Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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04/05/1994 | US5300403 Line width control in a radiation sensitive polyimide |
04/05/1994 | US5300402 Cationically polymerizable epoxy based coating, solvent, thixotropic agent |
04/05/1994 | US5300401 Photopolymerizable resin material and process for preparing print circuit using the material |
04/05/1994 | US5300400 Process for the production of relief patterns and images utilizing an organic compound having at least one acid-cleavable group and a storage stability improving amount of a second organic compound |
04/05/1994 | US5300399 Negative working, peel developable, single sheet color proofing system having a crosslinked layer containing a polymer with phenolic moieties |
04/05/1994 | US5300398 Positioning between support and dye image-receiving layer; thermal transfer; color proofs |
04/05/1994 | US5300397 Light-sensitive composition comprising a diazonium compound and a macromer as the polymeric binder |
04/05/1994 | US5300396 Process of making naphthoquinone diazide esters using lactone solvents |
04/05/1994 | US5300395 Partially translucent white film having a metallized surface |
04/05/1994 | US5300380 Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers |
04/05/1994 | US5300379 Patterning, etching, removing thickness from substrate |
04/05/1994 | US5300348 Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive |
04/05/1994 | US5300190 Process of producing diffraction grating |
04/05/1994 | US5299730 Method and apparatus for isolation of flux materials in flip-chip manufacturing |
04/05/1994 | CA1328330C Photocrosslinkable liquid crystalline polymers |
03/31/1994 | WO1994007260A1 Antireflex layer and process for lithographically structuring such a layer |
03/31/1994 | WO1994007183A1 Ultraviolet light sensitive onium salts and the use thereof as photoinitiators |
03/31/1994 | WO1994007179A1 Method and apparatus for the photolithographic exposure of excess photoresist on a substrate |
03/31/1994 | WO1994007110A1 Optical endpoint determination during the processing of material layers |
03/31/1994 | DE4232844A1 Exposure method for optical projection lithography used in integrated circuit mfr. - applying imaged structure to non-planar surface of exposure mask to increase image sharpness |
03/31/1994 | DE4232733A1 Transport unit between photographic exposure and developer units - has pivoted transport rollers and guide plates allowing temporary storage of exposed sheets |
03/31/1994 | DE4232187A1 Separation of photosensitive layer from carrier on printing plate and process appts. - uses PTFE coated band knife running it guides and supplied with lubricant. |
03/30/1994 | EP0589451A2 Photoresist Compositiom |
03/30/1994 | EP0589309A1 Positive-working presensitized plate for use in making lithographic printing plate |
03/30/1994 | EP0589241A2 Photosensitive dielectric sheet composition and multilayer interconnect circuits |
03/30/1994 | EP0589109A1 Crosslinking curable resin composition |
03/30/1994 | EP0589103A1 Image projection method and semiconductor device manufacturing method using the same |
03/30/1994 | CN1084537A Method for light-assisted curing of coatings |
03/30/1994 | CA2079377A1 Crosslinking curable resin composition |
03/29/1994 | US5299251 Exposure apparatus |
03/29/1994 | US5298976 Method and apparatus for measuring surface distances from a reference plane |
03/29/1994 | US5298975 Combined scanning force microscope and optical metrology tool |
03/29/1994 | US5298939 Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
03/29/1994 | US5298761 Method and apparatus for exposure process |
03/29/1994 | US5298588 Organosilicon polymers, and dyes, exhibiting nonlinear optical response |
03/29/1994 | US5298466 Method and apparatus for dry anisotropically etching a substrate |
03/29/1994 | US5298367 Polyalkylenesulfones |
03/29/1994 | US5298366 Method for producing a microlens array |
03/29/1994 | US5298365 Size-reducing projection exposure optical system |
03/29/1994 | US5298364 Negative photoresists, acid crosslinking |
03/29/1994 | US5298363 Photolithographically patterned fluorescent coating |
03/29/1994 | US5298361 Chromophore substituted halomethyl-1,3,5-triazine photopolymerization initiator |
03/29/1994 | US5298360 Multilayer, temporary support light sensitive resin and separator |
03/29/1994 | US5298359 Photosensitive heat-resistant polymer having hydroxyphenyl group for forming a patterned image |
03/29/1994 | US5298112 Method for removing composite attached to material by dry etching |
03/29/1994 | CA2023510C Single wavelength oscillating semiconductor laser device and method for manufacturing diffraction grating |
03/29/1994 | CA1328049C Relief printing plate manufacture |
03/29/1994 | CA1328048C Water-developable photosensitive resin composition, and resin or printing plate therefrom |
03/29/1994 | CA1328047C Light-sensitive mixture and light-sensitive recording material prepared from it |
03/25/1994 | CA2104247A1 Photoresist composition |
03/24/1994 | DE4331519A1 Fine pattern prodn with high resolution using simplified efficient method - by applying first photoresist, silylating and glassifying surface, making mask with second resist layer and etching down to substrate |
03/24/1994 | DE4231312A1 Antireflexschicht und Verfahren zur lithografischen Strukturierung einer Schicht Anti-reflective coating and method for lithographic patterning a layer |
03/24/1994 | DE4231106A1 Flexographic printing plate washing - has brush deflection roller to clean reverse sides of the plates |
03/24/1994 | DE4231104A1 Polymerised flexographic printing plate finishing - has recirculating conveyor system to carry pallets through sections |
03/24/1994 | DE4231103A1 Flexographic printing plate movement - gives movement to leading end of plate to secure and release it to carrier bar at processing station for simplified and automated working |
03/24/1994 | DE4231102A1 Polymerised flexographic print plates - are moved slower through drying than washing with increasing support from below |
03/23/1994 | EP0588580A2 Method for making stencil master plates, and original paper sheet for stencil printing, stencil master plate sheet assembly, and stencil printing device suitable for use with the method |
03/23/1994 | EP0588579A1 Synchrotron X-ray exposure method |
03/23/1994 | EP0588544A2 Fine pattern forming material and pattern formation process |
03/23/1994 | EP0588492A1 High aspect ratio, flexible thick film positive photoresist |
03/23/1994 | EP0588092A2 Negtive photoresist composition |
03/23/1994 | EP0588087A2 Method of determining optimum optical conditions for an anti-reflective layer used in a method of forming a resist pattern |
03/22/1994 | US5297243 Cutout mask production apparatus and method |
03/22/1994 | US5296917 Method of monitoring accuracy with which patterns are written |
03/22/1994 | US5296916 Mask alignment system for components with extremely sensitive surfaces |
03/22/1994 | US5296893 Box for an optical stepper reticle |
03/22/1994 | US5296892 Illuminating apparatus and projection exposure apparatus provided with such an illuminating apparatus |
03/22/1994 | US5296891 Illumination device |
03/22/1994 | US5296673 For ablation excimer laser image projection ablation of a target material |
03/22/1994 | US5296530 Method for light-assisted curing of coatings |
03/22/1994 | US5296334 Containing styrene-maleic anhydride copolymer esterified with monohydric alcohol and hydroxyalkyl acrylate, multifunctional acrylate monomer, multifunctional epoxide, photoinitiator |
03/22/1994 | US5296333 Photoresist adhesion promoter |
03/22/1994 | US5296332 Crosslinkable aqueous developable photoresist compositions and method for use thereof |
03/22/1994 | US5296331 Image receiving material containing particles of thermoplastic compound |
03/22/1994 | US5296330 Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive |
03/22/1994 | US5296271 Microwave treatment of photoresist on a substrate |
03/22/1994 | US5296259 Coating substrate with salt solution, drying, heating, forming tacky patterned adhesive layer, applying metal powder, firing to remove adhesive and sinter powder |
03/22/1994 | CA1327974C Contrast enhancement layer compositions, alkylnitrones, and use |
03/17/1994 | WO1994006060A1 Image-transfer process |
03/17/1994 | WO1994006058A1 Use of a casting resin and process for producing the same |
03/17/1994 | WO1994006057A1 Polyimide precursor and photosensitive composition containing the same |
03/17/1994 | WO1994004948A1 Apparatus for providing autostereoscopic and dynamic images and method of manufacturing same |
03/17/1994 | DE4230297C1 Verwendung eines Gießharzes und Verfahren zu dessen Herstellung Use of a casting resin and process for its preparation |
03/16/1994 | EP0587411A2 Latent image receiving sheet and microcapsules for use therein |
03/16/1994 | EP0587410A2 Record material |
03/16/1994 | EP0587276A1 Device manufacture involving lithographic processing |
03/16/1994 | EP0587261A2 Multiblock copolymers for flexographic printing plates |
03/16/1994 | EP0587231A2 Method of chemically modifying a surface in accordance with a pattern |
03/16/1994 | EP0587213A1 Image formation by thermal transfer |
03/16/1994 | EP0587208A1 Confocal method and apparatus for focusing in projection lithography |
03/16/1994 | EP0587189A2 A solder resist ink composition |
03/16/1994 | EP0587159A1 3-Thienyl silicon compounds, chemically adsorbed ultrathin film formed therefrom and method of manufacturing the same |
03/16/1994 | EP0587086A2 Method for producing color filter |
03/16/1994 | EP0587033A2 Method for producing color filter |
03/16/1994 | EP0586860A2 Photoresist composition and process for forming a pattern using the same |
03/16/1994 | EP0586772A1 Apparatus for coating plate-like articles, particularly printed circuit boards |
03/16/1994 | EP0586743A1 Recording material comprising a photopolymerizable compostion containing reactive multifunctional monomers |
03/16/1994 | EP0586500A1 Method and apparatus for automatized exposing of light sensitive material by means of laser light. |
03/16/1994 | EP0586497A1 Method and apparatus of exposing light sensitive material by means of a copying machine having a vertically movable laser unit. |
03/16/1994 | EP0586483A1 Method and apparatus for washing-out printing plates |