| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 04/28/1994 | WO1994009513A1 Interconnection structure for integrated circuits and method for making same |
| 04/28/1994 | DE4336009A1 Positive light-sensitive compsn. contg. development inhibitor - contg. widely spaced gps. pref. tert.-alkyl gps. decomposed by acid and alkali-soluble gps., water-insol., alkali-soluble resin and photo-acid |
| 04/28/1994 | DE4235702A1 Substrate surface structuring - uses separate masks with partial patterns to expose separate photo sensitive layers to form a complete pattern as an etching mask |
| 04/27/1994 | EP0594452A2 Radiation sensitive resin composition for microlens |
| 04/27/1994 | EP0594252A1 A device for applying a lacquer coating to a disc-shaped registration carrier |
| 04/27/1994 | EP0593854A2 Method and apparatus for developing lithographic offset printing plate |
| 04/27/1994 | EP0593806A1 Method for the preparation of a screen mesh for screen printing |
| 04/27/1994 | CN2163394Y Multifunctional plate-making machine |
| 04/27/1994 | CN1086023A Photosensitive material |
| 04/27/1994 | CN1086022A Single color whole page makeup system |
| 04/26/1994 | US5307207 Illuminating optical apparatus |
| 04/26/1994 | US5307184 Exposure apparatus |
| 04/26/1994 | US5307109 Method and apparatus for processing photosensitive material |
| 04/26/1994 | US5307106 Waste solution discharging apparatus for waterless lithographic printing plates |
| 04/26/1994 | US5306902 Confocal method and apparatus for focusing in projection lithography |
| 04/26/1994 | US5306756 Method and compositions for diffusion patterning |
| 04/26/1994 | US5306602 Multistep process; press heat bonding an electrically insulative bonding suspension paint |
| 04/26/1994 | US5306601 Laminating a semiconductor a polythiophenes layer, inorganic layer and photoresists layer, heating and hardening each layer |
| 04/26/1994 | US5306600 Oxygen-containing titanocenes, and the use thereof |
| 04/26/1994 | US5306596 Heat resistance; storage stability; used in minute processing in the making of semiconductors, integrated circuits |
| 04/26/1994 | US5306595 Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith |
| 04/26/1994 | US5306594 Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol |
| 04/26/1994 | US5306585 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 04/26/1994 | US5306584 Scanning grid pattern to obtain information on its location; transparent to exposing radiation |
| 04/26/1994 | US5305601 Solid fuel rocket motor assembly, and method of making the same |
| 04/26/1994 | CA1328908C Removal of surface contaminants by irradiation from a high-energy source |
| 04/26/1994 | CA1328883C Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds |
| 04/26/1994 | CA1328762C Photopolymerizable compositions |
| 04/26/1994 | CA1328760C Photoinitiator mixtures containing a titanocene and a 3-ketocoumarin |
| 04/20/1994 | EP0593387A2 Electron-beam lithography with induced currents |
| 04/20/1994 | EP0593274A1 Reticle having sub-patterns and a method of exposure using the same |
| 04/20/1994 | EP0593197A1 Solid state colour imaging device and method of manufacturing the same |
| 04/20/1994 | EP0593124A2 Apparatus and method for the manufacture of high uniformity total internal reflection holograms |
| 04/20/1994 | EP0592972A2 Resist coated metal- or semiconductor-substrate having a stable resist-substrate adhesion |
| 04/20/1994 | EP0592790A1 Negative photoresist composition |
| 04/20/1994 | EP0592745A1 Method and apparatus for two-sided coating of plate-like articles |
| 04/20/1994 | CN1085667A Micro-miniature structures and method of fabrication thereof |
| 04/19/1994 | US5305364 Projection type X-ray lithography apparatus |
| 04/19/1994 | US5305222 Pattern forming system |
| 04/19/1994 | US5305054 Imaging method for manufacture of microdevices |
| 04/19/1994 | US5305053 Image forming apparatus |
| 04/19/1994 | US5305052 Image forming apparatus |
| 04/19/1994 | US5305043 Method of and apparatus for producing a strip of lead frames for integrated circuit dies in a continuous system |
| 04/19/1994 | US5304628 Resin with carboxylic acid group and unsaturation, compound containing cyclocarbonate group; water, solvent, chemical and heat resistance when cured to film |
| 04/19/1994 | US5304610 Amphoteric copolymer derived from vinylpyridine and acetoxystyrene |
| 04/19/1994 | US5304515 Method for forming a dielectric thin film or its pattern of high accuracy on substrate |
| 04/19/1994 | US5304461 Process for the selective deposition of thin diamond film by gas phase synthesis |
| 04/19/1994 | US5304458 Multiblock copolymers for flexographic printing plates |
| 04/19/1994 | US5304456 Phenolic resin of aldehyde and hydroxy-containing indane-phenyl-type compound |
| 04/19/1994 | US5304454 Image forming method using silver halide, reducing agent and polymerizable compound |
| 04/19/1994 | US5304453 Fuine patterns |
| 04/19/1994 | US5304394 Technique for forming, by pyrolysis in a gaseous process, a coating based essentially upon oxygen and silicon |
| 04/19/1994 | US5304252 Method of removing a permanent photoimagable film from a printed circuit board |
| 04/19/1994 | CA1328700C Spin castable mixtures useful for making deep-uv contrast enhancement layers |
| 04/14/1994 | WO1994008439A1 Electrodeless lamp with bulb rotation |
| 04/14/1994 | WO1994008276A1 Photoresist stripping process using n,n-dimethyl-bis(2-hydroxyethyl) quaternary ammonium hydroxide |
| 04/14/1994 | WO1994008275A1 Positive-working photoresist composition |
| 04/14/1994 | WO1994007955A1 Novolak resin mixtures |
| 04/14/1994 | CA2144978A1 Electrodeless lamp with bulb rotation |
| 04/13/1994 | EP0592343A1 Automated process for the production of flexible printing plates, the plate being placed with the sensitive surface upwards and apparatus therefor |
| 04/13/1994 | EP0592094A2 Micro-miniature structure fabrication |
| 04/13/1994 | EP0591786A2 Photosensitive composition |
| 04/13/1994 | EP0591759A2 Radiation polymerizable mixture and process for the preparation of a solder mask |
| 04/13/1994 | CN1024182C Etched glass and process of mfg. same |
| 04/12/1994 | US5303002 Method and apparatus for enhancing the focus latitude in lithography |
| 04/12/1994 | US5303001 Illumination system for half-field dyson stepper |
| 04/12/1994 | US5302999 Illumination method, illumination apparatus and projection exposure apparatus |
| 04/12/1994 | US5302757 Ultraviolet light sensitive onium salts |
| 04/12/1994 | US5302725 Aryl triflate compounds and radiologically acid producing agents thereof |
| 04/12/1994 | US5302688 Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions |
| 04/12/1994 | US5302538 Method of manufacturing field effect transistor |
| 04/12/1994 | US5302495 Preexposure of edges of substrate which is covered by dry resist film and protective film, removal of protective film, exposure and patterning of film resist, then rapid heating |
| 04/12/1994 | US5302491 Including electrically detectable identification information during fabrication |
| 04/12/1994 | US5302490 Radiation sensitive compositions comprising blends of an aliphatic novolak resin and an aromatic novolak resin |
| 04/12/1994 | US5302489 Positive photoresist compositions containing base polymer which is substantially insoluble at pH between 7 and 10, quinonediazide acid generator and silanol solubility enhancer |
| 04/12/1994 | US5302488 Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material |
| 04/12/1994 | US5302487 Adding a high boiling solvent |
| 04/12/1994 | US5302477 Plurality of rim phase-shifted opening patterns in closely spaced array |
| 04/12/1994 | US5302460 Support material for offset-printing plates in the form of a sheet, a foil or a web process for its production and offset-printing plate comprising said material |
| 04/12/1994 | US5302421 Production of microstructure elements |
| 04/12/1994 | US5302313 Halogenated hydrocarbon solvents |
| 04/12/1994 | US5302198 Coating solution for forming glassy layers |
| 04/10/1994 | CA2108048A1 Radiation polymerisable mixture and method for manufacture of a solder mask |
| 04/07/1994 | DE4305201C1 Three dimensional component mfr with laser-cured resin and filler - involves mixing steel or ceramic powder in resin, laser curing given shape, heating in nitrogen@ atmosphere and nitric acid to remove resin and then sintering filler |
| 04/06/1994 | EP0590957A1 Photo-solidified object having unsolidified liquid ejecting ports and method of fabricating the same |
| 04/06/1994 | EP0590956A1 Photo-solidification modelling method with improved ability to restrain distortion |
| 04/06/1994 | EP0590755A1 A process for the manufacture of printing reticles |
| 04/06/1994 | EP0590204A1 A method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 04/06/1994 | CN1084980A Protocurable elements and slip film compositions used therein |
| 04/05/1994 | USH1299 Developing negative photoresist with acid in solubilizing solvent |
| 04/05/1994 | US5301124 Registration of patterns formed of multiple fields |
| 04/05/1994 | US5301013 Positioning device having two manipulators operating in parallel, and optical lithographic device provided with such a positioning device |
| 04/05/1994 | US5300972 Projection exposure apparatus |
| 04/05/1994 | US5300971 Projection exposure apparatus |
| 04/05/1994 | US5300967 Projection exposure apparatus |
| 04/05/1994 | US5300815 Technique of increasing bond pad density on a semiconductor die |
| 04/05/1994 | US5300786 Optical focus phase shift test pattern, monitoring system and process |
| 04/05/1994 | US5300628 Selected chelate resins and their use to remove multivalent metal impurities from resist components |
| 04/05/1994 | US5300536 Catalytic composition for photopolymerization and a photopolymerizable composition containing the same |
| 04/05/1994 | US5300404 Process for forming a positive pattern through deep ultraviolet exposure, heat treatment and development with TMAH solution containing an alcohol to improve adhesion |