Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1993
11/16/1993US5262283 Radiation a photoresists layer and etching
11/16/1993US5262282 Pattern forming method
11/16/1993US5262281 Resist material for use in thick film resists
11/16/1993US5262280 Printed circuits
11/16/1993US5262279 Dry process for stripping photoresist from a polyimide surface
11/16/1993US5262278 Film-forming solution of acrylic copolymer which has been reacted with glycidyl (meth)acrylate, also phosphoric ester of hydroxyalkyl (meth)acrylate and other unsaturated monomer, for photosensitive coatings
11/16/1993US5262277 Light sensitive elements for electrical thick films with heat resistance
11/16/1993US5262276 Light-sensitive compositions
11/16/1993US5262275 Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate
11/16/1993US5262273 Organosilane-novolak photoresist; semiconductors
11/16/1993US5262270 Light sensitive elements
11/16/1993US5262258 Process of manufacturing semiconductor devices
11/12/1993CA2092398A1 Three-dimensional image, and methods for the production thereof
11/11/1993WO1993022711A1 Adaptive optic wafer stepper illumination system
11/10/1993EP0569068A1 Method for processing a photographic material
11/10/1993EP0568993A2 Chemical amplification resist composition
11/10/1993EP0568853A1 Photoenhanced diffusion patterning for organic polymer films
11/10/1993EP0568841A1 Process of photoimaging using ink jet printing
11/10/1993EP0568827A2 Photoimageable compositions
11/10/1993EP0568744A1 A photosensitive printing plate developed by a peel-apart process
11/10/1993CN2146016Y Special drawing exposure hole head
11/09/1993US5260832 Projection lens system
11/09/1993US5260741 Copying machine and cartridge for accommodating photosensitive sheet
11/09/1993US5260580 Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device
11/09/1993US5260410 Photodegradation, semiconductor photoresists
11/09/1993US5260235 Depositing changable layer on fused quartz window, changing selected regions to form pattern, preferential etching, depositing conductive material, using fused quartz window and conductive material as mask
11/09/1993US5260175 Method of producing microstructures having regions of different structural height
11/09/1993US5260174 Method and apparatus for forming a coating of a viscous liquid on an object
11/09/1993US5260173 Process for laminated electromagnetic radiation imaged polymerized material with a integral membrane
11/09/1993US5260172 Forming photosensitive resist layer contain metallic component on substrate covering first layer exposing developing and etching
11/09/1993US5260170 Applying photodefinable resin containing electroless plating catalyst to substrate, developing image in resin, exposing part of substrate, applying second resin, developing second coincident image therein, selectively depositing conductor
11/09/1993US5260167 Light-sensitive litho printing plate requiring no dampening water
11/09/1993US5260166 A bonder layer covering clear matte sealant layer, and a photopolymer layer completely covering bonder layer
11/09/1993US5260164 Photosensitive material and image forming method
11/09/1993US5260163 Photoenhanced diffusion patterning for organic polymer films
11/09/1993US5260162 Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers
11/09/1993US5260161 Photosensitive composition and photosensitive lithographic printing plate comprising in admixture a tetrapolymer and a diazo resin
11/09/1993US5260154 Evaluating photolithographic exposures
11/09/1993US5260151 Lithography, miniaturization
11/09/1993US5260149 Photopolymerizable compositions in elements for hologram imaging
11/09/1993US5259926 Method of manufacturing a thin-film pattern on a substrate
11/09/1993US5259311 Laser engraving of photopolymer printing plates
11/09/1993CA1324064C Low toxicity liquid solvent
11/09/1993CA1324015C Method of and apparatus for forming volume type phase hologram
11/05/1993CA2069532A1 Photosensitive printing plate developed by a peel-apart process
11/03/1993EP0568496A2 Photoresist materials based on polystyrene
11/03/1993EP0568478A1 Darkfield alignment system using a confocal spatial filter
11/03/1993EP0568476A2 Silicon-containing positive resist and method of using the same in thin film packaging technology
11/03/1993EP0568235A1 Energy sensitive materials and methods for their use
11/03/1993EP0567701A1 Inspection method and apparatus
11/03/1993EP0556193A4 Method and apparatus for transferring articles between two controlled environments
11/02/1993US5258823 Alignment system
11/02/1993US5258808 Exposure apparatus for forming image
11/02/1993US5258282 Infrared radiation sensitive
11/02/1993US5258281 Heat-developable photosensitive material
11/02/1993US5258267 Process for forming resist pattern
11/02/1993US5258266 Method of forming minute patterns using positive chemically amplifying type resist
11/02/1993US5258265 Aqueous developable deep UV negative resist
11/02/1993US5258263 Lithography printing, photosensitivity, polymerizable monomers and photoexposing
11/02/1993US5258262 Radiation-sensitive film composed of at least one mono-molecular layer of fluorine-containing amphiphiles
11/02/1993US5258261 With water insoluble polymeic particles
11/02/1993US5258260 Aqueous developable deep UV negative resist
11/02/1993US5258258 Process for making lithographic printing plates
11/02/1993US5258257 Radiation sensitive compositions comprising polymer having acid labile groups
11/02/1993US5258246 Integrated circuits
11/02/1993US5257444 Plate making apparatus
11/02/1993CA2010084C Laser device
11/02/1993CA1323949C Ternary photoinitiator system for addition polymerization
10/1993
10/28/1993WO1993021748A1 Membrane dielectric isolation ic fabrication
10/28/1993WO1993021655A1 Lamp having controllable characteristics
10/28/1993WO1993021561A1 Imaging transfer system and process for transferring image and non-image areas thereof to a receptor element
10/28/1993WO1993021236A1 Visible photosensitizers for photopolymerizable compositions
10/27/1993EP0567332A2 Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers
10/27/1993EP0567178A1 A method for preparing an aluminium foil for use as a support in lithographic printing plates
10/27/1993EP0567063A2 Anisotropic metal oxide etch
10/27/1993EP0566896A1 Anphiphilic, elastomeric blockcopolymers for the production of offset printing plates
10/27/1993EP0566886A1 Method of producing diffraction grating
10/27/1993CN1077803A Undamaged regenerating method for precoated sensitive plate of positive pattern
10/26/1993US5257139 Reflection reduction projection optical system
10/26/1993US5257067 Apparatus for placing film mask in contact with object
10/26/1993US5256587 Hemisphere particles used as mask pattern
10/26/1993US5256522 Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
10/26/1993US5256521 Coating substrate, exposing to radiation, developing with alkaline solution
10/26/1993US5256520 Visible photosensitizers for photopolymerizable compositions
10/26/1993US5256517 Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having α-β-keto ester units and sulfonate units
10/26/1993US5256505 Lithographical mask for controlling the dimensions of resist patterns
10/26/1993US5256454 Method for suppression of electrification
10/26/1993US5256442 Forming emulsion pattern, applying photosensitive ink
10/26/1993US5256340 Method of making a three-dimensional object by stereolithography
10/21/1993DE4312324A1 Processing semiconductor, pref. capacitor - forming electrical connection with poly:silicon, forming layers of two materials, polishing and then etching
10/21/1993DE4311761A1 Silicon nitride anti-reflection film prodn. for use in photolithographic steps of semiconductor device mfr. - by selecting optical characteristic of film, by determining values of real and imaginary parts of specified relationship
10/20/1993EP0566353A1 Photopolymerizable composition
10/20/1993EP0566286A1 Photoresist stripping method
10/20/1993EP0566218A2 Method for finding a preferred spot for a laser beam of a laser beam interferometer and laser interferometer apparatus
10/20/1993EP0566217A2 Method and apparatus for focussing a beam of radiant energy
10/20/1993EP0565858A1 Radiation-sensitive compositions
10/20/1993EP0565818A2 Method for photochemically or mechanically producing flexible printing plates
10/20/1993EP0565664A1 Stereographic equipment and method
10/19/1993US5255051 Small field scanner
10/19/1993US5255050 Projection exposure method
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