Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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12/14/1993 | US5270079 Methods of meniscus coating |
12/14/1993 | US5270078 Method for preparing high resolution wash-off images |
12/14/1993 | US5269882 Method and apparatus for fabrication of thin film semiconductor devices using non-planar, exposure beam lithography |
12/14/1993 | US5269873 Apparatus for peeling-off a film laminated on a carrier material |
12/09/1993 | WO1993024860A1 Composition for forming anti-reflection film on resist and pattern formation method |
12/09/1993 | WO1993024327A1 A method and an apparatus for illuminating points on a medium |
12/09/1993 | WO1993024326A1 A method and a device for retaining a thin medium between two bodies |
12/09/1993 | DE4316114A1 X=ray beam mask used in X=ray lithography - comprises absorber contg. bismuth, titanium and nitrogen, and has amorphous structure |
12/08/1993 | EP0573365A2 Flexographic printing plates having vanadium oxide antistatic coatings |
12/08/1993 | EP0573299A1 Position detection method using an optical interference signal and electronic filtering of this signal in the spatial frequency domain |
12/08/1993 | EP0573281A2 Oblique illumination of a mask using a spatial filter with at least one extending parallel to the mask pattern |
12/08/1993 | EP0573280A2 Television signal processing circuit |
12/08/1993 | EP0573220A2 Dyed i-line positive-working radiation sensitive mixtures |
12/08/1993 | EP0573212A2 Method of etching anti-reflection coating |
12/08/1993 | EP0573056A2 Positive resist composition |
12/08/1993 | EP0573053A1 Photo-curable and thermosetting coating composition and method for formation of solder resist pattern |
12/08/1993 | EP0573031A2 Method for forming patterned solder mask |
12/08/1993 | EP0573023A1 Method for manufacturing liquid jet recording head |
12/08/1993 | EP0572948A1 Ink jet recording head, fabrication method thereof, and printer with ink jet recording head |
12/08/1993 | EP0572672A1 Process for manufacturing multicolor display |
12/08/1993 | EP0572507A1 Laser image setter. |
12/07/1993 | US5268951 X-ray beam scanning method for producing low distortion or constant distortion in x-ray proximity printing |
12/07/1993 | US5268742 Optical metrology apparatus for examining a surface |
12/07/1993 | US5268260 Photoresist develop and strip solvent compositions and method for their use |
12/07/1993 | US5268259 Coated with light sensitive photoresist; patterning |
12/07/1993 | US5268257 Containing unsaturated conjugated monomer and unsaturated acid |
12/07/1993 | US5268256 Photosensitive ionic polymer and polyethersiloxane copolymer |
12/07/1993 | US5268255 Photo-setting resist composition, a process for producing a printed circuit board by using the composition, and a printed circuit board obtained by using the composition |
12/07/1993 | US5268253 Lithographic printing plate according to the silver salt diffusion transfer process |
12/07/1993 | US5268252 Polyol with o-naphthoquinone-2-diazide-4-sulfonic acid |
12/07/1993 | US5268245 Process for forming a filter on a solid state imager |
12/07/1993 | US5268056 Plasma surface treating method and apparatus |
12/07/1993 | US5267825 Carrier device |
12/05/1993 | CA2096214A1 Positive resist composition |
12/02/1993 | DE4317378A1 Photocopying material with photo-oxidant and leuco dyestuff - which is 6-amino-2-di:phenyl-amino-9-phenyl-xanthene cpd. in microcapsules and reducing agent, giving stable dense black image and min. fog |
12/02/1993 | DE4317236A1 Forming structured patterns on semiconductor substrates - by forming chemically-enhanced resist layer and then outer resist layer to protect the first layer from the atmos. after exposure |
12/01/1993 | EP0572348A1 Apparatus for exposing and developing light-sensitive material |
12/01/1993 | EP0572342A1 Automised process for the production of flexible printing plates and apparatus therefor |
12/01/1993 | EP0572089A2 Method of manufacturing a top coat |
12/01/1993 | EP0571989A2 Positive resist composition |
12/01/1993 | EP0571988A2 Positive resist composition |
12/01/1993 | EP0571929A2 Dummy diffraction mask |
12/01/1993 | EP0571899A1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures |
12/01/1993 | EP0571756A2 High density, three-dimensional, intercoupled circuit structure |
12/01/1993 | EP0571625A1 Color filter and method of manufacturing the same |
11/30/1993 | US5267292 X-ray exposure apparatus |
11/30/1993 | US5267013 Apparatus and method for profiling a beam |
11/30/1993 | US5266790 Focusing technique suitable for use with an unpatterned specular substrate |
11/30/1993 | US5266445 Method of selectively irradiating a resist layer using radiation pulses |
11/30/1993 | US5266444 Method and composition for obtaining image reversal in epoxy formulations based upon photoinhibition |
11/30/1993 | US5266443 Presensitized plates for lithography not requiring dampening with water |
11/30/1993 | US5266441 Heat diffusible coloring compound, polymerizable binder |
11/30/1993 | US5266440 Photoresist composition with aromatic novolak binder having a weight-average molecular weight in excess of 1500 Daltons |
11/30/1993 | US5266427 Photopolymerized resin picture layer, automobile speedometer |
11/30/1993 | US5266426 Multilayer plate formed by exposure and development of photosensitive resin |
11/30/1993 | US5266424 Method of forming pattern and method of manufacturing photomask using such method |
11/30/1993 | US5266157 Dry etching method |
11/30/1993 | CA2021612C Contact printing process |
11/30/1993 | CA1324803C Printing method and printed product |
11/28/1993 | CA2097038A1 Photopolymerizable mixture and recording material prepared therefrom |
11/28/1993 | CA2096317A1 Positive resist composition |
11/28/1993 | CA2096213A1 Positive resist composition |
11/25/1993 | WO1993023794A1 Organometallic monomers and polymers with improved adhesion |
11/25/1993 | WO1993023154A1 Inorganic membrane for microfiltration, and a process for production of such an inorganic membrane |
11/25/1993 | WO1993019398A3 Composition for removing adhesives from polymeric film and process for using same |
11/25/1993 | DE4228790C1 Tonbares strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Mehrfarbenbildern mittels solch eines Gemischs Tonable, photosensitive composition and process for preparing multi-color images by means of such a mixture |
11/25/1993 | DE4223616C1 Mfr. of hollow microstructures closed on one side by means of a membrane - by galvanic deposition into a resist structure on a thin layer carried by a substrate |
11/24/1993 | EP0571330A1 High-resolution photoresist with enhanced sensitivity for I-line exposure |
11/24/1993 | EP0571149A2 Imagesetter |
11/24/1993 | EP0570894A1 Short-wavelength-absorbing polysilane |
11/24/1993 | EP0570884A2 Positive resist composition |
11/24/1993 | EP0570815A2 Method for producing a multicoloured image and photosensitive material for implementing this method |
11/24/1993 | EP0570609A1 Process for producing multistep structure in a substrate |
11/24/1993 | EP0570461A1 Pre-bake printing plate composition |
11/24/1993 | EP0349532B1 Thermal imaging medium |
11/23/1993 | US5264898 Projection exposure apparatus |
11/23/1993 | US5264329 Radiation sensitive compositions |
11/23/1993 | US5264328 Masking and development of patterns |
11/23/1993 | US5264325 Composition for photo imaging |
11/23/1993 | US5264324 Crosslinked addition polymer, epoxy resin, printed circuit boards |
11/23/1993 | US5264320 Mixture of dyes for black dye donor thermal color proofing |
11/23/1993 | US5264319 Used as positive type resist; high sensitivity and resolution |
11/23/1993 | US5264318 For printing plates, graphic arts |
11/23/1993 | US5264316 Light-sensitive material containing silver halide, reducing agent, polymerizable compound and base precursor |
11/19/1993 | CA2096216A1 Process for the production of a multicolored image, and photosensitive material for carrying out this process |
11/19/1993 | CA2095107A1 Positive resist composition |
11/18/1993 | EP0570176A1 Liquid crystal display panel and process for production thereof |
11/18/1993 | EP0570094A2 Method of forming a multilayer printed circuit board and product thereof |
11/18/1993 | EP0570041A1 A silver halide photographic material |
11/18/1993 | EP0569896A1 Three-dimensional image |
11/18/1993 | EP0569762A1 Pattern formation in photohardenable dielectric layers |
11/18/1993 | EP0569707A2 Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same |
11/17/1993 | CN1078415A Removal of surface contaminants by irradiation |
11/16/1993 | US5263130 Three dimensional modelling apparatus |
11/16/1993 | US5263073 Scanning systems for high resolution E-beam and X-ray lithography |
11/16/1993 | US5262927 Partially-molded, PCB chip carrier package |
11/16/1993 | US5262651 Positron beam lithography |
11/16/1993 | US5262500 IC=integrated circuits; copolymer of N-(4-hydroxyphenyl)maleimide and para-trialkylsilylstyrene |
11/16/1993 | US5262486 Modified emulsion polymers, in particular for photopolymerizable recording materials which can be developed in water and aqueous solvents |
11/16/1993 | US5262295 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material |