Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/1999
03/23/1999US5885744 Photoresist composition
03/23/1999US5885661 Droplet jet method for coating flat substrates with resist or similar materials
03/23/1999US5885343 Dyed silica pigments and products made from same
03/22/1999CA2247744A1 Writing bragg reflection gratings in optical waveguides
03/18/1999WO1999013539A2 Laser with line narrowing output coupler
03/18/1999WO1999013381A1 A negatively acting photoresist composition based on polyimide precursors
03/18/1999WO1999013007A1 Isoxindigos useful as colorants and preparation thereof
03/18/1999WO1998049708A3 Use of sacrificial masking layer and backside exposure in forming a black matrix layer
03/18/1999CA2280867A1 Isoxindigos useful as colorants and preparation thereof
03/18/1999CA2247709A1 Four mirror euv projection optics
03/17/1999EP0902329A1 Catadioptric reduction optical system
03/17/1999EP0902328A2 Process and apparatus for producing a high accuracy photosensitive resin printing plate blank
03/17/1999EP0902327A2 Radiation sensitive composition
03/17/1999EP0902326A2 Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin
03/17/1999EP0902325A2 Photosensitive composition
03/17/1999EP0902034A2 Very large scale immobilized peptide synthesis
03/17/1999EP0901650A1 Optical system for integrated circuit fabrication
03/17/1999EP0850501B1 Method and device for triggering diode-pumped solid state lasers
03/17/1999EP0741643B1 Laminar imaging medium utilizing crosslinked borated polymeric binder
03/17/1999EP0507773B1 Processing systems with intelligent article tracking
03/16/1999US5884242 Focus spot detection method and system
03/16/1999US5884114 Image forming device
03/16/1999US5884013 Autotypical screening with optimised dotshape
03/16/1999US5883932 Substrate holding device and exposing apparatus using the same
03/16/1999US5883705 Atomic force microscope for high speed imaging including integral actuator and sensor
03/16/1999US5883704 Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system
03/16/1999US5883703 Methods and apparatus for detecting and compensating for focus errors in a photolithography tool
03/16/1999US5883702 Stage driving exposure apparatus wherein the number of driving devices exceeds the degrees of freedom of the stage
03/16/1999US5883701 Scanning projection exposure method and apparatus
03/16/1999US5883700 Method for projection exposure to light
03/16/1999US5883011 Method of removing an inorganic antireflective coating from a semiconductor substrate
03/16/1999US5882844 Chemically amplified positive resist composition
03/16/1999US5882843 Photosensitive resin composition for color filter production
03/16/1999US5882840 Photosensitive element comprising an image forming layer and a photopolymerisable layer
03/16/1999US5882839 Support with image layers of metal and metal compounds, photosensitivity, free radicals and radiation transparent cover sheets curing by means of uv or visible light the parts of the cohesively broken photosensitive layer
03/16/1999US5882838 Silver halide light-sensitive material comprising support, hardening layer and light-sensitive layer
03/16/1999US5882836 Photocurable formulation containing a partially polymerized divinylsiloxane linked bisbenzocyclobutene resin
03/16/1999US5882835 Positive photoresist resin and chemical amplified positive photoresist composition containing the same
03/16/1999US5882826 The laminated film is obtained by continuously forming a sicn film on one of or each of sides of a sic film.
03/16/1999US5882554 Method for exposing optical master disk
03/16/1999US5882489 Processes for cleaning and stripping photoresist from surfaces of semiconductor wafers
03/16/1999US5881987 Vibration damping apparatus
03/16/1999US5881750 Substrate treating apparatus
03/16/1999CA2189785C Method of producing photographic relief
03/11/1999WO1999012194A1 Temperature adjusting method and aligner to which this method is applied
03/11/1999WO1999012075A1 Method of producing phase mask for fabricating optical fiber and optical fiber with bragg's diffraction grating produced by using the phase mask
03/11/1999WO1999012074A1 Photomask case, conveying device, and conveying method
03/11/1999WO1999012070A1 Illumination design for scanning microlithography systems
03/11/1999WO1999011467A1 Thermal waterless lithographic printing plate
03/11/1999CA2270525A1 Method of producing phase mask for fabricating optical fiber and optical fiber with bragg's diffraction grating produced by using the phase mask
03/10/1999EP0901160A2 Cleaning liquid for semiconductor devices
03/10/1999EP0901156A2 A semiconductor device having an anti-reflective layer and a method of manufacture thereof
03/10/1999EP0901044A2 Controlled shrinkage of photoresist
03/10/1999EP0901043A1 Radiation-sensitive resin composition
03/10/1999EP0900800A2 Stabilizer for organic borate salts and photosensitive composition containing the same
03/10/1999EP0900674A1 Method for forming a micro-relief on a metallic article and variants
03/10/1999EP0900653A1 Positive working IR sensitive mixture, thermal imageable recording material and method of producing lithographic printing plate for offset printing using said composition
03/10/1999EP0900652A2 White-light insensitive material for thermal registration and process for the fabrication of lithographic printing plates
03/10/1999EP0900412A1 Positioning device having two object holders
03/10/1999EP0900409A1 Processless diacetylenic salt films capable of developing a black image
03/10/1999EP0900398A2 Fabrication of small-scale coils and bands as photomasks on optical fibers for generation of in-fiber gratings, electromagnets as micro-nmr coils, microtransformers, and intra-vascular stents
03/10/1999EP0900239A1 Photo-addressable substrates and photo-addressable side-group polymers with highly inducible double refraction
03/10/1999EP0900237A1 Photoactive compounds for use with narrow wavelength band ultraviolet (uv) curing systems
03/10/1999EP0900213A1 Processes for preparing thioxanthone and derivatives thereof
03/10/1999EP0900150A2 Application to fabric of heat-activated transfers
03/10/1999EP0857163A4 Photo-encoded selective etching for glass based microtechnology applications
03/10/1999EP0737330B1 Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method
03/09/1999US5880891 High-resolution high-apertured objective
03/09/1999US5880834 Convex diffraction grating imaging spectrometer
03/09/1999US5880820 Light exposure installation of a double-sided printed circuit plate through artworks
03/09/1999US5880817 Projection-exposure apparatus and method exhibiting reduced solarization and radiation compaction
03/09/1999US5880816 Process for exposing the peripheral area of a semiconductor wafer for removing unnecessary resist on the semiconductor wafer and a device for executing the process
03/09/1999US5880169 Having high resolution for fine patterning
03/09/1999US5879866 Image recording process with improved image tolerances using embedded AR coatings
03/09/1999US5879863 Pattern forming method
03/09/1999US5879862 Forming layer having protuberances on nonplanar layer, applying seed layer, forming photoresist layer, patterning to expose top of seed layer, forming conductive layer thereon, removing residues including seed layer
03/09/1999US5879859 Comprising a cycloaliphatic diepoxide and photoacitve compound
03/09/1999US5879858 Composition comprising resin containing unsaturated photocrosslinkable groups, photopolymerizable monomer, photocrosslinkable polyester resin, photoinitiator
03/09/1999US5879857 Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
03/09/1999US5879856 Chemically amplified positive photoresists
03/09/1999US5879855 Pigment precursor dissolved in composition which can be transformed to insoluble pigment, positive or negative photoresist which can be modified
03/09/1999US5879854 Photoresist layer supporting polyester film and photoresist film laminate
03/09/1999US5879853 Deep ultraviolet and vacuum ultraviolet lithograpy systems; high etch resistance and low reflectivity
03/09/1999US5879852 Positive-working radiation-sensitive mixture
03/09/1999US5879851 Method for forming resist patterns by using an ammonium or morpholine compound as a developer
03/09/1999US5879845 Projection exposure method utilizing correction for change in optical characteristic
03/09/1999US5879844 Optical proximity correction method
03/09/1999US5879843 Method of reducing registration error in exposure step of semiconductor device
03/09/1999US5879842 Pattern projection method with charged particle beam utilizing continuous movement of mask and substrate
03/09/1999US5879837 Styrylcoumarin compound, photosensitive resin composition, and hologram recording medium
03/09/1999US5879576 Method and apparatus for processing substrates
03/09/1999US5879457 Rotating cup coating device
03/09/1999US5878918 Photoresist supplying system for used in a semiconductor fabrication
03/04/1999WO1999010970A1 Positioning device, driving unit, and aligner equipped with the device
03/04/1999WO1999010918A1 Process of isolation in integrated circuit fabrication, using an antireflective coating
03/04/1999WO1999010917A1 Aligner, exposure method, method of pressure adjustment of projection optical system, and method of assembling aligner
03/04/1999WO1999010771A1 Focusing and autofocusing in scanning laser imaging
03/04/1999WO1999010253A1 Water-developable plate package
03/04/1999DE19834445A1 Aluminium@ lithographic printing plate material used in diffusion transfer process
03/04/1999DE19737916A1 Mask for the production of semiconductor wafers or other micro structures
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