Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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10/19/1994 | EP0620464A2 Lens barrel holding apparatus |
10/19/1994 | EP0620201A2 Method of manufacturing mircro-optical elements |
10/18/1994 | US5357312 Illuminating system in exposure apparatus for photolithography |
10/18/1994 | US5357311 Projection type light exposure apparatus and light exposure method |
10/18/1994 | US5357304 Image development apparatus and method |
10/18/1994 | US5357116 Focused ion beam processing with charge control |
10/18/1994 | US5356758 Method and apparatus for positively patterning a surface-sensitive resist on a semiconductor wafer |
10/18/1994 | US5356755 Having specific viscosity, thickness and ultraviolet ray transmittance |
10/18/1994 | US5356754 Curable dry film photoresist blend comprising an acrylated polyether, an unsaturated crosslinking acrylate and a thermoplastic binder; short stripping time; insoluble in stripping liquids; printed circuits |
10/18/1994 | US5356753 Positive resist material |
10/18/1994 | US5356752 Compounds with acid-labile protective groups useful in positive-working radiation-sensitive mixtures |
10/18/1994 | US5356751 Method and product for particle mounting |
10/18/1994 | US5356740 Polyester; high resolution; photoresist, integrated circuit |
10/18/1994 | US5356686 X-ray mask structure |
10/18/1994 | US5355791 All-in-one screen printing machine |
10/18/1994 | CA1332611C Metallocenes and photopolymerisable composition containing same |
10/18/1994 | CA1332528C Photopolymerisable composition |
10/13/1994 | WO1994023343A1 Method and apparatus for process control |
10/13/1994 | WO1994023342A1 Photosensitive composition, photosensitive rubber plate and process for producing the plate, and flexographic plate and process for producing the plate |
10/13/1994 | WO1994023341A1 Reactive microgel, photosensitive resin composition containing the same, and flexographic plate material |
10/13/1994 | WO1994022929A1 Amphoteric copolymer derived from vinylpyridine & acetoxystyrene |
10/13/1994 | DE4412160A1 Exposure method for reducing the distortion in models generated by spatial imaging |
10/13/1994 | DE4411846A1 Process for the production of a fine resist pattern |
10/13/1994 | DE4318663C1 Method for masking and treating a surface of a substrate |
10/13/1994 | CA2159100A1 Method and apparatus for process control |
10/13/1994 | CA2158555A1 Amphoteric copolymer derived from vinylpyridine & acetoxystyrene |
10/13/1994 | CA2120847A1 Photosensitive composition for volume hologram recording |
10/12/1994 | EP0619525A1 A lithographic base and a method for making a lithographic printing plate therewith |
10/12/1994 | EP0619524A1 A lithographic base and a method for making a lithographic printing plate therewith |
10/12/1994 | EP0619523A2 Method for preparing lithographic printing plate |
10/12/1994 | EP0619522A2 Positive photoresist composition containing photoacid generator and use thereof |
10/12/1994 | EP0619521A2 Photopolymerizable printing layer for flexographic printing plates |
10/12/1994 | EP0619520A1 Photopolymerizable composition |
10/12/1994 | EP0619519A1 Photosensitive polycondensation compound for negative lithographic plates |
10/12/1994 | EP0619337A1 Photolabile Polymer with triazene and/or pentazadiene units |
10/12/1994 | EP0619321A1 Very large scale immobilized peptide synthesis |
10/12/1994 | EP0619192A1 Printing plate |
10/12/1994 | EP0619034A1 Selected novolak resins and selected radiation-sensitive compositions |
10/12/1994 | CN1093515A Method of and apparatus for cover sheet removal from laminated boards |
10/11/1994 | US5355219 Gap control apparatus and method utilizing heterodyne signal phase difference detection |
10/11/1994 | US5355194 Optical processing apparatus |
10/11/1994 | US5354977 Optical scanning head |
10/11/1994 | US5354695 Membrane dielectric isolation IC fabrication |
10/11/1994 | US5354645 Process for the production of flexographic printing reliefs |
10/11/1994 | US5354644 Light absorbers for microlithography |
10/11/1994 | US5354643 Reduces solubility in water |
10/11/1994 | US5354632 Lithography using a phase-shifting reticle with reduced transmittance |
10/11/1994 | CA2022026C Method and apparatus for automatically bonding film to a substrate and cutting the film to desired size |
10/11/1994 | CA1332323C Cryogenic process for metal lift off |
10/07/1994 | CA2120404A1 Photosensitive polycondensation compound for negative lithographic plates |
10/06/1994 | DE4411385A1 Processor for the treatment of a presensitised lithographic plate |
10/06/1994 | DE4411176A1 Entwickler für PS-Platten und Ergänzungsflüssigkeiten für Entwickler Developer for PS plates and complement liquids for developer |
10/06/1994 | DE4408236A1 Radiation-hardenable metal naphthenate |
10/05/1994 | EP0618611A2 Method and apparatus for washing substrates |
10/05/1994 | EP0618506A1 Stripping solution for photopolymerised resist stencils |
10/05/1994 | EP0618505A1 Device for exposing to light a double sided circuit board plate through printing plates |
10/05/1994 | EP0618504A2 Method of forming coating film and apparatus therefor |
10/05/1994 | EP0618503A2 Image forming method including heat development while covering surface of light-sensitive material |
10/05/1994 | EP0618502A1 Process for making stepped moulds, stepped moulds and high precision stepped microstructure bodies moulded therewith |
10/05/1994 | EP0617709A1 Metal ion reduction in novolak resins. |
10/04/1994 | US5353323 X-ray exposure apparatus |
10/04/1994 | US5353322 Lens system for X-ray projection lithography camera |
10/04/1994 | US5353166 Mounting system for optical annulus in lens assembly |
10/04/1994 | US5353116 Defect inspection system for phase shift masks |
10/04/1994 | US5353094 Image recording apparatus |
10/04/1994 | US5352564 Copolymer of styrene derivatives, an acid release agent and a dissolution inhibitor containing an unstable acid group |
10/04/1994 | US5352562 Image forming process and light-sensitive image forming material |
10/04/1994 | US5352559 Substrate having one reflective surface and reverse coated with pressure-rupturable capsules containing colorless chromogens for red, green or blue components which will harden when exposed to either direct or reflected light |
10/04/1994 | US5352550 Mask for manufacturing semiconductor devices and method of manufacture thereof |
10/04/1994 | US5352350 Method for controlling chemical species concentration |
10/04/1994 | US5352329 Covering the substrate by rubber membrane, removing exposed coating by contacting with acetic acid solvent, rinsing substrate with acetic acid and water |
10/04/1994 | US5352310 Forming a three-dimensional configuration by irradiating layers of polymer material to form latent image, stacking to form matrix, curing, separating |
10/04/1994 | US5351617 Method for laser-discharge imaging a printing plate |
10/04/1994 | CA1332243C Alkali-soluble organopolysiloxane |
10/04/1994 | CA1332214C Radiation sensitive devices |
10/04/1994 | CA1332213C Pre-imaged high resolution hot stamp transfer foil, article and method |
10/04/1994 | CA1332212C Water-developable photosensitive resin composition, and resin or printing plate therefrom |
10/04/1994 | CA1332211C Volume phase reflection holograms and methods for fabricating them |
10/01/1994 | CA2119821A1 Layer-removal solution for photo-cross-linked photoresist patterns |
09/29/1994 | WO1994022057A1 Water-developable photosensitive plates especially suited for commercial flexographic printing |
09/29/1994 | WO1994022053A1 Chemical functionalization of polymers |
09/29/1994 | WO1994022028A1 Method and apparatus for lithographic artifact determination |
09/29/1994 | WO1994021469A1 Seal manufacturing apparatus |
09/29/1994 | DE4410441A1 Positive-working photosensitive composition |
09/29/1994 | CA2158550A1 Chemical functionalization of polymers |
09/29/1994 | CA2135058A1 Seal making device |
09/28/1994 | EP0617569A1 Improved manufacture of printed circuit conductors by a partially additive process |
09/28/1994 | EP0617459A2 Semiconductor wafer cleaning and rinsing techniques |
09/28/1994 | EP0617455A2 Semiconductor device fabrication method |
09/28/1994 | EP0617332A1 Manufacturing process for a lead-frame forming material |
09/28/1994 | EP0617331A1 Light-patternable multilayer element, process for its fabrication and printing form obtained therefrom |
09/28/1994 | EP0617330A1 Diffusion transfer printing plate |
09/28/1994 | EP0617329A1 Method of forming a micro structure and an X-ray mask |
09/28/1994 | EP0616702A1 Aqueous-processable tonable imaging element |
09/28/1994 | EP0616701A1 Photocurable cyclobutarene compositions |
09/27/1994 | US5350924 Ion-optical imaging system |
09/27/1994 | US5350827 Selected structurally defined novolak binder resins and their use in radiation-sensitive compositions |
09/27/1994 | US5350714 Point-of-use purification |
09/27/1994 | US5350663 Construction of electrical circuits and protective or insulating layers for electronic components |
09/27/1994 | US5350662 Maskless process for forming refractory metal layer in via holes of GaAs chips |