| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/16/1994 | EP0586470A1 Preparation of photopolymerised elastomeric printing plates |
| 03/16/1994 | EP0586373A1 Methods of fabricating dual anode, flat panel electrophoretic displays. |
| 03/16/1994 | CN1083938A Photoresist composition and process for forming a pattern using the same |
| 03/16/1994 | CN1083779A Pattern formation in photohardenable dielectric layers |
| 03/15/1994 | US5295006 Optical exposure system for color video printer with light source moving along rod behind three color liquid crystal panels |
| 03/15/1994 | US5294854 Bearing for use in high resolution precision control device |
| 03/15/1994 | US5294801 Extended source e-beam mask imaging system including a light source and a photoemissive source |
| 03/15/1994 | US5294680 Amine substituted amide reaction products with amhydride polymers |
| 03/15/1994 | US5294521 Forming patterns on semiconductor wafers |
| 03/15/1994 | US5294520 Wiring patterns |
| 03/15/1994 | US5294519 Copper clad lamination of photosensitive coating on plates |
| 03/15/1994 | US5294517 Energy-curable cyanate compositions |
| 03/15/1994 | US5294516 Light-sensitive transfer material |
| 03/15/1994 | US5294515 Photopolymerizable, negative working, peel developable, single sheet color proofing system |
| 03/15/1994 | US5294514 Delaminating silver halide materials of donor and receiver elements by heating and applying opposed forces including vacuum |
| 03/15/1994 | US5294511 Photosensitive composition |
| 03/15/1994 | US5294505 Thin film patterns on semiconductor substrates to form light sensitive elements |
| 03/15/1994 | US5294474 Composite polyester films and their use as protective layers for photopolymer plates, and photopolymer plates comprising said films |
| 03/15/1994 | US5294314 Using superhydrated collagen for contact lenses |
| 03/15/1994 | US5294297 Method for processing surface of work roll |
| 03/15/1994 | US5294292 Preventing resist-residue buildup; drawing vacuum, filling with gas, supplying high frequency electric power; semiconductors |
| 03/15/1994 | US5294291 Process for the formation of a conductive circuit pattern |
| 03/15/1994 | US5294257 Edge masking spin tool |
| 03/15/1994 | CA1327696C Silver master plate recovery solution |
| 03/10/1994 | DE4330279A1 Presensitised lithographic printing with minimised edge peel plate - has silicone rubber layer obtd. from mixt. of alkenyl-substd. polysiloxane(s) with different mol.wt. cured with hydrido-polysiloxane |
| 03/10/1994 | DE4329803A1 Projection exposure method for ultra large scale integration chip mfr. - diffracting exposure light beam to eliminate perpendicular incidence angle component |
| 03/10/1994 | DE4329660A1 Dry presensitised plate for lithographic printing - has substrate coated with special photosensitive layer contg. water-soluble cpds. and polymerisable cpds. and a silicone rubber layer |
| 03/10/1994 | DE4232373A1 Structural semiconductor layer deposition method - heating applied film using laser beam, to transfer the film material to surface of substrate |
| 03/10/1994 | DE4229399A1 Prodn. of functional structure of semiconductor element - by forming all layers without lithography, and applying to substrate using physical method |
| 03/10/1994 | DE4228344A1 Photoresist deposition for micro-structuring process - using combination of electro-hydrodynamic ion source and ion spray deposition |
| 03/09/1994 | EP0585980A2 Radiation sensitive materials and devices made therewith |
| 03/09/1994 | EP0585836A2 Process for making microstructures |
| 03/09/1994 | EP0585797A1 High-pressure discharge lamp |
| 03/09/1994 | EP0585382A1 Transmissive system for characterizing materials containing photo-reactive constituents |
| 03/09/1994 | CN1083493A Aqueous developable photosensitive polyurethane-(METH)acrylate |
| 03/08/1994 | US5293216 Sensor for semiconductor device manufacturing process control |
| 03/08/1994 | US5292915 Compounds containing carbonate groups and carbonyl groups and the preparation and use thereof |
| 03/08/1994 | US5292816 Plastic materials made of heterogeneous copolymers of vinylidene fluoride and chlorotrifluoroethylene, use and process of manufacture |
| 03/08/1994 | US5292626 Developer containing an O-carboxymethyl ethylene glycol compound |
| 03/08/1994 | US5292625 Projecting light through prismatic element |
| 03/08/1994 | US5292624 Method for forming a metallurgical interconnection layer package for a multilayer ceramic substrate |
| 03/08/1994 | US5292622 Process for preparation of images on tonable light-sensitive layers |
| 03/08/1994 | US5292620 Hardening a laminate having a photohardenable layer |
| 03/08/1994 | US5292619 Photosensitive polymer composition |
| 03/08/1994 | US5292618 Photocurable self-retainable gel, shaped article prepared therefrom, applications and preparations thereof |
| 03/08/1994 | US5292617 Photosensitive element having support with adjustable adhesion |
| 03/08/1994 | US5292614 Negative photosensitive composition and method for forming a resist pattern |
| 03/08/1994 | US5292613 Thermoplastic resin layer, separator, photosensitive layer |
| 03/08/1994 | US5292610 Microcapsules and their use |
| 03/08/1994 | US5292605 Method for control of photoresist develop processes |
| 03/08/1994 | US5292556 Method for preparing negative-working wash-off relief images |
| 03/08/1994 | US5292458 Method of producing photosensitive microcapsules |
| 03/08/1994 | US5292445 Wet-etch process and composition |
| 03/03/1994 | DE4235333C1 Forming pictures on floor covering of stone or ceramics - by covering with light sensitive layer, exposing, developing, etc. |
| 03/02/1994 | EP0585164A1 Use of alkali soluble photopolymer in color proofing constructions |
| 03/02/1994 | EP0585041A1 Surface position detecting method |
| 03/02/1994 | EP0584970A2 Aqueous developable photosensitive polyurethane-(meth)acrylate |
| 03/02/1994 | EP0584916A2 Polymer for light-assisted curing of coatings and method for producing it |
| 03/02/1994 | EP0584780A2 Process for producing printed wiring board |
| 03/02/1994 | EP0584275A1 Flexographic printing plate |
| 03/01/1994 | US5291392 Method and apparatus for enhancing the accuracy of scanner systems |
| 03/01/1994 | US5291315 Method of obtaining hologram and an exposure apparatus |
| 03/01/1994 | US5291240 Nonlinearity-compensated large-area patterning system |
| 03/01/1994 | US5291217 Method and apparatus for producing thermal slide transparencies |
| 03/01/1994 | US5291009 Optical scanning head |
| 03/01/1994 | US5290992 Apparatus for maximizing light beam utilization |
| 03/01/1994 | US5290899 Photosensitive material having a silicon-containing polymer |
| 03/01/1994 | US5290824 Photocrosslinked second order nonlinear optical polymers |
| 03/01/1994 | US5290667 Positive photoresist containing naphthoquinone diazide, patterning, applying flush exposure to photoresist and dis-charging bubbles |
| 03/01/1994 | US5290666 Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt |
| 03/01/1994 | US5290665 Process for developing PS plate requiring no dampening water wherein the developer comprises, water, a solubilizer and an ethylene glycol mono(alkyl C6 -C8) ether derivative |
| 03/01/1994 | US5290664 Method for preparing electrode for semiconductor device |
| 03/01/1994 | US5290663 Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates |
| 03/01/1994 | US5290659 Light-sensitive material comprising light-sensitive layer, polymerizable layer and image formation accelerating layer provided on support |
| 03/01/1994 | US5290658 Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient |
| 03/01/1994 | US5290657 Improved sensitivity while maintaining heat resistance and film thickness retention |
| 03/01/1994 | US5290656 Positive photoresists |
| 03/01/1994 | US5290630 Optical element with nonlinear optical properties: multifunctional, chromophore-containing compound polymerizable into crosslinked network and able to be poled while being polymerized; cured, poled film |
| 03/01/1994 | US5290608 Masking and curing with heat to form patterns and development |
| 03/01/1994 | US5290397 Multilayer photoresists on substrates from images on silicon diene-styrene copolymers, masking and etching |
| 03/01/1994 | CA2097791A1 High aspect ratio, flexible thick film positive photoresist |
| 03/01/1994 | CA1327285C Optical waveguide devices, elements for making the devices and methods of making the devices and elements |
| 02/24/1994 | DE4327662A1 Fine, highly accurate resist pattern prodn. using positive photoresist - contg. naphtho-quinone-di:azide and novolak resin with alkaline coating, pref. contrast enhancing or antireflective coating |
| 02/24/1994 | DE4227868A1 Irradiated polyoxymethylene development for making micro-mouldings - using liq. substd. phenol cpd. contg. free phenolic hydroxyl gps having lower toxicity and odour than phenol@ |
| 02/24/1994 | DE4227325A1 Projection printing form illuminating device - has transparent LCD system imaging medium in operative connection with computer to control focusing. |
| 02/24/1994 | DE4227237A1 Microstructuring substrate surface - by casting shadow of beam of atom agglomerates onto surface |
| 02/23/1994 | EP0584030A1 Process for the abatement of propylene carbonate emissions |
| 02/23/1994 | EP0583962A2 Light-sensitive composition |
| 02/23/1994 | EP0583918A2 Reflection preventing film and process for forming resist pattern using the same |
| 02/23/1994 | EP0583860A2 Dry planographic printing plate |
| 02/23/1994 | EP0583784A2 Apparatus and method for interlevel dielectric planarization |
| 02/23/1994 | EP0583714A2 Method for preparing high-resolution wash-off images and non-photosensitive elements for use therein |
| 02/23/1994 | EP0583678A2 Process to create surface pattern and applications thereof |
| 02/23/1994 | EP0583625A2 Method of increasing the layout efficiency of dies on a wafer, and increasing the ratio of I/O area to active area per die |
| 02/23/1994 | CN1082725A A method for forming a patterned polyimide coating film on a substrate |
| 02/23/1994 | CN1082724A Producing method for standard colour projection film |
| 02/22/1994 | US5289312 Catadioptric reduction projection optical system |
| 02/22/1994 | US5289263 Apparatus for exposing periphery of an object |
| 02/22/1994 | US5289231 Apparatus for manufacturing disc medium |
| 02/22/1994 | US5289222 Drain arrangement for photoresist coating apparatus |