| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/18/1995 | EP0634028A1 Method for forming a lithographic pattern in a process for manufacturing semiconductor devices |
| 01/18/1995 | EP0633823A1 Removal of surface contaminants by irradiation |
| 01/17/1995 | US5383217 Exposure apparatus with laser source requiring new gas introduction |
| 01/17/1995 | US5383136 Electrical test structure and method for measuring the relative locations of conducting features on an insulating substrate |
| 01/17/1995 | US5383000 Partial coherence varier for microlithographic system |
| 01/17/1995 | US5382999 Optical pattern projecting apparatus |
| 01/17/1995 | US5382800 Charged particle beam exposure method and apparatus |
| 01/17/1995 | US5382637 Solid state chain extension polymerization between Lewis acid oligomers and deblocked Lewis bases |
| 01/17/1995 | US5382498 Processes for electron lithography |
| 01/17/1995 | US5382495 Cellulose ester, hydroxylated resin, crosslinking agent, silica and acid catalyst |
| 01/17/1995 | US5382317 Method of selectively applying a coating to a bilevel substrate |
| 01/17/1995 | US5382127 Pressurized interface apparatus for transferring a semiconductor wafer between a pressurized sealable transportable container and a processing equipment |
| 01/17/1995 | US5382095 Static pressure bearing device |
| 01/17/1995 | US5381807 Method of stripping resists from substrates using hydroxylamine and alkanolamine |
| 01/17/1995 | CA2037063C Optical machining apparatus |
| 01/12/1995 | WO1995001257A1 Method of forming a three-dimensional coloured article |
| 01/12/1995 | DE4400315C1 Process for the stepwise construction of microstructure elements, and microstructure elements produced by this process |
| 01/11/1995 | EP0633717A1 Process for manufacturing solderable printed circuit board |
| 01/11/1995 | EP0633716A1 Method for drying resist film formed by electrodeposition |
| 01/11/1995 | EP0633506A1 Scanning exposure apparatus |
| 01/11/1995 | EP0633505A1 Process and device for adjusting the distance between a workpiece and a mask |
| 01/11/1995 | EP0633504A1 Method for making a printing plate according to the silver salt diffusion transfer process |
| 01/11/1995 | EP0633503A1 Photopolymerizable compositions |
| 01/11/1995 | EP0633502A1 Pattern forming material |
| 01/11/1995 | EP0633501A2 Photosensitive material and image forming method |
| 01/11/1995 | EP0633500A1 Photosensitive composition and process for image formation |
| 01/11/1995 | EP0633499A1 Radiation sensitive resist composition |
| 01/11/1995 | EP0633498A1 Photographic processing apparatus |
| 01/11/1995 | EP0633296A1 Novel dyestuffs and their use |
| 01/11/1995 | EP0329791B1 Photosensitive resin composition and color filter |
| 01/11/1995 | CA2127634A1 Method for the production of a printed circuit which is ready for soldering |
| 01/10/1995 | US5380889 Silane having, bound to silicon, leaving group capable of reacting with hydroxyl on substrate surface to form covalent bond and substituent bound to silicon via oxygen and capable of absorbing deep UV light |
| 01/10/1995 | US5380882 Phenylacetates and the use thereof |
| 01/10/1995 | US5380881 Acid labile solution inhibitors and positive- and negative-acting photosensitive composition based thereon |
| 01/10/1995 | US5380623 Aqueous developer for lithographic printing plates which provides improved oleophilicity |
| 01/10/1995 | US5380622 Production of negative relief copies |
| 01/10/1995 | US5380621 Mid and deep-UV antireflection coatings and methods for use thereof |
| 01/10/1995 | US5380620 Image-forming process |
| 01/10/1995 | US5380618 Micropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solvent |
| 01/10/1995 | US5380365 Lip surface geometry for slide bead coating |
| 01/10/1995 | US5379698 Lithographic printing members for use with laser-discharge imaging |
| 01/10/1995 | CA1333855C Process for the formation of an image |
| 01/10/1995 | CA1333854C Positive photoresists with high resolution in the near uv |
| 01/10/1995 | CA1333853C Photopolymerizable composition |
| 01/05/1995 | WO1995000882A1 Soluble, conductive copolymer, the preparation and use thereof |
| 01/05/1995 | WO1995000869A1 Optical fiber primary coatings and fibers coated therewith |
| 01/05/1995 | WO1995000573A1 Reactive polymers having pendant flexible side chains prepared from ethylenically unsaturated isocyanates |
| 01/05/1995 | WO1995000567A1 Photosensitive resin composition for corrugated board printing plate |
| 01/05/1995 | WO1995000557A1 Thiol-ene compositions with improved cure speed retention |
| 01/05/1995 | DE4320792A1 Printing frame (copier frame) for copiers in the printing trade |
| 01/04/1995 | EP0632568A1 Positioning table device |
| 01/04/1995 | EP0632331A1 Exposure apparatus and microdevice manufacturing method using the same |
| 01/04/1995 | EP0632330A2 A process for forming a photosensitive material and an exposure apparatus used for the process |
| 01/04/1995 | EP0632329A1 Functionalised photoinitiator, macromeres and their use |
| 01/04/1995 | EP0632328A1 Improvement of the storage stability of a diazo-based imaging element for making a printing plate |
| 01/04/1995 | EP0632327A1 Photoresist composition |
| 01/04/1995 | EP0632326A1 Imaging element and method for making lithographic printing plates according to the silver salt diffusion transfer process |
| 01/04/1995 | EP0632079A1 Epoxyacrylates |
| 01/04/1995 | EP0632078A1 Epoxyacrylates |
| 01/04/1995 | EP0632003A1 Novel phenol compounds containing methoxymethyl group or hydroxymethyl group |
| 01/03/1995 | US5379090 Projection exposure apparatus |
| 01/03/1995 | US5378917 Particle-beam imaging system |
| 01/03/1995 | US5378802 Method for removing impurities from resist components and novolak resins |
| 01/03/1995 | US5378659 Method and structure for forming an integrated circuit pattern on a semiconductor substrate |
| 01/03/1995 | US5378586 Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester |
| 01/03/1995 | US5378585 Resist composition having a siloxane-bond structure |
| 01/03/1995 | US5378584 Radiation-sensitive recording material with a positive-working, radiation-sensitive layer having a rough surface containing a surfactant having polysiloxane units |
| 01/03/1995 | US5378583 Exposure and development with thinning of sheets to form patterns |
| 01/03/1995 | US5378579 Photopolymerizable composition and photosensitive lithographic printing plate |
| 01/03/1995 | US5378502 Method of chemically modifying a surface in accordance with a pattern |
| 01/03/1995 | US5378498 Antistatic solution for microlithic measurement |
| 01/03/1995 | US5378317 Method for removing organic film |
| 01/03/1995 | US5378315 Removing imaging member layers from a substrate |
| 01/03/1995 | US5378298 Radiation sensitive adhesive composition and method of photoimagingsame |
| 01/03/1995 | CA2127200A1 Functionalized photoinitiators, macromers thereof, and the use thereof |
| 12/28/1994 | EP0631190A2 Use of halogenated hydrocarbon solvents |
| 12/28/1994 | EP0631189A1 Improvement of the storage stability of a diazo-based imaging element for making a printing plate |
| 12/28/1994 | EP0631188A1 Resist materials |
| 12/28/1994 | EP0631180A1 Color filter |
| 12/28/1994 | EP0630921A2 Functional polymers and their production |
| 12/28/1994 | EP0572507B1 Laser image setter |
| 12/28/1994 | EP0464131B1 Initiators for polymerization |
| 12/27/1994 | US5377251 Exposure apparatus |
| 12/27/1994 | US5376988 Parallel-moving apparatus and lens moving device in an exposing apparatus using the same |
| 12/27/1994 | US5376802 Stencil mask and charge particle beam exposure method and apparatus using the stencil mask |
| 12/27/1994 | US5376727 Polymeric bland of a matrix resin and absorbent resin and a multivalent metal ion crosslinking agent |
| 12/27/1994 | US5376518 Photographic element provided with a backing layer and method for manufacture thereof |
| 12/27/1994 | US5376507 Method to produce nonlinear optical microcomponents |
| 12/27/1994 | US5376506 Pressing waveguide cell containing nonlinear polymer into mold containing linear polymer, then filling remainder of mold with linear polymer |
| 12/27/1994 | US5376504 Acid-hardening photoresists comprising a purified hexamethoxy methylmelamine resin as a crosslinker |
| 12/27/1994 | US5376503 A photo-crosslinkable blends consisting of an isoolefin, a para-alkylstyrene and a photoinitiator substituted on the alkyl group of para-alkylstyrene monomers; corrosion, solvent resistance |
| 12/27/1994 | US5376499 Highly heat-resistant positive resists comprising end-capped hydroxypolyamides |
| 12/27/1994 | US5376498 Negative type radiation-sensitive resin composition |
| 12/27/1994 | US5376497 Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive |
| 12/27/1994 | US5376496 Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder |
| 12/27/1994 | US5376495 Light-sensitive heat-sensitive recording material |
| 12/27/1994 | US5376483 Method of making masks for phase shifting lithography |
| 12/27/1994 | US5376482 Photomask having alignment marks |
| 12/27/1994 | US5376227 Multilevel resist process |
| 12/22/1994 | WO1994029369A1 Energy-curable cyanate/ethylenically unsaturated compositions |