Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/1994
02/22/1994US5288917 Liquid photoinitiator mixtures
02/22/1994US5288829 Curable silicone composition
02/22/1994US5288729 Exposing method and apparatus
02/22/1994US5288589 Storage stability
02/22/1994US5288588 Containing diamine substituted with phenolic hydroxyl, carboxyl, thiophenol and/or sulfonic groups
02/22/1994US5288587 Radiation-sensitive positive resist composition comprising an o-quinone diazide, an alkali-soluble resin and a polyphenol compound
02/22/1994US5288586 Image-foring process using microcapsules
02/22/1994US5288572 Directing pulsed monochromatic light on exposed region, detecting defracted light
02/22/1994US5288571 Comprising unsaturated polyetherurethane copolymers; acrylated resins; exposing to actinic radiation; releases paper dust, efficient
02/22/1994US5288570 Composite black and white substrate for color proofing films
02/22/1994US5288567 Stencil mask and charged particle beam exposure method and apparatus using the stencil mask
02/22/1994US5288368 Electron beam lithography with reduced charging effects
02/22/1994CA1327156C Apparatus and process for processing printing plates
02/21/1994CA2100516A1 Negative photoresist composition
02/21/1994CA2100392A1 Negative photoresist composition
02/17/1994WO1994003840A1 Method and product for particle mounting
02/17/1994WO1994003839A1 Process and element for making a relief image using an ir sensitive layer
02/17/1994WO1994003838A1 A flexographic printing element having an ir ablatable layer and process for making a flexographic printing plate
02/17/1994WO1994003837A1 Positive-acting radiation-sensitive mixture and recording material produced therewith
02/17/1994WO1994003551A1 Dialkyl alkoxy phenyl sulfonium salt cationic initiators
02/17/1994DE4226994A1 Heat resistant, thermally conductive anisotropic polymers - obtd. by in-situ crosslinking of mesogenic monomers in the liq. crystalline state, used in (micro)electronics esp. for multilayer circuits
02/17/1994DE4226464A1 Positive resist for dry development and fixing giving half-micron resolution - by e.g. silylation in aq. alcohol at room temp. is based on polymer with anhydride gps. photo-base and acid or precursor.
02/17/1994CA2138759A1 Method and product for particle mounting
02/17/1994CA2138411A1 Dialkyl alkoxy phenyl sulfonium salt cationic initiators
02/16/1994EP0583205A1 Polymeric dyes for antireflective coatings
02/16/1994EP0583035A1 Transmission mechanism, positioning device provided with such a transmission mechanism and lithographic device provided with such a positioning device
02/16/1994EP0583032A2 Photographic development apparatus
02/16/1994EP0582753A1 Heat- and photosensitive imaging element
02/16/1994EP0582752A1 Photographic development apparatus and a method relating thereto
02/16/1994EP0582751A1 Photographic development apparatus
02/16/1994EP0449969B1 Photoresist compositions containing cobalt (iii) compound and redox transfer ligand
02/16/1994EP0339020B1 Method of patterning resist for printed wiring board
02/15/1994US5287395 Inclined monochromator for high heat-load synchrotron x-ray radiation
02/15/1994US5287159 Image forming apparatus having a function of automatically detecting an original size and direction
02/15/1994US5287142 Projection exposure apparatus
02/15/1994US5286963 Projection exposure apparatus and method, a semiconductor device manufacturing system and method, and a semiconductor device manufactured by illuminating an original having a circuit pattern when the original and a wafer are in a focused state
02/15/1994US5286867 Substituted 1-sulfonyloxy-2-pyridones and process for preparing them
02/15/1994US5286622 Light-sensitive element for silver salt diffusion transfer method
02/15/1994US5286612 Process for generation of free superacid and for imaging, and imaging medium for use therein
02/15/1994US5286611 Photoresist
02/15/1994US5286610 Illuminating thin region on semiconductor substrate to make it pervious to light and exposing photoresist underneath; selectively removing either region
02/15/1994US5286609 Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray
02/15/1994US5286608 TiOx as an anti-reflection coating for metal lithography
02/15/1994US5286607 Photoresist patterning; integrated circuits
02/15/1994US5286606 Treating ion exchange resin with water, then mineral acid solution, passing surfactant solution through ion exchange resin, mixing surfactant with metal ion free developer
02/15/1994US5286605 Method for producing solid-state imaging device
02/15/1994US5286604 Single layer dry processible photothermal-sensitive element
02/15/1994US5286603 Radiation sensitive plates
02/15/1994US5286602 Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture
02/15/1994US5286601 Composition containing a halomethyl-1,3,5-triazine containing an amine-containing moiety
02/15/1994US5286600 Negative photosensitive composition and method for forming a resist pattern by means thereof
02/15/1994US5286599 Novolak polymer and-or poly(p-vinylphenol), organosilicon material, amino polymer and catinic photocatalyst
02/15/1994US5286597 Photosensitive transfer material
02/15/1994US5286595 Process for creating a tacky tonable image surface through exposure of a substrate coated with a polymer blend, including a photo-acid generator, to actinic radiation
02/15/1994US5286594 Nontacky, mar resistant, easily developed durable plates
02/15/1994US5286584 Method of manufacturing a device and group of masks for this method
02/15/1994US5286463 Using a reducing sugar
02/15/1994US5286345 Photolithographic etching process for fabricating wire screen disks for cryogenic cooler regenerators
02/15/1994CA2103863A1 Method for preparing high resolution wash-off images and non-photosensitive elements for use therein
02/15/1994CA1326971C Printing plate precursors
02/10/1994DE4225946A1 Print block carrier laser exposure - has laser transmitter divided into several organs allocated to sections along length of exposure line to block
02/10/1994DE4225830A1 Positiv arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial Positive working radiation-sensitive mixture and thus produced recording material
02/09/1994EP0582539A1 Chemical pre-treatment and biological destruction of propylene carbonate waste effluent streams to reduce the biological oxygen demand thereof
02/09/1994EP0582538A2 Propylene carbonate recovery process
02/09/1994EP0582313A2 Positive photosensitive resin composition
02/09/1994EP0582253A2 Apparatus for the posttreatment of image-wise exposed printing plates
02/09/1994EP0582252A2 Pretreatment device for photosensitive printing elements
02/09/1994EP0582251A2 Laser exposure apparatus for printing plates
02/09/1994EP0582179A2 Method for producing color filter
02/09/1994EP0582019A1 Fully automated and computerized conveyor based manufacturing line architectures adapted to pressurized sealable transportable containers
02/09/1994EP0582018A1 Pressurized interface apparatus for transferring a semiconductor wafer between a pressurized sealable transportable container and a processing equipment
02/09/1994EP0582017A1 Dispatching apparatus with a gas supply distribution system for handling and storing pressurized sealable transportable containers
02/09/1994EP0582016A1 Pressurized sealable transportable containers for storing a semiconductor wafer in a protective gaseous environment
02/09/1994EP0343246B1 Ultraviolet-absorptive polymer material
02/08/1994US5285488 Semiconductor device manufacturing method
02/08/1994US5285236 Large-area, high-throughput, high-resolution projection imaging system
02/08/1994US5285142 Electromagnetic alignment apparatus
02/08/1994US5285131 Vacuum-sealed silicon incandescent light
02/08/1994US5284797 Semiconductor bond pads
02/08/1994US5284737 Process of developing an image utilizing positive-working radiation sensitive mixtures containing alkali-soluble binder, o-quinonediazide photoactive compound and blankophor FBW actinic dye
02/08/1994US5284736 Flame-resistant photo-curable resin composition
02/08/1994US5284735 Mixture of radical-polymerizable compound having two or more double bonds, photoinitiator, high molecular weight organic compound and di-substituted ethylene compound
02/08/1994US5284734 Radiation-sensitive mixture and use thereof
02/08/1994US5284725 Photo-mask for manufacture of two-layer tab
02/08/1994US5284547 Etching semiconductor wafer surfaces, detecting end point by monitoring concentration of gases generated
02/06/1994CA2101582A1 Laser exposure apparatus for printing forms to be imagewise exposed
02/04/1994CA2100279A1 Aqueous developable photosensitive polyurethane-(meth)acrylate
02/03/1994WO1994002886A1 Method for the preparation of a polymer composition containing an electrically conductive polymer
02/03/1994WO1994002885A1 Hexahydroxybenzophenone sulfonate esters of diazonaphthoquinone sensitizers and positive photoresists employing same
02/03/1994WO1994002807A1 Double-sided circuit board exposure machine and method with optical registration and sag compensation
02/02/1994EP0581585A1 Catadioptric reduction projection optical system
02/02/1994EP0581445A1 Method and apparatus for the computer-controlled manufacture of three-dimensional objects from computer data
02/02/1994EP0581311A2 Alkali developable photosensitive resin composition
02/02/1994EP0581280A2 Pattern forming method
02/02/1994EP0581144A2 Adhesive composition for imaging medium
02/02/1994CN1081557A Method for forming tin solder durable figures with photosensitive thermosetting resin composition
02/01/1994US5283798 Laser screen for a cathode-ray tube and method for making same
02/01/1994US5283611 Image formation device with wrinkle free transport of film type photosensitive member
02/01/1994US5283374 Selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone and their use as sensitivity enhancers for radiation sensitive mixtures
02/01/1994US5283324 Process for preparing radiation sensitive compound and positive resist composition