| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/27/1994 | US5350661 Light sensitive printing plates with copolymers of conjugated dienes, acrylic acids and vinyl monomers |
| 09/27/1994 | US5350660 Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere |
| 09/27/1994 | US5350649 Microminiaturization optical masking and supports, exposure to light and focusing ion beams |
| 09/27/1994 | US5350644 Photovoltaic cells |
| 09/27/1994 | US5350485 High-resolution lithography and semiconductor device manufacturing method |
| 09/27/1994 | CA1332119C Resist compositions and use |
| 09/22/1994 | DE4308329A1 Process for the production of microstructures in polymers |
| 09/21/1994 | EP0616258A1 Radiation sensitive composition and process for forming relief structures with improved contrast |
| 09/21/1994 | EP0616257A2 Image transfer method and material |
| 09/21/1994 | EP0616241A2 A method of manufacturing a liquid crystal display device with excimer laser |
| 09/21/1994 | EP0615634A1 Production of lithographic printing plates in a dry manner. |
| 09/21/1994 | EP0472727B1 Narrow-band oscillation excimer laser |
| 09/21/1994 | CN1092554A Method for forming a fine-pattern |
| 09/20/1994 | US5349413 Sheet-like material processing apparatus |
| 09/20/1994 | US5349172 Optical scanning head |
| 09/20/1994 | US5349035 Bisphenol diacrylate |
| 09/20/1994 | US5348844 Domains of latex and elastomer bound by photopolymerizable compounds filling interstices, flexography |
| 09/20/1994 | US5348842 Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride |
| 09/20/1994 | US5348839 Photodelineable coatings from hydrogen silsesquioxane resin |
| 09/20/1994 | US5348838 Photoresist |
| 09/20/1994 | US5348837 Projection exposure apparatus and pattern forming method for use therewith |
| 09/20/1994 | US5348836 Silver halide photographic material |
| 09/20/1994 | US5348835 Without photoresist |
| 09/20/1994 | US5348834 Films for images |
| 09/20/1994 | US5348833 Colored positive-working quinone diazide photosensitive recording material for the production of a color test image utilizing adhesive layer containing alkali-insoluble organic polymer and alkali-soluble polyester |
| 09/20/1994 | US5348826 Patterning radiation sensitive layers; optics; semiconductors |
| 09/20/1994 | US5348605 Tilting bucket assembly for photopolymer platemaking |
| 09/20/1994 | CA1332093C Photoimagable solder mask coating |
| 09/20/1994 | CA1332031C Radiation-sensitive mixture for photosensitive coating materials |
| 09/19/1994 | CA2111451A1 Image transfer method |
| 09/15/1994 | WO1994020885A1 Apparatus for treating photographic originals with a treatment liquid |
| 09/15/1994 | WO1994020883A1 Variable annular illuminator for photolithographic projection imager |
| 09/15/1994 | WO1994020300A1 Clamping device |
| 09/15/1994 | WO1994020223A1 Method and system for applying a marking to a substrate, particularly a painted border adjacent to and around a windshield plate |
| 09/15/1994 | DE4408318A1 Photosensitive composition, and process for structure production using same |
| 09/15/1994 | DE4407920A1 Mounting of transparencies |
| 09/15/1994 | DE4406284A1 Polyamidic acid composition |
| 09/14/1994 | EP0615233A1 Recordable optical element having a leuco dye |
| 09/14/1994 | EP0615163A1 Onium salts and positive resist materials using the same |
| 09/14/1994 | EP0615162A2 Infra-red sensitive aqueous wash-off photoimaging element |
| 09/14/1994 | EP0614958A1 Cationic cross-linkable polyorganosiloxane compositions, their use as anti-adherents for paper and for protecting optical fibers and integrated circuits |
| 09/14/1994 | EP0614546A1 Silver halide photographic material |
| 09/14/1994 | EP0614497A1 Apparatus and method for treating a wafer of semiconductor material. |
| 09/14/1994 | CN1092183A Method for changing of contrast of picture |
| 09/14/1994 | CN1092182A Color scanner |
| 09/13/1994 | US5347561 X-ray exposure apparatus and semiconductor-device manufacturing method |
| 09/13/1994 | US5347356 Substrate aligning device using interference light generated by two beams irradiating diffraction grating |
| 09/13/1994 | US5347341 Photographic printing apparatus |
| 09/13/1994 | US5347162 Preformed planar structures employing embedded conductors |
| 09/13/1994 | US5347040 Sensitized onium salts |
| 09/13/1994 | US5346975 For wear resistant lithographic printing plates; photocrosslinkable; from maleimido group containing macromer |
| 09/13/1994 | US5346808 Positive image formation utilizing o-quinonediazide composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone |
| 09/13/1994 | US5346806 Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture |
| 09/13/1994 | US5346805 Photopolymerizable composition |
| 09/13/1994 | US5346804 Acid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixture |
| 09/13/1994 | US5346803 Chemical amplification type; large scale integrated microcircuits |
| 09/13/1994 | US5346801 Boron anion salt of cationic dye as photoinitiator |
| 09/13/1994 | US5346799 Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde |
| 09/13/1994 | US5345870 "Direct-to-press" positive lithographic printing plate and method for making same |
| 09/13/1994 | US5345816 Integrated tip strain sensor for use in combination with a single axis atomic force microscope |
| 09/13/1994 | CA1331927C Positive-type photosensitive electrodeposition coating composition |
| 09/13/1994 | CA1331926C Photoresist compositions |
| 09/08/1994 | DE4407292A1 Photosensitive resin |
| 09/08/1994 | DE4407044A1 Maske und Verfahren zu deren Herstellung Mask and method for their preparation |
| 09/08/1994 | DE4406871A1 Print production process |
| 09/07/1994 | EP0614215A1 Process for forming a metal contact on a relief of a semicondactor substrate, including a step of flowing a photosensitive resin layer |
| 09/07/1994 | EP0614126A1 Process for making a photoresist pattern and photoresist composition containing an oxidising compound |
| 09/07/1994 | EP0614125A1 Method and device for preparing flexible photo-sensible printing plates arranged on a cylindrical carrier |
| 09/07/1994 | EP0614124A2 Exposure apparatus |
| 09/07/1994 | EP0614123A1 Water-soluble electrically conducting polymers, their synthesis and use |
| 09/07/1994 | EP0614122A1 Tetra-acrylates containing polymerizable mixtures |
| 09/07/1994 | EP0614121A1 Deep uv sensitive photoresist resistant to latent image decay |
| 09/07/1994 | EP0614120A1 A source of photochemically generated acid for microelectronic photoresists |
| 09/07/1994 | EP0614119A1 Image forming device and method |
| 09/07/1994 | EP0614113A2 Silver halide photographic photosensitive material |
| 09/07/1994 | EP0614097A1 Image projection method and semiconductor device manufacturing method using the same |
| 09/07/1994 | EP0539411B1 Composite polyester films and their utilization as protection layer for photopolymer plates and photopolymer plates provided with such films |
| 09/06/1994 | US5345391 Method and apparatus for production of high resolution three-dimensional objects by stereolithography |
| 09/06/1994 | US5345336 Micro aspherical lens and fabricating method therefor and optical device |
| 09/06/1994 | US5345292 Illumination device for projection exposure apparatus |
| 09/06/1994 | US5344748 Microplastic structure and method of manufacture |
| 09/06/1994 | US5344747 Printed circuit manufacture, mild alkaline etching in short time |
| 09/06/1994 | US5344746 Applying a coating of photoresists, masking, exposure to light and removal of mask and development |
| 09/06/1994 | US5344744 Photosensitive resin composition |
| 09/06/1994 | US5344742 Benzyl-substituted photoactive compounds and photoresist compositions comprising same |
| 09/06/1994 | US5344740 Positive-type photosensitive electrodeposition coating composition containing quinonediazide resin having an anion-forming group and a nitrogen-containing compound and process for producing circuit plate using same |
| 09/06/1994 | US5344739 Photosensitive diazo resin composition for lithographic printing utilizing a xanthene dye having an anion group as the counter ion of the diazonium group |
| 09/06/1994 | US5344729 Rigid shell, metal film, photoresist |
| 09/06/1994 | US5344522 Pattern forming process and process for preparing semiconductor device utilizing said pattern forming process |
| 09/06/1994 | US5344298 Apparatus for making three-dimensional objects by stereolithography |
| 09/06/1994 | CA2116912A1 Polymerisable compositions containing tetraacrylates |
| 09/06/1994 | CA2111633A1 Deep uv sensitive photoresist resistant to latent image decay |
| 09/06/1994 | CA2111632A1 Source of photochemically generated acid for microelectronic photoresists |
| 09/02/1994 | CA2116624A1 Radiation-sensitive mixture and the production of relief structures having improved contrast |
| 09/01/1994 | WO1994019822A1 Laser controlled nanolithography |
| 09/01/1994 | WO1994019725A1 Photosensitive resin composition and process for forming relief pattern therefrom |
| 09/01/1994 | WO1994019724A1 Novel matrix resin for high-temperature stable photoimageable compositions |
| 09/01/1994 | WO1994019723A1 Resolution-enhancing optical phase structure for a projection illumination system |
| 09/01/1994 | WO1994019396A1 Polymers with intrinsic light-absorbing properties |
| 09/01/1994 | WO1994019174A1 Process for producing a three-dimensional object |