| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/13/1999 | EP0890878A2 Development material and process for the production of a negative colour proof, and process for the production of both a positive and negative colour proof on a single image-receiving material. |
| 01/13/1999 | EP0890188A1 Method of processing a semiconductor wafer for controlling drive current |
| 01/13/1999 | EP0890137A1 Articulated platform mechanism for laser pattern generation on a workpiece |
| 01/13/1999 | EP0890136A1 Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device |
| 01/13/1999 | EP0805828B1 Metal ion reduction in novolak resins solution in pgmea by chelating ion exchange resin |
| 01/13/1999 | CN1205013A Light-absorbing polymer, method for synthesizing thereof and film-forming composition and antireflection film prepared using said polymer |
| 01/13/1999 | CN1204862A Transmission system for synchrotron radiation light |
| 01/13/1999 | CN1204860A Partial collective mask for charged particle beam |
| 01/13/1999 | CN1204698A Tunable and removable plasma deposited antireflective coatings |
| 01/13/1999 | CN1204663A Photosensitive mixture and recording material produced therefrom |
| 01/13/1999 | CN1204590A Technology for making matel plane decorative exquisite photograph and scripts and paintings |
| 01/12/1999 | US5859690 Method of dividing and exposing patterns |
| 01/12/1999 | US5859478 Semiconductor device including a main alignment mark having peripheral minute alignment marks |
| 01/12/1999 | US5859424 Method for measuring a sample |
| 01/12/1999 | US5859085 Preparing pyrrole-silver complex; precipitation to form a white polycrystalline photosensitive powder; dissolving; casting onto surface; photopolymerizing to form a metal-loaded polymer film of low electroconductivity |
| 01/12/1999 | US5859084 Radiation-curable compositions containing photoinitiators linked by a covalent bond |
| 01/12/1999 | US5858940 Printing plate image deletion composition |
| 01/12/1999 | US5858822 Method for producing semiconductor device |
| 01/12/1999 | US5858627 Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers |
| 01/12/1999 | US5858626 Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
| 01/12/1999 | US5858625 Projecting exposure light transmitted through phase shifting mask onto photoresist placed on film to be etched for photosensitizing photoresist |
| 01/12/1999 | US5858623 Ion implanted patterned photoresist layer will not substantially outgas when it is exposed to a second ion beam |
| 01/12/1999 | US5858622 Depositing metal plating layer on substrate, depositing metal ground plane layer on second surface, applying photoresist, providing patterned x-ray mask, exposing to x-rays, developing, electroplating metal on exposed plating layer |
| 01/12/1999 | US5858621 Bi-layer silylation process using anti-reflective-coatings (ARC) for making distortion-free submicrometer photoresist patterns |
| 01/12/1999 | US5858620 Semiconductor device and method for manufacturing the same |
| 01/12/1999 | US5858619 Separating rows and columns of sub-pixels on a faceplate of a flat panel display device: applying and removing layers of photo-imageable material and layers of conductive material |
| 01/12/1999 | US5858618 Photopolymerizable resinous composition |
| 01/12/1999 | US5858617 Composition comprising unsaturated compound and pyrazoloazole methine or dimethine dye photoinitiator; non-staining, sensitivity, storage stability |
| 01/12/1999 | US5858616 Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same |
| 01/12/1999 | US5858615 Containing triazine compound |
| 01/12/1999 | US5858614 Polyphenyl resin containing 9,9-diarylfluorene units |
| 01/12/1999 | US5858609 Image-forming material and method for forming transferred image |
| 01/12/1999 | US5858607 Receiver, rough hydrophilic surface, polycyanoacrylate binder and support |
| 01/12/1999 | US5858606 Hydrophilic support; organometallic compound; reducing agent |
| 01/12/1999 | US5858605 Photoresist coating comprising alkali soluble resin and photoactive compound, reaction product of vinyl ether and ortho-naphthoquinonediazide sulfonyl compound, dissolved in solvent |
| 01/12/1999 | US5858604 Presensitized lithographic printing plate and method for preparing lithographic printing plate |
| 01/12/1999 | US5858603 Support material for making color test prints in the analog proof system |
| 01/12/1999 | US5858590 Method for forming photoresist patterns |
| 01/12/1999 | US5858589 Intensity modulated stochastic screening for preparing a lithographic printing plate |
| 01/12/1999 | US5858587 Positioning system and method and apparatus for device manufacture |
| 01/12/1999 | US5858584 Positive photosensitive resin composition and electronic apparatus using the same |
| 01/12/1999 | US5858581 Method of producing a display having a patternable conductive traces |
| 01/12/1999 | US5858580 Phase shifting circuit manufacture method and apparatus |
| 01/12/1999 | US5858578 Photo masks for developing planar layers in a semiconductor device, and methods of forming the same |
| 01/12/1999 | US5858518 Insulating layer comprising polyimide resin; dimensional stability |
| 01/12/1999 | US5858475 Dispersing coating upon substrate mounted on rotatable chuck; planarizing top surface of coating through agitation by ultrasonic waves |
| 01/12/1999 | US5858466 Photoresist supply system with air venting |
| 01/12/1999 | US5858459 Cassette invertor apparatus and method |
| 01/12/1999 | US5858188 Acrylic microchannels and their use in electrophoretic applications |
| 01/12/1999 | US5858106 Cleaning method for peeling and removing photoresist |
| 01/12/1999 | US5857619 In a conduit |
| 01/12/1999 | US5857258 Electrical test structure and method for measuring the relative locations of conductive features on an insulating substrate |
| 01/12/1999 | CA2131670C Electron beam lithography system |
| 01/07/1999 | WO1999000828A1 Method of manufacturing semiconductor device |
| 01/07/1999 | WO1999000707A1 Developing solution for resists |
| 01/07/1999 | WO1999000706A1 Transferring a programmable pattern by photon lithography |
| 01/07/1999 | WO1999000705A1 Methods of forming raised and recessed patterns and use of the patterns in the manufacture of liquid crystal display color filters |
| 01/07/1999 | WO1999000704A1 Radiation-sensitive resist composition with high heat resistance |
| 01/07/1999 | WO1999000703A1 Method of preparing a water-less lithographic printing form |
| 01/07/1999 | WO1999000691A1 Monolithic multi-faceted mirror for combining multiple beams from different light sources by reflection |
| 01/07/1999 | WO1999000444A1 Functionalized poly(alkylene carbonate), and use thereof |
| 01/07/1999 | WO1998038597A3 Data-conversion method for a multibeam laser writer for very complex microlithographic patterns |
| 01/07/1999 | EP0889367A1 Method for forming a photoresist pattern |
| 01/07/1999 | EP0889366A1 Method of providing microscopic features |
| 01/07/1999 | EP0889365A1 Apparatus for exposing and developing printing plates |
| 01/07/1999 | EP0889364A1 Method of treating a support suitable for use in the base of a lithographic printing plate |
| 01/07/1999 | EP0889363A1 Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes |
| 01/07/1999 | EP0889362A1 Photopolymerizable composition and dry film resist |
| 01/07/1999 | EP0889361A1 Initiators for cationic polymerization |
| 01/07/1999 | EP0889360A1 Reactive resin mixtures and their use |
| 01/07/1999 | EP0889359A2 Etching method for manufacture of a phase-shift mask |
| 01/07/1999 | EP0888578A1 Solutions and processes for removal of sidewall residue after dry-etching |
| 01/07/1999 | EP0888577A1 Industrial method and device for preparing lightened or pre-lightened positive plates for offset printing |
| 01/07/1999 | EP0888576A1 Production of water-less lithographic plates |
| 01/07/1999 | EP0888570A1 Reticular objective for microlithography-projection exposure installations |
| 01/07/1999 | EP0888395A1 Polymers with 2,3-dihydrofurane groups |
| 01/07/1999 | EP0888389A1 Photoactivatable chain transfer agents |
| 01/07/1999 | EP0664016B1 Method for preparing and using a screen printing stencil having raised edges |
| 01/07/1999 | CA2295635A1 Transferring a programmable pattern by photon lithography |
| 01/06/1999 | CN1204071A Projection exposure device and method, amplitude image diffirence appraising method and image diffirence eliminating light filter |
| 01/05/1999 | USH1774 Projecting exposure apparatus and method of exposing a circuit substrate |
| 01/05/1999 | US5857127 Apparatus for the photoresist development process of an integrated circuit fabrication |
| 01/05/1999 | US5856991 Very narrow band laser |
| 01/05/1999 | US5856884 Projection lens systems |
| 01/05/1999 | US5856677 Pattern projection method with charged particle beam and charged particle beam projection system |
| 01/05/1999 | US5856561 Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions |
| 01/05/1999 | US5856521 High transmittance to deep ultraviolet light gives a resists film excellent in resistance to etching and used to prepare resist; monomer contains a protected terminal hydroxy group |
| 01/05/1999 | US5856411 Resins for use in chemically amplified resists and manufacturing methods thereof |
| 01/05/1999 | US5856373 Dental visible light curable epoxy system with enhanced depth of cure |
| 01/05/1999 | US5856241 Method of manufacturing semiconductor device |
| 01/05/1999 | US5856071 Copolymer of a silicon containing acrylate and another acrylate; polarity cahnges after radiation becoming solublein an aqueous alkali solution |
| 01/05/1999 | US5856069 T-shaped pattern |
| 01/05/1999 | US5856067 Transistors, integrated circuits; width different from pattern on mask |
| 01/05/1999 | US5856066 Hydrogen-abstracting agent which can abstract hydrogen atoms from a compound upon irradiation with an active radiation |
| 01/05/1999 | US5856065 Blend containing photoinitiator and organosilicon compound |
| 01/05/1999 | US5856064 Dry peel-apart imaging or proofing system |
| 01/05/1999 | US5856062 Light-sensitive material comprising light-sensitive hardening layer provided on support |
| 01/05/1999 | US5856061 Production of color proofs and printing plates |
| 01/05/1999 | US5856060 Image forming material and image forming method employing the same |
| 01/05/1999 | US5856059 Photosensitive resin composition |