Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1993
10/19/1993US5254811 Hybrid microchip bonding article
10/19/1993US5254655 Organosilicon polymers, and dyes, exhibiting nonlinear optical response
10/19/1993US5254440 Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions and processes of forming resist images
10/19/1993US5254439 Light-sensitive polymer, method for preparing the same and method for forming patterns
10/19/1993US5254437 Photosensitive resin composition for flexographic printing
10/19/1993US5254435 Method of patterning resist
10/19/1993US5254434 Method of forming thermal transfer dye images
10/19/1993US5254432 Photosensitive composition
10/19/1993US5254431 Radiation-sensitive polymers having sulfonyl urthane side chains and azide containing side chains in a mixture with diazo compounds containing
10/19/1993US5254430 Lithographic printing plates
10/19/1993US5254429 Photopolymerizable coating composition and lithographic printing plate produced therefrom
10/19/1993US5254428 Uniform particle size
10/19/1993US5254375 Apparatus for controllably separating framed working area from remainder of the membrane
10/19/1993US5254367 Coating method and apparatus
10/19/1993US5254165 Image forming apparatus
10/19/1993CA1323463C Polymeric or polymerisable aromatic-aliphatic ketones suitable for use as polymerisation photoinitiators
10/14/1993WO1993020482A1 Method for forming a lithographic pattern in a process for manufacturing semiconductor devices
10/14/1993WO1993020481A1 Production of 2d-arrays
10/14/1993DE4243912A1 Light sensitive transfer material - has thermoplastic resin as release coat between temporary film base and intermediate coat, to prevent flaws and soiling on laminating light-sensitive resin coat to permanent substrate
10/14/1993DE4212081A1 Stabilising colour change in presensitised offset printing plate prodn. - from negative working compsn. contg. diazonium resin, binder and colour change system by drying to specified di:acetone alcohol content
10/14/1993DE4211934A1 Aq. alkaline developer soln. for offset printing plate - contg. silane cpd. with carboxylic acid or anhydride or sulphonic or phosphonic acid or acid halide gp. to maximise developer life
10/14/1993DE4211128A1 Transfer of image information of image original on to photo sensitive material - using light source transmitting light in direction of material and copy original which has transmission different from zero also objective
10/14/1993CA2132005A1 Method for improved lithographic patterning in a semiconductor fabrication process
10/13/1993EP0565488A1 Fluorine free titanocenes and their application
10/13/1993EP0565403A1 Silica/acrylation dispersions, method for producing them, their use in stereophotolithography and method for preparing articles made of resin
10/13/1993EP0565233A1 Photosensitive laminate having dual intermediate layers
10/13/1993EP0565030A1 Apparatur for treatment of special waste
10/13/1993EP0565006A2 Method for preparing PS plate
10/13/1993EP0564997A2 Positive photoresist composition
10/13/1993EP0564918A2 Light-curable elastomeric mixture and recording material for flexographic printing plates obtained therefrom
10/13/1993EP0564917A2 Light-curable elastomeric mixture and recording material for flexographic printing plates obtained therefrom
10/13/1993CN2143787Y Cold light source blue-printing machine
10/12/1993US5253177 Photo-solidification modeling device
10/12/1993US5253110 Illumination optical arrangement
10/12/1993US5253040 Projection aligner
10/12/1993US5253012 Substrate holding apparatus for vertically holding a substrate in an exposure apparatus
10/12/1993US5253006 Moving-unit type developing method and a moving-unit type developing apparatus
10/12/1993US5252835 Machining oxide thin-films with an atomic force microscope: pattern and object formation on the nanometer scale
10/12/1993US5252691 P-vinylphenoxydimethylphenylcarbyldimethylsilane homopolymer
10/12/1993US5252686 Siloxane polymers and positive working light-sensitive compositions comprising the same
10/12/1993US5252436 Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds
10/12/1993US5252435 Method for forming pattern
10/12/1993US5252434 Method for forming a sloped surface having a predetermined slope
10/12/1993US5252433 Method of forming and removing resist pattern
10/12/1993US5252432 Production of photopolymeric flexographic relief printing plates
10/12/1993US5252431 Light sensitive layer and silicone rubber layer; spraying pressurized liquid on the surface to remove the rubber layer
10/12/1993US5252430 Fine pattern forming method
10/12/1993US5252429 Process of color development using pearlescent toners having reduced stain characteristics
10/12/1993US5252428 Photoresin relief printing plate
10/12/1993US5252427 Positive photoresist compositions
10/12/1993US5252425 Hard copy imaging system
10/12/1993US5252423 Light-sensitive material containing silver halide reducing agent, polymerizable compound, color image forming substance, base precursor and polar compound
10/12/1993US5252414 Evaluation method of resist coating
10/12/1993US5252225 Method for precipitating an organic resin from an alkaline solution thereof
10/12/1993US5252137 System and method for applying a liquid
10/12/1993US5252134 Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing
10/11/1993CA2093405A1 Apparatus for reprocessing special waste
10/11/1993CA2092783A1 Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same
10/11/1993CA2092774A1 Positive photoresist composition
10/10/1993CA2093611A1 Fluorine-free titanocenes and the use thereof
10/09/1993CA2092244A1 Silicon-acrylic dispersions, process for obtaining them, their application in stereophotolithography and process for the preparation of resin objects
10/07/1993DE4310940A1 Light-sensitive transfer sheet for use in printing - using 4,6-bis(tri:halo:methyl)-s-triazin-2-yl photopolymerisation initiator to prevent yellowing in non-image regions
10/07/1993DE4210696A1 Printing pattern - is formed by projecting an image on an ink layer on a base which hardens in light of a given wavelength
10/06/1993EP0564438A1 Particle imaging system, in particular ion optical imaging system
10/06/1993EP0564405A1 Phenylacetic acid esters and their applications
10/06/1993EP0564389A1 Stabilized chemically amplified positive resist composition containing glycol ether polymers
10/06/1993EP0564364A2 Method for selectively exposing an uneven substrate surface
10/06/1993EP0564264A1 Illumination device for projection exposure apparatus
10/06/1993EP0564255A2 Stage device and pattern transfer system using the same
10/06/1993EP0564237A2 Preparation of color filter and photo-setting resin therefor
10/06/1993EP0564168A2 Pigment-dispersed color-filter composition
10/06/1993EP0564020A1 A lithographic printing plate according to the silver salt diffusion transfer process
10/06/1993EP0563990A1 Light-sensitive composition
10/06/1993EP0563925A1 Photopolymerizable composition
10/06/1993EP0563861A1 Device and method for feeding a sheet
10/06/1993EP0563703A1 Photosensitive element having support with adjustable adhesion
10/06/1993EP0563663A1 1,2-naphtoquinone-2-diazidesulfonic acid esters, a radiation-sensitive composition produced therewith and a radiation-sensitive recording material
10/06/1993EP0563605A1 Method for the production of microstructures
10/06/1993EP0563271A1 Uv/eb curable butyl copolymers for coating applications
10/06/1993EP0563251A1 Uv/eb curable butyl copolymers for lithographic and corrosion-resistant coating applications
10/06/1993EP0563247A1 Photodefinable interlevel dielectrics
10/06/1993EP0563156A1 Planographic printing plate precursor
10/06/1993EP0563102A1 Process and device for producing a three-dimensional object.
10/06/1993CN1022305C Printing method and printed product
10/05/1993US5251071 Color filter
10/05/1993US5251070 Catadioptric reduction projection optical system
10/05/1993US5251067 Fly-eye lens device and lighting system including same
10/05/1993US5250983 Photo reticle for fabricating a semiconductor device
10/05/1993US5250797 Exposure method and apparatus for controlling light pulse emission using determined exposure quantities and control parameters
10/05/1993US5250669 Thermostability, photoresists
10/05/1993US5250653 Positive-working photoresists
10/05/1993US5250395 Coating substrate with film of blocked polymer and aromatic dye, exposing to electromagnetic radiation, contacting with organometallic compound to form etch barrier, etching with reactive ions
10/05/1993US5250393 Containing diazo resin and alkali metal or ammonium silicate
10/05/1993US5250392 Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye
10/05/1993US5250391 Forms moisture resistant polymer
10/05/1993US5250390 Block polymer having hydrophilic rigid and hydrophobic flexible segments and a photopolymerizable unsaturated compound; resistance to water-dilutable printing inks
10/05/1993US5250389 Photosensitive elastomer composition
10/05/1993US5250388 Doping selected regions, irradiating to stabilize dopant; prevents oxygen-caused deterioration
10/05/1993US5250387 Transfer process using ultraviolet curable, non-prolonged tack toning materials
10/05/1993US5250385 Photosensitivity, storage stability