| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/01/1994 | US5283209 Deposition of photoresist on dielectric layer, forming window by selective ablation of resin |
| 02/01/1994 | US5283160 Polymerizable compositions |
| 02/01/1994 | US5283157 Diffusion transfer printing plate |
| 02/01/1994 | US5283156 Developing exposed imaging element using alkaline processing liquid in presence of specified sulfur compound regulator |
| 02/01/1994 | US5283155 Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative |
| 02/01/1994 | US5283152 Self-contained imaging sheet useful for reproducing images on plain paper and method therefor |
| 02/01/1994 | US5283141 Photolithography control system and method using latent image measurements |
| 02/01/1994 | US5283016 Method for preparing photosensitive microcapsules |
| 02/01/1994 | US5282921 Apparatus and method for optimally scanning a two-dimensional surface of one or more objects |
| 02/01/1994 | US5282918 Apparatus for separating and drawing off a film laminated on a carrier material |
| 02/01/1994 | US5282415 Device for supporting a pressure roll |
| 02/01/1994 | CA2098901A1 Adhesive composition, and imaging medium comprising this adhesive composition |
| 01/29/1994 | CA2100985A1 Method for light-assisted curing of coatings |
| 01/27/1994 | DE4324654A1 Presensitised lithographic printing plate with light-sensitive ester coating - comprises naphthoquinone-di:azide-sulphonate of poly-4-hydroxyphenyl-alkane and alkali-soluble resin, for hydrofluoride free soln. mark removal |
| 01/27/1994 | DE4324325A1 Optical component mfr. by reactive etching - of metal oxide dielectric, esp. tantalum or hafnium oxide |
| 01/26/1994 | EP0580532A2 Aqueous developer for lithographic printing plates with improved desensitizing capability |
| 01/26/1994 | EP0580530A2 Photosensitive compositions and lithographic printing plates with reduced propensity to blinding |
| 01/26/1994 | EP0580394A2 Method and apparatus for laser-imaging |
| 01/26/1994 | EP0580121A2 Photosensitive polyfunctional aromatic diazo compounds and photosensitive compositions using the same |
| 01/26/1994 | EP0580108A2 A photosensitive polyimide composition |
| 01/26/1994 | EP0580052A2 Process for making microstructures |
| 01/26/1994 | EP0580036A2 Process for making microstructures |
| 01/26/1994 | CN1081260A Hard light sensitive resin plate material |
| 01/25/1994 | US5282015 Methods and means for full-surface interferometric testing of grazing incidence mirrors |
| 01/25/1994 | US5281996 Photolithographic reduction imaging of extended field |
| 01/25/1994 | US5281734 Short-wavelength-absorbing polysilane |
| 01/25/1994 | US5281723 Feeding propylene carbonate effluent to a separation means, separating water and volatiles, recovering, evaporating to separate propylene carbonate from high boiling materials |
| 01/25/1994 | US5281690 Base-soluble polyimide release layers for use in microlithographic processing |
| 01/25/1994 | US5281678 Preparation of unsaturated epoxy ester resin and carboxylated unsaturated epoxy ester resin and photosensitive composition comprising the same |
| 01/25/1994 | US5281511 Process for producing an embossing die in roll form |
| 01/25/1994 | US5281510 Flexographic printing plates |
| 01/25/1994 | US5281509 Lithography printing plate |
| 01/25/1994 | US5281508 Photosensitivity |
| 01/25/1994 | US5281449 Coating and curing then development with alkali |
| 01/25/1994 | US5281447 Applying oxalate of group 8 element on substrate which can be decomposed on exposure to energy, exposing in a pattern to obtain metal |
| 01/25/1994 | US5280677 Positioning mechanism |
| 01/25/1994 | CA1326579C Ternary photoinitiator system for addition polymerization |
| 01/25/1994 | CA1326400C Thermal imaging medium |
| 01/21/1994 | CA2091286A1 Direct imaging process for forming resist pattern on a surface, and use thereof in fabricating printed boards |
| 01/20/1994 | WO1994001985A1 Treatment of substrates |
| 01/20/1994 | WO1994001808A1 System for detecting a latent image using an alignment apparatus |
| 01/20/1994 | WO1994001807A1 Metal ion reduction in top anti-reflective coatings for photoresists |
| 01/20/1994 | WO1994001806A1 Photopolymerizable composition |
| 01/20/1994 | WO1994001805A1 Positive-acting radiation-sensitive mixture and recording material produced therewith |
| 01/20/1994 | WO1994001804A1 Solid state imager |
| 01/20/1994 | WO1994001597A1 Apparatus and method for treating a wafer of semiconductor material |
| 01/20/1994 | WO1994001377A1 Ceramic green sheet |
| 01/20/1994 | DE4230142C1 Verwendung einer Übertragungsfolie Using a transfer film |
| 01/20/1994 | DE4222968A1 Positiv-arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial Positive-working radiation-sensitive mixture and thus produced recording material |
| 01/20/1994 | CA2138529A1 Solid state imager |
| 01/19/1994 | EP0579420A2 Negative working resist material and pattern forming process |
| 01/19/1994 | EP0579380A1 Apparatus and method for scanning a two-dimensional surface of one or more objects |
| 01/19/1994 | EP0579237A2 PS plate and method for processing same |
| 01/19/1994 | EP0578869A1 Photographic processing apparatus |
| 01/18/1994 | US5280437 Structure and method for direct calibration of registration measurement systems to actual semiconductor wafer process topography |
| 01/18/1994 | US5279927 Mixture of solvent, anionic surfactant, acid and buffer |
| 01/18/1994 | US5279926 Method and apparatus for removing vapor from a pressurized sprayed liquid in the manufacture of semiconductor integrated circuits |
| 01/18/1994 | US5279925 Masking; illuminating with scanning particle beam |
| 01/18/1994 | US5279923 Generating an acid when exposured to actinic radiation |
| 01/18/1994 | US5279922 Containing o-quinonediazide positive and diazo resin negative |
| 01/18/1994 | US5279921 Pattern formation resist and pattern formation method |
| 01/18/1994 | US5279918 Photoresist composition comprising a quinone diazide sulfonate of a novolac resin |
| 01/18/1994 | US5279917 Printing plate |
| 01/18/1994 | US5279913 Method of manufacturing a colour filter |
| 01/18/1994 | US5279912 Lenticular screen; imagewise exposure to actinic radiation |
| 01/18/1994 | US5279911 Transparent substrate, light shielding pattern and reflective film |
| 01/18/1994 | US5279889 Composite laminar structure |
| 01/18/1994 | US5279861 Method of coating a thin photosensitive or protective film on a printing roll |
| 01/18/1994 | US5279771 Removal photoresist from substrate |
| 01/18/1994 | US5279697 Device for forming flexographic printing plate |
| 01/18/1994 | US5279689 Laminating film to dimensionally stable transparent substrate; embossing in relief image; applying actinic radiation |
| 01/18/1994 | CA1326155C High resolution e-beam lithographic technique |
| 01/13/1994 | DE4322494A1 Photo litho plate development appts. - measures concn. of rubber soln. and plate etching medium for top-up of water or medium as required |
| 01/13/1994 | DE4321547A1 Light-sensitive material used as resist for very fine structurising of semiconductor - contg. fullerene with light-sensitive gps. of negative or positive type with high sensitivity and resolution |
| 01/13/1994 | DE4222660A1 Prodn. of micro-valve for easy application - using conventional X=ray and photolithographic techniques, plastics and electrolytic processing and etching on one substrate |
| 01/12/1994 | EP0578562A1 Procedure for determining the focus of a photolithographic exposure apparatus |
| 01/12/1994 | EP0578507A2 Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| 01/12/1994 | EP0578505A2 Method of adjusting concentration of developer |
| 01/12/1994 | EP0578177A2 Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern |
| 01/12/1994 | EP0577743A1 Photodefinable interlevel dielectrics |
| 01/11/1994 | USRE34503 Imaging device |
| 01/11/1994 | US5278683 Electrode plate structure for liquid crystal color display device |
| 01/11/1994 | US5278421 Pattern fabrication method using a charged particle beam and apparatus for realizing same |
| 01/11/1994 | US5278419 Electron beam exposure process for writing a pattern on an object by an electron beam with a compensation of the proximity effect |
| 01/11/1994 | US5278273 Siloxane polymers and positive working light-sensitive compositions comprising the same |
| 01/11/1994 | US5278199 Comprising polythiol compounds and polyene compounds |
| 01/11/1994 | US5278030 Comprising a polyoxyethylene glycol polyethers |
| 01/11/1994 | US5278029 Photolithography |
| 01/11/1994 | US5278028 Process for fabricating multi-discrete-phase fresnel lenses |
| 01/11/1994 | US5278027 Method and apparatus for making print imaging media |
| 01/11/1994 | US5278022 Polymeric compounds having pendant sulphonate groups for use in a radiation sensitive composition |
| 01/11/1994 | US5278021 O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles |
| 01/11/1994 | US5278009 Color filter and method of producing the same |
| 01/11/1994 | US5277772 Chemical modification of surfaces using heterocyclic azides |
| 01/11/1994 | US5277749 Methods and apparatus for relieving stress and resisting stencil delamination when performing lift-off processes that utilize high stress metals and/or multiple evaporation steps |
| 01/11/1994 | US5277738 Process and device for one- or two-sided stripping of protective films |
| 01/11/1994 | US5277539 Substrate conveying apparatus |
| 01/11/1994 | CA1326101C Radiation sensitive material |
| 01/11/1994 | CA1326031C 1,2-naphthoquinone diazide sulfonyl ester compounds with linking benzotriazole groups |
| 01/11/1994 | CA1325915C Method of manufacturing a semiconductor device, in which a negative image is formed on a semiconductor substrate in a positive photolacquer |