| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/28/1999 | WO1999004481A1 Exciting unit, linear or planar motor using the unit, stage device using the motor, and aligner using the device |
| 01/28/1999 | WO1999004467A1 Wavelength reference for excimer laser |
| 01/28/1999 | WO1999004416A1 Method and device for treating two-dimensional substrates, especially silicon slices (wafers), for producing microelectronic components |
| 01/28/1999 | WO1999004319A1 Improved dissolution inhibition resists for microlithography |
| 01/28/1999 | DE19822441A1 Cleaning method for imaged printing plate with silicone layer avoiding explosion or health hazard |
| 01/28/1999 | DE19731875A1 Three=dimensional image generation method |
| 01/27/1999 | EP0893739A1 Process and device for the posttreatment of aqueous suspensions issued from the development of exposed lithographic printing plates |
| 01/27/1999 | EP0893738A2 Scanning exposure apparatus and device manufacturing method |
| 01/27/1999 | EP0893737A2 Radiation sensitive composition |
| 01/27/1999 | EP0892942A1 Molecule, layered medium and method for creating a pattern |
| 01/27/1999 | EP0892941A1 Photo-curable resin composition |
| 01/27/1999 | EP0892910A2 Optical height meter, surface-inspection device provided with such a height meter, and lithographic apparatus provided with the inspection device |
| 01/27/1999 | EP0892823A1 Polymers or 2,7-dioxa-bicyclo 3,2,1]octane derivatives |
| 01/27/1999 | EP0892822A1 Liquid curable resin composition |
| 01/27/1999 | CN2305697Y Driver for plate washing brush in making plate cleaning technology |
| 01/27/1999 | CN1206126A Exposure device for making color picture tube |
| 01/27/1999 | CN1206117A Amplitude mask and apparatus for manufacturing long period grating filter using the same |
| 01/26/1999 | US5864433 Astigmatism-correcting optical system, projection exposure apparatus using the optical system and device manufacturing method |
| 01/26/1999 | US5864389 Stage apparatus and exposure apparatus and device producing method using the same |
| 01/26/1999 | US5864388 Surface activating process, and device and lamp for performing said process |
| 01/26/1999 | US5864386 Exposure apparatus |
| 01/26/1999 | US5864142 Electron beam exposure apparatus and method of controlling same |
| 01/26/1999 | US5863963 Halomethylated high performance curable polymers |
| 01/26/1999 | US5863712 Improving resolution and a shape accuracy by illuminating the pattern on a mask perpendicular to the top surface with pupil filters having at least two pupil functions with amplitude transmittance distribution asymmetric to pupil center |
| 01/26/1999 | US5863710 Developer solution for photolithographic patterning |
| 01/26/1999 | US5863709 Deep UV photolithography with reduced halation |
| 01/26/1999 | US5863707 Method for producing ultra-fine interconnection features |
| 01/26/1999 | US5863706 Processing method for patterning a film |
| 01/26/1999 | US5863705 Two-layer resist having a storage stable, wet developable top resist of polymer having tert-butylester or tert-butoxy-carbonyloxy blocking groups; sensitive to deep and near ultraviolet radiation; ketone- or sulfone photoiniator |
| 01/26/1999 | US5863704 Blends of diene-aromatic vinyl copolymer blocks, photopolymerizable ethylenically unsaturated monomer and photoinitiator |
| 01/26/1999 | US5863701 Polymers for photoresists used for printing plates and circuit boards |
| 01/26/1999 | US5863700 Adding a water-soluble solvent to a phenolic compound-formaldehyde novolak, adding water to precipitate, decanting to remove solvent/water solution containing phenolics and oligomers; dissolving the precipitate in a novlak solvent |
| 01/26/1999 | US5863699 Forms a pattern through light-exposure with either argon fluoride or fluorine excimer lasers, comprises a compound having either an acid-decomposable or acid-crosslinkable group |
| 01/26/1999 | US5863682 Charged particle beam writing method for determining optimal exposure dose prior to pattern drawing |
| 01/26/1999 | US5863680 Exposure method utilizing alignment of superimposed layers |
| 01/26/1999 | US5863679 Method for forming thin film pattern |
| 01/26/1999 | US5863678 Photopolymerizable composition for a color filter |
| 01/26/1999 | US5863677 Aligner and patterning method using phase shift mask |
| 01/26/1999 | US5863664 Energy-curable cyanate/ethylenically unsaturated compositions |
| 01/26/1999 | US5863620 Process and apparatus for coating printed circuit boards |
| 01/26/1999 | US5863619 Method of and apparatus for coating photoresist film |
| 01/26/1999 | US5863486 Phosphoric acid ester of a polyether |
| 01/26/1999 | US5863374 Method and apparatus for peeling a laminate |
| 01/26/1999 | US5863346 Aromatic hydrogen solvent, surfactant consisting essentially of a linear monoalkylbenzene sulfonic acid, dialkylbenezenesulfonic acid wherein said alkyl groups contain 1 to 4 carbon atoms, alkyl phenol |
| 01/26/1999 | US5863328 Device for surface coating or lacquering of substrates |
| 01/21/1999 | WO1999003176A1 Excimer laser with magnetic bearings supporting fan |
| 01/21/1999 | WO1999003022A1 High efficiency laser pattern generator |
| 01/21/1999 | WO1999003021A1 Method for producing active or passive components on a polymer basis for integrated optical devices |
| 01/21/1999 | WO1999003012A1 Anamorphic scan lens for laser scanner |
| 01/21/1999 | WO1999003011A1 Chevron error correction and autofocus optics for laser scanner |
| 01/21/1999 | WO1999002938A2 Two piece mirror arrangement for interferometrically controlled stage |
| 01/21/1999 | WO1999002343A1 Pattern formation |
| 01/21/1999 | DE19730582A1 Photolithographic processing of microelectronic components |
| 01/21/1999 | DE19730581A1 Cleaning silicon wafers with fluid media |
| 01/21/1999 | CA2296595A1 Anamorphic scan lens for laser scanner |
| 01/21/1999 | CA2296569A1 Process for the fabrication of active and passive polymer-based components for integrated optics |
| 01/21/1999 | CA2296276A1 Two piece mirror arrangement for interferometrically controlled stage |
| 01/21/1999 | CA2295554A1 High efficiency laser pattern generator |
| 01/21/1999 | CA2295549A1 Chevron error correction and autofocus optics for laser scanner |
| 01/20/1999 | EP0891877A2 Laser-induced thermal transfer recording process |
| 01/20/1999 | EP0891876A2 Photosensitive donor elements, assemblages, and associated process for laser-induced thermal transfer |
| 01/20/1999 | EP0891872A1 Process for obtaining a pattern on a transparent substrat |
| 01/20/1999 | EP0757629B1 Imaging medium and process |
| 01/20/1999 | EP0651893B1 Hexahydroxybenzophenone sulfonate esters of diazonaphthoquinone sensitizers and positive photoresists employing same |
| 01/20/1999 | CN1205784A Photosensitive resin compsn. |
| 01/20/1999 | CN1205783A Mixed solvent system for positive photoresists |
| 01/20/1999 | CN1205718A Solvent-free, radiation-curable, optical glass fiber coating compsn. and solvent-free method for making solvent-free, radiation-curable, optical glass fiber coating compsn. |
| 01/20/1999 | CN1205454A Photosensitive resin compsns. and display components using same |
| 01/19/1999 | US5862058 Optical proximity correction method and system |
| 01/19/1999 | US5861997 Catadioptric reduction projection optical system and exposure apparatus having the same |
| 01/19/1999 | US5861944 For exposing a substrate to a pattern formed on a mask |
| 01/19/1999 | US5861866 LSI mask pattern edit apparatus with contour line intensity distribution display method of resolution for lithography |
| 01/19/1999 | US5861715 Discharge lamp having a plurality of coating layers |
| 01/19/1999 | US5861444 Refractive index imaging material |
| 01/19/1999 | US5861330 Forming implants with hybrid resists which do not require additional masking steps at the well edges; implants reduce the lifetime of minority carriers in the parasitic transistor, reducing gain of the parasitic transistor |
| 01/19/1999 | US5861320 Position detection mark and position detection method |
| 01/19/1999 | US5861235 Ultraviolet-curable composition and method for patterning the cured product therefrom |
| 01/19/1999 | US5861234 Photopolymer useful in fabricating printing plates which are resistant to polar solvent based ink |
| 01/19/1999 | US5861233 Vapor depositing aluminum mask from alkylaluminum hydride to make trench; removing film; heating; burying inside with oxide; semiconductors |
| 01/19/1999 | US5861232 Flexographic plate |
| 01/19/1999 | US5861231 Styrene, 4-hydroxystyrene, tert-butyl acrylate terpolymer binder; coating for microelectronic wafer, flat panel display |
| 01/19/1999 | US5861229 Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound |
| 01/19/1999 | US5861195 Method for coating a plurality of fluid layers onto a substrate |
| 01/19/1999 | US5861064 Process for enhanced photoresist removal in conjunction with various methods and chemistries |
| 01/19/1999 | US5861061 Spin coating bowl |
| 01/19/1999 | CA2071598C Optical device and method of manufacturing the same |
| 01/14/1999 | WO1999001915A1 Very narrow band laser with unstable resonance cavity |
| 01/14/1999 | WO1999001797A1 Method for optical inspection and lithography |
| 01/14/1999 | WO1999001796A2 Pattern-forming methods |
| 01/14/1999 | WO1999001795A2 Pattern-forming methods and radiation sensitive materials |
| 01/14/1999 | WO1999001787A1 Phase mask for machining optical fibers and method of manufacturing the same |
| 01/14/1999 | WO1999001586A2 Device for transferring structures |
| 01/14/1999 | WO1999001512A1 Pigment dispersions containing c.i. pigment red 222 |
| 01/14/1999 | WO1999001511A1 Method for producing fine pigment dispersions |
| 01/14/1999 | WO1999001494A1 Process for producing epoxy ester resins and photosensitive resin compositions containing them |
| 01/14/1999 | WO1999001429A1 New oxime sulfonates and the use thereof as latent sulfonic acids |
| 01/13/1999 | EP0890983A1 Measurement pattern set and method for measuring dimension accuracy and overlay accuracy of circuit pattern |
| 01/13/1999 | EP0890945A1 Exposure recording method for optical recording materials |
| 01/13/1999 | EP0890880A1 Device for processing printing plates |
| 01/13/1999 | EP0890879A2 Infrared imageable material and offset printing plate made therefrom |