Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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10/19/1993 | US5254811 Hybrid microchip bonding article |
10/19/1993 | US5254655 Organosilicon polymers, and dyes, exhibiting nonlinear optical response |
10/19/1993 | US5254440 Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions and processes of forming resist images |
10/19/1993 | US5254439 Light-sensitive polymer, method for preparing the same and method for forming patterns |
10/19/1993 | US5254437 Photosensitive resin composition for flexographic printing |
10/19/1993 | US5254435 Method of patterning resist |
10/19/1993 | US5254434 Method of forming thermal transfer dye images |
10/19/1993 | US5254432 Photosensitive composition |
10/19/1993 | US5254431 Radiation-sensitive polymers having sulfonyl urthane side chains and azide containing side chains in a mixture with diazo compounds containing |
10/19/1993 | US5254430 Lithographic printing plates |
10/19/1993 | US5254429 Photopolymerizable coating composition and lithographic printing plate produced therefrom |
10/19/1993 | US5254428 Uniform particle size |
10/19/1993 | US5254375 Apparatus for controllably separating framed working area from remainder of the membrane |
10/19/1993 | US5254367 Coating method and apparatus |
10/19/1993 | US5254165 Image forming apparatus |
10/19/1993 | CA1323463C Polymeric or polymerisable aromatic-aliphatic ketones suitable for use as polymerisation photoinitiators |
10/14/1993 | WO1993020482A1 Method for forming a lithographic pattern in a process for manufacturing semiconductor devices |
10/14/1993 | WO1993020481A1 Production of 2d-arrays |
10/14/1993 | DE4243912A1 Light sensitive transfer material - has thermoplastic resin as release coat between temporary film base and intermediate coat, to prevent flaws and soiling on laminating light-sensitive resin coat to permanent substrate |
10/14/1993 | DE4212081A1 Stabilising colour change in presensitised offset printing plate prodn. - from negative working compsn. contg. diazonium resin, binder and colour change system by drying to specified di:acetone alcohol content |
10/14/1993 | DE4211934A1 Aq. alkaline developer soln. for offset printing plate - contg. silane cpd. with carboxylic acid or anhydride or sulphonic or phosphonic acid or acid halide gp. to maximise developer life |
10/14/1993 | DE4211128A1 Transfer of image information of image original on to photo sensitive material - using light source transmitting light in direction of material and copy original which has transmission different from zero also objective |
10/14/1993 | CA2132005A1 Method for improved lithographic patterning in a semiconductor fabrication process |
10/13/1993 | EP0565488A1 Fluorine free titanocenes and their application |
10/13/1993 | EP0565403A1 Silica/acrylation dispersions, method for producing them, their use in stereophotolithography and method for preparing articles made of resin |
10/13/1993 | EP0565233A1 Photosensitive laminate having dual intermediate layers |
10/13/1993 | EP0565030A1 Apparatur for treatment of special waste |
10/13/1993 | EP0565006A2 Method for preparing PS plate |
10/13/1993 | EP0564997A2 Positive photoresist composition |
10/13/1993 | EP0564918A2 Light-curable elastomeric mixture and recording material for flexographic printing plates obtained therefrom |
10/13/1993 | EP0564917A2 Light-curable elastomeric mixture and recording material for flexographic printing plates obtained therefrom |
10/13/1993 | CN2143787Y Cold light source blue-printing machine |
10/12/1993 | US5253177 Photo-solidification modeling device |
10/12/1993 | US5253110 Illumination optical arrangement |
10/12/1993 | US5253040 Projection aligner |
10/12/1993 | US5253012 Substrate holding apparatus for vertically holding a substrate in an exposure apparatus |
10/12/1993 | US5253006 Moving-unit type developing method and a moving-unit type developing apparatus |
10/12/1993 | US5252835 Machining oxide thin-films with an atomic force microscope: pattern and object formation on the nanometer scale |
10/12/1993 | US5252691 P-vinylphenoxydimethylphenylcarbyldimethylsilane homopolymer |
10/12/1993 | US5252686 Siloxane polymers and positive working light-sensitive compositions comprising the same |
10/12/1993 | US5252436 Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds |
10/12/1993 | US5252435 Method for forming pattern |
10/12/1993 | US5252434 Method for forming a sloped surface having a predetermined slope |
10/12/1993 | US5252433 Method of forming and removing resist pattern |
10/12/1993 | US5252432 Production of photopolymeric flexographic relief printing plates |
10/12/1993 | US5252431 Light sensitive layer and silicone rubber layer; spraying pressurized liquid on the surface to remove the rubber layer |
10/12/1993 | US5252430 Fine pattern forming method |
10/12/1993 | US5252429 Process of color development using pearlescent toners having reduced stain characteristics |
10/12/1993 | US5252428 Photoresin relief printing plate |
10/12/1993 | US5252427 Positive photoresist compositions |
10/12/1993 | US5252425 Hard copy imaging system |
10/12/1993 | US5252423 Light-sensitive material containing silver halide reducing agent, polymerizable compound, color image forming substance, base precursor and polar compound |
10/12/1993 | US5252414 Evaluation method of resist coating |
10/12/1993 | US5252225 Method for precipitating an organic resin from an alkaline solution thereof |
10/12/1993 | US5252137 System and method for applying a liquid |
10/12/1993 | US5252134 Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing |
10/11/1993 | CA2093405A1 Apparatus for reprocessing special waste |
10/11/1993 | CA2092783A1 Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same |
10/11/1993 | CA2092774A1 Positive photoresist composition |
10/10/1993 | CA2093611A1 Fluorine-free titanocenes and the use thereof |
10/09/1993 | CA2092244A1 Silicon-acrylic dispersions, process for obtaining them, their application in stereophotolithography and process for the preparation of resin objects |
10/07/1993 | DE4310940A1 Light-sensitive transfer sheet for use in printing - using 4,6-bis(tri:halo:methyl)-s-triazin-2-yl photopolymerisation initiator to prevent yellowing in non-image regions |
10/07/1993 | DE4210696A1 Printing pattern - is formed by projecting an image on an ink layer on a base which hardens in light of a given wavelength |
10/06/1993 | EP0564438A1 Particle imaging system, in particular ion optical imaging system |
10/06/1993 | EP0564405A1 Phenylacetic acid esters and their applications |
10/06/1993 | EP0564389A1 Stabilized chemically amplified positive resist composition containing glycol ether polymers |
10/06/1993 | EP0564364A2 Method for selectively exposing an uneven substrate surface |
10/06/1993 | EP0564264A1 Illumination device for projection exposure apparatus |
10/06/1993 | EP0564255A2 Stage device and pattern transfer system using the same |
10/06/1993 | EP0564237A2 Preparation of color filter and photo-setting resin therefor |
10/06/1993 | EP0564168A2 Pigment-dispersed color-filter composition |
10/06/1993 | EP0564020A1 A lithographic printing plate according to the silver salt diffusion transfer process |
10/06/1993 | EP0563990A1 Light-sensitive composition |
10/06/1993 | EP0563925A1 Photopolymerizable composition |
10/06/1993 | EP0563861A1 Device and method for feeding a sheet |
10/06/1993 | EP0563703A1 Photosensitive element having support with adjustable adhesion |
10/06/1993 | EP0563663A1 1,2-naphtoquinone-2-diazidesulfonic acid esters, a radiation-sensitive composition produced therewith and a radiation-sensitive recording material |
10/06/1993 | EP0563605A1 Method for the production of microstructures |
10/06/1993 | EP0563271A1 Uv/eb curable butyl copolymers for coating applications |
10/06/1993 | EP0563251A1 Uv/eb curable butyl copolymers for lithographic and corrosion-resistant coating applications |
10/06/1993 | EP0563247A1 Photodefinable interlevel dielectrics |
10/06/1993 | EP0563156A1 Planographic printing plate precursor |
10/06/1993 | EP0563102A1 Process and device for producing a three-dimensional object. |
10/06/1993 | CN1022305C Printing method and printed product |
10/05/1993 | US5251071 Color filter |
10/05/1993 | US5251070 Catadioptric reduction projection optical system |
10/05/1993 | US5251067 Fly-eye lens device and lighting system including same |
10/05/1993 | US5250983 Photo reticle for fabricating a semiconductor device |
10/05/1993 | US5250797 Exposure method and apparatus for controlling light pulse emission using determined exposure quantities and control parameters |
10/05/1993 | US5250669 Thermostability, photoresists |
10/05/1993 | US5250653 Positive-working photoresists |
10/05/1993 | US5250395 Coating substrate with film of blocked polymer and aromatic dye, exposing to electromagnetic radiation, contacting with organometallic compound to form etch barrier, etching with reactive ions |
10/05/1993 | US5250393 Containing diazo resin and alkali metal or ammonium silicate |
10/05/1993 | US5250392 Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye |
10/05/1993 | US5250391 Forms moisture resistant polymer |
10/05/1993 | US5250390 Block polymer having hydrophilic rigid and hydrophobic flexible segments and a photopolymerizable unsaturated compound; resistance to water-dilutable printing inks |
10/05/1993 | US5250389 Photosensitive elastomer composition |
10/05/1993 | US5250388 Doping selected regions, irradiating to stabilize dopant; prevents oxygen-caused deterioration |
10/05/1993 | US5250387 Transfer process using ultraviolet curable, non-prolonged tack toning materials |
10/05/1993 | US5250385 Photosensitivity, storage stability |