| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/16/1994 | US5338397 Method of forming a semiconductor device |
| 08/16/1994 | US5338396 Method of fabricating in-mold graphics |
| 08/16/1994 | US5338390 Two conductive electrodes positioned on opposite sides of wafer in etchant bath; monitoring impedance |
| 08/16/1994 | CA2003949C Process and device for forming a resist pattern on a cylindrical object, and an etched metal cylinder obtained using such a resist pattern |
| 08/11/1994 | CA2115192A1 Process for removing plastics from microstructures |
| 08/10/1994 | EP0610125A1 Master disks for producing dies, particularly for optical disks, and their method of manufacture |
| 08/10/1994 | EP0609984A1 Method of and apparatus for cover sheet removal from laminated boards |
| 08/10/1994 | EP0609891A2 Lithographic printing plate |
| 08/10/1994 | EP0609684A1 Positive-working light-sensitive composition |
| 08/10/1994 | EP0609241A1 Method for producing images using a photopolymerizable composition |
| 08/10/1994 | CN2173962Y Multipurpose photomechanical production machine |
| 08/10/1994 | CN1090522A Developer preparing apparatus and developer preparing method |
| 08/10/1994 | CA2114059A1 Wafer stage with reference surface |
| 08/09/1994 | US5337247 Exposure data forming method, pattern forming method, pattern exposure method and pattern exposure apparatus |
| 08/09/1994 | US5337169 Method for patterning an optical device for optical IC, and an optical device for optical IC fabricated by this method |
| 08/09/1994 | US5337151 Double-sided circuit board exposure machine and method with optical registration and material variation compensation |
| 08/09/1994 | US5337113 Photosensitive material processing apparatus |
| 08/09/1994 | US5337097 Projection optical apparatus |
| 08/09/1994 | US5336925 High resolution, photosensitivity, stability |
| 08/09/1994 | US5336892 Method and system for electron beam lithography |
| 08/09/1994 | US5336736 Polysilane and polysilane composition |
| 08/09/1994 | US5336630 Method of making semiconductor memory device |
| 08/09/1994 | US5336585 Photosensitive resin composition for use in forming a relief structure |
| 08/09/1994 | US5336583 Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone |
| 08/09/1994 | US5336575 Method of producing CRT screens using meniscus coating |
| 08/09/1994 | US5336574 Secondary etch resist material containing a compound with a (meth)acryloyl and a carboxy group and another with two or more (meth)acryloyl groups, along with a leveling agent and a chain transfer agent and/or a photoinitiator |
| 08/09/1994 | US5336529 Method for coating circuitboards |
| 08/09/1994 | US5336371 Immersing wafers in water-filled vessel while simultaneously pumping carbon dioxide and more water in at controlled velocity |
| 08/09/1994 | US5336319 Apparatus for applying an adhesive layer to a substrate surface |
| 08/09/1994 | US5335405 Method and apparatus for aligning phototools for photoprocessing of printed circuit boards |
| 08/05/1994 | EP0656128A4 Process for preparing electromagnetic radiation imaged material. |
| 08/04/1994 | WO1994017648A1 Method for drying resist film formed by electrodeposition |
| 08/04/1994 | WO1994017452A1 Photopolymerizable composition of high sensitivity and method for obtaining images therewith |
| 08/04/1994 | WO1994017451A1 Negative working, peel developable, single sheet color proofin system having a crosslinked layer containing a polymer with phenolic moieties |
| 08/04/1994 | WO1994017447A1 Chemical functionalization of surfaces |
| 08/04/1994 | WO1994016875A1 Process and device for producing a three-dimensional object |
| 08/04/1994 | DE4302931A1 Etch-resistant, highly viscous positive resist for photolithography |
| 08/04/1994 | DE4302564A1 Etching, pickling or developing appts. esp. for fine structuring |
| 08/04/1994 | CA2154444A1 Chemical functionalization of surfaces |
| 08/04/1994 | CA2151264A1 Negative working, peel developable, single sheet color proofing system having a crosslined layer containing a polymer with phenolic moieties |
| 08/03/1994 | EP0608983A1 A process for controlled deprotection of polymers and a process for fabricating a device utilizing partially deprotected resist polymers |
| 08/03/1994 | EP0608894A1 Positive-type photosensitive resin compositions |
| 08/03/1994 | EP0608777A1 Processing of lithographic printing material |
| 08/03/1994 | EP0608661A1 Device for coating of printing screens |
| 08/03/1994 | EP0608655A1 Integrated tip strain sensor for use in combination with a single axis atomic force microscope |
| 08/03/1994 | EP0608579A1 A heat and light sensitive imaging element |
| 08/03/1994 | EP0608572A2 Catadioptric optical reduction system with high numerical aperture |
| 08/03/1994 | EP0608448A1 Method and apparatus for determining position |
| 08/03/1994 | EP0366785B1 A color filter array |
| 08/03/1994 | CN1090399A Photosensitive dielectric sheet composition and multilayer interconnect circuits |
| 08/02/1994 | US5335259 X-ray exposure apparatus |
| 08/02/1994 | US5335047 Printing plate making apparatus for two different kinds of masters |
| 08/02/1994 | US5335044 Projection type exposure apparatus and method of exposure |
| 08/02/1994 | US5334749 Polymerizable phenol compound |
| 08/02/1994 | US5334542 Method of forming T-shaped electrode |
| 08/02/1994 | US5334489 Process for generation of squaric acid and for imaging, and imaging medium for use therein |
| 08/02/1994 | US5334487 Method for forming a patterned layer on a substrate |
| 08/02/1994 | US5334486 Reaction product of glycidyl methacrylate and a polyamine; photopolymerization initiator |
| 08/02/1994 | US5334485 Acid soluble photo-resist comprising a photosensitive polymer |
| 08/02/1994 | US5334484 Photopolymerizable composition and photopolymerizable element |
| 08/02/1994 | US5334481 Curcumin and derivatives; suppressing stray radiation or halation |
| 08/02/1994 | US5334468 Method for producing color filter |
| 08/02/1994 | US5334467 Gray level mask |
| 08/02/1994 | US5334456 Free-radical curable compositions |
| 08/02/1994 | US5334455 Free-radical curable compositions |
| 08/02/1994 | US5334342 Etching substrate to form cavities, nucleating and growing polycrystalline diamond film on surface to fill cavities, then bonding optical material to film and removing it from substrate to expose patterns |
| 08/02/1994 | US5334332 Mixture of hydroxylamine, alkanolamine and chelate compound |
| 08/02/1994 | US5334282 Forming plurality of unit patterns by shaping electron beam by means of an aperture; varying transmittance with second aperture to selectively control exposure intensity |
| 08/02/1994 | CA1331243C Photosensitive composition |
| 07/30/1994 | CA2114461A1 Positive-type photosensitive resin compositions |
| 07/27/1994 | EP0607962A1 Photosensitive resin composition |
| 07/27/1994 | EP0607947A1 Exposing device for projecting a pattern onto a photoresist layer with a surface having different levels |
| 07/27/1994 | EP0607899A2 Positive photoresist composition |
| 07/27/1994 | EP0607691A2 Method for forming an insulating layer |
| 07/27/1994 | EP0607680A2 Formation of microstructures using a preformed photoresist sheet |
| 07/27/1994 | EP0607674A1 Optical lithographical imaging system including optical transmission diffraction devices |
| 07/27/1994 | EP0607236A1 Processing waste washout liquid containing photopolymer from printing plate manufacture |
| 07/27/1994 | EP0607146A1 Thin films |
| 07/27/1994 | CN2172880Y Blueprint machine |
| 07/27/1994 | CN1090122A Manufacturing method for compound net plate of metal foil and silk screen |
| 07/27/1994 | CA2112828A1 Catadioptric optical reduction system with high numerical aperture |
| 07/26/1994 | US5333167 Mask structure for x-ray exposure and x-ray exposure device and method using it |
| 07/26/1994 | US5333166 Self-apodizing collimator for x-ray lithography |
| 07/26/1994 | US5333050 Measuring method and apparatus for meausring the positional relationship of first and second gratings |
| 07/26/1994 | US5333035 Exposing method |
| 07/26/1994 | US5332819 Photobleachable initiator systems |
| 07/26/1994 | US5332681 Method of making a semiconductor device by forming a nanochannel mask |
| 07/26/1994 | US5332653 Multilayer element with semiconductors and photoresists, forming apertures and exposure to ion bombardment, removal of masking material |
| 07/26/1994 | US5332651 Photocurable compositions comprising grafted polyvinyl alcohol derivates |
| 07/26/1994 | US5332650 Radiation-sensitive composition |
| 07/26/1994 | US5332649 Production of a photosensitive recording element |
| 07/26/1994 | US5332648 Alklali soluble phenolic polymer, cyclic ester or sulfonate which converts to the acid, an onium salt which generates an an acid on exposure to radiation |
| 07/26/1994 | US5332647 Photosensitive resins for elements |
| 07/26/1994 | US5332470 Process for manufacturing calibration structures particularly for the calibration of machines for measuring alignment in integrated circuits in general |
| 07/26/1994 | US5332440 Coating lip geometry for slide bead coating |
| 07/26/1994 | CA1330896C Photopolymers |
| 07/21/1994 | WO1994016120A2 Phosphating compositions and processes, particularly for use in fabrication of printed circuits utilizing organic resists |
| 07/21/1994 | WO1994015996A1 Toughened photocurable polymer composition for processible flexographic printing plates |
| 07/21/1994 | DE4400975A1 Imaging with UV-C radiation using coating contg. aromatic cpd. |
| 07/21/1994 | CA2157268A1 Toughened photocurable polymer composition for processible flexographic printing plates |