lens substrate, method of manufacturing the lens substrate and lens panel having the lens substrate |
| 05/02/2013 | US20130105998 Photosensitive adhesive composition, photosensitive adhesive film, and semiconductor device using each |
| 05/02/2013 | US20130105440 Nanocomposite negative photosensitive composition and use thereof |
| 05/02/2013 | DE102012206151A1 Optical system for microlithographic projection exposure system utilized for manufacturing e.g. LCD, has screen polarizer converting linear polarization distribution with polarization direction of bundle into mixed polarization distribution |
| 05/02/2013 | DE102012205976A1 Optical microlithography device for use in manufacture of semiconductor device, has actuators for tilting or oscillating certain optical elements of optical assembly with respect to substrate table during imaging process |
| 05/02/2013 | DE102011085334A1 Optisches System in einer Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage The optical system in an illumination device of a microlithography projection exposure apparatus |
| 05/01/2013 | EP2587313A2 Optical measurement system and method for measuring critical dimension of nanostructure |
| 05/01/2013 | EP2587283A2 Optical touch sensing structure with enhanced light transmittance and manufacturing method thereof |
| 05/01/2013 | EP2586806A2 Modified novolak phenolic resin, making method, and resist composition |
| 05/01/2013 | EP2585874A1 Method for producing a component and component produced by the method |
| 05/01/2013 | EP2585873A1 Exposure apparatus and device fabrication method |
| 05/01/2013 | CN202916586U Maskless graphic exposure system based on spatial light modulator |
| 05/01/2013 | CN202916585U Nanoimprinting device |
| 05/01/2013 | CN1968815B Manufacturing method for liquid ejecting head and liquid ejecting head obtained by this method |
| 05/01/2013 | CN1963668B Hologram recording material, and hologram recording medium |
| 05/01/2013 | CN103080845A Photoresist residue and polymer residue removing liquid composition |
| 05/01/2013 | CN103080844A Rinse liquid for lithography and method for forming pattern using same |
| 05/01/2013 | CN103080843A A method and apparatus for printing a periodic pattern with large depth of focus |
| 05/01/2013 | CN103080842A 投射曝光装置 Projection exposure device |
| 05/01/2013 | CN103080841A Imaging optical system |
| 05/01/2013 | CN103080840A 光刻设备和方法 Lithographic apparatus and method |
| 05/01/2013 | CN103080839A Photosensitive resin composition, oxime sulfonate compound, method for forming cured film, cured film, organic el display device, and liquid crystal display device |
| 05/01/2013 | CN103080838A Method for producing lithographic printing plate |
| 05/01/2013 | CN103080236A Curable resin composition, dry film thereof, cured product of said curable resin composition, and printed circuit board using same |
| 05/01/2013 | CN103080168A Method for producing photosensitive resin and photosensitive resin composition |
| 05/01/2013 | CN103078003A Method and device for photoetching focal plane detector indium column |
| 05/01/2013 | CN103076725A Solution for removing photoresist and application of solution |
| 05/01/2013 | CN103076724A Projection objective wave aberration on-line detection device and method based on double-beam interference |
| 05/01/2013 | CN103076723A Microlithography projection optical system |
| 05/01/2013 | CN103076722A Exposure method for reducing exposure defocus in marginal area of wafer and photoetching technology |
| 05/01/2013 | CN103076721A Positive photosensitive composition |
| 05/01/2013 | CN103076720A Photoresist compositions |
| 05/01/2013 | CN103076719A Photosensitive resin composition, photosensitive component, forming method of corrosion-resistant pattern and manufacturing method of printed wiring board |
| 05/01/2013 | CN103076718A Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern and process for producing printed circuit board, lead frame, semiconductor package and concavoconvex board |
| 05/01/2013 | CN103076717A Photosensitive resin composition, photosensitive component, forming method of corrosion-resistant pattern and manufacturing method of printed wiring board |