G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/1994
09/01/1994	WO1994018920A1 Surgical cutting tool
09/01/1994	WO1994016120A3 Phosphating compositions and processes, particularly for use in fabrication of printed circuits utilizing organic resists
09/01/1994	DE4406282A1 Lichtempfindliche Harzzusammensetzung A photosensitive resin composition
09/01/1994	DE4306152A1 Positive-working radiation-sensitive mixture, and recording material produced therewith
08/1994
08/31/1994	EP0613170A1 Method and apparatus for fabrication of thin film semiconductor devices using non-planar, exposure beam lithography
08/31/1994	EP0613169A1 Differential virtual ground beam blanker
08/31/1994	EP0613056A1 Screen printing origination film
08/31/1994	EP0613053A1 Process for removing plastics from microstructures
08/31/1994	EP0613052A2 Photolithography test structures
08/31/1994	EP0613051A1 Method of exposing and apparatus therefor
08/31/1994	EP0613050A2 Universal negative tone photoresist
08/31/1994	EP0612419A1 Ultraviolet light sensitive onium salts and the use thereof as photoinitiators
08/31/1994	EP0516742B1 Microcapsules containing an aqueous phase
08/31/1994	EP0476014B1 Very large scale immobilized polymer synthesis
08/31/1994	EP0401314B1 Cryogenic process for metal lift-off
08/31/1994	EP0296249B1 Method and apparatus for recovering and reusing resist composition
08/30/1994	US5343489 Arrangement for shaping a laser beam and for reducing the coherence thereof
08/30/1994	US5343271 Exposure apparatus for drawing patterns on substrates
08/30/1994	US5343270 Projection exposure apparatus
08/30/1994	US5342739 Method of preparing a negative pattern utilizing photosensitive polymer composition containing quinonediazide compound and a poly(amido)imide precursor
08/30/1994	US5342738 Resist film developing method and an apparatus for carrying out the same
08/30/1994	US5342737 Forming photoresist layer on substrate, expoosing to actinic radiation, developing and metallization
08/30/1994	US5342734 Mixture of acid stable polymer, photoinitiator, carbonate ester of tetrabutyl alcohol and polyhydric phenol
08/30/1994	US5342727 Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition
08/30/1994	US5342582 UV emitters to irrodiate scrap and choppers to comminute
08/30/1994	US5341799 Urethane polymers for printing plate compositions
08/30/1994	CA1331711C Photosensitive thermosetting resin composition and method of forming solder resist pattern by use thereof
08/27/1994	CA2116250A1 Screen printing origination film
08/25/1994	DE4405108A1 Positive-working photosensitive composition
08/25/1994	DE4305261A1 Radiation-sensitive mixture, and recording material produced therewith
08/24/1994	EP0611998A2 Positive-working radiation-sensitive mixture
08/24/1994	EP0611997A1 Photopolymerizable composition
08/24/1994	EP0611992A1 A silver salt diffusion transfer material and method for making an image therewith
08/24/1994	EP0611784A1 Polyfunctional vinyl ether compounds and photoresist resin compositions containing them
08/24/1994	EP0554350A4 High power lamp
08/24/1994	CN1091211A Universal holographic Chinese character coding and high-speed input method
08/23/1994	US5341024 Method of increasing the layout efficiency of dies on a wafer, and increasing the ratio of I/O area to active area per die
08/23/1994	US5340981 Rear field reflection microscopy process and apparatus
08/23/1994	US5340772 Method of increasing the layout efficiency of dies on a wafer and increasing the ratio of I/O area to active area per die
08/23/1994	US5340702 Coating photoresist with light shielding film; exposure and development
08/23/1994	US5340701 Photoinitiators
08/23/1994	US5340700 Method for improved lithographic patterning in a semiconductor fabrication process
08/23/1994	US5340699 Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates
08/23/1994	US5340697 Negative type photoresist composition
08/23/1994	US5340696 Photoresist compositions with copolymer binder having phenolic and nonaromatic cyclic alcohol units where the distribution of the cyclic alcohol concentration is less than 8 mole percent
08/23/1994	US5340693 Heat-sensitive recording material and method for obtaining an image using the same
08/23/1994	US5340691 Method for making a lithographic printing plate according to the silver salt diffusion transfer process
08/23/1994	US5340690 Using solvent mixture of alkanolamine and thiosulfate
08/23/1994	US5340688 Containing mixture of 1,2-naphthoquinonediazidosulfonate esters of polyhydroxy compounds and alkali soluble resin
08/23/1994	US5340687 Chemically modified hydroxy styrene polymer resins and their use in photoactive resist compositions wherein the modifying agent is monomethylol phenol
08/23/1994	US5340686 Alkali soluble phenol novolak resin, 1,2-quinone diazide compound and low molecular weight novolak compound
08/23/1994	US5340685 Light-sensitive composition containing diazo resin, polyurethane resin and fluorine atom-containing copolymer surfactant
08/23/1994	US5340684 Photosensitive composition and resin-encapsulated semiconductor device
08/23/1994	US5340683 Presensitized plate having surface-grained and anodized aluminum substrate with light-sensitive layer containing quinone diazide sulfonic acid ester of particular polyhydroxy compound
08/23/1994	US5340682 Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound
08/23/1994	US5340681 Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process
08/23/1994	US5340680 Desensitizable record material
08/23/1994	US5340653 Free-radical curable compositions comprising vinyl ether and urethane malenate compounds
08/23/1994	US5340420 Method for bonding a color separation filter to an image sensor
08/23/1994	US5340407 Solubilizing contaminant with terpene, removing with heated water, separating water from mixture
08/23/1994	US5339739 Emulsion coating apparatus
08/23/1994	CA1331534C Self-aligning aperture
08/23/1994	CA1331533C Photopolymerizable composition
08/23/1994	CA1331532C Photosensitizers and polymerizable compositions with mannich bases and iodonium salts
08/23/1994	CA1331509C Wet lamination process and apparatus
08/18/1994	WO1994018607A1 Process for forming positive polyimide pattern
08/18/1994	WO1994018606A1 Sulphonic acid esters, radiation-sensitive mixtures made therewith, and their use
08/18/1994	WO1994018605A1 Process for producing micro-structure components on a substrate
08/18/1994	WO1994018544A1 Sensors employing interference of electromagnetic waves passing through waveguides having functionalized surfaces
08/18/1994	DE4304301A1 Transport system and method for objects to be aligned with one another
08/18/1994	CA2155513A1 Sensors employing interference of electromagnetic waves passing through waveguides having functionalized surfaces
08/17/1994	EP0611062A1 Electromagnetic alignment apparatus
08/17/1994	EP0610983A2 A method for making a lithographic offset plate by the silver salt diffusion transfer process
08/17/1994	EP0610982A2 A method for making a lithographic offset plate by the silver salt diffusion transfer process
08/17/1994	EP0610981A2 A method for making a lithographic offset plate by the silver salt diffusion transfer process
08/17/1994	EP0610977A2 A processing solution and method for making a lithographic offset plate by the silver salt diffusion transfer process
08/17/1994	EP0610936A2 Lithographic printing material
08/17/1994	EP0610889A1 A "direct-to-press" positive lithographic printing plate and method for making same
08/17/1994	EP0610344A1 Positive photoresists containing solubility enhancers
08/17/1994	EP0610256A1 Polyamide materials
08/17/1994	EP0610184A1 Light exposure device.
08/17/1994	EP0610183A1 Exposure device.
08/17/1994	CN2174718Y 曝光装置 Exposure device
08/17/1994	CN1090934A Photosensitive sintering technique using colour separation process for generating colour image on ceramic
08/17/1994	CA2115333A1 Polyfunctional vinyl ether compounds and photoresist resin composition containing the same
08/16/1994	US5339346 Device fabrication entailing plasma-derived x-ray delineation
08/16/1994	US5339128 Resist processing method
08/16/1994	US5339074 Very low frequency tracking system
08/16/1994	US5338924 Apparatus and method for automatic focusing of light using a fringe plate
08/16/1994	US5338848 For optical recording media used with lasers
08/16/1994	US5338818 Acid sensitive polysilsesquioxanes in high resolution photoresists for deep ultraviolet radiation
08/16/1994	US5338653 Coating substrate with radiation sensitive mixture of indanol based phenolic resin binder and ortho-quinonediazide compound, image-wise exposing to radiant energy, developing
08/16/1994	US5338652 Coating substrate with mixture of novolak resins and o-quinonediazide for positive resist having improved resolution, then exposure, development
08/16/1994	US5338647 Reflection type photomask and reflection type photolithography method comprising a concavo-convex surface
08/16/1994	US5338643 O-quinonediazide photosensitive composition containing s-triazine compound, novolak resin, vinyl-based polymer and a dye
08/16/1994	US5338641 Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound
08/16/1994	US5338640 Alkali-developable; resistance to oxygen etching; multilayer photoresists; photolithographic printing plates
08/16/1994	US5338630 Observing optical characteristics of exposed undeveloped photoresist without removing wafer from stepper
08/16/1994	US5338627 Rotating roll coated with photosensitive film, scanning with multiple laser beams controlled by electronic data, developing, plating
08/16/1994	US5338626 Covering transparent substrate with opaque patterned layer and resist layer, then exposure to various actinic radiations, development, anisotropic etching

1 ... 1097 1098 1099 1100 1101 1102 1103 1104 1105 1106 1107 1108 1109 1110 1111 1112 1113 1114 1115 1116 1117 ... 1272