G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/1994
12/22/1994	WO1994029368A1 Energy-curable cyanate/ethylenically unsaturated compositions
12/22/1994	WO1994029364A1 Stabilized cationically-curable compositions
12/22/1994	WO1994029128A1 Embossed-pattern transfer sheet and method of pattern transfer
12/22/1994	WO1994028796A1 X-ray tube and microelectronics alignment process
12/22/1994	DE4419874A1 Alkalilösliches Harz und Harzzusammensetzung Alkali-soluble resin and resin composition
12/22/1994	CA2162883A1 Stabilized cationically curable compositions
12/21/1994	EP0630173A2 Process for preparing printed circuit board
12/21/1994	EP0629919A1 A method for making by phototypesetting a lithographic printing plate according to the silver salt diffusion transfer process
12/21/1994	EP0629918A1 A method for making a lithographic printing plate according to the silver salt diffusion transfer process
12/21/1994	EP0629917A2 Positive photoresist composition
12/21/1994	EP0629671A2 Solvent composition
12/21/1994	EP0629626A2 Cyclopropyl-substituted spiro-photochromic compounds
12/21/1994	CN1096595A Deep UV sensitive photoresist resistant to latent image decay
12/21/1994	CN1027087C Process for forming membrane
12/20/1994	US5375175 Method and apparatus of measuring line structures with an optical microscope by data clustering and classification
12/20/1994	US5375157 X-ray mask structure and a production method thereof, an exposure method using the X-ray mask structure, and a device fabricated by using the X-ray mask structure
12/20/1994	US5374974 High speed shuttle for gating a radiation beam, particularly for semiconductor lithography apparatus
12/20/1994	US5374742 Positive resist composition
12/20/1994	US5374693 Novolak resin blends for photoresist applications
12/20/1994	US5374504 Resist materials and processes of their use
12/20/1994	US5374503 Partial baking of polyamic acid, photoresist patterning and etching, curing
12/20/1994	US5374502 Resist patterns and method of forming resist patterns
12/20/1994	US5374501 Alkali soluble photopolymer in color proofing constructions
12/20/1994	US5374500 Positive photoresist composition containing photoacid generator and use thereof
12/20/1994	US5374497 Support, photosensitive imaging layer, print-out layer; multicolor
12/20/1994	US5374496 Image forming method
12/20/1994	US5374492 Contains a becteriorhodopsin variant in which aspartic acid in position 96 is replaced by any other naturally occurring amino acid; use in optical recording media
12/20/1994	US5374330 Anisotropic barium strontium titanate etch
12/20/1994	US5374312 Liquid coating system
12/20/1994	US5374184 Differing adhesion and cohesion of layers; processed by "peel-apart" development; lower background discoloration
12/20/1994	CA1333578C Production of metallic patterns
12/20/1994	CA1333537C Photopolymer color-proofing films with improved white light stability
12/20/1994	CA1333536C Photoresist compositions
12/20/1994	CA1333523C Desensitizable self-contained record material useful for security documents and the like
12/15/1994	DE4420417A1 Method of manufacturing a mask for producing a pattern on a semiconductor component
12/15/1994	DE4420409A1 Photomask (mask) with patterns for the reduction of the performance of a stepper
12/14/1994	EP0628988A1 Semiconductor manufacturing system with self-diagnosing function and self-diagnosing method thereof
12/14/1994	EP0628879A1 Surface-imaging technique for lithographic processes for device fabrication
12/14/1994	EP0628878A1 Method for obtaining a printing plate according to the silver salt diffusion transfer process
12/14/1994	EP0628877A1 Method for obtaining a printing plate according to the silver salt diffusion transfer process
12/14/1994	EP0628876A1 Environmentally stable highly sensitive acid amplifier photoresists
12/14/1994	EP0628860A1 New type of modified gelatin and its use in a DTR material
12/14/1994	EP0628806A2 Image measurement system and method
12/14/1994	EP0628599A1 Photosensitive resin composition for color filter
12/14/1994	EP0628409A1 Heat mode recording and method for making a printing plate therewith
12/14/1994	EP0628180A1 Pliable, aqueous processable, photoimageable permanent coatings for printed circuits
12/14/1994	EP0473643B1 Photocurable pigmented secondary optical fiber coatings
12/14/1994	CN2185453Y Automatic temp. controller for smoking cylinder in blueprint machine
12/14/1994	CN1027016C Paralle plate spliting 1:1 refraction and reflection optic system
12/13/1994	US5373232 Method of and articles for accurately determining relative positions of lithographic artifacts
12/13/1994	US5373137 Multiple-line laser writing apparatus and method
12/13/1994	US5372916 X-ray exposure method with an X-ray mask comprising phase shifter sidewalls
12/13/1994	US5372915 Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer
12/13/1994	US5372914 Using a protective resin
12/13/1994	US5372913 Photosensitive resin composition
12/13/1994	US5372912 Radiation-sensitive resist composition and process for its use
12/13/1994	US5372910 Image transfer layers
12/13/1994	US5372909 High resolution level, large exposure margin; photoresists
12/13/1994	US5372908 Photosensitive composition comprising a polysilane and an acid forming compound
12/13/1994	US5372907 Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates
12/13/1994	US5372903 Method of forming a phosphor layer on CRT panel and a water soluble emulsion with photosensitivity for an intermediate layer
12/13/1994	US5372902 Method for producing color filter
12/13/1994	US5372901 Removable bandpass filter for microlithographic aligners
12/13/1994	US5372677 Resist coating superimposed on resist pattern; preventing stripping of upper layer
12/08/1994	WO1994028449A1 Process for producing guiding elements for optical waveguide fibres
12/08/1994	WO1994028083A1 Antistatic agent and method for suppressing electrification
12/08/1994	WO1994027737A1 Method of and apparatus for application of liquid
12/08/1994	DE4419521A1 Alignment method and device for an exposure process
12/08/1994	DE4419237A1 Process for removing a photoresist containing a silicon compound or a germanium compound
12/08/1994	DE4419038A1 Element which generates multiple beams, and an optical printing device equipped therewith
12/08/1994	DE4240504A1 Method for producing conductive tracks over trench regions of integrated semiconductor circuits, positive photoresist being used for the structuring
12/07/1994	EP0627667A1 Device fabrication entailing synchrotron radiation
12/07/1994	EP0627666A1 Apparatus and method for changing the scale of a printed pattern
12/07/1994	EP0627665A1 A method for making a lithographic printing plate according to the silver salt diffusion transfer process
12/07/1994	EP0627663A1 Substrate having light-shielding layer, method for forming same and liquid crystal display device
12/07/1994	EP0627426A1 Pyran derivative, photosensitive resin composition, and hologram recording medium using it
12/07/1994	EP0627326A1 A method for converting silver areas of a silver based printing plate into ink repellant areas while rendering the hydrophilic areas ink acceptant
12/07/1994	EP0627123A1 Laser generated i.c. mask
12/07/1994	EP0627122A1 Laser generated i.c. pattern
12/06/1994	US5371774 X-ray lithography beamline imaging system
12/06/1994	US5371259 Iron (II) metallocene salts
12/06/1994	US5371181 Thiol-ene compositions with improved cure speed retention
12/06/1994	US5371169 Blends with overlapping molecular weight distribution; used in positive photoresists
12/06/1994	US5371115 Having sensitizers, electron acceptors selected from peracids, hydroperoxides and quinones; photosensitive, photoresists
12/06/1994	US5370975 Phase shift mask having phase shifter with edge angle frfo 70 to 85 degrees or 95 to 110 degrees
12/06/1994	US5370974 Laser exposure of photosensitive polyimide for pattern formation
12/06/1994	US5370971 Epoxy based photopolymerizable composition
12/06/1994	US5370969 Planarization layer, chemical vapor deposited interfacial film, and photosensitivwe resist layer
12/06/1994	US5370968 Photocurable elements having two photocurable layers
12/06/1994	US5370965 Storage stable, forms clear images
12/06/1994	US5370923 Curving insulating structure placed in close spaced proximity with a conductive, interconnect structure
12/06/1994	US5370906 Coating imaged aluminum oxide plate with permerable, low surface energy silicone, heating to cure, applying solvent developer to penetrate silicone and release imaged areas to form stencil
12/06/1994	US5370825 Water-soluble electrically conducting polymers, their synthesis and use
12/06/1994	US5370762 Use site production of sandblasting photomasks
12/06/1994	US5370491 Method and apparatus for transferring articles between two controlled environments
12/06/1994	CA1333400C Sulfonium salts having acid-labile groups
12/06/1994	CA1333378C Replicating process for interference patterns
12/03/1994	CA2124667A1 Photoresist composition
12/01/1994	DE4418620A1 Photopolymerisable composition
11/1994
11/30/1994	EP0626721A1 Process of forming a surface profile in the surface of a substrate

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