| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/05/1994 | US5326619 Thermal transfer donor element comprising a substrate having a microstructured surface |
| 07/05/1994 | CA2040306C Color filter and method of repairing thereof, and liquid crystal display |
| 07/05/1994 | CA1330498C Photostencils for screenprinting |
| 06/30/1994 | DE4341302A1 Implanting deep buried impurity zone in semiconductor and resist compsn. |
| 06/30/1994 | DE4243750A1 Printing forme prodn. |
| 06/29/1994 | EP0604364A2 New (cyclo)aliphatic epoxy compounds |
| 06/29/1994 | EP0604343A1 X-Ray beam scanning method for producing low distortion or constant distortion in X-ray Proximity printing |
| 06/29/1994 | EP0604093A1 Catadioptric reduction projection optical system |
| 06/29/1994 | EP0604054A1 Electron beam lithography with reduced charging effects |
| 06/29/1994 | EP0603743A2 Method for preparing negative-working wash-off relief images and elements for use therein |
| 06/29/1994 | EP0603642A1 Photosensitive material and processes for producing colour-proofing sheets |
| 06/29/1994 | EP0603380A1 Method for the preparation of a polymer composition containing an electrically conductive polymer |
| 06/29/1994 | CN2170536Y Non-contact code exposure head |
| 06/28/1994 | US5325414 X-ray mask alignment method and apparatus therefor as well as X-ray mask to be used to said method and said apparatus |
| 06/28/1994 | US5325230 Optical members and blanks of synthetic silica glass and method for their production |
| 06/28/1994 | US5325180 Apparatus for identifying and distinguishing temperature and system induced measuring errors |
| 06/28/1994 | US5324953 Reduced-projection exposure system with chromatic aberration correction system including diffractive lens such as holographic lens |
| 06/28/1994 | US5324827 Diimide with at least two double bonds and a non-centrosymmetric system of PI conjugated bonds bearing an electron withdrawing group |
| 06/28/1994 | US5324804 Positive photoresists, high resolution, good contrast |
| 06/28/1994 | US5324623 Microlens forming method |
| 06/28/1994 | US5324622 Silver halide photographic material |
| 06/28/1994 | US5324620 Radiation-sensitive compositions containing novolak polymers made from four phenolic derivatives and an aldehyde |
| 06/28/1994 | US5324619 Sensitivity, resolution, heat resistance, developability |
| 06/28/1994 | US5324618 Positive type quinonediazide photoresist composition containing select tetraphenolic additive |
| 06/28/1994 | US5324600 Method of forming resist pattern and photomask therefor |
| 06/28/1994 | US5324591 Deep ultraviolet photolithographically defined ultra-thin films for selective cell adhesion and outgrowth and method of manufacturing the same and devices containing the same |
| 06/28/1994 | US5324550 Pattern forming method |
| 06/28/1994 | US5324535 Coating dry solder directly on liquid resist sub-pattern |
| 06/28/1994 | US5324012 Holding apparatus for holding an article such as a semiconductor wafer |
| 06/28/1994 | CA1330405C Positive type photosensitive resinous composition and preparation thereof |
| 06/28/1994 | CA1330404C Positive type photo-sensitive resinous composition |
| 06/28/1994 | CA1330403C Developer-finisher compositions for lithographic plates |
| 06/23/1994 | WO1994013749A1 Thin film security device (tfsd) application process and adhesive therefor |
| 06/23/1994 | WO1994013352A1 Liquid applicator with metering insert |
| 06/23/1994 | CA2150248A1 Liquid applicator with metering insert |
| 06/22/1994 | EP0603007A1 Methods of meniscus coating |
| 06/22/1994 | EP0602923A1 Exposure apparatus using a catadioptric projection system |
| 06/22/1994 | EP0602893A1 Transfer imaging elements |
| 06/22/1994 | EP0602844A1 Projection electron lithographic procedure |
| 06/22/1994 | EP0602841A2 Integrated circuit fabrication method |
| 06/22/1994 | EP0602833A1 Processes for electron lithography |
| 06/22/1994 | EP0602829A2 Grating fabrication using electron beam lithography |
| 06/22/1994 | EP0602739A2 Aqueous developer for lithographic printing plates which provides improved oleophilicity |
| 06/22/1994 | EP0602736A2 Aqueous developer for lithographic printing plates which exhibits reduced sludge formation |
| 06/22/1994 | EP0602636A1 Method for matting a recording material and atomizing device therefor |
| 06/22/1994 | EP0602634A1 Large die photolithography |
| 06/22/1994 | EP0602377A1 Polymers containing N,N-disubstituted sulfonamide side groups and their use in radiation-sensitive compositions |
| 06/22/1994 | EP0602376A1 N,N-Disbustituted sulfonamides and radiation-sensitive composition produced therewith |
| 06/22/1994 | EP0602292A1 Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates |
| 06/22/1994 | EP0602252A1 Ceramic green sheet |
| 06/22/1994 | EP0602200A1 System for detecting a latent image using an alignment apparatus |
| 06/22/1994 | EP0602187A1 Photocurable polyimide coated glass fiber |
| 06/22/1994 | EP0523042B1 Ultrafast electro-dynamic x, y and theta positioning stage |
| 06/22/1994 | CN1088325A Single-colour ink-jetting plate-making system |
| 06/21/1994 | US5323440 Semiconductor device manufacturing exposure method |
| 06/21/1994 | US5323263 Off-axis catadioptric projection system |
| 06/21/1994 | US5323209 Apparatus for precision alignment of plates used in two-sided contact printing |
| 06/21/1994 | US5323208 Projection exposure apparatus |
| 06/21/1994 | US5323184 Apparatus for recording image on photosensitive material |
| 06/21/1994 | US5323047 Structure formed by a method of patterning a submicron semiconductor layer |
| 06/21/1994 | US5323035 Interconnection structure for integrated circuits and method for making same |
| 06/21/1994 | US5323016 Focusing method |
| 06/21/1994 | US5322999 Method and apparatus for precision control of galvanometer patterning system |
| 06/21/1994 | US5322922 Copolyamide or copolyimide-amide containing sulfo groups |
| 06/21/1994 | US5322765 Dry developable photoresist compositions and method for use thereof |
| 06/21/1994 | US5322764 Method for forming a patterned resist |
| 06/21/1994 | US5322763 Functioning as emulsion build for screen printing; exposing, developing photoresists; electroplating |
| 06/21/1994 | US5322762 High contrast, visible after irradiation; tribromomethyl phenyl sulfone, leuco diamond green, and dye |
| 06/21/1994 | US5322761 Flexographic printing plate having a vanadium oxide antistatic coating layer |
| 06/21/1994 | US5322757 High resolution and thermal resistance |
| 06/21/1994 | US5322747 Method of manufacturing an optical disc |
| 06/21/1994 | US5322268 Method of and apparatus for supplying photosensitive lithographic printing plates |
| 06/21/1994 | US5322079 Substrate holding apparatus of a simple structure for holding a rotating substrate, and a substrate processing apparatus including the substrate holding apparatus |
| 06/21/1994 | US5321977 Integrated tip strain sensor for use in combination with a single axis atomic force microscope |
| 06/21/1994 | CA1330269C Process for the formation of an image |
| 06/21/1994 | CA1330268C Light sensitive mixtures for making repeatedly tonable layers |
| 06/16/1994 | DE4342123A1 Colour filter for LCD display - has a register code pattern with a given step difference to give a diffused light from a light beam |
| 06/16/1994 | DE4339053A1 New clathrates of nitrogen-contg. fullerene analogues - contg. active agents releasable by irradiation |
| 06/15/1994 | EP0601974A1 Positive photoresist with better properties |
| 06/15/1994 | EP0601887A1 Method for forming pattern |
| 06/15/1994 | EP0601760A2 Peel-apart proofing system |
| 06/15/1994 | EP0601621A1 Three dimensional imaging system |
| 06/15/1994 | EP0601600A2 Processing of lithographic printing material and developer used therein |
| 06/15/1994 | EP0601413A1 Arene bisphosphinoxides |
| 06/15/1994 | EP0601240A1 Water developable diazo based lithographic printing plate |
| 06/15/1994 | EP0601236A1 Heat-sensitive imaging element |
| 06/15/1994 | EP0601203A1 Photosensitive resin composition |
| 06/15/1994 | EP0563102B1 Process and device for producing a three-dimensional object |
| 06/15/1994 | EP0293461B1 Holograms |
| 06/14/1994 | US5321622 Boolean layer comparison slice |
| 06/14/1994 | US5321493 Apparatus and method for evaluating a projection lens |
| 06/14/1994 | US5321458 Method and apparatus for developing presensitized offset printing plates |
| 06/14/1994 | US5320983 Spin-on glass processing technique for the fabrication of semiconductor devices |
| 06/14/1994 | US5320935 Method of forming a pattern from a photosensitive heat-resistant poly(amide)imide having hydroxyphenyl groups |
| 06/14/1994 | US5320934 Masking surface of integrated circuit |
| 06/14/1994 | US5320933 Photoimageable composition having improved adhesion promoter |
| 06/14/1994 | US5320932 Method of forming contact holes |
| 06/14/1994 | US5320931 Light-sensitive composition |
| 06/14/1994 | US5320928 Photosensitive composition comprising a diazonium compound and a polyurethane |
| 06/14/1994 | US5320920 Method for producing color filter comprising an inorganic active layer and photoresist |