| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/04/1999 | EP0760971B1 Dry-developable positive resist |
| 08/04/1999 | CN1225109A Curing process for cationically photocurable formulation |
| 08/04/1999 | CN1224858A Positive-tone photoimageable crosslinkable coating |
| 08/04/1999 | CN1224728A Photosensitive polymer and chemically amplified resist composition using the same |
| 08/03/1999 | US5933351 System and method for locating dies cut from a silicon wafer on a wafer table |
| 08/03/1999 | US5933278 Monolithic multi-faceted mirror for combining multiple beams from different light sources by reflection |
| 08/03/1999 | US5933220 Apparatus and method for limiting double exposure in stepper |
| 08/03/1999 | US5933219 Projection exposure apparatus and device manufacturing method capable of controlling polarization direction |
| 08/03/1999 | US5933218 Laser beam machining apparatus |
| 08/03/1999 | US5933217 For transferring a recticle pattern image to a substrate |
| 08/03/1999 | US5933216 Double-sided patterning system using dual-wavelength output of an excimer laser |
| 08/03/1999 | US5933215 Exposure apparatus and device manufacturing method using the same |
| 08/03/1999 | US5933211 Charged beam lithography apparatus and method thereof |
| 08/03/1999 | US5933002 Controlled bending actuator system |
| 08/03/1999 | US5932966 Electron sources utilizing patterned negative electron affinity photocathodes |
| 08/03/1999 | US5932884 Charged-beam exposure system and charged-beam exposure method |
| 08/03/1999 | US5932396 1,2-naphthoquinonediazidosulfonyl-substituted novolak resist |
| 08/03/1999 | US5932395 Prevent positional shift during exposure using multilayer mask |
| 08/03/1999 | US5932394 Producing a lithographic printing plate by sequentially exposing a thermo-sensitive imaging element by a set of radiation beams |
| 08/03/1999 | US5932393 Borate photoinitiators from monoboranes |
| 08/03/1999 | US5932392 Image forming material and image forming method |
| 08/03/1999 | US5932391 Containing an acyclic compound which is a vinyl polymerbeing light absorbent |
| 08/03/1999 | US5932381 Sensitivity, smoothnesss, waterproof |
| 08/03/1999 | US5932380 Setting threshold value for concentration of alkaline component which causes defective resolution, controlling and changing procesing atmosphere |
| 08/03/1999 | US5932309 Colored articles and compositions and methods for their fabrication |
| 08/03/1999 | US5932009 Wafer spinner having a heat controller for fabricating a semiconductor device |
| 08/03/1999 | US5931441 Method of isolating vibration in exposure apparatus |
| 08/03/1999 | US5931349 Viscous fluid discharging apparatus for manufacturing semiconductors having a removable bubble capturing portion |
| 08/03/1999 | US5930890 Structure and fabrication procedure for a stable post |
| 08/03/1999 | CA2078930C Register mark |
| 07/30/1999 | CA2243727A1 Positive-tone photoimageable crosslinkable coating |
| 07/29/1999 | WO1999037734A1 Photochromic polymerizable composition |
| 07/29/1999 | WO1999031713A3 Integrated material management module |
| 07/29/1999 | DE19902336A1 Optical projection system for manufacturing semiconductor components |
| 07/29/1999 | DE19860782A1 5-beta-cholan-24-yl-3-(meth)acrylate compounds useful for preparing copolymers resins for photoresists |
| 07/29/1999 | DE19751738A1 Halogen-free epoxy resin useful as coating for electronic components |
| 07/28/1999 | EP0932194A1 Method and system for semiconductor wafer fabrication process real-time in-situ interactive supervision |
| 07/28/1999 | EP0932082A2 Chemically amplified resist composition and method of creating a patterned resist using electron beam |
| 07/28/1999 | EP0932081A1 Pattern forming body, pattern forming method, and their applications |
| 07/28/1999 | EP0931647A1 A heat sensitive element and a method for producing lithographic plates therewith |
| 07/28/1999 | EP0931241A1 Method for correcting measurement errors in a machine measuring co-ordinates |
| 07/28/1999 | EP0931103A1 Monomers, oligomers and polymers with terminal oxirane groups, method of preparation and polymerisation under radiation exposure |
| 07/28/1999 | EP0930974A1 Inverted stamping process |
| 07/28/1999 | EP0830642B1 Film-stripping process |
| 07/28/1999 | EP0759577B1 Liquid photosensitive resin composition for flexography |
| 07/28/1999 | CN1224565A Thick-film conductor circuit and production method therefor |
| 07/28/1999 | CN1224236A Method and apparatus for quantifying proximity effect by measuring device performance |
| 07/28/1999 | CN1224233A Multi-phase mask |
| 07/27/1999 | US5930549 Developing device for semiconductor device fabrication and its controlling method |
| 07/27/1999 | US5930547 Process and apparatus for developing radiation-sensitive, exposed printing forms |
| 07/27/1999 | US5930324 Exposure apparatus and device manufacturing method using the same |
| 07/27/1999 | US5930084 Stabilized MR sensor and flux guide joined by contiguous junction |
| 07/27/1999 | US5930049 Projection optical system and method of using such system for manufacturing devices |
| 07/27/1999 | US5929991 Single plate corrector for stepper lens train |
| 07/27/1999 | US5929977 Exposure apparatus and exposure quantity control method |
| 07/27/1999 | US5929976 Process for exposing a peripheral area of a wafer and a device for executing the process |
| 07/27/1999 | US5929973 Apparatus and method for simultaneously transferring a mask pattern to both sides of a substrate |
| 07/27/1999 | US5929565 Short arc discharge lamp having anode with tungsten coating thereon |
| 07/27/1999 | US5929529 Reticle semiconductor wafer, and semiconductor chip |
| 07/27/1999 | US5929457 Charged particle beam transfer apparatus |
| 07/27/1999 | US5929451 Symmetric magnetic doublet for charged particle beam lithography |
| 07/27/1999 | US5929271 A 2-hydroxy-3-pinanone (meth) acrylate |
| 07/27/1999 | US5929176 Vinyl 4-tetrahydropyranyloxybenzal-vinyl 4-hydroxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer, vinyl 4-tetrahydropyranyloxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer and preparation methods thereof |
| 07/27/1999 | US5929130 Photocurable resin compositions for plastic molds |
| 07/27/1999 | US5928856 Thermographic imaging element |
| 07/27/1999 | US5928855 Comprising a first low energy reducing agent, a second high energy reducing agent and a third reducing agent a silicon compound or a polysiloxane containing at least one silicon-hydrogen bond for reducing silver salt |
| 07/27/1999 | US5928841 Forming pattern by depositing on substrate light sensitive layer comprising aromatic compound having conjugated double bonds, exposing to electromagnetic radiation of specified wavelength, developing |
| 07/27/1999 | US5928840 Patterning material and patterning method |
| 07/27/1999 | US5928839 Coating metal layers with layers of curable photoimageable composition, polymerizable acrylate monomer, oligomer formed by reaction of an epoxy resin and acrylic or methacrylic acid, photosensitive initiator, epoxy resin, curing agent, curing |
| 07/27/1999 | US5928837 Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds |
| 07/27/1999 | US5928836 Fractionated novolak resin copolymer and photoresist composition therefrom |
| 07/27/1999 | US5928834 Spot gloss film for color images |
| 07/27/1999 | US5928833 Radiation-sensitive materials |
| 07/27/1999 | US5928822 Method for confirming optimum focus of stepper |
| 07/27/1999 | US5928820 Method for measuring pattern line width during manufacture of a semiconductor device |
| 07/27/1999 | US5928819 Setting up two different indices of refraction dependent upon the alignment of polymer fibrils |
| 07/27/1999 | US5928818 Photoresist compositions |
| 07/27/1999 | US5928430 For stripping photoresists, paints |
| 07/27/1999 | US5927303 Substrate processing apparatus |
| 07/27/1999 | US5927205 Silicon-containing operating surface; silicon particles created on the operating surface during writing and/or imaging are removed by contact between the operating surface and the cleaning cylinder |
| 07/27/1999 | CA2167395C Osmotic devices having vapor-permeable coatings |
| 07/22/1999 | WO1999036950A1 Exposure system, exposure apparatus, and coating developing exposure apparatus |
| 07/22/1999 | WO1999036949A1 Exposure method and lithography system, exposure apparatus and method of producing the apparatus, and method of producing device |
| 07/22/1999 | WO1999036832A1 Illuminating device and exposure apparatus |
| 07/22/1999 | WO1999036831A1 Process for preparing a radiation-sensitive composition |
| 07/22/1999 | WO1999036259A1 Direct write imaging medium |
| 07/22/1999 | WO1999036151A1 Method of purifying photoacid generators for use in photoresist compositions |
| 07/22/1999 | DE19860832A1 New 2-carboxy-5-hydroxy-6-norbornyl (meth)acrylate, ester and copolymers useful in photoresist, e.g. for structurizing silicon wafer |
| 07/22/1999 | DE19860809A1 New di-tert.-butyl 5-norbornene-2.3-dicarboxylate and copolymers useful in photoresist, e.g. for structurizing silicon wafer |
| 07/22/1999 | DE19843179A1 Production of semiconductor device especially with very fine pattern |
| 07/22/1999 | DE19837037A1 Reticle for stepwise and repetition illumination in semiconductor manufacture |
| 07/22/1999 | DE19816220C1 Photomask blank earthing monitoring method for DRAM or logic circuit mfr. |
| 07/21/1999 | EP0930652A1 Portion of metallization of integrated circuit |
| 07/21/1999 | EP0930549A1 Optic for a total internal reflection (TIR) holographic system |
| 07/21/1999 | EP0930543A1 Dyed photoresists and methods and articles of manufacture comprising same |
| 07/21/1999 | EP0930542A1 Polymers and photoresist compositions for short wavelength imaging |
| 07/21/1999 | EP0930541A1 Radiation sensitive resin composition |
| 07/21/1999 | EP0930540A1 Photosensitive composition and use thereof |
| 07/21/1999 | EP0930539A1 Image-forming medium |
| 07/21/1999 | EP0930499A1 Automatic visual inspection apparatus, automatic visual inspection method, and recording medium having recorded an automatic visual inspection program |