Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/1999
08/18/1999CN1226258A Quick photo-addressable substrates and photo-addressable side-group polymers having highly inducible double refraction
08/18/1999CN1226200A Manufacture of laminated film and printed wiring board
08/18/1999CN1044763C Method and apparatus for removing film
08/17/1999US5940789 Stage control method and apparatus with varying stage controller parameter
08/17/1999US5940651 Drip catching apparatus for receiving excess photoresist developer solution
08/17/1999US5940528 Process for positioning of a mask relative to another mask, or masks relative to a workpiece and device for executing the process
08/17/1999US5940421 Current reversal prevention circuit for a pulsed gas discharge laser
08/17/1999US5939852 Stage feeding device
08/17/1999US5939725 Electron beam exposure apparatus
08/17/1999US5939511 Resin purification process
08/17/1999US5939510 Undercoating composition for photolithographic resist
08/17/1999US5939465 Photopolymerizable composition
08/17/1999US5939242 Positive photoresist with an alkoxyalkyl ester group-containing (co)polymer and carboxyl-group containing (co)polymer
08/17/1999US5939241 Method of preventing photoresist residue on metal lines
08/17/1999US5939240 Semiconductor element structure with stepped portion for formation of element patterns
08/17/1999US5939239 Photoimageable compositions containing photopolymerizable urethane oligomers and dibenzoate plasticizers
08/17/1999US5939238 High photospeed due to n-phenylglycine
08/17/1999US5939237 Top coats for shoot and run printing plates
08/17/1999US5939236 Multilayer element with resin and coating of photoresists
08/17/1999US5939235 Positive-working light-sensitive composition
08/17/1999US5939234 Increasing the photosensitivity of photoresists comprising a compound with an acid-decomposable tert-alkyl ester and tert-alkyl carbonate group and a polyhydroxystrene protected by acetal or silyl ether group for alkali solubility
08/17/1999US5939232 Multilayer; strippable substrate, transparent polymeric isolation layer, elastomer, pigmented photosensitive photopolymerizable layer
08/17/1999US5939231 Image forming material and image forming method employing the same
08/17/1999US5939226 Multilayer element with patterns
08/17/1999US5939206 Stabilized porous, electrically conductive substrates
08/17/1999US5939150 Metallizing patterns on semiconductors and printed circuits; exposure to radiation beam
08/17/1999US5939148 Photocurable resin, 3-(2-benzothiazolyl)-naphtho-2,3-b-pyran derivative sensitizer, and titanocene; photosensitivity, photoresists
08/17/1999US5939139 Method of removing coated film from substrate edge surface and apparatus for removing coated film
08/17/1999US5939130 Coating film forming method and coating film forming apparatus
08/17/1999US5938923 Microfabricated filter and capsule using a substrate sandwich
08/17/1999US5938187 Media feed apparatus for an imaging device
08/17/1999US5937876 Rinsing system used in a photoresist coater with capability to avoid a reversed pressure effect
08/17/1999CA2110297C Methods of fabricating dual anode, flat panel electrophoretic displays
08/17/1999CA2072831C Method of creating an index grating in an optical fiber and a mode converter using the index grating
08/13/1999CA2260351A1 Cylindrical printing plate
08/12/1999WO1999040613A1 Method of adjusting position detector
08/12/1999WO1999040487A1 Stage control method, stage utilizing the same, and exposure apparatus
08/12/1999WO1999040486A1 Exposure apparatus, exposure method, and recording medium
08/12/1999WO1999040485A1 Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures
08/12/1999WO1999040086A1 Pyran derivatives and use thereof
08/12/1999WO1999039999A1 Apparatus for supporting base plate, apparatus and method for transferring base plate, method of replacing base plate, and exposure apparatus and method of manufacturing the same
08/12/1999WO1999039837A1 Disc master drying cover assembly
08/11/1999EP0935172A1 Photosensitive resin, resist based on the photosensitive resin, exposure method using the resist, and semiconductor device obtained by the exposure method
08/11/1999EP0935171A1 Photoimageable compositions having hydrophilic binder polymers and hydrophilic monomers
08/11/1999EP0934825A1 Screen printing stencil production
08/11/1999EP0934366A1 Solventless primers which are hardenable by radiation
08/11/1999EP0825927B1 Lithographic printing form precursor and its use by heat imaging
08/11/1999CN1225727A Thermal treatment process of positive photoresist composition
08/11/1999CN1225726A Photosensitive composition and method for pattern formation
08/11/1999CN1225502A Method of separating chips from semiconductor wafer
08/10/1999US5936988 High pulse rate pulse power system
08/10/1999US5936813 Giant magnetoresistive head with electron cured insulator
08/10/1999US5936738 For use with a lithographic system and a substrate
08/10/1999US5936713 Method and device for producing features on a photolithographic layer
08/10/1999US5936712 Exposure method and apparatus including focus control
08/10/1999US5936711 Projection exposure method and projection exposure apparatus
08/10/1999US5936710 Scanning type exposure apparatus, position control apparatus, and method therefor
08/10/1999US5936071 Reacting hydroxy compound from phenolic resin with halide compound from quinonediazide compound using solid basic catalyst insoluble in solvent
08/10/1999US5935768 Baking and cooling of substrates done inside integrated thermal process module
08/10/1999US5935765 Forming antireflective film on substrate to prevent dimensional precision degradation caused by halation and interference phenomena due to reflected light from substrate
08/10/1999US5935764 Method of forming alignment mark and fabricating semiconductor device
08/10/1999US5935763 Self-aligned pattern over a reflective layer
08/10/1999US5935762 Two-layered TSI process for dual damascene patterning
08/10/1999US5935761 Photosensitive resin composition
08/10/1999US5935760 Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
08/10/1999US5935744 Method of drawing patterns through electron beam exposure utilizing target subpatterns and varied exposure quantity
08/10/1999US5935741 Method for forming a color filter
08/10/1999US5935738 Phase-shifting mask, exposure method and method for measuring amount of spherical aberration
08/10/1999US5935734 Defects such as pinholes within the resist layer are reduced.
08/10/1999US5935661 Radiation curing of powder coatings on heat sensitive substrates: chemical compositions and processes for obtaining coated workpieces
08/10/1999US5935454 Forming condensates at prescribed positions on a substrate and dry etching the substrate using the condensates thus formed as an etching mask
08/10/1999US5934965 Apertured nonplanar electrodes and forming methods
08/10/1999US5934197 Lithographic printing plate and method for manufacturing the same
08/10/1999US5934195 Without the use of film
08/10/1999US5934191 Stamp making apparatus
08/06/1999CA2261104A1 Photoimageable compositions having hydrophilic binder polymers and hydrophilic monomers
08/05/1999WO1999039414A1 Fluorine control system with fluorine monitor
08/05/1999WO1999039408A1 Excimer laser automatic fluorine control system
08/05/1999WO1999039407A1 Fluorine control system for excimer lasers
08/05/1999WO1999039382A1 Process for ashing organic materials from substrates
08/05/1999WO1999039375A1 Illumination meter and exposure system
08/05/1999WO1999039374A1 Exposure method and device
08/05/1999WO1999039333A1 Air-conditioner, partition and exposure apparatus
08/05/1999WO1999039247A1 Photopolymerization compositions including maleimides and processes for using the same
08/05/1999WO1999039246A1 Process for producing a photoresist composition having a reduced tendency to produce particles
08/05/1999WO1999039245A1 A process for making a photoactive compound and photoresist therefrom
08/05/1999WO1999038706A1 Flexible screen suitable for use in screen printing and method of making same
08/05/1999WO1999038705A1 Processless direct write printing plate having heat sensitive polymer
08/05/1999WO1999019754A8 Process and device for the wavelength-selective mixture and/or distribution of polychromatic light
08/05/1999WO1998013728A8 Ultra thin organic black matrix
08/05/1999DE19806188A1 Lens grid picture involving sequence of stereo pictures
08/05/1999CA2318809A1 Photopolymerization compositions including maleimides and processes for using the same
08/04/1999EP0933684A1 Developing system of photosensitive resin plates and apparatus used therein
08/04/1999EP0933683A2 Method of forming a resist pattern by using an optimized silicon carbide anti-reflective layer
08/04/1999EP0933682A2 Polymers comprising N-substituted maleimide units and their use in radiation-sensitive compositions
08/04/1999EP0933681A1 Positive-tone photoimageable crosslinkable coating
08/04/1999EP0933680A1 Forming pigment color filter arrays
08/04/1999EP0933388A2 Structured surfaces having hydrophobic properties
08/04/1999EP0932628A1 Electron-beam curable epoxy compositions
08/04/1999EP0768954B1 Exposure process and device
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