G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1994
11/30/1994	EP0626623A2 Masks for a double-sided exposing device
11/30/1994	EP0626622A1 Method of making heat-transferred dye prints
11/30/1994	EP0626621A1 Device fabrication entailing plasma-derived x-ray delineation
11/30/1994	EP0626620A1 Method for forming resist pattern
11/30/1994	EP0626614A1 A red-sensitive silver halide photographic material
11/30/1994	EP0626273A1 Lithographic printing plates having a hydrophilic barrier layer overlying an aluminum support
11/30/1994	EP0626076A1 New nonsilver x-ray recording process
11/30/1994	CN2184198Y Automatic timing tester-controller for light exposure
11/29/1994	US5369521 Scanning type projector
11/29/1994	US5369486 Position detector for detecting the position of an object using a diffraction grating positioned at an angle
11/29/1994	US5369468 Photographic printing apparatus and method
11/29/1994	US5369464 Exposure apparatus and an exposure method using the same
11/29/1994	US5369282 Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput
11/29/1994	US5369200 Positive photoresist having improved processing properties
11/29/1994	US5368993 Method of forming relief image having line width less than 0.35 microns utilizing copolymer binder having phenolic and nonaromatic cyclic alcohol units
11/29/1994	US5368992 Method of producing diffraction grating
11/29/1994	US5368991 Photosensitive resin composition for use as a light-shielding film which can be used as black matrices
11/29/1994	US5368990 Photopolymerizable composition
11/29/1994	US5368989 Photolithographic article utilizing polymers with light-absorbing properties for anti-reflective coating
11/29/1994	US5368987 Process for producing resist composition
11/29/1994	US5368985 Bisacylphosphine sulfides
11/29/1994	US5368982 Image forming process
11/29/1994	US5368980 Exposure of light sensitive material on a support and development for silver halide layer, processing with diffusion transfer activators
11/29/1994	US5368978 Separation of donor and receiver elements in diffusion transfer system
11/29/1994	US5368977 Positive type photosensitive quinone diazide phenolic resin composition
11/29/1994	US5368976 Pigment-dispersed color-filter composition comprising an alkali-soluble block copolymer as a binder
11/29/1994	US5368975 Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility
11/29/1994	US5368974 Lithographic printing plates having a hydrophilic barrier layer comprised of a copolymer of vinylphosphonic acid and acrylamide overlying an aluminum support
11/29/1994	US5368973 Dispersion of microcapsules of ethylenically unsaturated compounds and polymerization initiaators, dispersion, swelling then coating and drying on a substrate
11/29/1994	US5368931 Lithographic printing plate precursor of direct image type
11/29/1994	US5368901 Method for the production of a bottom resist
11/29/1994	US5368884 Method of forming solder mask
11/29/1994	US5368783 Novolak resin or polyhydroxystyrene resin, alkoxymethylated amino resin and triazine
11/29/1994	US5368437 Substrate transfer method
11/24/1994	WO1994027190A1 Process and device for coating printed circuit boards
11/24/1994	WO1994027189A1 Process and device for coating printed circuit boards
11/24/1994	WO1994027188A1 Device for masking substrates to be processed
11/24/1994	WO1994027187A1 Fabrication of microcomponents
11/24/1994	WO1994026533A1 Thermosensitive recording material
11/24/1994	DE4316401A1 Radiation-crosslinkable and thermally post-curable binders
11/24/1994	CA2162714A1 Process and apparatus for coating printed circuit boards
11/24/1994	CA2162712A1 Process and apparatus for coating printed circuit boards
11/23/1994	EP0625728A2 Radiation-sensitive composition containing a resole resin and a novolak resin and use thereof in lithographic plates
11/23/1994	EP0625430A1 Method for protecting an image
11/23/1994	CN2183580Y Multi-purpose copying machine
11/23/1994	CN1095490A Binding layer coating technology of solid photosensitive resin plate
11/22/1994	US5367613 Abstract pattern plate making system and printed matter printed thereby
11/22/1994	US5367588 Method of fabricating Bragg gratings using a silica glass phase grating mask and mask used by same
11/22/1994	US5367404 Image projection method and semiconductor device manufacturing method using the same
11/22/1994	US5367359 Plate-making method and plate-making apparatus for printing
11/22/1994	US5367358 Projection exposing apparatus and projection exposing method
11/22/1994	US5366998 Composition for removing adhesives from polymeric film and process for using same
11/22/1994	US5366852 Methods for treating photoresists
11/22/1994	US5366851 Device fabrication process
11/22/1994	US5366849 Photoresist pattern formation through etching where the imaging exposure changes in a given direction in the desired pattern and inclined vapor deposition is utilized to deposit a film
11/22/1994	US5366846 Crosslinking agents and compositions for photoresists
11/22/1994	US5366843 Coated substrate utilizing composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone as sensitivity enhancers
11/22/1994	US5366837 Melting thermoplastic particles to form glossy, transparent surface; pressing to adhere and transfer
11/22/1994	US5366757 In situ resist control during spray and spin in vapor
11/22/1994	US5366587 Process for fabricating micromachines
11/22/1994	US5366584 Removing uncured emulsion from stencils during photomask production
11/22/1994	US5365629 Apparatus for washing out flexographic printing plates
11/17/1994	EP0625001A2 Process for image-wise metallising structured printed circuit boards
11/17/1994	EP0624828A1 Developer circulating method in flexographic plate making step and apparatus for practicing the same
11/17/1994	EP0624827A1 Method of making micropatterns
11/17/1994	EP0624826A1 Method of forming relief patterns by i-line light irradiation
11/17/1994	EP0624825A2 Photosensitive polymer composition for flexographic printing plates processable in aqueous media
11/17/1994	EP0624824A1 Resist ink composition and cured article prepared therefrom
11/17/1994	EP0624580A1 Styrylcoumarin compound, photosensitive resin composition, and hologram recording medium
11/17/1994	EP0624262A1 Method of applying a lacquer film sensitive to uv and/or electron-beam radiation
11/17/1994	EP0624261A1 Process for preparing photohardenable elastomeric element having increased exposure latitude
11/17/1994	EP0624260A1 Negative working, peel developable, single sheet color proofing system.
11/17/1994	EP0624114A1 Microstructured membranes and methods for making same
11/17/1994	DE4416660A1 Verfahren zum Abscheiden eines Metalls auf einem Substrat aus einem Galvanisierbad A method for depositing a metal on a substrate from a plating bath
11/17/1994	DE4409220A1 Pattern forming material and pattern forming process
11/16/1994	CN1095078A Photosensitive polymer composition for flexagraphic painting plates processable in aqueous media
11/16/1994	CN1095060A A source of photochemically generated acid for microelectronic photoresists
11/15/1994	US5365561 Exposure control in an X-ray exposure apparatus
11/15/1994	US5365378 Convex reflective sign
11/15/1994	US5365371 Projection exposure apparatus
11/15/1994	US5365342 Alignment and exposure apparatus and method for manufacture of integrated circuits
11/15/1994	US5365051 Projection exposure apparatus
11/15/1994	US5364743 Process for fabrication of bubble jet using positive resist image reversal for lift off of passivation layer
11/15/1994	US5364742 Micro-miniature structures and method of fabrication thereof
11/15/1994	US5364741 Aqueous developable photosensitive polyurethane-(meth)acrylate
11/15/1994	US5364740 Heat, radiation, iodonium or triazine compound
11/15/1994	US5364739 Nonsilver x-ray recording process
11/15/1994	US5364738 Divinyl ethers, solubility in developers
11/15/1994	US5364737 Latex binder polymer with carboxylic acid and unsaturated monomers, photoinitiators and polyether polyurethane thickener
11/15/1994	US5364736 Solder masks for printed circuits
11/15/1994	US5364734 Postive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith
11/15/1994	US5364732 Image forming method and image forming medium
11/15/1994	US5364718 Method of exposing patttern of semiconductor devices and stencil mask for carrying out same
11/15/1994	US5364716 Pattern exposing method using phase shift and mask used therefor
11/15/1994	US5364488 Coaxial plasma processing apparatus
11/15/1994	US5364433 Optical member of synthetic quartz glass for excimer lasers and method for producing same
11/11/1994	CA2122744A1 Photosensitive polymer composition for flexographic printing plates processable in aqueous media
11/10/1994	WO1994025904A1 Positive electron-beam resist composition and developer for positive electron-beam resist
11/10/1994	WO1994025903A1 Partially polymerized resins
11/10/1994	WO1994025881A1 Lithographically produced stepped lens with a fresnel surface structure and process for producing it

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