| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/11/1994 | CA1325912C Apparatus and method for creating thin and thick patterns |
| 01/06/1994 | WO1994000801A1 Color filter, material thereof and resin |
| 01/06/1994 | WO1994000800A1 Photosensitive resin composition |
| 01/05/1994 | EP0577385A1 Photocurable elements and slip film compositions used therein |
| 01/05/1994 | EP0577187A1 Method of providing a metal pattern on glass in an electroless process |
| 01/05/1994 | EP0576736A1 A method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 01/05/1994 | EP0576622A1 Lithographic printing plates |
| 01/05/1994 | EP0576533A1 Fluid cooled contact mask |
| 01/05/1994 | DE4220650A1 Printing plate prepn. with quality control of exposure and development - uses scanned data from original copy and plates for automatic fault detection |
| 01/04/1994 | US5276725 Exposure system |
| 01/04/1994 | US5276724 X-ray exposure apparatus |
| 01/04/1994 | US5276465 Plotter drum |
| 01/04/1994 | US5276337 Accuracy of alignment and O/L measurement systems by means of tunable source and handling of signal |
| 01/04/1994 | US5276126 Selected novolak resin planarization layer for lithographic applications |
| 01/04/1994 | US5276124 Ladder polymers, photoresists, lithographic printing plates |
| 01/04/1994 | US5275921 Forming a thin film from a base polymer obtained from polyvinylphenol and having a protective tert-butoxy group |
| 01/04/1994 | US5275920 Light sensitive elements for exposure and development, then etching |
| 01/04/1994 | US5275919 Process for making photosensitive resin printing plate and plate-making apparatus used therefor |
| 01/04/1994 | US5275918 Ultraviolet curable heat activatable transfer toners |
| 01/04/1994 | US5275917 Photocurable composition |
| 01/04/1994 | US5275915 Developer for light-sensitive material |
| 01/04/1994 | US5275914 Multilayer sheets |
| 01/04/1994 | US5275913 Multilayer photoresists for integrated circuits |
| 01/04/1994 | US5275911 Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures |
| 01/04/1994 | US5275910 Positive radiation-sensitive resist composition |
| 01/04/1994 | US5275909 Positive-working radiation sensitive mixtures and articles containing alkali-soluble binder, o-quinonediazide photoactive compound and BLANKOPHOR FBW acting dye |
| 01/04/1994 | US5275908 Lithographic plates with chemical resistance or photoresists with heat resistance |
| 01/04/1994 | US5275907 Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding |
| 01/04/1994 | US5275734 Chemical pre-treatment and biological destruction of propylene carbonate waste streams effluent streams to reduce the biological oxygen demand thereof |
| 01/04/1994 | US5275695 Depositing two layers of radiation-sensitive resist material; patterning to form recesses; etching |
| 01/04/1994 | US5275693 Film forming process |
| 01/04/1994 | US5275689 Solubilizing acid labile polymer by reaction with organic acid |
| 01/04/1994 | US5275658 Liquid supply apparatus |
| 01/04/1994 | US5275517 Riston cutting machine |
| 01/04/1994 | US5275237 Liquid filled hot plate for precise temperature control |
| 01/04/1994 | CA1325714C Tool for connecting cable wires |
| 12/30/1993 | CA2099623A1 Photocurable elements and slip film compositions used therein |
| 12/29/1993 | EP0576384A1 Laser exposure of photosensitive polyimide |
| 12/29/1993 | EP0576297A1 Device for normal or oblique illumination of a mask |
| 12/29/1993 | EP0575850A2 Direct laser imaging for three-dimensional circuits and the like |
| 12/29/1993 | EP0575849A2 Conformal photomask for three-dimensional printed circuit board technology |
| 12/29/1993 | EP0575848A2 Ablative process for printed circuit board technology |
| 12/29/1993 | EP0575802A1 Photopolymeric printing plates |
| 12/29/1993 | EP0575426A1 Resist formation. |
| 12/29/1993 | EP0325647B1 A method and apparatus for dry processing or etching a substrate |
| 12/29/1993 | EP0302941B1 Positive photosensitive resin composition and process for its production |
| 12/28/1993 | US5274427 Scanning exposure apparatus having cutting structure for severing photosensitive web |
| 12/28/1993 | US5274420 Beamsplitter type lens elements with pupil-plane stops for lithographic systems |
| 12/28/1993 | US5274417 Exposing apparatus and method of forming image |
| 12/28/1993 | US5274148 Dialky alkoxy phenyl sulfonium salt cationic initiators |
| 12/28/1993 | US5274060 Monomers of ether-substituted styrene derivatives |
| 12/28/1993 | US5273862 Photopolymerizable recording material comprising a cover layer substantially impermeable to oxygen, binds oxygen and is soluble in water at 20°C. |
| 12/28/1993 | US5273858 Method of making lithographic aluminum offset printing plates |
| 12/28/1993 | US5273856 Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation |
| 12/28/1993 | US5273855 Photosensitive layer of a water-soluble component made insoluble by actinic radiation, a resin emulsion having a glass transition temperature of-20 to 40 degrees C. and colorant |
| 12/28/1993 | US5273723 Having a platinum catalytic reactor in the exhaust tract to decompose oxidized resist and convert ozone to oxygen; antideposit agent |
| 12/28/1993 | US5273691 Stereolithographic curl reduction |
| 12/28/1993 | US5273622 Longitudinally moving from station to station |
| 12/28/1993 | US5273192 Resist layer application apparatus |
| 12/28/1993 | US5273076 Solvent transport device |
| 12/28/1993 | CA1325694C Conjugated diene copolymer, process for producing the same, and photosensitive resin composition comprising the same |
| 12/28/1993 | CA1325548C Photocurable electrodeposition coating composition for printed circuit photoresist films |
| 12/23/1993 | WO1993026039A1 Using a nanochannel glass mask to form semiconductor devices |
| 12/23/1993 | WO1993025938A1 Imaging and illumination system with aspherization and aberration correction by phase steps |
| 12/23/1993 | WO1993025387A1 Engraving head |
| 12/23/1993 | DE4320033A1 Metal pattern prodn. in semiconductor device mfr. - using anti-reflection film to avoid photoresist pattern recesses |
| 12/22/1993 | EP0575095A1 Full aperture grazing incidence interferometry |
| 12/22/1993 | EP0574939A1 Resist composition |
| 12/22/1993 | EP0574934A1 Method for forming a patterned polyimide coating film on a substrate |
| 12/22/1993 | EP0574861A1 System for continuous fabrication of micro-structures and thin film semiconductor devices on elongate substrates |
| 12/22/1993 | EP0574546A1 Peel-apart photosensitive element |
| 12/22/1993 | CN1079827A Photoenhanced diffusion patterning for organic polymer films |
| 12/21/1993 | US5272502 Double-surface concurrent exposure device |
| 12/21/1993 | US5272118 Photolithographic masking process |
| 12/21/1993 | US5272042 Positive photoresist system for near-UV to visible imaging |
| 12/21/1993 | US5272041 Negative type lithographic printing plate |
| 12/21/1993 | US5272036 Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method |
| 12/21/1993 | US5272035 Photosensitive lithographic printing plate having treated aluminum support with diazonium light-sensitive layer containing polyurethane resin and phosphorous additive |
| 12/21/1993 | US5272026 Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article |
| 12/21/1993 | US5271800 Method for anisotropic etching in the manufacture of semiconductor devices |
| 12/21/1993 | US5271797 Method for patterning metal oxide thin film |
| 12/21/1993 | US5271775 Methods for treating substrates by applying a halogenated hydrocarbon thereto |
| 12/21/1993 | CA1325354C Photosensitive resin base printing material |
| 12/21/1993 | CA1325353C Negative resist compositions |
| 12/16/1993 | DE4319178A1 New copolymers, useful esp. in resist compsns. - based on 1-(1-cyano:ethenyl)-adamantane or 2-norbornene-2-carbo:nitrile and a (meth)acrylate deriv. |
| 12/16/1993 | CA2097404A1 System for continuous fabrication of micro-structures and thin film semiconductor devices on elongate substrates |
| 12/15/1993 | EP0574022A2 Movement actuator/sensor systems |
| 12/15/1993 | EP0573866A1 Method for forming patterned layers of heat-resistant polycondensates |
| 12/15/1993 | EP0573805A1 Photopolymerizable mixture and printing material made thereof |
| 12/15/1993 | EP0573609A1 Photosensitive compositions containing comb polymer binders |
| 12/15/1993 | CN1079555A Cylinder surface projection type exposure method |
| 12/14/1993 | US5270771 Aligner and exposure method for manufacturing semiconductor device |
| 12/14/1993 | US5270485 High density, three-dimensional, intercoupled circuit structure |
| 12/14/1993 | US5270431 Preparation of oligomeric or polymeric radiation-reactive intermediates for solvent-structured layers |
| 12/14/1993 | US5270378 Acrylic surfactants and compositions containing those surfactants |
| 12/14/1993 | US5270354 Method of making aqueous loaded latex compositions |
| 12/14/1993 | US5270222 Method and apparatus for semiconductor device fabrication diagnosis and prognosis |
| 12/14/1993 | US5270151 Spin on oxygen reactive ion etch barrier |
| 12/14/1993 | US5270147 Stripping film material |
| 12/14/1993 | US5270146 Photosensitive laminate having dual intermediate layers |