G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1994
11/10/1994	WO1994025496A1 High purity thiol-ene composition
11/10/1994	WO1994025282A1 Laser-induced thermal transfer process
11/10/1994	WO1994025276A1 Printing screen and method for printing a variable thickness pattern
11/10/1994	CA2159733A1 Partially polymerized resins
11/09/1994	EP0623945A2 Discharge lamp
11/09/1994	EP0623908A1 Individual identification label
11/09/1994	EP0623854A1 Apparatus for developing a printing plate
11/09/1994	EP0623853A1 Single step developable negative working and positive working printing plate and imaging process
11/09/1994	EP0623852A1 Resist compositions for circuit boards
11/09/1994	EP0623633A2 High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions
11/09/1994	EP0623440A1 Method of providing a patterned relief of cured photoresist on a flat substrate surface and device for carrying out such a method
11/09/1994	CN1094827A Two-fale register exposing apparatus
11/08/1994	US5363196 Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage
11/08/1994	US5363172 Method of projection exposure and stepper
11/08/1994	US5363171 Photolithography exposure tool and method for in situ photoresist measurments and exposure control
11/08/1994	US5363170 Illumination device and projection exposure apparatus using the same
11/08/1994	US5362874 Storage stability, discoloration inhibition
11/08/1994	US5362812 Photoresists
11/08/1994	US5362806 Toughened photocurable polymer composition for processible flexographic printing plates
11/08/1994	US5362608 Microlithographic substrate cleaning and compositions therefor
11/08/1994	US5362607 Method for making a patterned resist substrate composite
11/08/1994	US5362606 Positive resist pattern formation through focused ion beam exposure and surface barrier silylation
11/08/1994	US5362605 Blending a urethane acrylate or methacrylate prepolymer with a complexing polymer based on polyvinyl pyrrolidone; improved dimensional stability
11/08/1994	US5362604 Photosensitive resin composition and process for the production thereof, and virgin flexographic printing plate
11/08/1994	US5362603 Photopolymerizable composition for color filter and color filter prepared therefrom
11/08/1994	US5362602 Method of making lithographic aluminum offset printing plates
11/08/1994	US5362600 Radiation sensitive compositions comprising polymer having acid labile groups
11/08/1994	US5362599 Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
11/08/1994	US5362598 Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye
11/08/1994	US5362597 Lenses
11/08/1994	US5362585 Forming an array of latent images in a resist and analyzing scattered light from edges to provide information on correct exposure, focus and lens characteristics
11/08/1994	US5362584 Phase-shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas
11/08/1994	US5362583 Reticle mask exposure method comprising blank to remove incomplete circuits
11/08/1994	US5362536 Exposure to a thermally-generated acid becomes an absorption dye; light reflecting layer
11/08/1994	CA1332952C Titanocenes and a radiation-polymerizable composition containing these titanocenes
11/08/1994	CA1332951C Titanocenes, the use thereof, and n-substituted fluoranilines
11/08/1994	CA1332950C Titanocenes and their use
11/08/1994	CA1332949C Titanocenes and their use
11/06/1994	CA2122804A1 Single step developable negative working and positive working printing plate and imaging process
11/02/1994	EP0622683A1 Resist structures having through holes with shaped wall profiles and fabrication thereof
11/02/1994	EP0622682A1 Photosensitive resin composition
11/02/1994	EP0621963A1 Visible and ultraviolet irradiation photosensitive system for film-forming pigmented photo-crosslinkable compositions
11/02/1994	EP0621828A1 Granulates for offset printing
11/01/1994	US5361292 Condenser for illuminating a ring field
11/01/1994	US5361122 Autofocusing device and projection exposure apparatus with the same
11/01/1994	US5361121 Periphery exposing method and apparatus therefor
11/01/1994	US5360873 Actinic radiation-reactive pressure-sensitive adhesive composition
11/01/1994	US5360864 Process for preparation of photosensitive composition
11/01/1994	US5360860 Photosensitive
11/01/1994	US5360764 Method of fabricating laser controlled nanolithography
11/01/1994	US5360698 Deep UV lift-off resist process
11/01/1994	US5360697 Multilayer element with dielectric layer on silicon and barriers, photoresists and developers, plasma etching and removal of layers
11/01/1994	US5360696 Resist composition
11/01/1994	US5360693 Positive o-quinone diazide photoresist containing base copolymer utilizing monomer having anhydride function and further monomer that increases etch resistance
11/01/1994	US5360692 Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent
11/01/1994	US5360508 Applying apparatus
11/01/1994	US5359928 Method for preparing and using a screen printing stencil having raised edges
11/01/1994	CA1332796C Photopolymerizable compositions and elements for refractive index imaging
10/1994
10/27/1994	WO1994024611A1 On axis mask and wafer alignment system
10/27/1994	WO1994024610A1 High resolution mask programmable via selected by low resolution photomasking
10/27/1994	WO1994024609A2 Photocurable compositions
10/27/1994	WO1994024170A1 Compositions of matter
10/27/1994	WO1994023854A1 Removal of surface contaminants by irradiation
10/27/1994	DE4313111A1 Method for producing a printing original, in particular a printing form of a printing machine
10/27/1994	DE4312812A1 Process and arrangement for determining the end point of silylation processes of exposed varnishes for masks
10/27/1994	CA2160255A1 Removal of surface contaminants by irradiation
10/26/1994	EP0621509A1 Radiation sensitive resin composition
10/26/1994	EP0621508A1 Radiation sensitive resin composition
10/26/1994	EP0621322A1 Reactive polymeric dyes
10/26/1994	EP0620931A1 Improved mask for photolithography
10/26/1994	EP0620930A1 Method and device for coating circuit boards.
10/26/1994	CN2181015Y Flow-division type pressure scraper for heavy nitrogen duplicator
10/25/1994	US5359454 Apparatus for providing autostereoscopic and dynamic images
10/25/1994	US5359407 Optical scanning apparatus, surface-state inspection apparatus and exposure apparatus
10/25/1994	US5359389 Exposure apparatus including two illuminating systems and exposure process using the same
10/25/1994	US5359388 Microlithographic projection system
10/25/1994	US5359202 Electron beam exposure apparatus employing blanking aperture array
10/25/1994	US5359201 Aftertreatment apparatus for imagewise exposed printing plates
10/25/1994	US5359101 Acrylate polymers with strong electron withdrawing groups
10/25/1994	US5358999 Process for preparation of photosensitive compositions of stilbazolium quaternary
10/25/1994	US5358987 Polysilane compositions
10/25/1994	US5358834 Photographic element provided with a backing layer
10/25/1994	US5358827 Using an optical focusing system having a lateral magnification that focuses radiation
10/25/1994	US5358825 Contacting copper surface with n-heterocycle compound, which coordinates to surface and reacts with epoxy resists to prevent peeling
10/25/1994	US5358824 Photosensitive resin composition utilizing 1,2-naphthoquinone diazide compound having spirobichroman or spirobiindane ring
10/25/1994	US5358823 Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone
10/25/1994	US5358809 Methods of fabricating thin film structures by imaging through the substrate in different directions
10/25/1994	US5358807 Improved resolution
10/25/1994	US5358604 Method for producing conductive patterns
10/25/1994	US5358591 Method of and apparatus for cover sheet removal from laminated boards
10/25/1994	CA1332721C Method of making patterns
10/20/1994	DE4403741A1 Close exposure process, and apparatus therefor
10/19/1994	EP0620703A1 Resin compositions and printed circuit boards using the same
10/19/1994	EP0620674A1 Method for making a lithographic printing plate
10/19/1994	EP0620673A1 Method for making a lithographic printing plate
10/19/1994	EP0620502A1 A lithographic base and a method for making a lithographic printing plate therewith
10/19/1994	EP0620501A2 Photosensitive composition for volume hologram recording
10/19/1994	EP0620500A2 Resist and pattern formation using the same
10/19/1994	EP0620499A1 Photopolymerisable material and process for making colour image
10/19/1994	EP0620498A1 Phase-shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas

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