| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/21/1994 | CA2152948A1 Phosphating compositions and processes, particularly for use in fabrication of printed circuits utilizing organic resists |
| 07/21/1994 | CA2113741A1 Photosensitive resin compositions |
| 07/20/1994 | EP0607106A1 Manufacturing process of improved photosensitive printing plates |
| 07/20/1994 | EP0606839A1 Method of and apparatus for optically shaping photosetting resin |
| 07/20/1994 | EP0606642A1 Photosensitive recording element and method for the production of a relief printing plate |
| 07/20/1994 | EP0606402A1 Lamination of a photopolymerizable solder mask layer to a substrate containing holes using an intermediate photopolymerizable liquid layer. |
| 07/20/1994 | EP0606355A1 Method and compositions for diffusion patterning |
| 07/20/1994 | EP0513359B1 Yag laser working machine for precision working of thin film |
| 07/20/1994 | CN1089727A Method for mfg. optical plastics chrome plated code disc |
| 07/19/1994 | US5331371 Alignment and exposure method |
| 07/19/1994 | US5331370 Method and apparatus for determining a feature-forming variant of a lithographic system |
| 07/19/1994 | US5331191 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
| 07/19/1994 | US5330883 Techniques for uniformizing photoresist thickness and critical dimension of underlying features |
| 07/19/1994 | US5330882 Preliminary exposure exciting sensitizing dye and quenching oxygen, main exposure exciting photoinitiator, three-dimensionally crosslinked polymer binder, radically polymerizable monomer |
| 07/19/1994 | US5330881 Microlithographic method for producing thick, vertically-walled photoresist patterns |
| 07/19/1994 | US5330879 Masking with narrow, hard material |
| 07/19/1994 | US5330878 Patterning a printed circuit using computer |
| 07/19/1994 | US5330877 Photosensitive compositions containing stilbazolium groups |
| 07/19/1994 | US5330876 Imagewise laser heating dye-ablative recording element of support and layer of image dye dispersed in polymer binder associated with infrared-absorbing material, exposure through dye side of element, removing ablated image dye material |
| 07/19/1994 | US5330875 Process for producing negative and positive original images on a bilevel printing plate utilizing non-silver halide layer and silver halide overlayer |
| 07/19/1994 | US5330862 Method for forming resist mask pattern by light exposure having a phase shifter pattern comprising convex forms in the resist |
| 07/19/1994 | US5330053 Case for photomask |
| 07/19/1994 | CA2112285A1 Positive photoresist composition |
| 07/19/1994 | CA1330737C Photoresist composition comprising cyclohexyleneoxyalkyl acrylates |
| 07/19/1994 | CA1330736C Water-developable photosensitive plate and its production |
| 07/19/1994 | CA1330735C Image deletion fluid for printing plate |
| 07/13/1994 | EP0605964A2 Electron lithography using a photocathode |
| 07/13/1994 | EP0605856A2 Process for the manufacture of p-hydroxystyrene polymers and use thereof |
| 07/13/1994 | EP0605567A1 Water-soluble formulation for masking and the like, and method utilizing the same |
| 07/13/1994 | CN1089370A 形成图形的方法 The method of forming a pattern |
| 07/13/1994 | CN1089369A Method for forming a pattern by silylation |
| 07/13/1994 | CN1089360A Color filter of liquid crystal display device and method for manufacturing the same |
| 07/12/1994 | US5329389 Liquid crystal device |
| 07/12/1994 | US5329354 Alignment apparatus for use in exposure system for optically transferring pattern onto object |
| 07/12/1994 | US5329336 Exposure method and apparatus |
| 07/12/1994 | US5329335 Method and apparatus for projection exposure |
| 07/12/1994 | US5329334 Integrated circuit test reticle and alignment mark optimization method |
| 07/12/1994 | US5329333 Exposure apparatus and method |
| 07/12/1994 | US5329332 System for achieving a parallel relationship between surfaces of wafer and reticle of half-field dyson stepper |
| 07/12/1994 | US5329331 Post-processing apparatus with solution's temperature detector |
| 07/12/1994 | US5329157 Semiconductor packaging technique yielding increased inner lead count for a given die-receiving area |
| 07/12/1994 | US5329126 Apparatus and process for vacuum-holding an object |
| 07/12/1994 | US5328973 Radiation-sensitive mixture with a polymeric binder containing units of α,β-unsaturated carboxamides |
| 07/12/1994 | US5328811 Polyaldehyde layer on copper oxide, copper foil and substrate for lithographic images |
| 07/12/1994 | US5328807 Photoresists films, radiation transparent plates, phase shift, and patterns |
| 07/12/1994 | US5328806 Positive image formation utilizing radiation sensitive mixture containing dimeric or trimeric sesamol/aldehyde condensation products as sensitivity enhancers |
| 07/12/1994 | US5328805 Aqueous developable photosensitive polyurethane-(meth)acrylate |
| 07/12/1994 | US5328804 Improved resolution, acrylic ester monomers containing uretidine dione and hexahydrotriazine trione groups |
| 07/12/1994 | US5328803 Photopolymerizable composition |
| 07/12/1994 | US5328800 Color image forming method using silver halide, reducing agent, polymerizable compound and colorant |
| 07/12/1994 | US5328797 Process for producing a negative-working lithographic printing form utilizing solvent mixture of mono-(C1 -C4) alkyl ether of diethylene glycol and a solvent having boiling point between 50° and 150° C. |
| 07/12/1994 | US5328785 High power phase masks for imaging systems |
| 07/12/1994 | US5328752 Substrate for printed circuit boards using photocurable resin and process for producing the same |
| 07/12/1994 | US5328560 Method of manufacturing semiconductor device |
| 07/12/1994 | US5328551 Method of making high output strain gage |
| 07/12/1994 | US5328537 Method for manufacturing screen printing plate |
| 07/12/1994 | CA2011361C Narrow-band laser apparatus |
| 07/07/1994 | WO1994015262A1 Process for producing a developer having a low metal ion level |
| 07/07/1994 | WO1994015261A1 Method of generating lines on semiconductor wafer |
| 07/07/1994 | WO1994015260A1 Pattern forming material |
| 07/07/1994 | WO1994015259A1 Resin compositions for photoresist applications |
| 07/07/1994 | WO1994015258A1 Photodefinable polymers containing perfluorocyclobutane groups |
| 07/07/1994 | WO1994014893A1 Novolak resin blends for photoresist applications |
| 07/07/1994 | WO1994014892A1 Photosensitive resin composition for color filter |
| 07/07/1994 | WO1994014863A1 Metal ion reduction in the raw materials |
| 07/07/1994 | WO1994014862A1 Using a lewis base to control molecular weight of novolak resins |
| 07/07/1994 | WO1994014858A1 Metal ion reduction in polyhydroxystyrene and photoresists |
| 07/07/1994 | CA2151151A1 Photodefineable polymers containing perfluorocyclobutane groups |
| 07/06/1994 | EP0605361A2 Photosensitive compositions |
| 07/06/1994 | EP0605350A1 Solvent stabilization process and method of recovering solvent |
| 07/06/1994 | EP0605331A1 Bleaching of dyes in photosensitive systems |
| 07/06/1994 | EP0605124A2 Radiation-sensitive resist composition |
| 07/06/1994 | EP0605123A2 Method for integrated circuit fabrication including linewidth control during etching |
| 07/06/1994 | EP0605103A1 Projection apparatus for immersed exposure |
| 07/06/1994 | EP0605095A1 Apparatus and method for preparing a developer solution |
| 07/06/1994 | EP0605089A2 Photoresist composition |
| 07/06/1994 | EP0605029A1 Data-hiding and skew scan for unioning of shapes in electron beam lithography post-processing |
| 07/06/1994 | EP0604841A1 Process for making patterned polymer layers with non-linear optical properties |
| 07/06/1994 | EP0586373A4 Methods of fabricating dual anode, flat panel electrophoretic displays |
| 07/05/1994 | US5327475 Soft x-ray submicron lithography using multiply charged ions |
| 07/05/1994 | US5327415 Integrated light deflector and method of fabrication therefor |
| 07/05/1994 | US5327338 Scanning laser lithography system alignment apparatus |
| 07/05/1994 | US5327033 Micromechanical magnetic devices |
| 07/05/1994 | US5326850 Molding materials based on unsaturated copolyamides |
| 07/05/1994 | US5326840 Radiation-sensitive mixture containing novel polymers embodying units composed of amides of α, β-unsaturated carboxylic acids as binders |
| 07/05/1994 | US5326826 Binder |
| 07/05/1994 | US5326792 Protective coatings for flexibile circuits |
| 07/05/1994 | US5326729 Transparent quartz glass and process for its production |
| 07/05/1994 | US5326727 Method for integrated circuit fabrication including linewidth control during etching |
| 07/05/1994 | US5326675 Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer |
| 07/05/1994 | US5326674 Photolithography |
| 07/05/1994 | US5326673 Method by use of the letterpress |
| 07/05/1994 | US5326672 Resist patterns and method of forming resist patterns |
| 07/05/1994 | US5326671 Triazine polymers |
| 07/05/1994 | US5326670 Process for forming resist pattern |
| 07/05/1994 | US5326669 Photosensitive compositions |
| 07/05/1994 | US5326667 Forming color proof directly from digital image data |
| 07/05/1994 | US5326665 Positive type resist composition |
| 07/05/1994 | US5326663 Method of manufacturing shadow mask |
| 07/05/1994 | US5326659 For optical lithography, focusing |