Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/1994
05/17/1994US5313272 Method and apparatus for measuring deviation between patterns on a semiconductor wafer
05/17/1994US5313248 Heat protection of photosensitive elements in image formation apparatus
05/17/1994US5312905 Image forming materials
05/17/1994US5312780 Forming anti-reflective coating by sputtering amorphous silicon on substrate
05/17/1994US5312720 Development of photosensitive images exposed photoresists
05/17/1994US5312719 Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms
05/17/1994US5312717 Residue free vertical pattern transfer with top surface imaging resists
05/17/1994US5312716 Process for producing a semiconductor
05/17/1994US5312715 Light-sensitive composition and process
05/17/1994US5312516 Immersion of tantalum pentoxide and illumination
05/17/1994US5312510 Apparatus for optimally scanning a two-dimensional surface of one or more objects
05/17/1994US5312505 Film peeling method and apparatus for practicing same
05/17/1994CA2018262C Lithographic technique using laser scanning for fabrication of electronic components and the like
05/17/1994CA1329599C Styryl compounds, process for preparing the same and photoresist compositions comprising the same
05/17/1994CA1329507C Etched glass and process of manufacturing same
05/17/1994CA1329506C Color image forming method using leuco dyes and recording material containing leuco dyes
05/17/1994CA1329505C Coating printing cylinders by applying a photocrosslinkable recording layer
05/12/1994CA2102148A1 Positive resist composition
05/11/1994WO1994010684A1 Optically readable information disc including visible ornamental hologram, and method of fabricating same
05/11/1994WO1994010633A1 Rasterizer for a pattern generation apparatus
05/11/1994WO1994010611A1 Developer circulating method in flexographic plate making step and apparatus for practicing the same
05/11/1994WO1994010608A1 Chemically amplified photoresist
05/11/1994WO1994010607A1 Imaging medium and process
05/11/1994WO1994010606A1 Imaging medium and process
05/11/1994WO1994010223A1 Unitary reaction resin systems
05/11/1994WO1994009989A1 Improved laser pattern generation apparatus
05/11/1994EP0596668A2 Process for imaging of photoresist
05/11/1994EP0596515A1 Alkaline photoresist stripping composition producing reduced metal corrosion
05/11/1994EP0596294A1 Positive-working radiation-sensitive mixture and recording material produced therewith
05/11/1994DE4338437A1 Lichtempfindliche Harzzusammensetzung A photosensitive resin composition
05/11/1994DE4338079A1 Copying process esp. for making colour proof from digital date - with substrate, peel coat and photopolymerisable coat contg. silver halide emulsion, which is transferred with peel coat after cure
05/11/1994DE4237531A1 Automatic positioning system for offset printing plate prodn. - has travelling mounting plate for master originals and movable printing plate carrier for multi-original large format exposure
05/11/1994CA2148122A1 Improved laser pattern generation apparatus
05/11/1994CA2148121A1 Rasterizer for a pattern generation apparatus
05/11/1994CA2147633A1 Imaging medium and process
05/11/1994CA2147632A1 Imaging medium and process
05/11/1994CA2127108A1 Developer-circulating method in flexographic printing plate-making process and apparatus for carrying out developer-circulating method
05/10/1994US5311362 Projection exposure apparatus
05/10/1994US5311282 High precision stepping aligner having a spiral stepping pattern
05/10/1994US5311252 Method of proximity imaging photolithographic structures for ink jet printers
05/10/1994US5311250 Pellicle mounting apparatus
05/10/1994US5311249 Projection exposure apparatus
05/10/1994US5311247 Plate making machine
05/10/1994US5310909 Photochromic compounds, a process for their preparation, and their use
05/10/1994US5310869 Crosslinked
05/10/1994US5310862 Photosensitive polyimide precursor compositions and process for preparing same
05/10/1994US5310703 Method of manufacturing a semiconductor device, in which photoresist on a silicon oxide layer on a semiconductor substrate is stripped using an oxygen plasma afterglow and a biased substrate
05/10/1994US5310626 Inorganic dielectric, nitride
05/10/1994US5310625 Improved wall angles
05/10/1994US5310624 Integrated circuit micro-fabrication using dry lithographic processes
05/10/1994US5310623 As a replica in a photoresist material which is used to reproduce directly in a substrate
05/10/1994US5310622 Masking
05/10/1994US5310621 Ionizing noble gas using radio frequency electric field; etching; applying photoresist
05/10/1994US5310620 Alkali-soluble nitrone compounds and contrast enhanced material comprising the same
05/10/1994US5310619 Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable
05/10/1994US5310618 Light-sensitive compositions and articles utilizing a compound or polymer containing an aromatic diazonium salt group and a light-absorbing residue of a sensitizing dye for trichloromethyl-s-triazine or azinium salt photopolymerization initiators
05/10/1994US5310581 Photocurable compositions
05/10/1994US5310428 Solvent stabilization process and method of recovering solvent
05/10/1994CA1329335C Image-forming method employing light-sensitive material
05/05/1994DE4311738C1 Photosensitive mixt. contg. esterified copolymer of cyclic anhydride - and olefin, esterified with unsatd. alcohol, diazonium polycondensate and exposure indicator and use in printing plate prodn.
05/05/1994DE4242632C1 X-ray mask copying system using X-ray beam lithography - uses telescope and capacitive spacing sensor for accurate alignment and spacing of mask holders and heat sink
05/05/1994DE4236609A1 Method for forming a structure in the surface of a substrate - with an auxiliary structure laterally bounding an initial masking structure, followed by selective removal of masking structure using the auxiliary structure as an etching mask
05/04/1994EP0595776A2 Method and system for making a pre-emulsified fabric for printing matrix assemblies
05/04/1994EP0595750A1 An alternating RIM phase-shifting mask.
05/04/1994EP0595749A2 In situ resist control during spray and spin in vapor
05/04/1994EP0595702A2 Acrylic surfactants and compositions containing those surfactants
05/04/1994EP0595361A2 Method of forming micropatterns
05/04/1994EP0595196A1 Optical focus test pattern monitoring system and process
05/04/1994EP0594895A1 Photographic processing apparatus
05/04/1994EP0514436B1 Overlay proofs comprising precolored and toned images
05/04/1994EP0424464B1 Thermally stable phenolic resin compositions and their use in light-sensitive compositions
05/04/1994EP0380676B1 Photoresist composition
05/04/1994EP0346355B1 Photopatternable composite
05/04/1994CN1086372A Process for producing printed wiring board
05/03/1994US5309274 Optical beam scanning apparatus
05/03/1994US5309209 Heat-fixing apparatus for color video printer including a stationary heat tube
05/03/1994US5309198 Light exposure system
05/03/1994US5309197 Projection exposure apparatus
05/03/1994US5309196 Transfer imaging system
05/03/1994US5308991 Method and apparatus for making a predistorted reticle to compensate for lens distortions
05/03/1994US5308746 Silver image bleaching solution and process
05/03/1994US5308745 Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins
05/03/1994US5308744 Light sensitive elements, relief images and photoresists
05/03/1994US5308743 Positive image-forming process utilizing glass substrate with oxide film of indium-tin alloy, coated with o-quinonediazide photoresist, with etching of the oxide film in the imagewise exposed areas
05/03/1994US5308742 Method of etching anti-reflection coating
05/03/1994US5308741 Radiation; semiconductors
05/03/1994US5308740 Electrical measurement of sidewall angle
05/03/1994US5308739 Multilayer light sensitive element for images
05/03/1994US5308735 Aromatic-aldehyde resins, improved solubility
05/03/1994US5308722 Voting technique for the manufacture of defect-free printing phase shift lithography
05/03/1994US5308447 Endpoint and uniformity determinations in material layer processing through monitoring multiple surface regions across the layer
05/03/1994US5308180 Liquid applicator with metering insert
05/03/1994CA1329045C Negative working photoresists responsive to shorter visible wavelengths and novel coated articles
05/03/1994CA1329044C Enhanced imaging composition containing an azinium activator
05/03/1994CA1329043C Photopolymerizable composition
05/03/1994CA1329042C Dye sensitized photographic imaging system
05/03/1994CA1329041C Negative working photoresists responsive to longer wavelengths and novel coated articles
05/03/1994CA1329037C Stripping compositions and methods of stripping resists from substrates
05/03/1994CA1329036C Phenoxy propanol containing developer compositions for lithographic plates having neutral ph
05/03/1994CA1329035C Method for producing amine-formaldehyde microcapsules and photosensitive microcapsules produced thereby