| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 02/10/1995 | CA2129569A1 Novel (meth)acrylates containing urethane groups |
| 02/09/1995 | WO1995004370A1 Method for electrodeposition of photosensitive resist |
| 02/09/1995 | WO1995004305A1 Photosensitive fluorinated poly(amic acid) aminoacrylate salt |
| 02/09/1995 | WO1995004303A1 High-brightness directional viewing screen |
| 02/09/1995 | WO1995003935A1 Light source destructuring and shaping device |
| 02/09/1995 | DE4326289A1 Process for the production of microstructure elements |
| 02/09/1995 | DE4326061A1 Method for structuring a metallic thin-film measurement resistor |
| 02/08/1995 | EP0637780A1 Exposure apparatus for photolithography |
| 02/08/1995 | EP0637779A1 Imaging element and method for making aluminum lithographic printing plates according to the silver salt diffusion transfer process |
| 02/08/1995 | EP0637778A1 A method for making lithographic printing plates according to the silver salt diffusion transfer process |
| 02/08/1995 | EP0637777A1 Imaging element and method for making lithographic printing plates according to the silver salt diffusion transfer process |
| 02/08/1995 | EP0637776A1 Photosensitive resin composition and process for forming relief pattern therefrom |
| 02/08/1995 | EP0637393A1 Resolution-enhancing optical phase structure for a projection illumination system |
| 02/08/1995 | EP0637281A1 Process for producing a three-dimensional object |
| 02/07/1995 | US5387961 Illumination system for projection exposing apparatus |
| 02/07/1995 | US5387682 Halomethyl-1,3,5-triazines containing a monomeric moiety |
| 02/07/1995 | US5387497 High resolution lithography method using hydrogen developing reagent |
| 02/07/1995 | US5387495 Coating top surface of substrate with insulating layer of tetrafluoroethylene, depositing conductive seed layer, lines, patterned layer of posts, removing portions of seed layer, depositing liquid fluorinated hydrocarbon dielectric |
| 02/07/1995 | US5387494 Includes a latex binder polymer having carboxylic acid functionality, a photopolymerizable monomer fraction and a photoinitiator |
| 02/07/1995 | US5387493 Fine conductor pattern |
| 02/07/1995 | US5387492 Energy-curable cyanate compositions |
| 02/07/1995 | US5387491 Photosensitive transfer sheet |
| 02/07/1995 | US5387490 Method of preparing a laminar thermal imaging medium |
| 02/07/1995 | US5387486 Radiation-polymerizable mixture and process for producing a solder resist mask |
| 02/07/1995 | US5387484 For use with lasers for ablation of ceramics, polymers and metals; blocking, reflecting, transmission of beams |
| 02/07/1995 | US5387483 Processing of lithographic printing material and developer used therein |
| 02/07/1995 | US5387445 Resinous sealant made from a light-curable resin composition comprising at least one compound having unsaturated bonds and another having mercapto groups |
| 02/07/1995 | CA2000246C Transferrable, thermoplastic, antiblocking/adhesive protecting layer for images |
| 02/02/1995 | WO1995003564A1 Exposure unit and method for exposing photosensitive materials |
| 02/02/1995 | WO1995003337A1 Photoinitiator compositions |
| 02/02/1995 | WO1995003310A1 Novel ortho spiro ester compound, resin composition, and product of curing |
| 02/02/1995 | WO1995003294A1 Monomers with cyclic carbonate groups |
| 02/02/1995 | WO1995003033A1 Osmotic devices having vapor-permeable coatings |
| 02/02/1995 | DE4426820A1 Image-producing material and image-producing process |
| 02/02/1995 | DE4426457A1 Polyester film for image-forming transfer material |
| 02/02/1995 | DE4422038A1 Exposure method for the production of semiconductor components, and a diffraction mask used for this purpose |
| 02/01/1995 | EP0636941A1 Deep ultraviolet absorbent and its use in pattern formation |
| 02/01/1995 | EP0636940A1 Photosensitive polymer composition |
| 02/01/1995 | EP0636939A2 Photoinitiator compositions and photosensitive materials using the same |
| 02/01/1995 | EP0636938A1 Silver halide light-sensitive material comprising polymerizable layer provided on aluminum support |
| 02/01/1995 | EP0636932A1 Method for manufacturing a substrate having window-shaped and frame-shaped coating films on the surface thereof |
| 02/01/1995 | EP0636931A1 Method for manufacture of a substrate having window-shaped and frame-shaped coating films on the surface thereof |
| 02/01/1995 | EP0636586A1 Photomask substrate plate of synthetic fused silica glass for photolithography |
| 02/01/1995 | EP0636494A1 High molecular weight binders for laser ablative imaging |
| 01/31/1995 | US5386433 Semiconductor laser including periodic structures with different periods for producing a single wavelength of light |
| 01/31/1995 | US5386319 High resolution imagery systems and methods |
| 01/31/1995 | US5386269 Alignment and exposure apparatus |
| 01/31/1995 | US5386268 Exposure unit and method for exposing photosensitive materials |
| 01/31/1995 | US5386266 Projection exposure system |
| 01/31/1995 | US5386221 Laser pattern generation apparatus |
| 01/31/1995 | US5385956 Method for the preparation of a polymer composition containing an electrically conductive polymer |
| 01/31/1995 | US5385809 Process for fabricating a device utilizing partially deprotected resist polymers |
| 01/31/1995 | US5385808 Photosensitive resin composition and semiconductor apparatus using it |
| 01/31/1995 | US5385807 Photopolymerizable composition |
| 01/31/1995 | US5385805 Process and materials for controlling the visual aspect of images |
| 01/31/1995 | US5385804 Silicon containing negative resist for DUV, I-line or E-beam lithography comprising an aromatic azide side group in the polysilsesquioxane polymer |
| 01/31/1995 | US5385795 Method for producing color filter |
| 01/31/1995 | US5385759 Couplers having tapered surfaces which constitute substrate guide surfaces; fabricating photosensitive or photoconductive members |
| 01/31/1995 | US5385636 Protection by photosensitive resin; automatic alignement |
| 01/31/1995 | CA1334139C Preparation of relief printing plates |
| 01/26/1995 | WO1995002852A1 Photosensitive emulsions |
| 01/26/1995 | WO1995002851A1 Radiation-sensitive paint composition |
| 01/26/1995 | WO1995002472A1 Post treatment of a coated substrate with a gas containing excited halogen to remove residues |
| 01/26/1995 | DE4426141A1 Photosensitive composition |
| 01/26/1995 | DE4426070A1 Laser-drawing facility and method for adjusting the laser-drawing facility |
| 01/26/1995 | DE4426069A1 Laser-drawing facility |
| 01/25/1995 | EP0635873A1 Processing system and device manufacturing method using the same |
| 01/25/1995 | EP0635760A1 Process for making microstructures |
| 01/25/1995 | EP0635756A2 Thermal developing photosensitive member and image forming method using the thermal developing photosensitive member |
| 01/25/1995 | EP0635492A1 Glycoprotein IIb/IIIa antagonists |
| 01/25/1995 | EP0635378A2 Typographic printing plate and its use for the impression of non-absorbent hard surfaces |
| 01/25/1995 | EP0635145A1 Photoresists having a low level of metal ions |
| 01/25/1995 | EP0634972A1 Process and device for producing a three-dimensional object |
| 01/25/1995 | CN1097890A Master disks for making dies for pressing in particular optical disks and their methods of manufacture as well as the pressing dies obtained from the master disks and optical disks obtained...... |
| 01/24/1995 | US5384464 Process and apparatus for optical near field microlithography |
| 01/24/1995 | US5384238 Positive-acting photothermographic materials |
| 01/24/1995 | US5384231 Fabricating lens array structures for imaging devices |
| 01/24/1995 | US5384230 Process for fabricating printed circuit boards |
| 01/24/1995 | US5384229 Photoimageable compositions for electrodeposition |
| 01/24/1995 | US5384228 Novolak resins with quinone diazide sulfonic esters and condensation polymers of phenol with hydroxybenzaldehyde and aromatic compounds |
| 01/24/1995 | US5384227 Image forming materials prepared using 2-diazo-1,2-naphthoquinone compounds having fluorine atom containing substituent groups |
| 01/24/1995 | US5384220 Silylation |
| 01/24/1995 | US5384219 Reticle with structurally identical inverted phase-shifted features |
| 01/24/1995 | US5384218 Photomask and pattern transfer method for transferring a pattern onto a substrate having different levels |
| 01/24/1995 | US5384007 Process for manufacturing a screen printing stencil |
| 01/24/1995 | CA1334059C Radiation sensitive mixture and production of relief patterns |
| 01/24/1995 | CA1334052C Stereolithographic beam profiling |
| 01/23/1995 | CA2128348A1 Glycoprotein iib/iiia antagonists |
| 01/23/1995 | CA2128282A1 Image carrier for a letterpress printing process and use of said carrier for printing on non-absorbing hard surfaces |
| 01/19/1995 | DE4325846C1 Use of furan-modified aromatic pinacol derivatives as initiators and furan-modified aromatic pinacol derivatives as such |
| 01/18/1995 | EP0634783A1 Thermal process module for substrate coat/develop system |
| 01/18/1995 | EP0634710A1 Improvements relating to holograms and diffraction gratings |
| 01/18/1995 | EP0634709A1 Improvements relating to holograms and diffraction gratings |
| 01/18/1995 | EP0634702A1 Measuring method and apparatus |
| 01/18/1995 | EP0634701A1 Exposure apparatus, and manufacturing method for devices using same |
| 01/18/1995 | EP0634700A1 Scanning type exposure apparatus |
| 01/18/1995 | EP0634699A1 Clustered photolithography system |
| 01/18/1995 | EP0634698A1 Process for forming positive polyimide pattern |
| 01/18/1995 | EP0634697A1 A diazo based imaging element having improved storage stability |
| 01/18/1995 | EP0634696A1 Chemically amplified resist composition |