| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/14/1994 | US5320918 Optical lithographical imaging system including optical transmission diffraction devices |
| 06/14/1994 | US5320864 Sedimentary deposition of photoresist on semiconductor wafers |
| 06/14/1994 | US5320225 Apparatus and method for securely carrying a substrate |
| 06/14/1994 | CA1330175C Photoimageable compositions |
| 06/10/1994 | CA2110429A1 Transfer imaging elements |
| 06/09/1994 | WO1994012912A1 Metal ion reduction in bottom anti-reflective coatings for photoresists |
| 06/09/1994 | WO1994012911A1 Method and apparatus for fabricating microlenses |
| 06/09/1994 | WO1994012903A1 Process for producing optical polymer components with integrated vertical coupling structures |
| 06/09/1994 | DE4340725A1 UV-Absorber UV absorber |
| 06/08/1994 | EP0600747A2 Method for forming a fine pattern |
| 06/08/1994 | EP0600708A1 Reflection type mask and manufacture of microdevices using the same |
| 06/08/1994 | EP0600615A2 Shoot and run printing materials |
| 06/08/1994 | EP0600262A2 Aqueous processable, multilayer photoimageable permanent coatings for printed circuits |
| 06/08/1994 | CN2168271Y Integrated photo-engraving for use in light room or dark room |
| 06/08/1994 | CN1024980C Non-photographic method for patterning organic polymer films |
| 06/07/1994 | USRE34634 Light illumination device |
| 06/07/1994 | US5319060 Preparation of unsaturated epoxy ester resin and carboxylated unsaturated epoxy ester resin and photosensitive composition comprising the same |
| 06/07/1994 | US5318944 Image receiving sheet |
| 06/07/1994 | US5318877 An imageable layer on facings comprising a hydrosilated silicon-incorporated polystyrene-diene copolymer which forming silicon oxide to resist etching; oxidation resistance |
| 06/07/1994 | US5318876 Radiation-sensitive mixture containing acid-labile groups and production of relief patterns |
| 06/07/1994 | US5318875 Positive quinonediazide photoresist composition containing select hydroxyphenol additive |
| 06/07/1994 | US5318874 O-naphthoquinone diazide photosensitive coating composition containing a polyvinyl pyrrolidone compound and a stannic halide |
| 06/07/1994 | US5318870 Method of patterning a phenolic polymer film without photoactive additive through exposure to high energy radiation below 225 nm with subsequent organometallic treatment and the associated imaged article |
| 06/07/1994 | US5318868 Photomask and method for manufacturing semiconductor device using photomask |
| 06/07/1994 | US5318808 UV-curable coatings |
| 06/07/1994 | CA2020237C Device manufacture involving lithographic processing |
| 06/06/1994 | CA2110631A1 Arenebisphosphine oxides |
| 06/01/1994 | EP0599779A1 High-resolution negative photoresist having extended processing latitude |
| 06/01/1994 | EP0599762A1 Method of forming sub-half micron patterns with optical lithography using bilayer resist |
| 06/01/1994 | EP0599720A2 Photosensitive article and process for transferring an image thereto |
| 06/01/1994 | EP0599571A2 Photoresist composition |
| 06/01/1994 | EP0599539A2 Method for forming a pattern by silylation |
| 06/01/1994 | EP0599510A2 Improvements in or relating to the formation of images |
| 06/01/1994 | EP0599463A2 High speed, dry processed printing plate construction |
| 06/01/1994 | EP0599367A1 Focused ion beam processing with charge control |
| 06/01/1994 | EP0599308A1 Surface treatment method of electrodeposition type photosensitive resin layer |
| 06/01/1994 | EP0599229A1 Cadmium/rare gas discharge lamp of the short arc type, as well as projection exposure device using the same |
| 06/01/1994 | EP0599075A1 Photosensitive resin composition or photosensitive heat curing resin composition and photosolder resist composition using the same |
| 06/01/1994 | EP0599069A2 Light-sensitive recording material |
| 06/01/1994 | EP0599068A2 Light-sensitive recording material |
| 06/01/1994 | EP0598926A1 Process and apparatus for the manufacturing of flexographic printing plates |
| 06/01/1994 | EP0328655B1 Pattern-forming process utilizing radiation-induced graft polymerization reaction |
| 06/01/1994 | DE4240997C1 Production of mounted circuit boards for fine raster pattern of SMD devices - having boards subjected to series of masking exposure and soldering operations |
| 06/01/1994 | DE4240141A1 Photoresist compsn. for making resist and registration mark for e.g. PCB's - contg leuco dyestuff, hexa:aryl:bis:imidazole initiator sensitised to visible and/or IR light and UV-sensitive photopolymerisation initiator |
| 06/01/1994 | DE4240137A1 Level optical colour filter prodn. from negative light-sensitive coat - by opt. repeated exposure and toning, total exposure through substrate and coating with transparent powder before heating, useful for LCD |
| 06/01/1994 | CN1024867C Color picture tube exposing method and apparatus thereof |
| 05/31/1994 | US5317615 Exposure apparatus |
| 05/31/1994 | US5317450 Projection exposure apparatus |
| 05/31/1994 | US5317363 Image forming apparatus using dry silver salt material |
| 05/31/1994 | US5317161 Ion source |
| 05/31/1994 | US5317141 Apparatus and method for high-accuracy alignment |
| 05/31/1994 | US5317080 Printing plates, paints, inks, adhesives and photoresists |
| 05/31/1994 | US5317069 Photoresists |
| 05/31/1994 | US5316897 Exposing a substrate to radiation according to a predetermined pattern recorded on a mask |
| 05/31/1994 | US5316896 Method of forming a pattern |
| 05/31/1994 | US5316895 Photolithographic method using non-photoactive resins |
| 05/31/1994 | US5316894 Method of making printed wiring boards |
| 05/31/1994 | US5316892 Method for developing lithographic printing plates |
| 05/31/1994 | US5316891 Fine pattern forming method |
| 05/31/1994 | US5316884 Radiation-sensitive compositions containing 5-indanol in the binder resin as a comonomer |
| 05/31/1994 | US5316883 Method for controlling pressure during image development |
| 05/31/1994 | US5316878 Pattern forming method and photomasks used therefor |
| 05/31/1994 | US5316843 Writing material composite for writing upon with pen or pencil comprises synthetic resin film and a mat coating consists of amino resins, mineral and polymeric binder; improved pen and pencil receptivity |
| 05/31/1994 | US5316276 Thickness compensation actuator system |
| 05/26/1994 | WO1994011788A1 Method of producing microstructures |
| 05/26/1994 | WO1994011787A1 Method of deposition |
| 05/26/1994 | WO1994011785A1 On-demand production of lat imaging films |
| 05/26/1994 | WO1994011781A1 Lens array photolithography |
| 05/26/1994 | WO1994011719A1 Method of fabricating membranes mounted on a frame |
| 05/26/1994 | DE4338778A1 Prodn. of multilayered resist pattern for semiconductor substrates - by forming lower resist film on substrate, forming intermediate layer, then forming upper resist film, etc. |
| 05/26/1994 | DE4329985A1 Microscopic transmitter or detector of electromagnetic radiation - has two or more faces of tip coated with thin electromagnetic radiation absorbing layers, with point and edge uncoated |
| 05/26/1994 | CA2149645A1 Method of deposition |
| 05/26/1994 | CA2109678A1 Surface treatment method of electrodeposition type photosensitive resin layer |
| 05/25/1994 | EP0598672A1 Method of making a rim-type phase-shift mask |
| 05/25/1994 | EP0598582A2 Method and apparatus for inspecting surfaces for foreign matter |
| 05/25/1994 | EP0598320A2 Positive resist composition |
| 05/25/1994 | EP0598241A1 Lithographic printing material |
| 05/25/1994 | EP0378575B1 Asymmetric purge air system for cleaning a lens |
| 05/24/1994 | US5315629 Ringfield lithography |
| 05/24/1994 | US5315349 Projection aligner |
| 05/24/1994 | US5315123 Electron beam lithography apparatus |
| 05/24/1994 | US5314988 Thermally stable highly sensitive resists and the like |
| 05/24/1994 | US5314978 Copolymer of sulfur dioxide and nuclear-substituted trialkylgermylstyrene |
| 05/24/1994 | US5314931 Resist compositions |
| 05/24/1994 | US5314789 Method of forming a relief image comprising amphoteric compositions |
| 05/24/1994 | US5314786 Positive-working radiation sensitive mixture comprising sulfonic acid esters of 2,4,6-tris-(2-hydroxyethoxy)-[1,3,5]triazine, and recording material containing these esters |
| 05/24/1994 | US5314785 Photoinitiator which generates acid on exposure, polymer containing acid labile alkoxy alkyl ester pendant groups |
| 05/24/1994 | US5314784 Process for detackifying transferred toned images |
| 05/24/1994 | US5314783 Photosensitive quinone diazide and resin composition having high absorbency for a wavelength of 365 nm containing a benzotriazole ultraviolet absorbing compound |
| 05/24/1994 | US5314782 Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative |
| 05/24/1994 | US5314772 High resolution, multi-layer resist for microlithography and method therefor |
| 05/24/1994 | US5314770 Multilayer photosensitive films, masking, forming patterns and development then removal of coatings |
| 05/24/1994 | US5314769 Method for producing color filter |
| 05/24/1994 | US5314709 Unzippable polymer mask for screening operations |
| 05/24/1994 | US5314068 Container for a plate-like article |
| 05/24/1994 | CA1329719C Lithographic printing plate and method of treating the same |
| 05/19/1994 | CA2102954A1 Formation of images |
| 05/18/1994 | EP0597100A1 Developing solution and developing method |
| 05/18/1994 | EP0596941A1 Acid-substituted ternary acetal polymers and use thereof in photosensitive compositions and lithographic printing plates. |
| 05/18/1994 | CN1086827A Multiblock copolymers for flexographic printing plates |