Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2015
02/26/2015WO2015025925A1 Photosensitive resin composition
02/26/2015WO2015025859A1 Radiation-sensitive resin composition, method for forming resist pattern, radiation-sensitive acid generating agent, acid diffusion control agent and compound
02/26/2015WO2015025808A1 Method for securing fiber, fiber-securing-structure body secured to fiber holding member, laser device provided with said fiber-securing-structure body, exposure device, and inspection device
02/26/2015WO2015025689A1 Photosensitive coloring composition, color filter, method for producing color filter, organic el liquid crystal display device, and color filter-forming kit
02/26/2015WO2015025665A1 Coating liquid to be applied over resist pattern and method for forming reverse pattern
02/26/2015WO2015025098A1 Calibration method for a cd-sem characterisation technique
02/26/2015WO2015024783A1 Lithography system and a machine learning controller for such a lithography system
02/26/2015WO2015024316A1 Polyether compound, preparation method and photoresist composition thereof
02/26/2015US20150056561 Composite Holographic Optical Diffuser Structure with High Frequency Overlay and Method of Fabrication Thereof
02/26/2015US20150056560 Photosensitive conductive paste and method of producing conductive pattern
02/26/2015US20150056559 Immersion liquid, exposure apparatus, and exposure process
02/26/2015US20150056558 Photoacid generator and photoresist comprising same
02/26/2015US20150056557 Chemically amplified positive-type photosensitive resin composition and method for producing resist pattern using the same
02/26/2015US20150056556 Photosensitive composition and photoresist
02/26/2015US20150056555 Photoresist and Method of Formation and Use
02/26/2015US20150056554 Oxime Ester Photoinitiators
02/26/2015US20150056553 Photopatternable Materials and Related Electronic Devices and Methods
02/26/2015US20150056552 Method of Processing a Photosensitive Structure
02/26/2015US20150056545 Polymer compound, chemically amplified negative resist composition, photo-curable dry film and production method thereof, layered product, patterning process, and substrate
02/26/2015US20150056544 Method for manufacturing liquid crystal display device, and liquid crystal display device
02/26/2015US20150056542 Organometallic solution based high resolution patterning compositions
02/26/2015US20150056097 Imaging devices for molecule detection
02/26/2015US20150055755 Novel Objective for EUV Microscopy, EUV Lithography, and X-Ray Imaging
02/26/2015US20150055214 Catadioptric projection objective
02/26/2015US20150055212 Catadioptric projection objective
02/26/2015US20150055127 Particulate Contamination Measurement Method and Apparatus
02/26/2015US20150055114 Layered radiation-sensitive materials with varying sensitivity
02/26/2015US20150055113 Pattern formation method, mask for exposure, and exposure apparatus
02/26/2015US20150055112 Lithography apparatus and method for producing a mirror arrangement
02/26/2015US20150055111 Reflective optical element and euv lithography appliance
02/26/2015US20150055110 Illumination optical unit for projection lithography
02/26/2015US20150055109 Projection objective for a microlithographic projection exposure apparatus
02/26/2015US20150055108 Mirror for the EUV Wavelength Range, Method for Producing such a Mirror, and Projection Exposure Apparatus Comprising such a Mirror
02/26/2015US20150055107 Microelectromechanical mirror assembly
02/26/2015US20150055106 Radiation Source and Lithographic Apparatus
02/26/2015US20150055105 Exposure apparatus, exposure method, and exposure program
02/26/2015US20150055104 Lithographic apparatus and device manufacturing method
02/26/2015US20150055103 Fluid handling structure, a lithographic apparatus and a device manufacturing method
02/26/2015US20150055102 Lithographic apparatus and a method of operating the apparatus
02/26/2015US20150054940 Qualifying patterns for microlithography
02/26/2015US20150053900 Photosensitive Resin Composition for Color Filter, and Color Filter Prepared Using the Same
02/26/2015US20150053469 Printed circuit board and method of manufacturing the same
02/26/2015US20150052776 Drying apparatus for use in a lithography system
02/25/2015EP2839968A1 Original plate for lithographic printing plate, and method for printing same
02/25/2015EP2839506A1 Electrostatic clamp
02/25/2015EP2839345A1 Method and apparatus for the photopolymerization and the washing in series of digital printing plates for flexography
02/25/2015EP2839344A1 Lighting apparatus for providing light for processing an object
02/25/2015EP2839343A1 Optical system of a microlithographic projection exposure apparatus
02/25/2015EP2839342A1 Substrate holder, lithographic apparatus, and device manufacturing method
02/25/2015EP2838927A2 Sulfonium compounds, their preparation and use
02/25/2015EP2838658A1 A nanocapillary device for biomolecule detection, a fluidic network structure and a method of manufacturing thereof
02/24/2015US8964167 Cylindrical magnetic levitation stage and lithography
02/24/2015US8964166 Stage device, exposure apparatus and method of producing device
02/24/2015US8964165 Optical apparatus with adjustable action of force on an optical module
02/24/2015US8964164 Lithographic apparatus and device manufacturing method
02/24/2015US8964163 Immersion lithographic apparatus and device manufacturing method with a projection system having a part movable relative to another part
02/24/2015US8964162 Optical assembly
02/24/2015US8963971 Laser exposure method and product
02/24/2015US8963110 Continuous generation of extreme ultraviolet light
02/24/2015US8962747 Resist underlayer composition and process of producing integrated circuit devices using the same
02/24/2015US8962712 Photosensitive resin composition, dry film thereof, and printed wiring board using them
02/24/2015US8962483 Interconnection designs using sidewall image transfer (SIT)
02/24/2015US8962234 Resist underlayer film forming composition and method for forming resist pattern using the same
02/24/2015US8962233 Actinic-ray—or radiation-sensitive resin composition and method of forming pattern using the composition
02/24/2015US8962223 Mask blank, reflective mask blank, photomask, reflective mask, photomask set and method of manufacturing a semiconductor device
02/24/2015US8962081 Template forming method
02/24/2015US8961853 Silicon pen nanolithography
02/24/2015US8961852 Templates having high contrast alignment marks
02/24/2015US8961851 Apparatus and method of fabricating flat plate display
02/24/2015US8961837 Photosensitive resin composition for color filter and color filter using same
02/24/2015US8961801 Imprint lithography method and apparatus
02/24/2015US8961800 Functional nanoparticles
02/24/2015US8961744 System and method for recycling high-boiling-point waste photoresist stripper
02/24/2015US8960928 Pellicle frame
02/19/2015WO2015023683A1 Micro forming devices and systems and uses thereof
02/19/2015WO2015023610A1 An edge-based full chip mask topography modeling
02/19/2015WO2015023606A1 System and method for attaching a mask to a mask holder
02/19/2015WO2015023041A1 Metal complex azo dye and use thereof as coloring agent for color resist
02/19/2015WO2015022885A1 Alkali-developable photocurable thermosetting resin composition and printed wiring board using same
02/19/2015WO2015022820A1 Pattern forming method, method for manufacturing electronic device using same, and electronic device
02/19/2015WO2015022779A1 Reagent for enhancing generation of chemical species
02/19/2015WO2015022239A1 Method and inspection apparatus and computer program product for assessing a quality of reconstruction of a value of a parameter of interest of a structure
02/19/2015WO2015022125A1 Lithographic apparatus, programmable patterning device and lithographic method
02/19/2015WO2015021709A1 Device for performing automatic contraposition, exposure and alignment on display panel to be aligned, and method for manufacturing phase difference plate
02/19/2015US20150050813 Lithography apparatus, and method of manufacturing article
02/19/2015US20150050602 Spin Development Method and Apparatus
02/19/2015US20150050601 Developable bottom antireflective coating composition and pattern forming method using thereof
02/19/2015US20150050600 Resist pattern-forming method
02/19/2015US20150050599 Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography
02/19/2015US20150050598 Methods for Cleaning Membranes used for Filtering Chemicals
02/19/2015US20150050597 Solution composition for passivation layer, thin film transistor array panel, and manufacturing method for thin film transistor array panel
02/19/2015US20150050596 Photosensitive polysiloxane composition and uses thereof
02/19/2015US20150050595 Photosensitive Resin Composition and Light Blocking Layer Using the Same
02/19/2015US20150050594 Positive Photosensitive Resin Composition, and Photosensitive Resin Film and Display Device Prepared by Using the Same
02/19/2015US20150050593 Photosensitive resin composition
02/19/2015US20150050586 Photosensitive conductive paste and method of producing conductive pattern
02/19/2015US20150050585 Resin composition, printed circuit board using the composition, and method of manufacturing the same
02/19/2015US20150050473 Resin composition, printed circuit board using the composition, and method of manufacturing the same
02/19/2015US20150049323 Lithographic Apparatus
02/19/2015US20150049322 Substrate processing system and method of controlling the same
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