Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1994
10/19/1994EP0620464A2 Lens barrel holding apparatus
10/19/1994EP0620201A2 Method of manufacturing mircro-optical elements
10/18/1994US5357312 Illuminating system in exposure apparatus for photolithography
10/18/1994US5357311 Projection type light exposure apparatus and light exposure method
10/18/1994US5357304 Image development apparatus and method
10/18/1994US5357116 Focused ion beam processing with charge control
10/18/1994US5356758 Method and apparatus for positively patterning a surface-sensitive resist on a semiconductor wafer
10/18/1994US5356755 Having specific viscosity, thickness and ultraviolet ray transmittance
10/18/1994US5356754 Curable dry film photoresist blend comprising an acrylated polyether, an unsaturated crosslinking acrylate and a thermoplastic binder; short stripping time; insoluble in stripping liquids; printed circuits
10/18/1994US5356753 Positive resist material
10/18/1994US5356752 Compounds with acid-labile protective groups useful in positive-working radiation-sensitive mixtures
10/18/1994US5356751 Method and product for particle mounting
10/18/1994US5356740 Polyester; high resolution; photoresist, integrated circuit
10/18/1994US5356686 X-ray mask structure
10/18/1994US5355791 All-in-one screen printing machine
10/18/1994CA1332611C Metallocenes and photopolymerisable composition containing same
10/18/1994CA1332528C Photopolymerisable composition
10/13/1994WO1994023343A1 Method and apparatus for process control
10/13/1994WO1994023342A1 Photosensitive composition, photosensitive rubber plate and process for producing the plate, and flexographic plate and process for producing the plate
10/13/1994WO1994023341A1 Reactive microgel, photosensitive resin composition containing the same, and flexographic plate material
10/13/1994WO1994022929A1 Amphoteric copolymer derived from vinylpyridine & acetoxystyrene
10/13/1994DE4412160A1 Exposure method for reducing the distortion in models generated by spatial imaging
10/13/1994DE4411846A1 Process for the production of a fine resist pattern
10/13/1994DE4318663C1 Method for masking and treating a surface of a substrate
10/13/1994CA2159100A1 Method and apparatus for process control
10/13/1994CA2158555A1 Amphoteric copolymer derived from vinylpyridine & acetoxystyrene
10/13/1994CA2120847A1 Photosensitive composition for volume hologram recording
10/12/1994EP0619525A1 A lithographic base and a method for making a lithographic printing plate therewith
10/12/1994EP0619524A1 A lithographic base and a method for making a lithographic printing plate therewith
10/12/1994EP0619523A2 Method for preparing lithographic printing plate
10/12/1994EP0619522A2 Positive photoresist composition containing photoacid generator and use thereof
10/12/1994EP0619521A2 Photopolymerizable printing layer for flexographic printing plates
10/12/1994EP0619520A1 Photopolymerizable composition
10/12/1994EP0619519A1 Photosensitive polycondensation compound for negative lithographic plates
10/12/1994EP0619337A1 Photolabile Polymer with triazene and/or pentazadiene units
10/12/1994EP0619321A1 Very large scale immobilized peptide synthesis
10/12/1994EP0619192A1 Printing plate
10/12/1994EP0619034A1 Selected novolak resins and selected radiation-sensitive compositions
10/12/1994CN1093515A Method of and apparatus for cover sheet removal from laminated boards
10/11/1994US5355219 Gap control apparatus and method utilizing heterodyne signal phase difference detection
10/11/1994US5355194 Optical processing apparatus
10/11/1994US5354977 Optical scanning head
10/11/1994US5354695 Membrane dielectric isolation IC fabrication
10/11/1994US5354645 Process for the production of flexographic printing reliefs
10/11/1994US5354644 Light absorbers for microlithography
10/11/1994US5354643 Reduces solubility in water
10/11/1994US5354632 Lithography using a phase-shifting reticle with reduced transmittance
10/11/1994CA2022026C Method and apparatus for automatically bonding film to a substrate and cutting the film to desired size
10/11/1994CA1332323C Cryogenic process for metal lift off
10/07/1994CA2120404A1 Photosensitive polycondensation compound for negative lithographic plates
10/06/1994DE4411385A1 Processor for the treatment of a presensitised lithographic plate
10/06/1994DE4411176A1 Entwickler für PS-Platten und Ergänzungsflüssigkeiten für Entwickler Developer for PS plates and complement liquids for developer
10/06/1994DE4408236A1 Radiation-hardenable metal naphthenate
10/05/1994EP0618611A2 Method and apparatus for washing substrates
10/05/1994EP0618506A1 Stripping solution for photopolymerised resist stencils
10/05/1994EP0618505A1 Device for exposing to light a double sided circuit board plate through printing plates
10/05/1994EP0618504A2 Method of forming coating film and apparatus therefor
10/05/1994EP0618503A2 Image forming method including heat development while covering surface of light-sensitive material
10/05/1994EP0618502A1 Process for making stepped moulds, stepped moulds and high precision stepped microstructure bodies moulded therewith
10/05/1994EP0617709A1 Metal ion reduction in novolak resins.
10/04/1994US5353323 X-ray exposure apparatus
10/04/1994US5353322 Lens system for X-ray projection lithography camera
10/04/1994US5353166 Mounting system for optical annulus in lens assembly
10/04/1994US5353116 Defect inspection system for phase shift masks
10/04/1994US5353094 Image recording apparatus
10/04/1994US5352564 Copolymer of styrene derivatives, an acid release agent and a dissolution inhibitor containing an unstable acid group
10/04/1994US5352562 Image forming process and light-sensitive image forming material
10/04/1994US5352559 Substrate having one reflective surface and reverse coated with pressure-rupturable capsules containing colorless chromogens for red, green or blue components which will harden when exposed to either direct or reflected light
10/04/1994US5352550 Mask for manufacturing semiconductor devices and method of manufacture thereof
10/04/1994US5352350 Method for controlling chemical species concentration
10/04/1994US5352329 Covering the substrate by rubber membrane, removing exposed coating by contacting with acetic acid solvent, rinsing substrate with acetic acid and water
10/04/1994US5352310 Forming a three-dimensional configuration by irradiating layers of polymer material to form latent image, stacking to form matrix, curing, separating
10/04/1994US5351617 Method for laser-discharge imaging a printing plate
10/04/1994CA1332243C Alkali-soluble organopolysiloxane
10/04/1994CA1332214C Radiation sensitive devices
10/04/1994CA1332213C Pre-imaged high resolution hot stamp transfer foil, article and method
10/04/1994CA1332212C Water-developable photosensitive resin composition, and resin or printing plate therefrom
10/04/1994CA1332211C Volume phase reflection holograms and methods for fabricating them
10/01/1994CA2119821A1 Layer-removal solution for photo-cross-linked photoresist patterns
09/1994
09/29/1994WO1994022057A1 Water-developable photosensitive plates especially suited for commercial flexographic printing
09/29/1994WO1994022053A1 Chemical functionalization of polymers
09/29/1994WO1994022028A1 Method and apparatus for lithographic artifact determination
09/29/1994WO1994021469A1 Seal manufacturing apparatus
09/29/1994DE4410441A1 Positive-working photosensitive composition
09/29/1994CA2158550A1 Chemical functionalization of polymers
09/29/1994CA2135058A1 Seal making device
09/28/1994EP0617569A1 Improved manufacture of printed circuit conductors by a partially additive process
09/28/1994EP0617459A2 Semiconductor wafer cleaning and rinsing techniques
09/28/1994EP0617455A2 Semiconductor device fabrication method
09/28/1994EP0617332A1 Manufacturing process for a lead-frame forming material
09/28/1994EP0617331A1 Light-patternable multilayer element, process for its fabrication and printing form obtained therefrom
09/28/1994EP0617330A1 Diffusion transfer printing plate
09/28/1994EP0617329A1 Method of forming a micro structure and an X-ray mask
09/28/1994EP0616702A1 Aqueous-processable tonable imaging element
09/28/1994EP0616701A1 Photocurable cyclobutarene compositions
09/27/1994US5350924 Ion-optical imaging system
09/27/1994US5350827 Selected structurally defined novolak binder resins and their use in radiation-sensitive compositions
09/27/1994US5350714 Point-of-use purification
09/27/1994US5350663 Construction of electrical circuits and protective or insulating layers for electronic components
09/27/1994US5350662 Maskless process for forming refractory metal layer in via holes of GaAs chips